BRPI1005172B8 - método de analisar fluorescência de raio-x - Google Patents

método de analisar fluorescência de raio-x

Info

Publication number
BRPI1005172B8
BRPI1005172B8 BRPI1005172A BRPI1005172A BRPI1005172B8 BR PI1005172 B8 BRPI1005172 B8 BR PI1005172B8 BR PI1005172 A BRPI1005172 A BR PI1005172A BR PI1005172 A BRPI1005172 A BR PI1005172A BR PI1005172 B8 BRPI1005172 B8 BR PI1005172B8
Authority
BR
Brazil
Prior art keywords
rays
liquid sample
continuous
primary
scattered radiation
Prior art date
Application number
BRPI1005172A
Other languages
English (en)
Inventor
Morikawa Atsushi
Watanabe Kenji
Yamada Yasujiro
Kataoka Yoshiyuki
Original Assignee
Rigaku Denki Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Rigaku Denki Co Ltd filed Critical Rigaku Denki Co Ltd
Publication of BRPI1005172A2 publication Critical patent/BRPI1005172A2/pt
Publication of BRPI1005172B1 publication Critical patent/BRPI1005172B1/pt
Publication of BRPI1005172B8 publication Critical patent/BRPI1005172B8/pt

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N23/00—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00
    • G01N23/22—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material
    • G01N23/223—Investigating or analysing materials by the use of wave or particle radiation, e.g. X-rays or neutrons, not covered by groups G01N3/00 – G01N17/00, G01N21/00 or G01N22/00 by measuring secondary emission from the material by irradiating the sample with X-rays or gamma-rays and by measuring X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/07—Investigating materials by wave or particle radiation secondary emission
    • G01N2223/076—X-ray fluorescence
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/60—Specific applications or type of materials
    • G01N2223/637—Specific applications or type of materials liquid

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)

Abstract

método de analisar fluorescência de raio-x. um método de analisar fluorescência de raio-x inclui irradiar uma amostra de líquido (3a) com raios-x primários (2), a amostra de líquido contendo pelo menos um elemento de carbono, oxigênio, nitrogênio e hidrogênio como componentes principais. o método então mede a intensidade dos raios-x fluorescentes (4) gerados de cada um dos elementos incluídos na amostra de líquido (3a) e tendo o número atômico 9 a 20 e a intensidade de radiação dispersa (12) dos raios-x contínuos produzidos pela dispersão primária de raios-x pela amostra de líquido (3a) na base da razão entre a intensidade medida de raios-x fluorescentes (4) gerada a partir de cada elemento e a intensidade medida da radiação dispersa (12) dos raios-x contínuos produzidos pelos raios-x primários. o comprimento de onda da radiação dispersa (12) dos raios-x contínuos produzidos pelos raios-x pelos primários é ajustado para ser menor que o comprimento de onda dos raios-x fluorescentes gerados a partir de cada elemento e é ajustado de forma que a intensidade medida da radiação dispersa (12) dos raios-x contínuos produzidos pelos raios-x primários e um coeficiente de absorção de massa são inversamente proporcionais um ao outro dentro da faixa de variação da composição na amostra de líquido (3a).
BRPI1005172A 2009-09-07 2010-07-01 método de analisar fluorescência de raio-x BRPI1005172B8 (pt)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2009205822 2009-09-07
PCT/JP2010/061250 WO2011027613A1 (ja) 2009-09-07 2010-07-01 蛍光ｘ線分析方法

Publications (3)

Publication Number Publication Date
BRPI1005172A2 BRPI1005172A2 (pt) 2017-04-25
BRPI1005172B1 BRPI1005172B1 (pt) 2019-09-10
BRPI1005172B8 true BRPI1005172B8 (pt) 2020-09-08

Family

ID=43638545

Family Applications (1)

Application Number Title Priority Date Filing Date
BRPI1005172A BRPI1005172B8 (pt) 2009-09-07 2010-07-01 método de analisar fluorescência de raio-x

Country Status (6)

Country Link
US (1) US8433035B2 (pt)
EP (1) EP2333529B1 (pt)
JP (1) JP4629158B1 (pt)
CN (1) CN102187208B (pt)
BR (1) BRPI1005172B8 (pt)
WO (1) WO2011027613A1 (pt)

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Publication number Priority date Publication date Assignee Title
US8433035B2 (en) 2009-09-07 2013-04-30 Rigaku Corporation X-ray fluorescence analyzing method
US20110304437A1 (en) * 2010-06-09 2011-12-15 Plus Location Systems USA LLC Antenna and Sensor System for Sharply Defined Active Sensing Zones
US9164047B2 (en) * 2010-10-08 2015-10-20 Bruker Axs Gmbh Apparatus and method for supporting a liquid sample for measuring scattering of electromagnetic radiation
JP2013053873A (ja) * 2011-09-01 2013-03-21 Jeol Ltd スペクトル表示装置、スペクトル表示方法、およびプログラム
DE102012204350B4 (de) * 2012-03-20 2021-12-02 Siemens Healthcare Gmbh Verfahren zur Energie-Kalibrierung quantenzählender Röntgendetektoren in einem Dual-Source Computertomographen
CN103940836A (zh) * 2013-01-22 2014-07-23 中国科学院青海盐湖研究所 液体x射线散射样品池
WO2015056305A1 (ja) * 2013-10-15 2015-04-23 株式会社島津製作所 蛍光ｘ線分析方法及び蛍光ｘ線分析装置
FR3030043B1 (fr) * 2014-12-12 2017-12-22 Commissariat Energie Atomique Procede d'etude d'une zone d'un objet pour en determiner une epaisseur massique et une composition en utilisant un faisceau d'electrons et des mesures d'intensite d'un rayonnement x
US10018748B2 (en) 2015-01-16 2018-07-10 Saudi Arabian Oil Company Inline density and fluorescence spectrometry meter
US9784699B2 (en) * 2015-03-03 2017-10-10 Panalytical B.V. Quantitative X-ray analysis—matrix thickness correction
CN107209132B (zh) * 2015-08-28 2019-06-21 株式会社理学 荧光x射线分析装置
CN106908466A (zh) * 2017-03-29 2017-06-30 中国科学院过程工程研究所 一种在线x射线荧光光谱分析系统
US11047814B2 (en) 2017-08-07 2021-06-29 C. Uyemura & Co., Ltd. X-ray fluorescence analysis measurement method and X-ray fluorescence analysis measurement device
JP6979650B2 (ja) * 2018-03-13 2021-12-15 株式会社リガク 蛍光ｘ線分析方法、蛍光ｘ線分析装置またはプログラム
CN110132188B (zh) * 2019-06-19 2020-11-10 中国人民解放军空军工程大学 一种基于多元素x射线特征光谱综合分析的涂渗层厚度计算方法
JP7302504B2 (ja) * 2020-02-27 2023-07-04 株式会社島津製作所 蛍光ｘ線分析装置
JP7497058B2 (ja) 2021-12-01 2024-06-10 株式会社リガク 蛍光ｘ線分析装置
EP4276452B1 (en) * 2022-05-13 2024-07-03 Bruker AXS GmbH System and method for determining mass fractions in a test sample with wave-length dispersive x-ray fluorescence spectrometers

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JPS6482749A (en) 1987-09-24 1989-03-28 Nec Corp Announcement machine
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JP3059403B2 (ja) * 1996-07-18 2000-07-04 理学電機工業株式会社 Ｘ線分析方法および装置
JP3569734B2 (ja) 2000-09-04 2004-09-29 理学電機工業株式会社 蛍光ｘ線分析装置
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JP4262734B2 (ja) * 2005-09-14 2009-05-13 株式会社リガク 蛍光ｘ線分析装置および方法
JP4908119B2 (ja) * 2005-10-19 2012-04-04 株式会社リガク 蛍光ｘ線分析装置
JP3950156B1 (ja) 2006-04-11 2007-07-25 理学電機工業株式会社 蛍光ｘ線分析装置
EP1978354A1 (en) * 2007-04-05 2008-10-08 Panalytical B.V. Wavelength dispersive X-ray Fluorescence Apparatus with energy dispersive detector in the form of a silicon drift detector to improve background supression
JP4514772B2 (ja) 2007-06-01 2010-07-28 株式会社リガク 蛍光ｘ線分析装置およびその方法
JP2009205822A (ja) 2008-02-26 2009-09-10 Panasonic Electric Works Co Ltd 照明器具
US8433035B2 (en) 2009-09-07 2013-04-30 Rigaku Corporation X-ray fluorescence analyzing method

Also Published As

Publication number Publication date
EP2333529A4 (en) 2011-09-07
CN102187208B (zh) 2013-12-04
WO2011027613A1 (ja) 2011-03-10
US8433035B2 (en) 2013-04-30
BRPI1005172A2 (pt) 2017-04-25
JP2011075542A (ja) 2011-04-14
EP2333529A1 (en) 2011-06-15
CN102187208A (zh) 2011-09-14
BRPI1005172B1 (pt) 2019-09-10
EP2333529B1 (en) 2013-10-16
US20110243301A1 (en) 2011-10-06
JP4629158B1 (ja) 2011-02-09

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Legal Events

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B06F Objections, documents and/or translations needed after an examination request according [chapter 6.6 patent gazette]
B06T Formal requirements before examination [chapter 6.20 patent gazette]
B09A Decision: intention to grant [chapter 9.1 patent gazette]
B16A Patent or certificate of addition of invention granted [chapter 16.1 patent gazette]

Free format text: PRAZO DE VALIDADE: 20 (VINTE) ANOS CONTADOS A PARTIR DE 01/07/2010, OBSERVADAS AS CONDICOES LEGAIS. (CO) 20 (VINTE) ANOS CONTADOS A PARTIR DE 01/07/2010, OBSERVADAS AS CONDICOES LEGAIS

B16C Correction of notification of the grant [chapter 16.3 patent gazette]

Free format text: REF. RPI 2540 DE 10/09/2019 QUANTO AO RELATORIO DESCRITIVO.

B21F Lapse acc. art. 78, item iv - on non-payment of the annual fees in time

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