UA101607C2 - СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ - Google Patents

СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ

Info

Publication number
UA101607C2
UA101607C2 UAA200908469A UAA200908469A UA101607C2 UA 101607 C2 UA101607 C2 UA 101607C2 UA A200908469 A UAA200908469 A UA A200908469A UA A200908469 A UAA200908469 A UA A200908469A UA 101607 C2 UA101607 C2 UA 101607C2
Authority
UA
Ukraine
Prior art keywords
unit
substrate
metal
realization
coating
Prior art date
Application number
UAA200908469A
Other languages
English (en)
Ukrainian (uk)
Inventor
Даниэль Шале
Даниэль Жак
Флоран Спонэм
Original Assignee
Арселормиттал Франс
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=38118569&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=UA101607(C2) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Арселормиттал Франс filed Critical Арселормиттал Франс
Publication of UA101607C2 publication Critical patent/UA101607C2/ru

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/246—Replenishment of source material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/3457—Sputtering using other particles than noble gas ions
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34—Sputtering
    • C23C14/35—Sputtering by application of a magnetic field, e.g. magnetron sputtering
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/56—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks
    • C23C14/562—Apparatus specially adapted for continuous coating; Arrangements for maintaining the vacuum, e.g. vacuum locks for coating elongated substrates
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/32733—Means for moving the material to be treated
    • H01J37/32752—Means for moving the material to be treated for moving the material across the discharge
    • H01J37/32761—Continuous moving
    • H01J37/3277—Continuous moving of continuous material
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H01J37/3402—Gas-filled discharge tubes operating with cathodic sputtering using supplementary magnetic fields
    • H01J37/3405—Magnetron sputtering
    • H01J37/3408—Planar magnetron sputtering

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)

Abstract

Объектом настоящего изобретения является способ нанесения покрытия минимум на одну сторону основания, которую перемещают путем вакуумного напыления слоя металла или металлического сплава, который может сублимироваться, согласно которому в указанный металл или металлический сплав размещают напротив указанной стороны основания в размере не менее двух слитков, которые находятся в контакте друг с другом, при этом во время нанесения покрытия поверхность указанных слитков, обращенную к указанной стороне основания, удерживают параллельно основанию и на постоянном от него расстоянии, объектом изобретения является также установка нанесения покрытия для осуществления указанного способа, а также устройство подачи (1) металла для этой установки.
UAA200908469A 2007-01-16 2008-01-16 СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ UA101607C2 (ru)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
EP07290054A EP1947210A1 (fr) 2007-01-16 2007-01-16 Procede de revetement d'un substrat, installation de mise en oeuvre du procede et dispositif d'alimentation en metal d'une telle installation
PCT/FR2008/000046 WO2008107538A2 (fr) 2007-01-16 2008-01-16 Procédé de revêtement d'un substrat, installation de mise en oeuvre du procédé et dispositif d'alimentation en métal d'une telle installation

Publications (1)

Publication Number Publication Date
UA101607C2 true UA101607C2 (ru) 2013-04-25

Family

ID=38118569

Family Applications (1)

Application Number Title Priority Date Filing Date
UAA200908469A UA101607C2 (ru) 2007-01-16 2008-01-16 СПОСОБ НАНЕСЕНИЯ ПОКРЫТИЯ НА ОСНОВание, УСТАНОВКА ДЛЯ ОСУЩЕСТВЛЕНИЯ СПОСОБА И УСТРОЙСТВО ПОДАЧИ МЕТАЛЛА ДЛЯ ЭТОЙ УСТАНОВКИ

Country Status (17)

Country Link
US (1) US9051642B2 (ru)
EP (2) EP1947210A1 (ru)
JP (1) JP5276013B2 (ru)
KR (1) KR101472605B1 (ru)
CN (1) CN101622371B (ru)
BR (1) BRPI0806610B8 (ru)
CA (1) CA2675271C (ru)
ES (1) ES2730837T3 (ru)
HU (1) HUE043907T2 (ru)
MA (1) MA31095B1 (ru)
MX (1) MX2009007512A (ru)
PL (1) PL2111477T3 (ru)
RU (1) RU2458180C2 (ru)
TR (1) TR201908607T4 (ru)
UA (1) UA101607C2 (ru)
WO (1) WO2008107538A2 (ru)
ZA (1) ZA200904774B (ru)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO2017017484A1 (en) 2015-07-30 2017-02-02 Arcelormittal Method for the manufacture of a hardened part which does not have lme issues
CN106399945B (zh) * 2016-09-30 2020-09-18 中国科学院合肥物质科学研究院 一种生物多孔镁表面生长锌合金镀层的制备方法
CN111934645B (zh) * 2020-08-13 2023-03-24 厦门市三安集成电路有限公司 铝铜合金膜层的制备方法、声表面波滤波器以及双工器

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Also Published As

Publication number Publication date
EP2111477B1 (fr) 2019-03-13
EP1947210A1 (fr) 2008-07-23
US9051642B2 (en) 2015-06-09
MX2009007512A (es) 2009-08-13
ZA200904774B (en) 2010-04-28
TR201908607T4 (tr) 2019-07-22
US20100068412A1 (en) 2010-03-18
CN101622371A (zh) 2010-01-06
EP2111477A2 (fr) 2009-10-28
HUE043907T2 (hu) 2019-09-30
ES2730837T3 (es) 2019-11-12
WO2008107538A2 (fr) 2008-09-12
JP5276013B2 (ja) 2013-08-28
BRPI0806610B8 (pt) 2024-01-09
WO2008107538A3 (fr) 2008-10-30
BRPI0806610A2 (pt) 2011-09-20
MA31095B1 (fr) 2010-01-04
CA2675271C (fr) 2012-04-10
CN101622371B (zh) 2011-09-07
RU2458180C2 (ru) 2012-08-10
RU2009131034A (ru) 2011-02-27
CA2675271A1 (fr) 2008-09-12
JP2010515830A (ja) 2010-05-13
KR20090101461A (ko) 2009-09-28
KR101472605B1 (ko) 2014-12-15
BRPI0806610B1 (pt) 2023-09-26
PL2111477T3 (pl) 2019-09-30

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