CH512085A - Metériel sensible aux radiations - Google Patents

Metériel sensible aux radiations

Info

Publication number
CH512085A
CH512085A CH1916668A CH1916668A CH512085A CH 512085 A CH512085 A CH 512085A CH 1916668 A CH1916668 A CH 1916668A CH 1916668 A CH1916668 A CH 1916668A CH 512085 A CH512085 A CH 512085A
Authority
CH
Switzerland
Prior art keywords
sensitive material
radiation sensitive
radiation
sensitive
Prior art date
Application number
CH1916668A
Other languages
English (en)
Inventor
Graham Borden Douglas
Original Assignee
Eastman Kodak Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Eastman Kodak Co filed Critical Eastman Kodak Co
Publication of CH512085A publication Critical patent/CH512085A/fr

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/0042Photosensitive materials with inorganic or organometallic light-sensitive compounds not otherwise provided for, e.g. inorganic resists
    • BPERFORMING OPERATIONS; TRANSPORTING
    • B41PRINTING; LINING MACHINES; TYPEWRITERS; STAMPS
    • B41MPRINTING, DUPLICATING, MARKING, OR COPYING PROCESSES; COLOUR PRINTING
    • B41M5/00Duplicating or marking methods; Sheet materials for use therein
    • B41M5/26Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used
    • B41M5/30Thermography ; Marking by high energetic means, e.g. laser otherwise than by burning, and characterised by the material used using chemical colour formers
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F5/00Compounds containing elements of Groups 3 or 13 of the Periodic Table
    • C07F5/02Boron compounds
    • C07F5/027Organoboranes and organoborohydrides
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/02Phosphorus compounds
    • C07F9/28Phosphorus compounds with one or more P—C bonds
    • C07F9/54Quaternary phosphonium compounds
    • CCHEMISTRY; METALLURGY
    • C07ORGANIC CHEMISTRY
    • C07FACYCLIC, CARBOCYCLIC OR HETEROCYCLIC COMPOUNDS CONTAINING ELEMENTS OTHER THAN CARBON, HYDROGEN, HALOGEN, OXYGEN, NITROGEN, SULFUR, SELENIUM OR TELLURIUM
    • C07F9/00Compounds containing elements of Groups 5 or 15 of the Periodic Table
    • C07F9/66Arsenic compounds
    • C07F9/70Organo-arsenic compounds
    • C07F9/74Aromatic compounds
    • CCHEMISTRY; METALLURGY
    • C09DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09BORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B44/00Azo dyes containing onium groups
    • C09B44/10Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system
    • C09B44/12Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom
    • C09B44/126Azo dyes containing onium groups containing cyclammonium groups attached to an azo group by a carbon atom of the ring system having one nitrogen atom as the only ring hetero atom in a six-membered ring, e.g. pyrridinium, quinolinium
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/52Compositions containing diazo compounds as photosensitive substances
    • G03C1/54Diazonium salts or diazo anhydrides
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/72Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705
    • G03C1/73Photosensitive compositions not covered by the groups G03C1/005 - G03C1/705 containing organic compounds
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055Radiation sensitive composition or product or process of making
    • Y10S430/127Spectral sensitizer containing
    • YGENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10STECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S522/00Synthetic resins or natural rubbers -- part of the class 520 series
    • Y10S522/904Monomer or polymer contains initiating group

Landscapes

  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Optics & Photonics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Molecular Biology (AREA)
  • General Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
CH1916668A 1967-12-26 1968-12-23 Metériel sensible aux radiations CH512085A (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US69316867A 1967-12-26 1967-12-26

Publications (1)

Publication Number Publication Date
CH512085A true CH512085A (fr) 1971-08-31

Family

ID=24783601

Family Applications (1)

Application Number Title Priority Date Filing Date
CH1916668A CH512085A (fr) 1967-12-26 1968-12-23 Metériel sensible aux radiations

Country Status (8)

Country Link
US (1) US3567453A (fr)
BE (1) BE726207A (fr)
BR (1) BR6805097D0 (fr)
CH (1) CH512085A (fr)
DE (1) DE1815868A1 (fr)
ES (1) ES361827A1 (fr)
FR (1) FR1602445A (fr)
GB (1) GB1246298A (fr)

Families Citing this family (151)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3887379A (en) * 1972-03-30 1975-06-03 Ibm Photoresist azide sensitizer composition
US4105450A (en) * 1973-07-27 1978-08-08 Fuji Photo Film Co., Ltd. Spectrally sensitized positive light-sensitive o-quinone diazide containing composition
AU497960B2 (en) * 1974-04-11 1979-01-25 Minnesota Mining And Manufacturing Company Photopolymerizable compositions
US4324852A (en) * 1974-04-15 1982-04-13 Eastman Kodak Company Transition metal photoreduction systems and processes
US4201588A (en) * 1974-04-15 1980-05-06 Eastman Kodak Company Radiation sensitive co(III)complex photoreduction element with image recording layer
CA1051705A (fr) * 1974-04-15 1979-04-03 Thap Dominh Formation d'images au moyen d'un complexe a metal de transition a gain eleve
US4195998A (en) * 1974-04-15 1980-04-01 Eastman Kodak Company CO(III) Complex containing radiation sensitive element with diazo recording layer
US4264703A (en) * 1974-05-02 1981-04-28 General Electric Company Cationically polymerizable compositions containing photodecomposable aromatic iodonium salts
US4175973A (en) * 1974-05-02 1979-11-27 General Electric Company Curable compositions
US4058401A (en) * 1974-05-02 1977-11-15 General Electric Company Photocurable compositions containing group via aromatic onium salts
US4069056A (en) * 1974-05-02 1978-01-17 General Electric Company Photopolymerizable composition containing group Va aromatic onium salts
GB1512982A (en) * 1974-05-02 1978-06-01 Gen Electric Salts
US4058400A (en) * 1974-05-02 1977-11-15 General Electric Company Cationically polymerizable compositions containing group VIa onium salts
US4175963A (en) * 1974-05-02 1979-11-27 General Electric Company Method of exposing and curing an epoxy composition containing an aromatic onium salt
GB1518141A (en) * 1974-05-02 1978-07-19 Gen Electric Polymerizable compositions
US4378277A (en) * 1974-05-08 1983-03-29 Minnesota Mining & Manufacturing Company Photopolymerizable epoxy-containing compositions
US4026705A (en) * 1975-05-02 1977-05-31 General Electric Company Photocurable compositions and methods
US4256828A (en) * 1975-09-02 1981-03-17 Minnesota Mining And Manufacturing Company Photocopolymerizable compositions based on epoxy and hydroxyl-containing organic materials
US4069054A (en) * 1975-09-02 1978-01-17 Minnesota Mining And Manufacturing Company Photopolymerizable composition containing a sensitized aromatic sulfonium compound and a cationacally polymerizable monomer
US4045221A (en) * 1975-09-08 1977-08-30 Eastman Kodak Company Process of amplifying image in image recording layer by releasing reactant from image forming layer containing cobalt(III)complex
US4171221A (en) * 1975-09-08 1979-10-16 Eastman Kodak Company High gain Co(III)complex imaging
US4307177A (en) * 1975-12-09 1981-12-22 General Electric Company Method of using polymerizable compositions containing onium salts
US4062686A (en) * 1976-04-21 1977-12-13 Eastman Kodak Company Sensitizers for photocrosslinkable polymers
US4147552A (en) * 1976-05-21 1979-04-03 Eastman Kodak Company Light-sensitive compositions with 3-substituted coumarin compounds as spectral sensitizers
US4486529A (en) * 1976-06-10 1984-12-04 American Hoechst Corporation Dialo printing plate made from laser
US4314019A (en) * 1976-09-07 1982-02-02 Eastman Kodak Company Transition metal photoreduction systems and processes
JPS5934293B2 (ja) * 1977-04-20 1984-08-21 王子製紙株式会社 感光性組成物
FR2400221A1 (fr) * 1977-08-09 1979-03-09 Kodak Pathe Compose de diazonium photosensible utile, en particulier, pour preparer des planches d'impression lithographique, procede de preparation de ce compose et plaque presensibilisee avec ce compose
US4243737A (en) * 1977-11-25 1981-01-06 Eastman Kodak Company Image forming composition and elements with Co(III) complex, conjugated π bonding compounds and photoreductant
DE2754403A1 (de) * 1977-12-07 1979-06-13 Basf Ag Methinfarbstoffe
JPS5536838A (en) * 1978-09-08 1980-03-14 Tokyo Ohka Kogyo Co Ltd Novel light absorber and photoresist composition containing this
JPS5560944A (en) * 1978-10-31 1980-05-08 Fuji Photo Film Co Ltd Image forming method
DE2847878A1 (de) * 1978-11-04 1980-05-22 Hoechst Ag Lichtempfindliches gemisch
JPS6046422B2 (ja) * 1978-12-07 1985-10-16 東京応化工業株式会社 新規なフオトレジスト組成物
US4248959A (en) * 1978-12-07 1981-02-03 American Hoechst Corporation Preparation of diazo printing plates using laser exposure
JPS566236A (en) * 1979-06-28 1981-01-22 Fuji Photo Film Co Ltd Photosensitive material and pattern forming method using it
JPS569740A (en) * 1979-07-05 1981-01-31 Fuji Photo Film Co Ltd Image forming method
US4307182A (en) * 1980-05-23 1981-12-22 Minnesota Mining And Manufacturing Company Imaging systems with tetra(aliphatic) borate salts
US4343891A (en) * 1980-05-23 1982-08-10 Minnesota Mining And Manufacturing Company Fixing of tetra (hydrocarbyl) borate salt imaging systems
US4365019A (en) * 1981-08-06 1982-12-21 Eastman Kodak Company Positive-working resist quinone diazide containing composition and imaging method having improved development rates
US4588671A (en) * 1981-12-21 1986-05-13 Institut Khimii Akademii Nauk Sssr Photo and electron resist with donor-acceptor complex and light sensitive compound
US4511642A (en) * 1982-02-17 1985-04-16 Nippon Telegraph And Telephone Public Corp. Photo-fixing heat-sensitive recording media with photosensitive diazonium salt, coupler, and organic boron salt
US4447521A (en) * 1982-10-25 1984-05-08 Minnesota Mining And Manufacturing Company Fixing of tetra(hydrocarbyl)borate salt imaging systems
US4464458A (en) * 1982-12-30 1984-08-07 International Business Machines Corporation Process for forming resist masks utilizing O-quinone diazide and pyrene
GB8305134D0 (en) * 1983-02-24 1983-03-30 Minnesota Mining & Mfg Radiationsensitive elements
US4522911A (en) * 1983-06-28 1985-06-11 International Business Machines Corporation Deep ultra-violet lithographic resists with diazohomotetramic acid compounds
GB8333901D0 (en) * 1983-12-20 1984-02-01 Minnesota Mining & Mfg Radiationsensitive compositions
US4828960A (en) * 1985-01-07 1989-05-09 Honeywell Inc. Reflection limiting photoresist composition with two azo dyes
US4601969A (en) * 1985-03-28 1986-07-22 International Business Machines Corporation High contrast, high resolution deep ultraviolet lithographic resist composition with diazo carbonyl compound having alpha phosphoryl substitution
US4772541A (en) * 1985-11-20 1988-09-20 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
EP0223587B1 (fr) * 1985-11-20 1991-02-13 The Mead Corporation Matériaux photosensitifs contenant des colorants ioniques comme initiateurs
US4937159A (en) * 1985-11-20 1990-06-26 The Mead Corporation Photosensitive materials and compositions containing ionic dye compounds as initiators and thiols as autooxidizers
US5151520A (en) * 1985-11-20 1992-09-29 The Mead Corporation Cationic dye-triarylmonoalkylorate anion complexes
US4772530A (en) * 1986-05-06 1988-09-20 The Mead Corporation Photosensitive materials containing ionic dye compounds as initiators
US4800149A (en) * 1986-10-10 1989-01-24 The Mead Corporation Photohardenable compositions containing a dye borate complex and photosensitive materials employing the same
US4874450A (en) * 1987-01-29 1989-10-17 The Mead Corporation Laminating transparent or translucent materials using ionic dye-counter ion complexes
US4751102A (en) * 1987-07-27 1988-06-14 The Mead Corporation Radiation-curable ink and coating compositions containing ionic dye compounds as initiators
US4788124A (en) * 1987-08-19 1988-11-29 The Mead Corporation Thermal recording method and material
JP2571115B2 (ja) * 1989-01-17 1997-01-16 富士写真フイルム株式会社 感光性組成物の増感方法及び増感された感光性組成物
US5212042A (en) * 1989-08-22 1993-05-18 Fuji Photo Film Co., Ltd. Positive type light-sensitive composition
US5176984A (en) * 1989-10-25 1993-01-05 The Mead Corporation Photohardenable compositions containing a borate salt
US5100755A (en) * 1989-12-27 1992-03-31 The Mead Corporation Dye-benzyltriaryl borate photoinitiators and photohardenable composition containing these photoinitiators
EP0541631A1 (fr) * 1990-07-31 1993-05-19 Eastman Kodak Company Borates de pyridinium a substitution n
EP0555058B1 (fr) * 1992-02-07 1997-05-07 Toyo Ink Manufacturing Co., Ltd. Complexe d'(oxo)sulfonium, composition polymérisable le contenant et méthode de polymérisation
US5500453A (en) * 1992-02-07 1996-03-19 Toyo Ink Manufacturing Co., Ltd. (Oxo)sulfonium complex, polymerizable composition containing the complex, and method of polymerizing the composition
JP3442176B2 (ja) 1995-02-10 2003-09-02 富士写真フイルム株式会社 光重合性組成物
TW466256B (en) * 1995-11-24 2001-12-01 Ciba Sc Holding Ag Borate photoinitiator compounds and compositions comprising the same
AU717137B2 (en) * 1995-11-24 2000-03-16 Ciba Specialty Chemicals Holding Inc. Borate coinitiators for photopolymerization
TW467933B (en) * 1995-11-24 2001-12-11 Ciba Sc Holding Ag Photopolymerizable compositions comprising borate photoinitiators from monoboranes and the use thereof
JPH1081838A (ja) * 1996-07-16 1998-03-31 Showa Denko Kk 光硬化性材料及びその硬化方法
US7285422B1 (en) 1997-01-23 2007-10-23 Sequenom, Inc. Systems and methods for preparing and analyzing low volume analyte array elements
IT1294790B1 (it) * 1997-07-15 1999-04-15 Isoclima Spa Dispositivo elettrocromico per l'attenuazione o il filtraggio della luce
WO2000009572A1 (fr) * 1998-08-11 2000-02-24 Rhodia Chimie Procede de polymerisation et/ou de reticulation sous faisceau d'electrons et/ou rayons gamma
FR2782320B1 (fr) * 1998-08-11 2003-08-15 Rhodia Chimie Sa Nouveaux amorceurs de polymerisation et/ou de reticulation activables sous faisceau d'electrons
JP4130030B2 (ja) 1999-03-09 2008-08-06 富士フイルム株式会社 感光性組成物および1,3−ジヒドロ−1−オキソ−2h−インデン誘導体化合物
DE60022395T2 (de) 1999-12-22 2006-06-29 Reckitt Benckiser (Uk) Limited, Slough Photokatalytische zusammensetzungen und verfahren
AU2002245047A1 (en) 2000-10-30 2002-07-24 Sequenom, Inc. Method and apparatus for delivery of submicroliter volumes onto a substrate
JP4291638B2 (ja) 2003-07-29 2009-07-08 富士フイルム株式会社 アルカリ可溶性ポリマー及びそれを用いた平版印刷版原版
WO2005021661A1 (fr) * 2003-08-21 2005-03-10 Merck Patent Gmbh Colorants de cyanoborates, fluoralkylphosphates, fluoralkylborates ou d'imides
US7939644B2 (en) * 2003-08-21 2011-05-10 Merck Patent Gmbh Cyanoborate, fluoroalkylphosphate, fluoroalkylborate or imide dyes
JP4452572B2 (ja) 2004-07-06 2010-04-21 富士フイルム株式会社 感光性組成物およびそれを用いた画像記録方法
JP4396443B2 (ja) 2004-08-18 2010-01-13 コニカミノルタエムジー株式会社 感光性平版印刷版の製造方法及び使用方法
JP5089866B2 (ja) 2004-09-10 2012-12-05 富士フイルム株式会社 平版印刷方法
WO2006061981A1 (fr) 2004-12-09 2006-06-15 Konica Minolta Medical & Graphic, Inc. Procede de formation d’images, dispositif d’impression a jet d’encre photopolymerisable, ensemble d’encres et procede d’impresion a jet d’encre
EP1701213A3 (fr) 2005-03-08 2006-11-22 Fuji Photo Film Co., Ltd. Composition photosensible
JP4474317B2 (ja) 2005-03-31 2010-06-02 富士フイルム株式会社 平版印刷版の作製方法
JP2006335826A (ja) 2005-05-31 2006-12-14 Fujifilm Holdings Corp インクジェット記録用インク組成物およびこれを用いた平版印刷版の作製方法
CN101316721A (zh) 2005-11-01 2008-12-03 柯尼卡美能达医疗印刷器材株式会社 平版印刷版材料、平版印刷版、平版印刷版的制备方法和平版印刷版的印刷方法
ES2289905B1 (es) * 2005-11-24 2009-04-01 Exotech, S.L. Composicion que comprende un compuesto fotoactivo y un coiniciador y su uso como fotoiniciador.
JP5276264B2 (ja) 2006-07-03 2013-08-28 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、平版印刷版の製造方法
JP2008163081A (ja) 2006-12-27 2008-07-17 Fujifilm Corp レーザー分解性樹脂組成物およびそれを用いるパターン形成材料ならびにレーザー彫刻型フレキソ印刷版原版
EP1955858B1 (fr) 2007-02-06 2014-06-18 FUJIFILM Corporation Procédé et dispositif d'impression à jet d'encre
DE602008006279D1 (de) 2007-02-07 2011-06-01 Fujifilm Corp Tintenstrahlaufzeichnungsvorrichtung mit Wartungsvorrichtung für Tintenstrahldruckkopf und Wartungsverfahren für einen Tintenstrahldruckkopf
WO2008096618A1 (fr) 2007-02-09 2008-08-14 Konica Minolta Medical & Graphic, Inc. Tête à jet d'encre, imprimante à jet d'encre et procédé d'impression à jet d'encre
JP5227521B2 (ja) 2007-02-26 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、インクセット
JP5224699B2 (ja) 2007-03-01 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、平版印刷版の製造方法、及び平版印刷版
JP5243072B2 (ja) 2007-03-30 2013-07-24 富士フイルム株式会社 インク組成物、並びに、それを用いた画像記録方法及び画像記録物
JP5306681B2 (ja) 2007-03-30 2013-10-02 富士フイルム株式会社 重合性化合物、重合体、インク組成物、印刷物及びインクジェット記録方法
WO2009039122A2 (fr) 2007-09-17 2009-03-26 Sequenom, Inc. Dispositif de transfert d'échantillon robotique intégré
JP4898618B2 (ja) 2007-09-28 2012-03-21 富士フイルム株式会社 インクジェット記録方法
JP5265165B2 (ja) 2007-09-28 2013-08-14 富士フイルム株式会社 塗布装置及びこれを用いるインクジェット記録装置
JP5227560B2 (ja) 2007-09-28 2013-07-03 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
CN101430505B (zh) 2007-11-08 2013-04-17 富士胶片株式会社 激光雕刻用树脂组合物、激光雕刻用树脂印刷版原版、凸版印刷版以及制备凸版印刷版的方法
JP5500831B2 (ja) 2008-01-25 2014-05-21 富士フイルム株式会社 レリーフ印刷版の作製方法及びレーザー彫刻用印刷版原版
JP5241252B2 (ja) 2008-01-29 2013-07-17 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
JP5254632B2 (ja) 2008-02-07 2013-08-07 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物
US20090214797A1 (en) 2008-02-25 2009-08-27 Fujifilm Corporation Inkjet ink composition, and inkjet recording method and printed material employing same
JP5137618B2 (ja) 2008-02-28 2013-02-06 富士フイルム株式会社 レーザー彫刻用樹脂組成物、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版及びレリーフ印刷版の製造方法
EP2095970A1 (fr) 2008-02-29 2009-09-02 Fujifilm Corporation Composition de résine pour gravure au laser, précurseur de plaque d'impression en résine pour gravure au laser, plaque d'impression en relief et procédé de production d'une plaque d'impression en relief
EP2098367A1 (fr) * 2008-03-05 2009-09-09 Eastman Kodak Company Combinaison de sensibilisateur/initiateur pour compositions thermosensibles à action négative utilisables pour des plaques lithographiques
JP5583329B2 (ja) 2008-03-11 2014-09-03 富士フイルム株式会社 顔料組成物、インク組成物、印刷物、インクジェット記録方法、及びポリアリルアミン誘導体
JP4914862B2 (ja) 2008-03-26 2012-04-11 富士フイルム株式会社 インクジェット記録方法、及び、インクジェット記録装置
JP5322575B2 (ja) 2008-03-28 2013-10-23 富士フイルム株式会社 レーザー彫刻用樹脂組成物、画像形成材料、レーザー彫刻用レリーフ印刷版原版、レリーフ印刷版、及びレリーフ印刷版の製造方法
JP5305793B2 (ja) 2008-03-31 2013-10-02 富士フイルム株式会社 レリーフ印刷版及びレリーフ印刷版の製造方法
JP5414367B2 (ja) 2008-06-02 2014-02-12 富士フイルム株式会社 顔料分散物及びそれを用いたインク組成物
EP2292430B1 (fr) 2008-06-23 2015-01-07 Konica Minolta Holdings, Inc. Dispositif d'enregistrement à jet d'encre et procédé d'enregistrement à jet d'encre
JP5383133B2 (ja) 2008-09-19 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット記録方法及び印刷物成形体の製造方法
JP2010077228A (ja) 2008-09-25 2010-04-08 Fujifilm Corp インク組成物、インクジェット記録方法、及び、印刷物
US8888262B2 (en) 2008-11-07 2014-11-18 Konica Minolta Holdings, Inc. Actinic energy radiation curable inkjet ink and inkjet recording method
JP2010115791A (ja) 2008-11-11 2010-05-27 Konica Minolta Ij Technologies Inc 画像形成装置
JP2010180330A (ja) 2009-02-05 2010-08-19 Fujifilm Corp 非水系インク、インクセット、画像記録方法、画像記録装置、および記録物
JP5350827B2 (ja) 2009-02-09 2013-11-27 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349095B2 (ja) 2009-03-17 2013-11-20 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5349097B2 (ja) 2009-03-19 2013-11-20 富士フイルム株式会社 インク組成物、インクジェット記録方法、印刷物、及び、成形印刷物の製造方法
JP5383289B2 (ja) 2009-03-31 2014-01-08 富士フイルム株式会社 インク組成物、インクジェット用であるインク組成物、インクジェット記録方法、およびインクジェット法による印刷物
JP5572026B2 (ja) 2009-09-18 2014-08-13 富士フイルム株式会社 インク組成物、及び、インクジェット記録方法
JP5530141B2 (ja) 2009-09-29 2014-06-25 富士フイルム株式会社 インク組成物及びインクジェット記録方法
JP5692494B2 (ja) 2010-03-16 2015-04-01 セイコーエプソン株式会社 インク組成物および記録方法
JP2012031388A (ja) 2010-05-19 2012-02-16 Fujifilm Corp 印刷方法、オーバープリントの作製方法、ラミネート加工方法、発光ダイオード硬化性コーティング組成物、及び、発光ダイオード硬化性インク組成物
WO2012023368A1 (fr) 2010-08-19 2012-02-23 コニカミノルタホールディングス株式会社 Encre durcissable par rayonnement actif et procédé d'enregistrement à jet d'encre durcissable par rayonnement actif
EP2650132B1 (fr) 2010-12-10 2019-10-16 Konica Minolta, Inc. Dispositif d'impression à jet d'encre
EP2692776B1 (fr) 2011-03-30 2017-02-22 Asahi Kasei Kabushiki Kaisha Organopolysiloxane, son procédé de production, et composition de résine durcissable le contenant
US20140049590A1 (en) 2011-04-27 2014-02-20 Konica Minolta, Inc. Inkjet recording device
JP5867585B2 (ja) 2012-03-01 2016-02-24 コニカミノルタ株式会社 インクジェット記録方法
EP2644664B1 (fr) 2012-03-29 2015-07-29 Fujifilm Corporation Composition d'encre de type durcissant au rayonnement actinique, procédé d'enregistrement à jet d'encre, feuille décorative, produit moulé en feuille décorative, procédé de production d'article moulé dans un moule, et article moulé dans un moule
CN104284779B (zh) 2012-05-01 2016-03-09 柯尼卡美能达株式会社 图像形成装置
JP5980702B2 (ja) 2013-03-07 2016-08-31 富士フイルム株式会社 インクジェットインク組成物、インクジェット記録方法、及び、成型印刷物の製造方法
JP6183455B2 (ja) 2013-03-29 2017-08-23 コニカミノルタ株式会社 画像形成装置
JP5939644B2 (ja) 2013-08-30 2016-06-22 富士フイルム株式会社 画像形成方法、インモールド成型品の製造方法、及び、インクセット
US11914293B2 (en) 2017-01-31 2024-02-27 Flint Group Germany Gmbh Radiatioin-curable mixture containing low-functionalised, partially saponified polyvinyl acetate
CN110678332B (zh) 2017-03-27 2021-11-26 富林特集团德国有限公司 制造图形凸纹结构的方法
WO2019072701A1 (fr) 2017-10-10 2019-04-18 Flint Group Germany Gmbh Précurseur en relief avec faible courbure transversale et plissage
DK3721293T3 (da) 2017-12-08 2023-07-10 Flint Group Germany Gmbh Fremgangsmåde til mærkning af en reliefforløber til fremstilling af en reliefstruktur
NL2020109B1 (en) 2017-12-18 2019-06-25 Xeikon Prepress Nv Method for fixing and treating a flexible plate on a drum, and flexible plate for use therein
EP4614232A3 (fr) 2018-04-26 2025-11-19 XSYS Prepress N.V. Appareil et procédé de traitement d'un précurseur de plaque en relief
EP3629089A1 (fr) 2018-09-26 2020-04-01 Flint Group Germany GmbH Procédé de développement thermique de précurseurs en relief
NL2027002B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2027003B1 (en) 2020-11-27 2022-07-04 Flint Group Germany Gmbh Photosensitive composition
NL2028207B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh A relief precursor with vegetable oils as plasticizers suitable for printing plates
NL2028208B1 (en) 2021-05-12 2022-11-30 Flint Group Germany Gmbh Flexographic printing element precursor with high melt flow index
NL2035286B1 (en) 2023-07-06 2025-01-13 Xsys Germany Gmbh Relief precursors with enhanced stability

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FR1602445A (fr) 1970-11-23
BE726207A (fr) 1969-05-29
ES361827A1 (es) 1970-11-01
BR6805097D0 (pt) 1973-01-11
US3567453A (en) 1971-03-02
GB1246298A (en) 1971-09-15
DE1815868A1 (de) 1969-11-06

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