CA2020411A1 - Dispositif a ondes acoustiques de surface - Google Patents

Dispositif a ondes acoustiques de surface

Info

Publication number
CA2020411A1
CA2020411A1 CA2020411A CA2020411A CA2020411A1 CA 2020411 A1 CA2020411 A1 CA 2020411A1 CA 2020411 A CA2020411 A CA 2020411A CA 2020411 A CA2020411 A CA 2020411A CA 2020411 A1 CA2020411 A1 CA 2020411A1
Authority
CA
Canada
Prior art keywords
thin film
piezoelectric thin
acoustic wave
wave device
surface acoustic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
CA2020411A
Other languages
English (en)
Other versions
CA2020411C (fr
Inventor
Hideharu Ieki
Atsushi Sakurai
Koji Kimura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Murata Manufacturing Co Ltd
Original Assignee
Murata Manufacturing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Murata Manufacturing Co Ltd filed Critical Murata Manufacturing Co Ltd
Publication of CA2020411A1 publication Critical patent/CA2020411A1/fr
Application granted granted Critical
Publication of CA2020411C publication Critical patent/CA2020411C/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/25—Constructional features of resonators using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H3/00—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators
    • H03H3/007—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks
    • H03H3/08—Apparatus or processes specially adapted for the manufacture of impedance networks, resonating circuits, resonators for the manufacture of electromechanical resonators or networks for the manufacture of resonators or networks using surface acoustic waves
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/02535—Details of surface acoustic wave devices
    • H03H9/02543—Characteristics of substrate, e.g. cutting angles
    • H03H9/02582—Characteristics of substrate, e.g. cutting angles of diamond substrates
    • H—ELECTRICITY
    • H03—ELECTRONIC CIRCUITRY
    • H03H—IMPEDANCE NETWORKS, e.g. RESONANT CIRCUITS; RESONATORS
    • H03H9/00—Networks comprising electromechanical or electro-acoustic elements; Electromechanical resonators
    • H03H9/02—Details
    • H03H9/125—Driving means, e.g. electrodes, coils
    • H03H9/145—Driving means, e.g. electrodes, coils for networks using surface acoustic waves
    • H03H9/14538—Formation

Landscapes

  • Physics & Mathematics (AREA)
  • Acoustics & Sound (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
CA002020411A 1989-07-06 1990-07-04 Dispositif a ondes acoustiques de surface Expired - Lifetime CA2020411C (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP1-174763 1989-07-06
JP1174763A JPH0340510A (ja) 1989-07-06 1989-07-06 弾性表面波装置

Publications (2)

Publication Number Publication Date
CA2020411A1 true CA2020411A1 (fr) 1991-01-07
CA2020411C CA2020411C (fr) 1994-05-03

Family

ID=15984245

Family Applications (1)

Application Number Title Priority Date Filing Date
CA002020411A Expired - Lifetime CA2020411C (fr) 1989-07-06 1990-07-04 Dispositif a ondes acoustiques de surface

Country Status (7)

Country Link
US (1) US5061870A (fr)
EP (1) EP0407163B1 (fr)
JP (1) JPH0340510A (fr)
KR (1) KR930007797B1 (fr)
CN (1) CN1015041B (fr)
CA (1) CA2020411C (fr)
DE (1) DE69023707T2 (fr)

Families Citing this family (26)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5162690A (en) * 1989-04-14 1992-11-10 Murata Manufacturing Co., Ltd. Surface acoustic wave device
JPH04358410A (ja) * 1991-06-05 1992-12-11 Sumitomo Electric Ind Ltd 表面弾性波素子及びその製造方法
EP0534354A1 (fr) * 1991-09-25 1993-03-31 Sumitomo Electric Industries, Limited Procédé de fabrication de dispositif à ondes acoustiques de surface et son procédé de fabrication
JPH0590871A (ja) * 1991-09-27 1993-04-09 Sumitomo Electric Ind Ltd 表面弾性波素子
US5440189A (en) * 1991-09-30 1995-08-08 Sumitomo Electric Industries, Ltd. Surface acoustic wave device
JP3252865B2 (ja) * 1992-09-11 2002-02-04 住友電気工業株式会社 表面弾性波素子および表面弾性波素子の製造方法
JP3198691B2 (ja) * 1993-01-14 2001-08-13 株式会社村田製作所 酸化亜鉛圧電結晶膜
ATE165197T1 (de) * 1993-07-20 1998-05-15 Avl List Gmbh Piezoelektrisches kristallelement
JP3085043B2 (ja) * 1993-08-05 2000-09-04 株式会社村田製作所 サファイア面上の酸化亜鉛圧電結晶膜
KR0171921B1 (ko) * 1993-09-13 1999-03-30 모리시타 요이찌 전자부품과 그 제조방법
JP3295921B2 (ja) * 1994-06-20 2002-06-24 住友電気工業株式会社 表面弾性波素子用ダイヤモンド基材及び素子
US5633616A (en) * 1994-10-07 1997-05-27 Mitsubishi Denki Kabushiki Kaisha Thin film saw filter including doped electrodes
US5576589A (en) * 1994-10-13 1996-11-19 Kobe Steel Usa, Inc. Diamond surface acoustic wave devices
US5815900A (en) * 1995-03-06 1998-10-06 Matsushita Electric Industrial Co., Ltd. Method of manufacturing a surface acoustic wave module
DE19610806A1 (de) * 1995-03-20 1996-10-10 Hitachi Media Electron Kk Oberflächenwellen-Filter und Antennenweiche
WO1997008761A1 (fr) * 1995-08-28 1997-03-06 Accuweb, Inc. Unites de transducteurs a ultrasons pour detection du bord d'un ruban
JPH09223943A (ja) * 1996-02-19 1997-08-26 Nec Corp 弾性表面波デバイス
ATE333162T1 (de) * 1998-10-16 2006-08-15 Seiko Epson Corp Akustische oberflächenwellenvorrichtung
JP4502553B2 (ja) * 2000-12-05 2010-07-14 日本碍子株式会社 弾性表面波デバイス用基板の製造方法
JP2003037467A (ja) * 2001-07-24 2003-02-07 Murata Mfg Co Ltd 弾性表面波装置
TWI282660B (en) 2001-12-27 2007-06-11 Murata Manufacturing Co Surface acoustic wave device and manufacturing method therefor
JP3646116B2 (ja) 2003-07-17 2005-05-11 Ｔｄｋ株式会社 表面弾性波素子、表面弾性波装置、表面弾性波デュプレクサ、及び表面弾性波素子の製造方法
KR101644165B1 (ko) * 2009-09-25 2016-07-29 삼성전자주식회사 표면탄성파 디바이스 및 바이오센서
JP2011139214A (ja) * 2009-12-28 2011-07-14 Seiko Epson Corp 弾性表面波デバイス、発振器、モジュール装置
JP6205937B2 (ja) * 2013-07-22 2017-10-04 セイコーエプソン株式会社 圧電膜製造方法、振動子製造方法、振動片、振動子、発振器、電子機器及び移動体
JP2020092321A (ja) 2018-12-05 2020-06-11 太陽誘電株式会社 弾性波デバイスおよびその製造方法、フィルタ並びにマルチプレクサ

Family Cites Families (14)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5549014A (en) * 1978-10-04 1980-04-08 Seiko Instr & Electronics Ltd Electrode for vibrating element
JPS5748820A (en) * 1980-09-05 1982-03-20 Murata Mfg Co Ltd Surface acoustic wave element
JPS57145419A (en) * 1981-03-05 1982-09-08 Clarion Co Ltd Surface acoustic wave element
GB2120037B (en) * 1982-03-11 1987-11-18 Nobuo Mikoshiba Surface acoustic wave device
GB2181917B (en) * 1982-03-11 1987-11-18 Nobuo Mikoshiba Surface acoustic wave device
JPS59231911A (ja) * 1983-06-14 1984-12-26 Clarion Co Ltd 表面弾性波素子
JPS6046108A (ja) * 1983-08-23 1985-03-12 Oki Electric Ind Co Ltd 表面弾性波デバイスの製造方法
JPS6192022A (ja) * 1984-10-11 1986-05-10 Matsushita Electric Ind Co Ltd 表面波フイルタ
JPS6298812A (ja) * 1985-10-25 1987-05-08 Hitachi Ltd 弾性表面波装置
JPS62272610A (ja) * 1986-05-21 1987-11-26 Hitachi Ltd 弾性表面波素子
JPS63314906A (ja) * 1987-06-18 1988-12-22 Matsushita Electric Ind Co Ltd 表面弾性波装置の製造方法
US4935658A (en) * 1987-10-02 1990-06-19 Quartztronics, Inc. Crystal resonator with low acceleration sensitivity and method of manufacture thereof
JPH01303910A (ja) * 1988-06-01 1989-12-07 Hitachi Ltd 固体電子素子、その製造方法、及びそれを利用した装置
US4968954A (en) * 1988-09-30 1990-11-06 Shin-Etsu Chemical Co., Ltd. Epitaxial layer-bearing wafer of rare earth gallium garnet for MSW device

Also Published As

Publication number Publication date
DE69023707T2 (de) 1996-05-09
EP0407163A3 (en) 1991-07-17
KR930007797B1 (ko) 1993-08-19
DE69023707D1 (de) 1996-01-04
EP0407163B1 (fr) 1995-11-22
JPH0340510A (ja) 1991-02-21
KR910003921A (ko) 1991-02-28
US5061870A (en) 1991-10-29
CN1048636A (zh) 1991-01-16
EP0407163A2 (fr) 1991-01-09
CA2020411C (fr) 1994-05-03
CN1015041B (zh) 1991-12-04

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Legal Events

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