DK228689A - Beskyttende flerlagsbelaegning til beskyttelse af et substrat og fremgangsmaade til frembringelse af en saadan belaegning - Google Patents

Beskyttende flerlagsbelaegning til beskyttelse af et substrat og fremgangsmaade til frembringelse af en saadan belaegning Download PDF

Info

Publication number
DK228689A
DK228689A DK228689A DK228689A DK228689A DK 228689 A DK228689 A DK 228689A DK 228689 A DK228689 A DK 228689A DK 228689 A DK228689 A DK 228689A DK 228689 A DK228689 A DK 228689A
Authority
DK
Denmark
Prior art keywords
coating
substrate
protect
procedure
making
Prior art date
Application number
DK228689A
Other languages
Danish (da)
English (en)
Other versions
DK228689D0 (da
Inventor
Jean-Marie Gauthier
Francois Coeuret
Claude Bonet
Original Assignee
Air Liquide
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide filed Critical Air Liquide
Publication of DK228689D0 publication Critical patent/DK228689D0/da
Publication of DK228689A publication Critical patent/DK228689A/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3435—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising a nitride, oxynitride, boronitride or carbonitride
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3441—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising carbon, a carbide or oxycarbide
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/34—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions
    • C03C17/3411—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials
    • C03C17/3429—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating
    • C03C17/3482—Surface treatment of glass, not in the form of fibres or filaments, by coating with at least two coatings having different compositions with at least two coatings of inorganic materials at least one of the coatings being a non-oxide coating comprising silicon, hydrogenated silicon or a silicide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/02—Pretreatment of the material to be coated
    • C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
    • C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/308—Oxynitrides
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02T—CLIMATE CHANGE MITIGATION TECHNOLOGIES RELATED TO TRANSPORTATION
    • Y02T50/00—Aeronautics or air transport
    • Y02T50/60—Efficient propulsion technologies, e.g. for aircraft
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24942—Structurally defined web or sheet [e.g., overall dimension, etc.] including components having same physical characteristic in differing degree
    • Y10T428/2495—Thickness [relative or absolute]
    • Y10T428/24967—Absolute thicknesses specified
    • Y10T428/24975—No layer or component greater than 5 mils thick
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31507—Of polycarbonate
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/31504—Composite [nonstructural laminate]
    • Y10T428/31652—Of asbestos
    • Y10T428/31663—As siloxane, silicone or silane

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Inorganic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Laminated Bodies (AREA)
  • Chemical Vapour Deposition (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Wrappers (AREA)
  • Formation Of Insulating Films (AREA)
  • Medicines That Contain Protein Lipid Enzymes And Other Medicines (AREA)
  • Compression Or Coding Systems Of Tv Signals (AREA)
  • Magnetic Record Carriers (AREA)
  • Optical Record Carriers And Manufacture Thereof (AREA)
DK228689A 1988-05-11 1989-05-10 Beskyttende flerlagsbelaegning til beskyttelse af et substrat og fremgangsmaade til frembringelse af en saadan belaegning DK228689A (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR8806369A FR2631346B1 (fr) 1988-05-11 1988-05-11 Revetement protecteur multicouche pour substrat, procede de protection de substrat par depot par plasma d'un tel revetement, revetements obtenus et leurs applications

Publications (2)

Publication Number Publication Date
DK228689D0 DK228689D0 (da) 1989-05-10
DK228689A true DK228689A (da) 1989-11-13

Family

ID=9366231

Family Applications (1)

Application Number Title Priority Date Filing Date
DK228689A DK228689A (da) 1988-05-11 1989-05-10 Beskyttende flerlagsbelaegning til beskyttelse af et substrat og fremgangsmaade til frembringelse af en saadan belaegning

Country Status (11)

Country Link
US (1) US5116665A (de)
EP (1) EP0345107B1 (de)
JP (1) JPH0230764A (de)
KR (1) KR890017185A (de)
AT (1) ATE72544T1 (de)
DE (1) DE68900824D1 (de)
DK (1) DK228689A (de)
ES (1) ES2038834T3 (de)
FI (1) FI892268A7 (de)
FR (1) FR2631346B1 (de)
NO (1) NO891902L (de)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5278243A (en) * 1992-01-14 1994-01-11 Soane Technologies, Inc. High impact resistant macromolecular networks
FR2661688B1 (fr) * 1990-05-02 1992-07-17 Air Liquide Revetement multicouche pour substrat polycarbonate et procede d'elaboration d'un tel revetement.
FR2664294B1 (fr) * 1990-07-06 1992-10-23 Plasmametal Procede de metallisation d'une surface.
JP2874298B2 (ja) * 1990-07-24 1999-03-24 日本板硝子株式会社 磁気記録媒体およびその製造方法
US5234748A (en) * 1991-06-19 1993-08-10 Ford Motor Company Anti-reflective transparent coating with gradient zone
DE4404690A1 (de) * 1994-02-15 1995-08-17 Leybold Ag Verfahren zur Erzeugung von Sperrschichten für Gase und Dämpfe auf Kunststoff-Substraten
FR2741328B1 (fr) * 1995-11-20 1997-12-19 Commissariat Energie Atomique Boite de stockage d'un objet destine a etre protege d'une contamination physico-chimique
FR2756663B1 (fr) * 1996-12-04 1999-02-26 Berenguer Marc Procede de traitement d'un substrat semi-conducteur comprenant une etape de traitement de surface
EP0848083A3 (de) * 1996-12-12 2001-03-07 Eastman Kodak Company Anorganische und diamantartiger Kohlenstoff-Schutzschichten und Verfahren zu deren Herstellung bei Raumtemperatur
US5879775A (en) * 1996-12-12 1999-03-09 Eastman Kodak Compnay Protective inorganic and DLC coatings for plastic media such as plastic cards
FR2759362B1 (fr) * 1997-02-10 1999-03-12 Saint Gobain Vitrage Substrat transparent muni d'au moins une couche mince a base de nitrure ou d'oxynitrure de silicium et son procede d'obtention
US6203898B1 (en) * 1997-08-29 2001-03-20 3M Innovatave Properties Company Article comprising a substrate having a silicone coating
US6251802B1 (en) 1998-10-19 2001-06-26 Micron Technology, Inc. Methods of forming carbon-containing layers
DE19958473A1 (de) * 1999-12-04 2001-06-07 Bosch Gmbh Robert Verfahren zur Herstellung von Kompositschichten mit einer Plasmastrahlquelle
KR100562783B1 (ko) * 2003-08-08 2006-03-20 남상욱 렌즈 가공 시의 축 이동과 표면손상을 방지하기 위하여 보호막을 형성시킨 안경렌즈의 제조방법
US20050238816A1 (en) * 2004-04-23 2005-10-27 Li Hou Method and apparatus of depositing low temperature inorganic films on plastic substrates
RU2007119782A (ru) * 2004-10-29 2008-12-10 Дау Глобал Текнолоджиз Инк. (Us) Износостойкие покрытия, полученные посредством плазменного химического осаждения из паровой фазы
DE102005007825B4 (de) * 2005-01-10 2015-09-17 Interpane Entwicklungs-Und Beratungsgesellschaft Mbh Verfahren zur Herstellung einer reflexionsmindernden Beschichtung, reflexionsmindernde Schicht auf einem transparenten Substrat sowie Verwendung einer derartigen Schicht
FR2976577B1 (fr) * 2011-06-17 2014-03-28 Saint Gobain Procede de fabrication d'un vitrage comprenant une couche poreuse

Family Cites Families (25)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS554040A (en) * 1978-06-26 1980-01-12 Hitachi Ltd Photoconductive material
US4239819A (en) * 1978-12-11 1980-12-16 Chemetal Corporation Deposition method and products
BG32652A1 (en) * 1980-03-13 1982-09-15 Kolev Method for surface laying of metals on synthetic, natural and artificial polymers
DE3117037C2 (de) * 1980-05-08 1987-05-14 Takao Sakai Osaka Kawamura Elektrophotografisches Aufzeichnungsmaterial
JPS57177156A (en) * 1981-04-24 1982-10-30 Canon Inc Photoconductive material
EP0309000B1 (de) * 1981-07-17 1992-10-14 Kanegafuchi Kagaku Kogyo Kabushiki Kaisha Amorpher Halbleiter und photovoltaische Vorrichtung aus amorphem Silizium
JPS5826052A (ja) * 1981-08-06 1983-02-16 Asahi Glass Co Ltd アルカリ拡散防止酸化ケイ素膜付ガラス体
US4460669A (en) * 1981-11-26 1984-07-17 Canon Kabushiki Kaisha Photoconductive member with α-Si and C, U or D and dopant
DE3307573A1 (de) * 1982-03-04 1983-09-15 Canon K.K., Tokyo Fotoleitfaehiges aufzeichnungselement
US4486521A (en) * 1982-03-16 1984-12-04 Canon Kabushiki Kaisha Photoconductive member with doped and oxygen containing amorphous silicon layers
US4490454A (en) * 1982-03-17 1984-12-25 Canon Kabushiki Kaisha Photoconductive member comprising multiple amorphous layers
JPS5996137A (ja) * 1982-11-25 1984-06-02 Shin Etsu Chem Co Ltd 塩化ビニル系樹脂複合製品の製造方法
US4666808A (en) * 1983-04-01 1987-05-19 Kyocera Corp. Amorphous silicon electrophotographic sensitive member
JPS6014248A (ja) * 1983-07-06 1985-01-24 Fuji Photo Film Co Ltd 電子写真用感光体
JPH0616177B2 (ja) * 1983-07-27 1994-03-02 キヤノン株式会社 電子写真用光導電部材
US4546008A (en) * 1983-11-07 1985-10-08 Canon Kabushiki Kaisha Method for forming a deposition film
DE3546544C2 (de) * 1984-02-28 1990-02-15 Sharp K.K., Osaka, Jp
JPH0685391B2 (ja) * 1984-10-09 1994-10-26 キヤノン株式会社 堆積膜形成方法
US4668365A (en) * 1984-10-25 1987-05-26 Applied Materials, Inc. Apparatus and method for magnetron-enhanced plasma-assisted chemical vapor deposition
US4721631A (en) * 1985-02-14 1988-01-26 Sharp Kabushiki Kaisha Method of manufacturing thin-film electroluminescent display panel
JPH084071B2 (ja) * 1985-12-28 1996-01-17 キヤノン株式会社 堆積膜形成法
US4841328A (en) * 1986-08-04 1989-06-20 Sanyo Electric Co., Ltd. Electrostatic recording apparatus
US4847157A (en) * 1986-08-28 1989-07-11 Libbey-Owens-Ford Co. Glass coating method and resulting article
US4777090A (en) * 1986-11-03 1988-10-11 Ovonic Synthetic Materials Company Coated article and method of manufacturing the article
FR2614317B1 (fr) * 1987-04-22 1989-07-13 Air Liquide Procede de protection de substrat polymerique par depot par plasma de composes du type oxynitrure de silicium et dispositif pour sa mise en oeuvre.

Also Published As

Publication number Publication date
JPH0230764A (ja) 1990-02-01
EP0345107B1 (de) 1992-02-12
NO891902L (no) 1989-11-13
FR2631346A1 (fr) 1989-11-17
FI892268L (fi) 1989-11-12
FI892268A7 (fi) 1989-11-12
ES2038834T3 (es) 1993-08-01
DE68900824D1 (de) 1992-03-26
FR2631346B1 (fr) 1994-05-20
FI892268A0 (fi) 1989-05-10
ATE72544T1 (de) 1992-02-15
EP0345107A1 (de) 1989-12-06
KR890017185A (ko) 1989-12-15
DK228689D0 (da) 1989-05-10
NO891902D0 (no) 1989-05-10
US5116665A (en) 1992-05-26

Similar Documents

Publication Publication Date Title
DK228689A (da) Beskyttende flerlagsbelaegning til beskyttelse af et substrat og fremgangsmaade til frembringelse af en saadan belaegning
MX9401182A (es) Aparato de recubrimiento, procedimiento de recubrimiento de vidrio, compuestos y composiciones para recubrir vidrio y sustratos de vidrio recubiertos.
DK1147065T3 (da) Smudsresistent coating til glasoverflader
TW363919B (en) Coated plastic substrate
DK1017880T3 (da) Fremgangsmåde og sammensætninger til at forhindre korrosion af metalsubstrater
IL133820A0 (en) Method and apparatus for fabrication of thin films by chemical vapor deposition
ES2118866T3 (es) Procedimiento para producir capas oxidicas de silicio, resistentes al rayado, sobre plasticos mediante recubrimiento plasmatico.
EP0099724A3 (de) Aufbringung von Schichten auf Substraten unter Verwendung eines, sich nicht im lokalen thermodynamischen Gleichgewicht befindenden, Hochdruck-Plasmabogens
ES2040161A1 (es) Herramienta de corte con revestimiento cvd y pvd enriquecido con aglutinante.
FI932395A0 (fi) Minskning av nedbrytning av polymersubstrat foerorsakad av ultraviolettstraolning
AU1508695A (en) Process for plasma-enhanced chemical vapor deposition of anti-fog and anti-scratch coatings onto various substrates
TW376405B (en) Lithium and potassium copolysilicate barrier coatings
ATE253533T1 (de) Harte kratzfeste beschichtungen für substrate
DK0506552T3 (da) Fremgangsmåde til behandling af eksempelvis overfladen af et substrat ved plasmafluxspraying samt anordning til udøvelse af fremgangsmåden
BR9909962A (pt) Processo para a preparação de revestimentos protetores de uv por deposição realçada de plasma
NO932182D0 (no) Barrierefilm og fremgangsmaate for fremtilling derav
DE60211597D1 (de) PECVD von Siliciumdioxidfilmen von optischer Qualität
DE59704351D1 (de) Vakuum-Beschichtungsanlage zum Aufdampfen von Vergütungsschichten auf optische Substrate
IT1187818B (it) Procedimento per formare un rivestimento su un substrato particolarmente per formare rivestimenti soppressori di iridescenza su substrati di vetro
ZA961390B (en) Process for producing a protecting coating on a surface of a glass or ceramic article
DE69402139D1 (de) Plasma Reaktor für Abscheidung- oder Ätz-Prozess
EP0607787A3 (de) Vorrichtung zum Beschichten oder Ätzen von Substraten.
WO2001007249A3 (de) Organische schutzschicht für vakuumtechnisch bearbeitete produkte
DE69505837D1 (de) Beschichtungen mit niedriger oberflächenenergie
DE59705983D1 (de) Verfahren zum Aufdampfen von Vergütungsschichten auf optische Substrate