CA2045878C - Methode et appareil de fabrication de sondes - Google Patents

Methode et appareil de fabrication de sondes

Info

Publication number: CA2045878C
Authority: CA; Canada
Prior art keywords: probe; electrode; information; end portion; recording medium
Prior art date: 1990-07-09
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Expired - Lifetime

Application number

CA 2045878

Other languages

English (en)

Other versions

CA2045878A1 (fr

Inventor

Toshimitsu Kawase

Akihiko Yamano

Ryo Kuroda

Hiroyasu Nose

Toshihiko Miyazaki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Canon Inc

Original Assignee

Canon Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1990-07-09

Filing date

1991-06-26

Publication date

1997-08-19

1991-06-26 Application filed by Canon Inc filed Critical Canon Inc

1992-01-10 Publication of CA2045878A1 publication Critical patent/CA2045878A1/fr

1997-08-19 Application granted granted Critical

1997-08-19 Publication of CA2045878C publication Critical patent/CA2045878C/fr

2011-06-26 Anticipated expiration legal-status Critical

Status Expired - Lifetime legal-status Critical Current

Links

239000000523 sample Substances 0.000 title claims abstract description 203
238000000034 method Methods 0.000 title description 14
238000006073 displacement reaction Methods 0.000 claims description 13
238000001514 detection method Methods 0.000 claims description 11
239000004020 conductor Substances 0.000 claims description 4
238000002844 melting Methods 0.000 claims description 3
230000008018 melting Effects 0.000 claims description 3
238000010438 heat treatment Methods 0.000 claims description 2
230000007246 mechanism Effects 0.000 abstract description 20
238000002407 reforming Methods 0.000 abstract description 2
230000001172 regenerating effect Effects 0.000 description 41
239000000463 material Substances 0.000 description 16
230000004304 visual acuity Effects 0.000 description 16
230000033001 locomotion Effects 0.000 description 15
238000005498 polishing Methods 0.000 description 11
230000008929 regeneration Effects 0.000 description 11
238000011069 regeneration method Methods 0.000 description 11
230000015572 biosynthetic process Effects 0.000 description 10
238000005259 measurement Methods 0.000 description 9
238000012545 processing Methods 0.000 description 9
BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 8
239000000758 substrate Substances 0.000 description 7
230000010363 phase shift Effects 0.000 description 6
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 5
229910002804 graphite Inorganic materials 0.000 description 5
239000010439 graphite Substances 0.000 description 5
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 5
229910052721 tungsten Inorganic materials 0.000 description 5
239000010937 tungsten Substances 0.000 description 5
238000010586 diagram Methods 0.000 description 4
239000010408 film Substances 0.000 description 4
230000006870 function Effects 0.000 description 4
238000007689 inspection Methods 0.000 description 4
238000001659 ion-beam spectroscopy Methods 0.000 description 4
229910052697 platinum Inorganic materials 0.000 description 4
238000012935 Averaging Methods 0.000 description 3
230000006866 deterioration Effects 0.000 description 3
230000000694 effects Effects 0.000 description 3
PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 3
229910052737 gold Inorganic materials 0.000 description 3
239000010931 gold Substances 0.000 description 3
230000003446 memory effect Effects 0.000 description 3
238000003776 cleavage reaction Methods 0.000 description 2
230000001276 controlling effect Effects 0.000 description 2
230000005684 electric field Effects 0.000 description 2
239000011521 glass Substances 0.000 description 2
230000003287 optical effect Effects 0.000 description 2
230000008569 process Effects 0.000 description 2
230000009467 reduction Effects 0.000 description 2
230000007017 scission Effects 0.000 description 2
230000003213 activating effect Effects 0.000 description 1
230000003321 amplification Effects 0.000 description 1
238000013459 approach Methods 0.000 description 1
230000008859 change Effects 0.000 description 1
238000006243 chemical reaction Methods 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
238000001816 cooling Methods 0.000 description 1
230000002542 deteriorative effect Effects 0.000 description 1
238000011161 development Methods 0.000 description 1
230000018109 developmental process Effects 0.000 description 1
230000008020 evaporation Effects 0.000 description 1
238000001704 evaporation Methods 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
238000003199 nucleic acid amplification method Methods 0.000 description 1
150000002894 organic compounds Chemical class 0.000 description 1
238000007747 plating Methods 0.000 description 1
PXXKQOPKNFECSZ-UHFFFAOYSA-N platinum rhodium Chemical compound [Rh].[Pt] PXXKQOPKNFECSZ-UHFFFAOYSA-N 0.000 description 1
HWLDNSXPUQTBOD-UHFFFAOYSA-N platinum-iridium alloy Chemical compound [Ir].[Pt] HWLDNSXPUQTBOD-UHFFFAOYSA-N 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
230000001105 regulatory effect Effects 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1

Landscapes

Measurement Of Length, Angles, Or The Like Using Electric Or Magnetic Means (AREA)
Automatic Analysis And Handling Materials Therefor (AREA)
Electrical Discharge Machining, Electrochemical Machining, And Combined Machining (AREA)

CA 2045878 1990-07-09 1991-06-26 Methode et appareil de fabrication de sondes Expired - Lifetime CA2045878C (fr)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2-179557		1990-07-09
JP17955790A JP2802675B2 (ja)	1990-07-09	1990-07-09	プローブ形成方法及び装置

Publications (2)

Publication Number	Publication Date
CA2045878A1 CA2045878A1 (fr)	1992-01-10
CA2045878C true CA2045878C (fr)	1997-08-19

Family

ID=16067822

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CA 2045878 Expired - Lifetime CA2045878C (fr)	1990-07-09	1991-06-26	Methode et appareil de fabrication de sondes

Country Status (2)

Country	Link
JP (1)	JP2802675B2 (fr)
CA (1)	CA2045878C (fr)

Families Citing this family (1)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0926427A (ja) *	1995-07-07	1997-01-28	Hewlett Packard Co <Hp>	位置決め装置、およびこれを用いたメディア移動型メモリ装置

1990
- 1990-07-09 JP JP17955790A patent/JP2802675B2/ja not_active Expired - Fee Related
1991
- 1991-06-26 CA CA 2045878 patent/CA2045878C/fr not_active Expired - Lifetime

Also Published As

Publication number	Publication date
JP2802675B2 (ja)	1998-09-24
JPH0466802A (ja)	1992-03-03
CA2045878A1 (fr)	1992-01-10

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Legal Events

Date	Code	Title	Description
1991-06-26	EEER	Examination request
2011-06-26	MKLA	Lapsed
2012-12-02	MKEC	Expiry (correction)	Effective date: 20121202