CA1176404A - Controlling boron content of electroless nickel-boron deposits - Google Patents

Controlling boron content of electroless nickel-boron deposits

Info

Publication number: CA1176404A
Authority: CA; Canada
Prior art keywords: bath; boron; electroless; deposit; nickel
Prior art date: 1981-08-24
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired

Application number

CA000407217A

Other languages

English (en)

French (fr)

Inventor

Glenn O. Mallory

Theresa R. Horhn

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Richardson Chemical Co

Original Assignee

Richardson Chemical Co

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1981-08-24

Filing date

1982-07-14

Publication date

1984-10-23

1982-07-14 Application filed by Richardson Chemical Co filed Critical Richardson Chemical Co

1984-10-23 Application granted granted Critical

1984-10-23 Publication of CA1176404A publication Critical patent/CA1176404A/en

Status Expired legal-status Critical Current

Links

229910052796 boron Inorganic materials 0.000 title claims abstract description 59
ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 title claims abstract description 57
QDWJUBJKEHXSMT-UHFFFAOYSA-N boranylidynenickel Chemical compound [Ni]#B QDWJUBJKEHXSMT-UHFFFAOYSA-N 0.000 title claims abstract description 23
UORVGPXVDQYIDP-UHFFFAOYSA-N borane Chemical compound B UORVGPXVDQYIDP-UHFFFAOYSA-N 0.000 claims abstract description 71
229910000085 borane Inorganic materials 0.000 claims abstract description 43
-1 vanadyl ions Chemical class 0.000 claims abstract description 27
150000002500 ions Chemical class 0.000 claims abstract description 18
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 69
229910052759 nickel Inorganic materials 0.000 claims description 35
239000008139 complexing agent Substances 0.000 claims description 31
238000000151 deposition Methods 0.000 claims description 30
230000008021 deposition Effects 0.000 claims description 27
150000001875 compounds Chemical class 0.000 claims description 21
239000003638 chemical reducing agent Substances 0.000 claims description 19
239000003623 enhancer Substances 0.000 claims description 13
238000000034 method Methods 0.000 claims description 13
230000002708 enhancing effect Effects 0.000 claims description 12
239000000758 substrate Substances 0.000 claims description 11
239000002253 acid Substances 0.000 claims description 8
150000002148 esters Chemical class 0.000 claims description 8
150000003839 salts Chemical class 0.000 claims description 7
150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 5
239000003381 stabilizer Substances 0.000 claims description 5
UUUGYDOQQLOJQA-UHFFFAOYSA-L vanadyl sulfate Chemical compound [V+2]=O.[O-]S([O-])(=O)=O UUUGYDOQQLOJQA-UHFFFAOYSA-L 0.000 claims description 4
229910000352 vanadyl sulfate Inorganic materials 0.000 claims description 4
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 claims description 3
239000000872 buffer Substances 0.000 claims description 3
229940041260 vanadyl sulfate Drugs 0.000 claims description 3
CMZUMMUJMWNLFH-UHFFFAOYSA-N sodium metavanadate Chemical compound [Na+].[O-][V](=O)=O CMZUMMUJMWNLFH-UHFFFAOYSA-N 0.000 claims description 2
125000005287 vanadyl group Chemical group 0.000 claims description 2
UORVGPXVDQYIDP-BJUDXGSMSA-N borane Chemical group [10BH3] UORVGPXVDQYIDP-BJUDXGSMSA-N 0.000 claims 4
150000001412 amines Chemical group 0.000 claims 2
125000004122 cyclic group Chemical group 0.000 claims 1
IPCAPQRVQMIMAN-UHFFFAOYSA-L zirconyl chloride Chemical compound Cl[Zr](Cl)=O IPCAPQRVQMIMAN-UHFFFAOYSA-L 0.000 claims 1
KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 9
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical compound [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 6
229910052717 sulfur Inorganic materials 0.000 description 6
239000011593 sulfur Substances 0.000 description 6
DHMQDGOQFOQNFH-UHFFFAOYSA-N Glycine Chemical compound NCC(O)=O DHMQDGOQFOQNFH-UHFFFAOYSA-N 0.000 description 4
JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 4
229910052751 metal Inorganic materials 0.000 description 4
239000002184 metal Substances 0.000 description 4
238000007747 plating Methods 0.000 description 4
VHUUQVKOLVNVRT-UHFFFAOYSA-N Ammonium hydroxide Chemical compound [NH4+].[OH-] VHUUQVKOLVNVRT-UHFFFAOYSA-N 0.000 description 2
RGHNJXZEOKUKBD-SQOUGZDYSA-N D-gluconic acid Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@@H](O)C(O)=O RGHNJXZEOKUKBD-SQOUGZDYSA-N 0.000 description 2
PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 2
AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 2
150000007513 acids Chemical class 0.000 description 2
150000001298 alcohols Chemical class 0.000 description 2
239000000908 ammonium hydroxide Substances 0.000 description 2
RJTANRZEWTUVMA-UHFFFAOYSA-N boron;n-methylmethanamine Chemical compound [B].CNC RJTANRZEWTUVMA-UHFFFAOYSA-N 0.000 description 2
230000003139 buffering effect Effects 0.000 description 2
150000001735 carboxylic acids Chemical class 0.000 description 2
230000003247 decreasing effect Effects 0.000 description 2
229960002449 glycine Drugs 0.000 description 2
125000002887 hydroxy group Chemical group [H]O* 0.000 description 2
239000004310 lactic acid Substances 0.000 description 2
229960000448 lactic acid Drugs 0.000 description 2
235000014655 lactic acid Nutrition 0.000 description 2
239000000203 mixture Substances 0.000 description 2
FUBACIUATZGHAC-UHFFFAOYSA-N oxozirconium;octahydrate;dihydrochloride Chemical compound O.O.O.O.O.O.O.O.Cl.Cl.[Zr]=O FUBACIUATZGHAC-UHFFFAOYSA-N 0.000 description 2
UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 2
LSGOVYNHVSXFFJ-UHFFFAOYSA-N vanadate(3-) Chemical class [O-][V]([O-])([O-])=O LSGOVYNHVSXFFJ-UHFFFAOYSA-N 0.000 description 2
BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 1
FBPFZTCFMRRESA-KVTDHHQDSA-N D-Mannitol Chemical compound OC[C@@H](O)[C@@H](O)[C@H](O)[C@H](O)CO FBPFZTCFMRRESA-KVTDHHQDSA-N 0.000 description 1
RGHNJXZEOKUKBD-UHFFFAOYSA-N D-gluconic acid Natural products OCC(O)C(O)C(O)C(O)C(O)=O RGHNJXZEOKUKBD-UHFFFAOYSA-N 0.000 description 1
FEWJPZIEWOKRBE-JCYAYHJZSA-N Dextrotartaric acid Chemical compound OC(=O)[C@H](O)[C@@H](O)C(O)=O FEWJPZIEWOKRBE-JCYAYHJZSA-N 0.000 description 1
WHUUTDBJXJRKMK-UHFFFAOYSA-N Glutamic acid Natural products OC(=O)C(N)CCC(O)=O WHUUTDBJXJRKMK-UHFFFAOYSA-N 0.000 description 1
239000004471 Glycine Substances 0.000 description 1
QNAYBMKLOCPYGJ-REOHCLBHSA-N L-alanine Chemical compound C[C@H](N)C(O)=O QNAYBMKLOCPYGJ-REOHCLBHSA-N 0.000 description 1
CKLJMWTZIZZHCS-REOHCLBHSA-N L-aspartic acid Chemical compound OC(=O)[C@@H](N)CC(O)=O CKLJMWTZIZZHCS-REOHCLBHSA-N 0.000 description 1
WHUUTDBJXJRKMK-VKHMYHEASA-N L-glutamic acid Chemical compound OC(=O)[C@@H](N)CCC(O)=O WHUUTDBJXJRKMK-VKHMYHEASA-N 0.000 description 1
KZSNJWFQEVHDMF-BYPYZUCNSA-N L-valine Chemical compound CC(C)[C@H](N)C(O)=O KZSNJWFQEVHDMF-BYPYZUCNSA-N 0.000 description 1
229930195725 Mannitol Natural products 0.000 description 1
VEQPNABPJHWNSG-UHFFFAOYSA-N Nickel(2+) Chemical compound [Ni+2] VEQPNABPJHWNSG-UHFFFAOYSA-N 0.000 description 1
240000000543 Pentas lanceolata Species 0.000 description 1
ABLZXFCXXLZCGV-UHFFFAOYSA-N Phosphorous acid Chemical class OP(O)=O ABLZXFCXXLZCGV-UHFFFAOYSA-N 0.000 description 1
UCKMPCXJQFINFW-UHFFFAOYSA-N Sulphide Chemical compound [S-2] UCKMPCXJQFINFW-UHFFFAOYSA-N 0.000 description 1
FEWJPZIEWOKRBE-UHFFFAOYSA-N Tartaric acid Natural products [H+].[H+].[O-]C(=O)C(O)C(O)C([O-])=O FEWJPZIEWOKRBE-UHFFFAOYSA-N 0.000 description 1
XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 1
LEHOTFFKMJEONL-UHFFFAOYSA-N Uric Acid Chemical compound N1C(=O)NC(=O)C2=C1NC(=O)N2 LEHOTFFKMJEONL-UHFFFAOYSA-N 0.000 description 1
TVWHNULVHGKJHS-UHFFFAOYSA-N Uric acid Natural products N1C(=O)NC(=O)C2NC(=O)NC21 TVWHNULVHGKJHS-UHFFFAOYSA-N 0.000 description 1
KZSNJWFQEVHDMF-UHFFFAOYSA-N Valine Natural products CC(C)C(N)C(O)=O KZSNJWFQEVHDMF-UHFFFAOYSA-N 0.000 description 1
125000000217 alkyl group Chemical group 0.000 description 1
BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 1
235000001014 amino acid Nutrition 0.000 description 1
150000001413 amino acids Chemical class 0.000 description 1
150000003863 ammonium salts Chemical class 0.000 description 1
150000008064 anhydrides Chemical class 0.000 description 1
150000001450 anions Chemical class 0.000 description 1
229910052787 antimony Inorganic materials 0.000 description 1
WATWJIUSRGPENY-UHFFFAOYSA-N antimony atom Chemical compound [Sb] WATWJIUSRGPENY-UHFFFAOYSA-N 0.000 description 1
235000003704 aspartic acid Nutrition 0.000 description 1
OQFSQFPPLPISGP-UHFFFAOYSA-N beta-carboxyaspartic acid Natural products OC(=O)C(N)C(C(O)=O)C(O)=O OQFSQFPPLPISGP-UHFFFAOYSA-N 0.000 description 1
YJROYUJAFGZMJA-UHFFFAOYSA-N boron;morpholine Chemical compound [B].C1COCCN1 YJROYUJAFGZMJA-UHFFFAOYSA-N 0.000 description 1
NNTOJPXOCKCMKR-UHFFFAOYSA-N boron;pyridine Chemical compound [B].C1=CC=NC=C1 NNTOJPXOCKCMKR-UHFFFAOYSA-N 0.000 description 1
OWBTYPJTUOEWEK-UHFFFAOYSA-N butane-2,3-diol Chemical compound CC(O)C(C)O OWBTYPJTUOEWEK-UHFFFAOYSA-N 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
150000001805 chlorine compounds Chemical class 0.000 description 1
KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Chemical class O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 1
238000000354 decomposition reaction Methods 0.000 description 1
230000001419 dependent effect Effects 0.000 description 1
XPPKVPWEQAFLFU-UHFFFAOYSA-N diphosphoric acid Chemical compound OP(O)(=O)OP(O)(O)=O XPPKVPWEQAFLFU-UHFFFAOYSA-N 0.000 description 1
238000007772 electroless plating Methods 0.000 description 1
HOVMDLVUTWIOKI-UHFFFAOYSA-N ethane-1,2-diamine;methylphosphonic acid Chemical compound NCCN.CP(O)(O)=O.CP(O)(O)=O.CP(O)(O)=O.CP(O)(O)=O HOVMDLVUTWIOKI-UHFFFAOYSA-N 0.000 description 1
239000000174 gluconic acid Substances 0.000 description 1
235000012208 gluconic acid Nutrition 0.000 description 1
235000013922 glutamic acid Nutrition 0.000 description 1
239000004220 glutamic acid Substances 0.000 description 1
235000011187 glycerol Nutrition 0.000 description 1
235000013905 glycine and its sodium salt Nutrition 0.000 description 1
NAQMVNRVTILPCV-UHFFFAOYSA-N hexane-1,6-diamine Chemical compound NCCCCCCN NAQMVNRVTILPCV-UHFFFAOYSA-N 0.000 description 1
DKPHLYCEFBDQKM-UHFFFAOYSA-H hexapotassium;1-phosphonato-n,n-bis(phosphonatomethyl)methanamine Chemical compound [K+].[K+].[K+].[K+].[K+].[K+].[O-]P([O-])(=O)CN(CP([O-])([O-])=O)CP([O-])([O-])=O DKPHLYCEFBDQKM-UHFFFAOYSA-H 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-M hydroxide Chemical compound [OH-] XLYOFNOQVPJJNP-UHFFFAOYSA-M 0.000 description 1
NBZBKCUXIYYUSX-UHFFFAOYSA-N iminodiacetic acid Chemical compound OC(=O)CNCC(O)=O NBZBKCUXIYYUSX-UHFFFAOYSA-N 0.000 description 1
238000007654 immersion Methods 0.000 description 1
239000004615 ingredient Substances 0.000 description 1
229910052500 inorganic mineral Inorganic materials 0.000 description 1
238000011068 loading method Methods 0.000 description 1
239000001630 malic acid Substances 0.000 description 1
235000011090 malic acid Nutrition 0.000 description 1
235000010355 mannitol Nutrition 0.000 description 1
239000000594 mannitol Substances 0.000 description 1
239000011707 mineral Substances 0.000 description 1
150000007522 mineralic acids Chemical class 0.000 description 1
238000012986 modification Methods 0.000 description 1
230000004048 modification Effects 0.000 description 1
150000002815 nickel Chemical class 0.000 description 1
229910001453 nickel ion Inorganic materials 0.000 description 1
229910052755 nonmetal Inorganic materials 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
UEZVMMHDMIWARA-UHFFFAOYSA-M phosphonate Chemical compound [O-]P(=O)=O UEZVMMHDMIWARA-UHFFFAOYSA-M 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
WSHYKIAQCMIPTB-UHFFFAOYSA-M potassium;2-oxo-3-(3-oxo-1-phenylbutyl)chromen-4-olate Chemical compound [K+].[O-]C=1C2=CC=CC=C2OC(=O)C=1C(CC(=O)C)C1=CC=CC=C1 WSHYKIAQCMIPTB-UHFFFAOYSA-M 0.000 description 1
239000011253 protective coating Substances 0.000 description 1
229940005657 pyrophosphoric acid Drugs 0.000 description 1
230000002269 spontaneous effect Effects 0.000 description 1
IIACRCGMVDHOTQ-UHFFFAOYSA-N sulfamic acid Chemical class NS(O)(=O)=O IIACRCGMVDHOTQ-UHFFFAOYSA-N 0.000 description 1
150000003467 sulfuric acid derivatives Chemical class 0.000 description 1
239000011975 tartaric acid Substances 0.000 description 1
235000002906 tartaric acid Nutrition 0.000 description 1
UVZICZIVKIMRNE-UHFFFAOYSA-N thiodiacetic acid Chemical compound OC(=O)CSCC(O)=O UVZICZIVKIMRNE-UHFFFAOYSA-N 0.000 description 1
229940116269 uric acid Drugs 0.000 description 1
239000004474 valine Substances 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
- C23C18/16—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by reduction or substitution, e.g. electroless plating
- C23C18/31—Coating with metals
- C23C18/32—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron
- C23C18/34—Coating with nickel, cobalt or mixtures thereof with phosphorus or boron using reducing agents

Landscapes

Chemical & Material Sciences (AREA)
General Chemical & Material Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Engineering & Computer Science (AREA)
Materials Engineering (AREA)
Mechanical Engineering (AREA)
Metallurgy (AREA)
Organic Chemistry (AREA)
Chemically Coating (AREA)
Manufacturing Of Printed Wiring (AREA)

CA000407217A 1981-08-24 1982-07-14 Controlling boron content of electroless nickel-boron deposits Expired CA1176404A (en)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
US29552381A	1981-08-24	1981-08-24
US295,523		1981-08-24

Publications (1)

Publication Number	Publication Date
CA1176404A true CA1176404A (en)	1984-10-23

Family

ID=23138067

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA000407217A Expired CA1176404A (en)	1981-08-24	1982-07-14	Controlling boron content of electroless nickel-boron deposits

Country Status (4)

Country	Link
EP (1)	EP0073583B1 (de)
JP (1)	JPS5842766A (de)
CA (1)	CA1176404A (de)
DE (1)	DE3269823D1 (de)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4503131A (en) *	1982-01-18	1985-03-05	Richardson Chemical Company	Electrical contact materials
JPH01222064A (ja) *	1988-03-02	1989-09-05	Hitachi Ltd	化学ニッケルめっき液およびそれを使用する方法
JP2002226974A (ja) *	2000-11-28	2002-08-14	Ebara Corp	無電解Ｎｉ−Ｂめっき液、電子デバイス装置及びその製造方法
US6645567B2 (en)	2001-12-19	2003-11-11	Intel Corporation	Electroless plating bath composition and method of using
JP5344416B2 (ja) *	2006-03-09	2013-11-20	奥野製薬工業株式会社	自己触媒型無電解ニッケルめっき液用耐折り曲げ性向上剤及び自己触媒型無電解ニッケルめっき液
JP2013028866A (ja) *	2006-03-09	2013-02-07	Okuno Chemical Industries Co Ltd	無電解ニッケルめっき液
CN111118480B (zh) *	2020-01-14	2022-02-11	常州大学	一种低温化学镀Ni-B二元合金层的化学镀液及化学镀方法
US20230084432A1 (en) *	2021-09-15	2023-03-16	Western Digital Technologies, Inc.	Nickel-boron coatings for housings and enclosures

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE1198167B (de) *	1958-11-26	1965-08-05	Du Pont	Waessriges Bad zur chemischen Abscheidung von UEberzuegen aus Nickel-Bor- oder Kobalt-Bor-Legierungen
US4139660A (en) *	1963-07-16	1979-02-13	Bernhard Joos	Method for increasing solid surface tension
GB1360592A (en) *	1973-02-14	1974-07-17	Rca Corp	Electroless cobalt plating bath
US4019910A (en) *	1974-05-24	1977-04-26	The Richardson Chemical Company	Electroless nickel polyalloy plating baths
US4151311A (en) *	1976-01-22	1979-04-24	Nathan Feldstein	Post colloid addition of catalytic promoters to non noble metal principal catalytic compounds in electroless plating catalysts
IT1070268B (it) *	1976-10-19	1985-03-29	Alfachimici Spa	Composizione per la deposizione anelettrica di leghe a base di nichelio
US4259376A (en) *	1977-09-16	1981-03-31	Nathan Feldstein	Catalytic promoters in electroless plating catalysts applied as an emulsion
GB2066857A (en) *	1980-01-07	1981-07-15	Vmei Lenin Nis	>Method for the production of an abrasive surface

1982
- 1982-07-14 CA CA000407217A patent/CA1176404A/en not_active Expired
- 1982-08-10 DE DE8282304210T patent/DE3269823D1/de not_active Expired
- 1982-08-10 EP EP19820304210 patent/EP0073583B1/de not_active Expired
- 1982-08-24 JP JP14675182A patent/JPS5842766A/ja active Granted

Also Published As

Publication number	Publication date
DE3269823D1 (en)	1986-04-17
JPH0153352B2 (de)	1989-11-14
JPS5842766A (ja)	1983-03-12
EP0073583A1 (de)	1983-03-09
EP0073583B1 (de)	1986-03-12

Legal Events

Date	Code	Title	Description
2001-10-24	MKEC	Expiry (correction)
2002-07-14	MKEX	Expiry
2023-05-26	MKEX	Expiry	Effective date: 20020714

Publication	Publication Date	Title
KR101080061B1 (ko)	2011-11-04	무전해 니켈 도금 용액
US4397812A (en)	1983-08-09	Electroless nickel polyalloys
CA1124008A (en)	1982-05-25	Bath for electroless depositing tin on substrates
US3310430A (en)	1967-03-21	Electroless copper plating
US4019910A (en)	1977-04-26	Electroless nickel polyalloy plating baths
US4407869A (en)	1983-10-04	Controlling boron content of electroless nickel-boron deposits
US6824597B2 (en)	2004-11-30	Stabilizers for electroless plating solutions and methods of use thereof
US6183546B1 (en)	2001-02-06	Coating compositions containing nickel and boron
US2935425A (en)	1960-05-03	Chemical nickel plating processes and baths therefor
CA1176404A (en)	1984-10-23	Controlling boron content of electroless nickel-boron deposits
JPS6070183A (ja)	1985-04-20	化学銅めっき方法
US6048585A (en)	2000-04-11	Removal of orthophosphite ions from electroless nickel plating baths
KR101936977B1 (ko)	2019-01-09	무전해 니켈 도금욕 조성물
US3607317A (en)	1971-09-21	Ductility promoter and stabilizer for electroless copper plating baths
CA1144304A (en)	1983-04-12	Electroless deposition of copper
US3661596A (en)	1972-05-09	Stabilized, chemical nickel plating bath
JPH0144790B2 (de)	1989-09-29
USH325H (en)	1987-09-01	Electroless deposition of transition metals
US4038085A (en)	1977-07-26	Method of treating electroless nickel plating bath
JP2000309876A (ja)	2000-11-07	置換型無電解錫−銀合金めっき液
US20070175358A1 (en)	2007-08-02	Electroless gold plating solution
JPH07292477A (ja)	1995-11-07	無電解金めっき方法
JPH05295557A (ja)	1993-11-09	無電解ニッケルリンめっき液
JPS60194081A (ja)	1985-10-02	改良された無電解銅めつき浴及び方法