BE794482A - Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis - Google Patents

Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis

Info

Publication number
BE794482A
BE794482A BE794482DA BE794482A BE 794482 A BE794482 A BE 794482A BE 794482D A BE794482D A BE 794482DA BE 794482 A BE794482 A BE 794482A
Authority
BE
Belgium
Prior art keywords
alpha
compositions containing
containing cyclic
dicarbonyl compounds
photopolymerisable compositions
Prior art date
Application number
Other languages
English (en)
Inventor
C T Chang
Original Assignee
Du Pont
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Publication date
Publication of BE794482A publication Critical patent/BE794482A/fr

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D487/00—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00
    • C07D487/02—Heterocyclic compounds containing nitrogen atoms as the only ring hetero atoms in the condensed system, not provided for by groups C07D451/00 - C07D477/00 in which the condensed system contains two hetero rings
    • C07D487/04—Ortho-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C07—ORGANIC CHEMISTRY
    • C07D—HETEROCYCLIC COMPOUNDS
    • C07D241/00—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings
    • C07D241/02—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings
    • C07D241/06—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having one or two double bonds between ring members or between ring members and non-ring members
    • C07D241/08—Heterocyclic compounds containing 1,4-diazine or hydrogenated 1,4-diazine rings not condensed with other rings having one or two double bonds between ring members or between ring members and non-ring members with oxygen atoms directly attached to ring carbon atoms
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/112—Cellulosic
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/116—Redox or dye sensitizer
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/12—Nitrogen compound containing
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/114—Initiator containing
    • Y10S430/124—Carbonyl compound containing
    • Y10S430/125—Carbonyl in heterocyclic compound
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/127—Spectral sensitizer containing

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Materials For Photolithography (AREA)
BE794482D 1972-01-25 Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis BE794482A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US22069472A 1972-01-25 1972-01-25

Publications (1)

Publication Number Publication Date
BE794482A true BE794482A (fr) 1973-07-24

Family

ID=22824581

Family Applications (1)

Application Number Title Priority Date Filing Date
BE794482D BE794482A (fr) 1972-01-25 Compositions photopolymerisables contenant des composes cis- alpha -dicarbonyliques cycliques et des sensibilisateurs choisis

Country Status (5)

Country Link
US (1) US3756827A (fr)
JP (1) JPS4884183A (fr)
BE (1) BE794482A (fr)
FR (1) FR2169192B1 (fr)
GB (1) GB1415378A (fr)

Families Citing this family (62)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3930857A (en) * 1973-05-03 1976-01-06 International Business Machines Corporation Resist process
US4017652A (en) * 1974-10-23 1977-04-12 Ppg Industries, Inc. Photocatalyst system and ultraviolet light curable coating compositions containing the same
US4058442A (en) * 1975-09-15 1977-11-15 Lee Pharmaceuticals Photopolymerizable composition for formed-in-place artificial nails
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4048034A (en) * 1976-08-27 1977-09-13 Uop Inc. Photopolymerization using an alpha-aminoacetophenone
EP0002321B1 (fr) * 1977-11-29 1981-10-28 Bexford Limited Eléments photopolymérisables et procédé pour fabriquer des plaques d'impression à partir de tels éléments
BE878405A (fr) * 1978-08-24 1979-12-17 Letraset Internat Ltd Materiels photosensibles
GB2029423A (en) * 1978-08-25 1980-03-19 Agfa Gevaert Nv Photo-polymerisable materials and recording method
US4282309A (en) * 1979-01-24 1981-08-04 Agfa-Gevaert, N.V. Photosensitive composition containing an ethylenically unsaturated compound, initiator and sensitizer
EP0022188B1 (fr) * 1979-06-18 1984-10-03 EASTMAN KODAK COMPANY (a New Jersey corporation) Compositions de co-initiateurs pour photopolymérisation avec des 3-acyl-coumarines, composition photopolymérisable et élément photographique
DE3001616A1 (de) * 1980-01-17 1981-07-23 ESPE Fabrik pharmazeutischer Präparate GmbH, 8031 Seefeld Verfahren zur herstellung von zahnersatzteilen durch photopolymerisieren einer verformbaren masse
US4268667A (en) * 1980-04-21 1981-05-19 E. I. Du Pont De Nemours And Company Derivatives of aryl ketones based on 9,10-dihydro-9,10-ethanoanthracene and p-dialkyl-aminoaryl aldehydes as visible sensitizers for photopolymerizable compositions
DE3135113A1 (de) * 1981-09-04 1983-03-24 Bayer Ag, 5090 Leverkusen Photopolymerisierbare massen, deren verwendung fuer zahnaerztliche zwecke, sowie verfahren zur herstellung von zahnersatzteilen, zahnfuellungen und ueberzuegen
DE3464921D1 (en) * 1983-05-02 1987-08-27 Du Pont Constrained n-alkylamino aryl ketones as sensitizers for photopolymer compositions
USRE35135E (en) * 1983-09-28 1995-12-26 Mitsui Petrochemical Industries, Ltd. Photocurable resin composition
JPS60149603A (ja) * 1984-01-17 1985-08-07 Kuraray Co Ltd 光重合性の組成物
US4571377A (en) * 1984-01-23 1986-02-18 Battelle Memorial Institute Photopolymerizable composition containing a photosensitive donor and photoinitiating acceptor
JPH06689B2 (ja) * 1986-09-05 1994-01-05 宇部興産株式会社 光重合性歯科材料
US4894314A (en) * 1986-11-12 1990-01-16 Morton Thiokol, Inc. Photoinitiator composition containing bis ketocoumarin dialkylamino benzoate, camphorquinone and/or a triphenylimidazolyl dimer
JPS63270703A (ja) * 1986-12-09 1988-11-08 Canon Inc 光重合開始剤及び記録媒体
CA1308852C (fr) * 1987-01-22 1992-10-13 Masami Kawabata Composition photopolymerisable
CA1323949C (fr) * 1987-04-02 1993-11-02 Michael C. Palazzotto Systeme ternaire de photoinitiateur pour la polymerisation additive
US4828583A (en) * 1987-04-02 1989-05-09 Minnesota Mining And Manufacturing Company Coated abrasive binder containing ternary photoinitiator system
US4902605A (en) * 1987-07-24 1990-02-20 Eastman Kodak Company Photoresist composition comprising cyclohexyleneoxyalkyl acrylates
JPH0669928B2 (ja) * 1987-10-06 1994-09-07 宇部興産株式会社 光重合性歯科材料
DE69004245T2 (de) * 1990-02-23 1994-05-11 Minnesota Mining & Mfg Semi-thermoplastische Formmasse mit thermostabilem Formerinnerungsvermögen.
US5066231A (en) * 1990-02-23 1991-11-19 Minnesota Mining And Manufacturing Company Dental impression process using polycaprolactone molding composition
US5709548A (en) * 1990-02-23 1998-01-20 Minnesota Mining And Manufacturing Company Dental crown liner composition and methods of preparing provisional applications
US5514521A (en) * 1990-08-22 1996-05-07 Brother Kogyo Kabushiki Kaisha Photocurable composition
JP2871181B2 (ja) * 1991-07-09 1999-03-17 ブラザー工業株式会社 光硬化型組成物
JP3141517B2 (ja) 1992-05-14 2001-03-05 ブラザー工業株式会社 光硬化型組成物
US5739174A (en) * 1993-12-15 1998-04-14 Minnesota Mining And Manufacturing Company Epoxysilicone photocurable composition comprising a sulfolene or isatin photosensitizer
JPH07207188A (ja) * 1993-12-15 1995-08-08 Minnesota Mining & Mfg Co <3M> 光硬化性組成物
EP0780731B1 (fr) 1995-12-22 2002-04-17 Mitsubishi Chemical Corporation Composition photopolymérisable pour filtre couleur, filtre couleur et dispositif d'affichage à cristaux liquides
JPH09218514A (ja) * 1996-02-09 1997-08-19 Brother Ind Ltd 光硬化型組成物及び感光性カプセル
JPH11184084A (ja) 1997-12-22 1999-07-09 Brother Ind Ltd 速硬化性感光性組成物及び記録用シート
US8119041B2 (en) * 2001-09-05 2012-02-21 Fujifilm Corporation Non-resonant two-photon absorption induction method and process for emitting light thereby
US7247489B2 (en) * 2002-03-11 2007-07-24 Auburn University Ion-detecting microspheres and methods of use thereof
EP1742096A4 (fr) 2004-04-26 2008-10-01 Mitsubishi Chem Corp Composition de couleur bleue pour filtre de couleur, filtre de couleur et dispositif d'affichage d'image couleur
US20050272926A1 (en) * 2004-06-02 2005-12-08 Lee Yoon Y Non-crystalline cellulose and production thereof
JP2006065074A (ja) 2004-08-27 2006-03-09 Fuji Photo Film Co Ltd 感光性平版印刷版
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
WO2006083960A1 (fr) * 2005-01-31 2006-08-10 Beckman Coulter, Inc. Capteurs ioniques optiques à microsphères de silice dopés
EP2107089A1 (fr) 2005-06-13 2009-10-07 Toshiba TEC Kabushiki Kaisha Encre à jet d'encre, procédé d'enregistrement à jet d'encre, procédé d'évaluation d'encre à jet d'encre, et procédé de fabrication d'encre à jet d'encre
US7678252B2 (en) * 2005-06-14 2010-03-16 Auburn University Long lived anion-selective sensors based on a covalently attached metalloporphyrin as anion receptor
JP4701042B2 (ja) 2005-08-22 2011-06-15 富士フイルム株式会社 感光性平版印刷版
US8242203B2 (en) * 2005-11-10 2012-08-14 Eric Bakker Covalently attached nile blue derivatives for optical sensors
TW200807104A (en) 2006-04-19 2008-02-01 Mitsubishi Chem Corp Color image display device
JP4890408B2 (ja) 2007-09-28 2012-03-07 富士フイルム株式会社 重合性組成物及びそれを用いた平版印刷版原版、アルカリ可溶性ポリウレタン樹脂、並びに、ジオール化合物の製造方法
US8491816B2 (en) 2008-02-07 2013-07-23 Mitsubishi Chemical Corporation Semiconductor light emitting device, backlight, color image display device and phosphor to be used for them
JP5264427B2 (ja) 2008-03-25 2013-08-14 富士フイルム株式会社 平版印刷版の作製方法
JP5228631B2 (ja) 2008-05-29 2013-07-03 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5248203B2 (ja) 2008-05-29 2013-07-31 富士フイルム株式会社 平版印刷版現像用処理液及び平版印刷版の作製方法
JP5405141B2 (ja) 2008-08-22 2014-02-05 富士フイルム株式会社 平版印刷版の作製方法
AU2009283446B2 (en) 2008-08-22 2014-12-04 Fujifilm Corporation Process for producing lithographic printing plate
JP5171483B2 (ja) 2008-08-29 2013-03-27 富士フイルム株式会社 平版印刷版の作製方法
WO2011156129A1 (fr) * 2010-06-08 2011-12-15 Dow Corning Corporation Fluides hydrauliques à base de silicone
WO2013039235A1 (fr) 2011-09-15 2013-03-21 富士フイルム株式会社 Procédé de recyclage d'eaux usées produites par un procédé de fabrication de plaque
EP2762977B1 (fr) 2011-11-04 2017-09-27 FUJIFILM Corporation Procédé de recyclage d'une solution résiduaire de traitement de fabrication de plaque
EP3147335A1 (fr) 2015-09-23 2017-03-29 BYK-Chemie GmbH Compositions colorantes contenant des agents mouillants et/ou dispersants à faible indice d'amine
WO2019096893A1 (fr) 2017-11-15 2019-05-23 Byk-Chemie Gmbh Copolymère séquencé
EP3710505B1 (fr) 2017-11-15 2022-01-05 BYK-Chemie GmbH Copolymère séquencé

Also Published As

Publication number Publication date
JPS4884183A (fr) 1973-11-08
FR2169192B1 (fr) 1978-02-10
FR2169192A1 (fr) 1973-09-07
DE2302820B2 (de) 1976-04-01
DE2302820A1 (de) 1973-08-30
US3756827A (en) 1973-09-04
GB1415378A (en) 1975-11-26

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