CA1232915A - Compositions photosensibles a base de resine - Google Patents

Compositions photosensibles a base de resine

Info

Publication number
CA1232915A
CA1232915A CA000445119A CA445119A CA1232915A CA 1232915 A CA1232915 A CA 1232915A CA 000445119 A CA000445119 A CA 000445119A CA 445119 A CA445119 A CA 445119A CA 1232915 A CA1232915 A CA 1232915A
Authority
CA
Canada
Prior art keywords
surfactant
perfluorooctyl
fluorocarbon
photosensitive resin
mixtures
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
CA000445119A
Other languages
English (en)
Inventor
Takeo Kuramoto
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
WR Grace KK
Original Assignee
WR Grace KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by WR Grace KK filed Critical WR Grace KK
Application granted granted Critical
Publication of CA1232915A publication Critical patent/CA1232915A/fr
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/0048—Photosensitive materials characterised by the solvents or agents facilitating spreading, e.g. tensio-active agents

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Compositions Of Macromolecular Compounds (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Detergent Compositions (AREA)
  • Polymerisation Methods In General (AREA)
CA000445119A 1983-01-28 1984-01-11 Compositions photosensibles a base de resine Expired CA1232915A (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP58011249A JPS59137943A (ja) 1983-01-28 1983-01-28 感光性樹脂組成物
JP11249/83 1983-01-28

Publications (1)

Publication Number Publication Date
CA1232915A true CA1232915A (fr) 1988-02-16

Family

ID=11772662

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000445119A Expired CA1232915A (fr) 1983-01-28 1984-01-11 Compositions photosensibles a base de resine

Country Status (7)

Country Link
JP (1) JPS59137943A (fr)
AU (1) AU556611B2 (fr)
CA (1) CA1232915A (fr)
DE (1) DE3402465A1 (fr)
GB (1) GB2134275B (fr)
IT (1) IT1206696B (fr)
NL (1) NL8400257A (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61226745A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPS61226746A (ja) * 1985-03-30 1986-10-08 Japan Synthetic Rubber Co Ltd 半導体集積回路製造用のスピンコート用レジスト組成物
JPH0721626B2 (ja) * 1985-08-10 1995-03-08 日本合成ゴム株式会社 半導体微細加工用レジスト組成物
JPH083630B2 (ja) * 1986-01-23 1996-01-17 富士写真フイルム株式会社 感光性組成物
JPH06105351B2 (ja) * 1986-03-27 1994-12-21 富士写真フイルム株式会社 感光性組成物
JPH0762761B2 (ja) * 1986-03-28 1995-07-05 富士写真フイルム株式会社 画像形成材料
JPH06105350B2 (ja) * 1987-07-13 1994-12-21 富士写真フイルム株式会社 平版印刷版用感光性組成物
JP2878150B2 (ja) * 1994-04-27 1999-04-05 東京応化工業株式会社 レジスト用塗布液およびこれを用いたレジスト材料

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3347676A (en) * 1964-04-30 1967-10-17 Du Pont Photopolymerizable compositions and process
JPS54135004A (en) * 1978-04-10 1979-10-19 Fuji Photo Film Co Ltd Photosensitive flat printing plate
US4252887A (en) * 1979-08-14 1981-02-24 E. I. Du Pont De Nemours And Company Dimers derived from unsymmetrical 2,4,5-triphenylimidazole compounds as photoinitiators
JPS5660441A (en) * 1979-10-22 1981-05-25 Asahi Chem Ind Co Ltd Photosensitive resin composition improved in water development property and manufacture of photosensitive resin plate using this composition
DE3022362A1 (de) * 1980-06-14 1981-12-24 Hoechst Ag, 6000 Frankfurt Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung

Also Published As

Publication number Publication date
GB8401661D0 (en) 1984-02-22
IT8419349A0 (it) 1984-01-27
IT1206696B (it) 1989-04-27
AU2371684A (en) 1984-08-02
GB2134275B (en) 1987-05-13
JPS59137943A (ja) 1984-08-08
AU556611B2 (en) 1986-11-13
DE3402465A1 (de) 1984-08-02
GB2134275A (en) 1984-08-08
NL8400257A (nl) 1984-08-16

Similar Documents

Publication Publication Date Title
US4162920A (en) Lithographic plate finisher
US4576743A (en) Plate cleaner for lithographic printing plate
CA1232915A (fr) Compositions photosensibles a base de resine
JPH0145608B2 (fr)
US5053311A (en) Direct planographic printing plate requiring no dampening
EP0547786A1 (fr) Composition d'encre de sécurité résistant à l'eau et document inhibé avec cet encre
US5174815A (en) Lithographic printing ink additive
EP0488530B1 (fr) Composition d'encre et procédé pour produire une plaque d'impression lithographique utilisant celle-ci
US4339530A (en) Developer mixture for developing exposed light-sensistive copying layers
EP3885831B1 (fr) Plaque originale d'impression flexographique développable à l'eau
DE4036611A1 (de) Vorsensibilisierte platte
US5409803A (en) Single-phase developers for lithograpic printing elements
US4551516A (en) Coating composition and the use thereof
DE69123886T2 (de) Vorsensibilisierte Platten für die Herstellung von Druckplatten für wasserlosen Offsetdruck
EP0136903B1 (fr) Article et composition photosensible stable à l'emmagasinage
DE3702839A1 (de) Vorsensibilisierte trockenplatte
US4530721A (en) Lithographic fountain concentrate
EP0144201A2 (fr) Agent de nettoyage pour plaques d'impression électrophotolithographique
JPS60213943A (ja) 現像液組成物
JPS6141149A (ja) レタ−セツト印刷用感光性樹脂版材
US5714302A (en) Method of printing with using lithographic printing plate made by silver complex diffusion transfer process and using dampening composition containing nonionic surface active agent
DE4330279A1 (de) Vorsensibilisierte Platte für die Verwendung zur Herstellung einer lithographischen Druckplatte, die kein Anfeuchtungswasser benötigt
US5290665A (en) Process for developing PS plate requiring no dampening water wherein the developer comprises, water, a solubilizer and an ethylene glycol mono(alkyl C6 -C8) ether derivative
EP0262245B1 (fr) Feuille d'enregistrement transparente et méthode pour la préparation de telles feuilles
DE69113031T2 (de) Korrekturflüssigkeit für eine lithographische Diazo-Druckform.

Legal Events

Date Code Title Description
MKEX Expiry