CA1335542C - Pattern-forming material and pattern formation method - Google Patents

Pattern-forming material and pattern formation method

Info

Publication number
CA1335542C
CA1335542C CA000582506A CA582506A CA1335542C CA 1335542 C CA1335542 C CA 1335542C CA 000582506 A CA000582506 A CA 000582506A CA 582506 A CA582506 A CA 582506A CA 1335542 C CA1335542 C CA 1335542C
Authority
CA
Canada
Prior art keywords
units
pattern
forming material
mol
material according
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
CA000582506A
Other languages
English (en)
French (fr)
Inventor
Naohiro Muramoto
Katsutoshi Mine
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
DuPont Toray Specialty Materials KK
Original Assignee
Dow Corning Toray Silicone Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Dow Corning Toray Silicone Co Ltd filed Critical Dow Corning Toray Silicone Co Ltd
Application granted granted Critical
Publication of CA1335542C publication Critical patent/CA1335542C/en
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/075—Silicon-containing compounds
    • G03F7/0757—Macromolecular compounds containing Si-O, Si-C or Si-N bonds

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Silicon Polymers (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
CA000582506A 1987-11-09 1988-11-08 Pattern-forming material and pattern formation method Expired - Fee Related CA1335542C (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP282638/87 1987-11-09
JP62282638A JP2608429B2 (ja) 1987-11-09 1987-11-09 パターン形成用材料およびパターン形成方法

Publications (1)

Publication Number Publication Date
CA1335542C true CA1335542C (en) 1995-05-16

Family

ID=17655122

Family Applications (1)

Application Number Title Priority Date Filing Date
CA000582506A Expired - Fee Related CA1335542C (en) 1987-11-09 1988-11-08 Pattern-forming material and pattern formation method

Country Status (8)

Country Link
US (1) US4985342A (de)
EP (1) EP0315954B1 (de)
JP (1) JP2608429B2 (de)
KR (1) KR890702081A (de)
AU (1) AU611220B2 (de)
CA (1) CA1335542C (de)
DE (1) DE3854714T2 (de)
WO (1) WO1989004507A1 (de)

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KR101523393B1 (ko) 2007-02-27 2015-05-27 이엠디 퍼포먼스 머티리얼스 코프. 규소를 주성분으로 하는 반사 방지 코팅 조성물
JP4946787B2 (ja) * 2007-10-22 2012-06-06 Ｊｓｒ株式会社 レジスト下層膜用組成物及びその製造方法
JP5635411B2 (ja) * 2007-11-21 2014-12-03 イーストマン ケミカル カンパニー プラスチック製哺乳瓶、他のブロー成形物品及びそれらの製造方法
US8501287B2 (en) 2007-11-21 2013-08-06 Eastman Chemical Company Plastic baby bottles, other blow molded articles, and processes for their manufacture
US8198371B2 (en) 2008-06-27 2012-06-12 Eastman Chemical Company Blends of polyesters and ABS copolymers
US20100099828A1 (en) * 2008-10-21 2010-04-22 Eastman Chemical Company Clear Binary Blends of Aliphatic Polyesters and Aliphatic-Aromatic Polyesters
JP5136439B2 (ja) * 2008-11-28 2013-02-06 Ｊｓｒ株式会社 多層レジストプロセス用シリコン含有膜形成用組成物及びシリコン含有膜並びにパターン形成方法
US8895654B2 (en) * 2008-12-18 2014-11-25 Eastman Chemical Company Polyester compositions which comprise spiro-glycol, cyclohexanedimethanol, and terephthalic acid
US20100159176A1 (en) * 2008-12-18 2010-06-24 Eastman Chemical Company Miscible blends of terephthalate polyesters containing 1,4-cyclohexanedimethanol and 2,2,4,4-tetramethylcyclobutane-1,3-diol
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Also Published As

Publication number Publication date
EP0315954A3 (en) 1990-08-29
DE3854714T2 (de) 1996-05-09
JPH01123229A (ja) 1989-05-16
WO1989004507A1 (fr) 1989-05-18
JP2608429B2 (ja) 1997-05-07
US4985342A (en) 1991-01-15
EP0315954B1 (de) 1995-11-22
AU2490088A (en) 1989-05-11
EP0315954A2 (de) 1989-05-17
KR890702081A (ko) 1989-12-22
DE3854714D1 (de) 1996-01-04
AU611220B2 (en) 1991-06-06

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