BRPI0806610B8 - Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato - Google Patents

Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato

Info

Publication number
BRPI0806610B8
BRPI0806610B8 BRPI0806610A BRPI0806610A BRPI0806610B8 BR PI0806610 B8 BRPI0806610 B8 BR PI0806610B8 BR PI0806610 A BRPI0806610 A BR PI0806610A BR PI0806610 A BRPI0806610 A BR PI0806610A BR PI0806610 B8 BRPI0806610 B8 BR PI0806610B8
Authority
BR
Brazil
Prior art keywords
substrate
coating
face
metal
installing continuous
Prior art date
Application number
BRPI0806610A
Other languages
English (en)
Inventor
Daniel Chaleix
Daniel Jacques
Florent Sponem
Original Assignee
Arcelormittal France
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38118569&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=BRPI0806610(B8) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Arcelormittal France filed Critical Arcelormittal France
Publication of BRPI0806610A2 publication Critical patent/BRPI0806610A2/pt
Publication of BRPI0806610B1 publication Critical patent/BRPI0806610B1/pt
Publication of BRPI0806610B8 publication Critical patent/BRPI0806610B8/pt

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3457—Sputtering using other particles than noble gas ions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato" a presente invenção refere-se a um processo de revestimento de pelo menos uma face de um substrato em deslocamento, por evaporação sob vácuo de uma camada de metal ou de liga metálica suscetível de ser sublimado(a), de acordo com o qual o metal ou liga metálica é disposto em frente à face do substrato sob a forma de pelo menos dois lingotes colocados em contato um com o outro, a superfície dos lingotes voltada na direção da dita face do substrato sendo mantida paralela ao substrato e a uma distância constante desse último, no decorrer do revestimento, assim como a uma instalação de revestimento de execução do processo e a um dispositivo de alimentação em metal (1) para uma tal instalação.
BRPI0806610A 2007-01-16 2008-01-16 Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato BRPI0806610B8 (pt)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP07290054A EP1947210A1 (fr) 2007-01-16 2007-01-16 Procede de revetement d'un substrat, installation de mise en oeuvre du procede et dispositif d'alimentation en metal d'une telle installation
EP07290054.1 2007-01-16
PCT/FR2008/000046 WO2008107538A2 (fr) 2007-01-16 2008-01-16 Procédé de revêtement d'un substrat, installation de mise en oeuvre du procédé et dispositif d'alimentation en métal d'une telle installation

Publications (3)

Publication Number Publication Date
BRPI0806610A2 BRPI0806610A2 (pt) 2011-09-20
BRPI0806610B1 BRPI0806610B1 (pt) 2023-09-26
BRPI0806610B8 true BRPI0806610B8 (pt) 2024-01-09

Family

ID=38118569

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI0806610A BRPI0806610B8 (pt) 2007-01-16 2008-01-16 Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato

Country Status (17)

Country Link
US (1) US9051642B2 (pt)
EP (2) EP1947210A1 (pt)
JP (1) JP5276013B2 (pt)
KR (1) KR101472605B1 (pt)
CN (1) CN101622371B (pt)
BR (1) BRPI0806610B8 (pt)
CA (1) CA2675271C (pt)
ES (1) ES2730837T3 (pt)
HU (1) HUE043907T2 (pt)
MA (1) MA31095B1 (pt)
MX (1) MX2009007512A (pt)
PL (1) PL2111477T3 (pt)
RU (1) RU2458180C2 (pt)
TR (1) TR201908607T4 (pt)
UA (1) UA101607C2 (pt)
WO (1) WO2008107538A2 (pt)
ZA (1) ZA200904774B (pt)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017017484A1 (en) * 2015-07-30 2017-02-02 Arcelormittal Method for the manufacture of a hardened part which does not have lme issues
CN106399945B (zh) * 2016-09-30 2020-09-18 中国科学院合肥物质科学研究院 一种生物多孔镁表面生长锌合金镀层的制备方法
CN111934645B (zh) * 2020-08-13 2023-03-24 厦门市三安集成电路有限公司 铝铜合金膜层的制备方法、声表面波滤波器以及双工器

Family Cites Families (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3020177A (en) * 1959-05-13 1962-02-06 Continental Can Co Art of vaporizing materials
US3329524A (en) * 1963-06-12 1967-07-04 Temescal Metallurgical Corp Centrifugal-type vapor source
JPS60221566A (ja) * 1984-04-18 1985-11-06 Agency Of Ind Science & Technol 薄膜形成装置
JPH0740148B2 (ja) 1984-12-20 1995-05-01 キヤノン株式会社 静電荷像現像用正荷電性非磁性トナー
JPS61147260U (pt) * 1985-02-28 1986-09-11
JPS61263008A (ja) * 1985-05-16 1986-11-21 大阪特殊合金株式会社 透明導電膜の製造方法及びその装置
JPS62238358A (ja) * 1986-04-10 1987-10-19 Nippon Kokan Kk <Nkk> メツキ槽内へのインゴツト供給方法
JPS6350472A (ja) * 1986-08-19 1988-03-03 Hitachi Maxell Ltd 真空蒸着装置
JPS6473074A (en) * 1987-09-16 1989-03-17 Matsushita Electric Industrial Co Ltd Sputtering device
US5230923A (en) * 1987-12-17 1993-07-27 Toyo Ink Manufacturing Co., Ltd. Process and apparatus for the substantially continuous manufacture of a silicon oxide deposition film on a flexible plastic film
US5135817A (en) * 1988-07-06 1992-08-04 Kabushiki Kaisha Kobe Seiko Sho Zn-Mg alloy vapor deposition plated metals of high corrosion resistance, as well as method of producing them
JPH05179424A (ja) * 1991-12-26 1993-07-20 Nisshin Steel Co Ltd 表裏異種めっき鋼板
JP3060710B2 (ja) * 1992-03-11 2000-07-10 住友電装株式会社 電気接点用材料の製造方法および製造装置
US5962923A (en) * 1995-08-07 1999-10-05 Applied Materials, Inc. Semiconductor device having a low thermal budget metal filling and planarization of contacts, vias and trenches
BE1009838A3 (fr) 1995-12-20 1997-10-07 Cockerill Rech & Dev Procede et dispositif pour la formation d'un revetement sur un substrat.
ES2152506T3 (es) * 1996-03-06 2001-02-01 Alusuisse Tech & Man Ag Dispositivo para recubrir una superficie de un sustrato.
UA17473A (uk) * 1996-04-04 1997-05-06 Міжнародний Центр Електронно-Променевих Технологій Інституту Електрозварювання Ім. Є.О. Патона Нан України Спосіб отримаhhя hа підкладці захисhого покриття з градієhтом хімічhого складу та структури по товщиhі з зовhішhім керамічhим шаром
US5983976A (en) * 1998-03-31 1999-11-16 Takata Corporation Method and apparatus for manufacturing metallic parts by fine die casting
JP2001207255A (ja) * 2000-01-27 2001-07-31 Akihisa Inoue マグネシウム合金及びその製造装置ならびにその製造方法
US7062348B1 (en) * 2000-07-13 2006-06-13 The Extreme Ultaviolet Lithography Llc Dynamic mask for producing uniform or graded-thickness thin films
CN1226447C (zh) * 2003-08-26 2005-11-09 孙伟成 一种泡沫铝卷毯的生产装置及其制备方法
US6923868B2 (en) * 2003-09-23 2005-08-02 Gba S.A. Installation for electron-ray coatication of coatings
EP1518941A1 (en) * 2003-09-24 2005-03-30 Sidmar N.V. A method and apparatus for the production of metal coated steel products
JP4475968B2 (ja) * 2004-01-29 2010-06-09 三菱重工業株式会社 真空蒸着機
US20050244580A1 (en) * 2004-04-30 2005-11-03 Eastman Kodak Company Deposition apparatus for temperature sensitive materials
UA17473U (en) 2006-04-25 2006-09-15 Andrii Volodymyrovych Pantus Method for stereotopometric assessment of face proportionality

Also Published As

Publication number Publication date
EP2111477A2 (fr) 2009-10-28
UA101607C2 (ru) 2013-04-25
RU2009131034A (ru) 2011-02-27
JP2010515830A (ja) 2010-05-13
US20100068412A1 (en) 2010-03-18
CN101622371A (zh) 2010-01-06
EP1947210A1 (fr) 2008-07-23
CA2675271C (fr) 2012-04-10
WO2008107538A2 (fr) 2008-09-12
KR20090101461A (ko) 2009-09-28
ES2730837T3 (es) 2019-11-12
MA31095B1 (fr) 2010-01-04
PL2111477T3 (pl) 2019-09-30
WO2008107538A3 (fr) 2008-10-30
TR201908607T4 (tr) 2019-07-22
HUE043907T2 (hu) 2019-09-30
CA2675271A1 (fr) 2008-09-12
ZA200904774B (en) 2010-04-28
BRPI0806610B1 (pt) 2023-09-26
CN101622371B (zh) 2011-09-07
JP5276013B2 (ja) 2013-08-28
US9051642B2 (en) 2015-06-09
MX2009007512A (es) 2009-08-13
EP2111477B1 (fr) 2019-03-13
KR101472605B1 (ko) 2014-12-15
RU2458180C2 (ru) 2012-08-10
BRPI0806610A2 (pt) 2011-09-20

Similar Documents

Publication Publication Date Title
Aihua et al. Friction and wear properties of TiN, TiAlN, AlTiN and CrAlN PVD nitride coatings
Jianxin et al. Dry sliding wear behavior of PVD TiN, Ti55Al45N, and Ti35Al65N coatings at temperatures up to 600 C
Lofaj et al. Nanohardness and tribological properties of nc-TiB2 coatings
BR112014013449A2 (pt) material composto altamente estruturado e processo para a fabricação de revestimentos protetores para substratos que sofrem corrosão
EP2623632A3 (en) Method of forming a microstructure
BR112012016440A2 (pt) elemento deslizante, em particular anel de pistão, tendo um revestimento, e processo para produção de um elemento deslizante
BRPI0512880A (pt) folha de aço com revestimento de liga de zinco galvanizado por imersão a quente, e processo para produzi-la
MX2019000961A (es) Aparato y metodo para deposicion al vacio.
Tokoroyama et al. Ultra-low friction properties of carbon nitride tantalum coatings in the atmosphere
EP2172577A3 (en) Surface treatments for turbine components to reduce particle accumulation during use thereof
BRPI0806610B8 (pt) Processo de revestimento de um substrato e instalação de revestimento de modo contínuo de um substrato
AU2019268204A1 (en) Hot-dip Al-based Alloy Coated Steel Sheet Excellent in Workability
Jeon et al. Synthesis and characterization of quaternary Ti–Si–C–N coatings prepared by a hybrid deposition technique
BR112013033548A2 (pt) eixo de cames com um bloco de cames axialmente deslocável
Lin et al. Investigation on the structural and mechanical properties of anti-sticking sputtered tungsten chromium nitride films
BR112012007544A2 (pt) geometria de aplicador de revestimento não ortogonal para revestimentos aperfeiçoados em um substrato
Mei et al. Effect of nitrogen partial pressure on microstructure and mechanical properties of Mo-Cu-VN composite coatings deposited by HIPIMS
Dai et al. Influence of bias voltage on microstructure and properties of Al-containing diamond-like carbon films deposited by a hybrid ion beam system
MY168401A (en) Entry sheet for drilling
Ezirmik et al. Influence of Cu additions on the mechanical and wear properties of NbN coatings
Bobzin et al. Triboactive CrAlN+ X hybrid dcMS/HPPMS PVD nitride hard coatings for friction and wear reduction on components
BR112015032334A8 (pt) Processo para revestimento de pelo menos regiões parciais da superfície de um substrato ou para produção de substratos com uma região de superfície
BR112012031291A8 (pt) &#34;processo de preparo à baixa temperatura de revestimentos meso-estruturados eletrocondutores&#34;
Penkov et al. Frictional behavior of atmospheric plasma jet deposited carbon–ZnO composite coatings
Yang et al. The effect of deposition parameters on the mechanical properties of Cr–C–N coatings

Legal Events

Date Code Title Description
B07A Application suspended after technical examination (opinion) [chapter 7.1 patent gazette]
B09B Patent application refused [chapter 9.2 patent gazette]
B12B Appeal against refusal [chapter 12.2 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 16/01/2008, OBSERVADAS AS CONDICOES LEGAIS. PATENTE CONCEDIDA CONFORME ADI 5.529/DF, QUE DETERMINA A ALTERACAO DO PRAZO DE CONCESSAO.

B16C Correction of notification of the grant [chapter 16.3 patent gazette]

Free format text: REFERENTE A RPI 2751 DE 26/09/2023 QUANTO AO ITEM (54) TITULO.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

Free format text: REFERENTE A 18A ANUIDADE.

B24J Lapse because of non-payment of annual fees (definitively: art 78 iv lpi, resolution 113/2013 art. 12)

Free format text: EM VIRTUDE DA EXTINCAO PUBLICADA NA RPI 2862 DE 11-11-2025 E CONSIDERANDO AUSENCIA DE MANIFESTACAO DENTRO DOS PRAZOS LEGAIS, INFORMO QUE CABE SER MANTIDA A EXTINCAO DA PATENTE E SEUS CERTIFICADOS, CONFORME O DISPOSTO NO ARTIGO 12, DA RESOLUCAO 113/2013.