ATE88026T1 - Verfahren zur herstellung waermebestaendiger strukturierter schichten. - Google Patents

Verfahren zur herstellung waermebestaendiger strukturierter schichten.

Info

Publication number
ATE88026T1
ATE88026T1 AT87112551T AT87112551T ATE88026T1 AT E88026 T1 ATE88026 T1 AT E88026T1 AT 87112551 T AT87112551 T AT 87112551T AT 87112551 T AT87112551 T AT 87112551T AT E88026 T1 ATE88026 T1 AT E88026T1
Authority
AT
Austria
Prior art keywords
layer
film
layers
produced
light
Prior art date
Application number
AT87112551T
Other languages
German (de)
English (en)
Inventor
Hellmut Dr Ahne
Winfried Plundrich
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Application granted granted Critical
Publication of ATE88026T1 publication Critical patent/ATE88026T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/143—Electron beam
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/146—Laser beam

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Laminated Bodies (AREA)
  • Non-Metallic Protective Coatings For Printed Circuits (AREA)
  • Ceramic Products (AREA)
  • Chemical Vapour Deposition (AREA)
  • Processes Of Treating Macromolecular Substances (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Glass Compositions (AREA)
  • Insulated Conductors (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Ultra Sonic Daignosis Equipment (AREA)
  • Electrotherapy Devices (AREA)
  • Management, Administration, Business Operations System, And Electronic Commerce (AREA)
AT87112551T 1986-09-11 1987-08-28 Verfahren zur herstellung waermebestaendiger strukturierter schichten. ATE88026T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE3630997 1986-09-11
EP87112551A EP0259723B1 (fr) 1986-09-11 1987-08-28 Procédé de fabrication de couches structurées résistantes à la chaleur

Publications (1)

Publication Number Publication Date
ATE88026T1 true ATE88026T1 (de) 1993-04-15

Family

ID=6309397

Family Applications (1)

Application Number Title Priority Date Filing Date
AT87112551T ATE88026T1 (de) 1986-09-11 1987-08-28 Verfahren zur herstellung waermebestaendiger strukturierter schichten.

Country Status (8)

Country Link
US (1) US4975347A (fr)
EP (1) EP0259723B1 (fr)
JP (1) JPS6389846A (fr)
KR (1) KR880004351A (fr)
AT (1) ATE88026T1 (fr)
DE (1) DE3785277D1 (fr)
DK (1) DK471887A (fr)
FI (1) FI873945L (fr)

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5268256A (en) * 1990-08-02 1993-12-07 Ppg Industries, Inc. Photoimageable electrodepositable photoresist composition for producing non-tacky films
AU649695B2 (en) * 1990-08-02 1994-06-02 Ppg Industries Ohio, Inc. Photoimageable electrodepositable photoresist composition
SG50586A1 (en) * 1991-07-26 2000-05-23 Rolic Ag Liquid crystal display cell
JPH0756336A (ja) * 1993-06-07 1995-03-03 Ajinomoto Co Inc 樹脂組成物
US6048375A (en) * 1998-12-16 2000-04-11 Norton Company Coated abrasive
US6509138B2 (en) * 2000-01-12 2003-01-21 Semiconductor Research Corporation Solventless, resistless direct dielectric patterning
US20100299773A1 (en) * 2009-05-20 2010-11-25 Monsanto Technology Llc Methods and compositions for selecting an improved plant
DE102013106736B3 (de) * 2013-06-27 2014-12-04 Von Ardenne Anlagentechnik Gmbh Transportwalze und Transporteinrichtung für eine horizontale Durchlauf-Substratbehandlungsanlage
US11485904B2 (en) * 2017-02-20 2022-11-01 Samsung Electronics Co., Ltd. Layered structures, production methods thereof, and liquid crystal display including the same

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL87862C (fr) * 1951-08-20
US2997391A (en) * 1957-04-22 1961-08-22 Time Inc Photosensitive polyamide resins containing stilbene units in the molecule
US3644289A (en) * 1969-05-29 1972-02-22 Upjohn Co Light sensitive polyurethanes prepared from hydroxyl containing polymer and an isocyanato-stilbene compound
US3694415A (en) * 1970-07-15 1972-09-26 Kiyoshi Honda Coating resinous composition
US4304923A (en) * 1979-02-27 1981-12-08 Minnesota Mining And Manufacturing Company Photopolymerizable oligomer
US4390615A (en) * 1979-11-05 1983-06-28 Courtney Robert W Coating compositions
US4587204A (en) * 1983-08-29 1986-05-06 General Electric Company Photopatternable dielectric compositions, method for making and use
JPS61132947A (ja) * 1984-11-30 1986-06-20 Hitachi Chem Co Ltd 感光性樹脂組成物

Also Published As

Publication number Publication date
EP0259723A2 (fr) 1988-03-16
JPS6389846A (ja) 1988-04-20
FI873945A0 (fi) 1987-09-11
KR880004351A (ko) 1988-06-03
FI873945A7 (fi) 1988-03-12
EP0259723B1 (fr) 1993-04-07
US4975347A (en) 1990-12-04
FI873945L (fi) 1988-03-12
DK471887D0 (da) 1987-09-10
EP0259723A3 (en) 1988-12-07
DE3785277D1 (de) 1993-05-13
DK471887A (da) 1988-03-12

Similar Documents

Publication Publication Date Title
ATE37242T1 (de) Verfahren zur herstellung einer schutzschicht oder einer reliefabbildung.
JPS61220328A (ja) リフト・オフ・マスクの製造方法
DE3860511D1 (de) Verfahren zur herstellung von leiterplatten.
ATE3336T1 (de) Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen, danach hergestellte reliefstrukturen und deren verwendung.
ATE88026T1 (de) Verfahren zur herstellung waermebestaendiger strukturierter schichten.
DE69513424D1 (de) Verfahren zur Herstellung einer Matrize zur Erzeugung optischer Scheiben ohne Benutzung einer Hauptplatte
EP0259727A3 (fr) Procédé de fabrication de couches structurées résistantes à la chaleur à base d'époxydes
ATE60927T1 (de) Verfahren zur herstellung waermebestaendiger strukturierter schichten und deren verwendung.
CA2091286A1 (fr) Methode d'imagerie directe pour former un masque de resine photosensible sur une surface et son utilisation dans la fabrication des cartes de circuits imprimes
DE3169802D1 (en) Process for the production of highly heat-resistant relief structures, and their use
KR910009126A (ko) 금속 패턴(pattern)의 제조방법
ATE32957T1 (de) Verfahren zur herstellung von polyimidazol- und polyimidazopyrrolon-reliefstrukturen.
JPS6113247A (ja) フオトマスクの透明欠陥を修正する方法
ATE3126T1 (de) Verfahren zur herstellung hochwaermebestaendiger reliefstrukturen, danach hergestellte reliefstrukturen und deren verwendung.
JPS63182889A (ja) プリント配線板の製造方法
JPS63141392A (ja) 印刷配線板の製造法
JPS56140345A (en) Formation of pattern
JPH07168368A (ja) レジストパターンおよび薄膜金属パターンの形成方法
KR890007620A (ko) 프린트 회로의 제조방법
SU500607A1 (ru) Способ изготовлени печатной платы
JPS6447024A (en) Formation of pattern
JPS62164737A (ja) 有機高分子体の加工方法
JPS58184146A (ja) マスク基板の製造方法
JPS6473729A (en) Formation of thin film
JPS554706A (en) Production of magnetic head

Legal Events

Date Code Title Description
REN Ceased due to non-payment of the annual fee