CH626468A5 - - Google Patents

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Publication number
CH626468A5
CH626468A5 CH326978A CH326978A CH626468A5 CH 626468 A5 CH626468 A5 CH 626468A5 CH 326978 A CH326978 A CH 326978A CH 326978 A CH326978 A CH 326978A CH 626468 A5 CH626468 A5 CH 626468A5
Authority
CH
Switzerland
Prior art keywords
layer
resistance
chromium
silicon
substrate
Prior art date
Application number
CH326978A
Other languages
German (de)
English (en)
Inventor
Konrad Dr Hieber
Original Assignee
Siemens Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens Ag filed Critical Siemens Ag
Publication of CH626468A5 publication Critical patent/CH626468A5/de

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/12—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C17/00—Apparatus or processes specially adapted for manufacturing resistors
    • H01C17/06—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base
    • H01C17/075—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques
    • H01C17/08—Apparatus or processes specially adapted for manufacturing resistors adapted for coating resistive material on a base by thin-film techniques by vapour deposition
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01C—RESISTORS
    • H01C7/00—Non-adjustable resistors formed as one or more layers or coatings; Non-adjustable resistors made from powdered conducting material or powdered semi-conducting material with or without insulating material
    • H01C7/006—Thin film resistors
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/26—Web or sheet containing structurally defined element or component, the element or component having a specified physical dimension
    • Y10T428/263—Coating layer not in excess of 5 mils thick or equivalent
    • Y10T428/264—Up to 3 mils
    • Y10T428/265—1 mil or less

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Electromagnetism (AREA)
  • Non-Adjustable Resistors (AREA)
  • Apparatuses And Processes For Manufacturing Resistors (AREA)
  • Physical Vapour Deposition (AREA)
  • Electronic Switches (AREA)
  • Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
CH326978A 1977-05-31 1978-03-28 CH626468A5 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2724498A DE2724498C2 (de) 1977-05-31 1977-05-31 Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung

Publications (1)

Publication Number Publication Date
CH626468A5 true CH626468A5 (fr) 1981-11-13

Family

ID=6010290

Family Applications (1)

Application Number Title Priority Date Filing Date
CH326978A CH626468A5 (fr) 1977-05-31 1978-03-28

Country Status (6)

Country Link
US (1) US4414274A (fr)
JP (1) JPS5945201B2 (fr)
CH (1) CH626468A5 (fr)
DE (1) DE2724498C2 (fr)
FR (1) FR2393410A1 (fr)
GB (1) GB1570841A (fr)

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2724498C2 (de) 1977-05-31 1982-06-03 Siemens AG, 1000 Berlin und 8000 München Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung
US4191938A (en) * 1978-07-03 1980-03-04 International Business Machines Corporation Cermet resistor trimming method
DE2909804A1 (de) * 1979-03-13 1980-09-18 Siemens Ag Verfahren zum herstellen duenner, dotierter metallschichten durch reaktives aufstaeuben
DE3004149A1 (de) * 1980-02-05 1981-08-13 Siemens AG, 1000 Berlin und 8000 München Verfahren zur reproduzierbaren herstellung metallischer schichten
US4325048A (en) * 1980-02-29 1982-04-13 Gould Inc. Deformable flexure element for strain gage transducer and method of manufacture
JPS56130374A (en) * 1980-03-19 1981-10-13 Hitachi Ltd Thermal head
JPS5882770A (ja) * 1981-11-13 1983-05-18 Hitachi Ltd 感熱記録ヘツド
JPS5884406A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 薄膜抵抗体の製造方法
JPS5884401A (ja) * 1981-11-13 1983-05-20 株式会社日立製作所 抵抗体
NL8203297A (nl) * 1982-08-24 1984-03-16 Philips Nv Weerstandslichaam.
JPS59209157A (ja) * 1983-05-13 1984-11-27 Hitachi Ltd 感熱記録ヘッドの製造方法
JPS60182351A (ja) * 1984-02-28 1985-09-17 Diesel Kiki Co Ltd スイツチ付弁装置
DE3431114A1 (de) * 1984-08-24 1986-03-06 Vdo Adolf Schindling Ag, 6000 Frankfurt Elektrischer widerstand
DE3609503A1 (de) * 1985-03-22 1986-10-02 Canon K.K., Tokio/Tokyo Heizwiderstandselement und heizwiderstand unter verwendung desselben
DE3608887A1 (de) * 1985-03-22 1986-10-02 Canon K.K., Tokio/Tokyo Waermeerzeugungs-widerstandselement und waermeerzeugungs-widerstandsvorrichtung unter verwendung des waermeerzeugungs-widerstandselements
DE3609691A1 (de) * 1985-03-23 1986-10-02 Canon K.K., Tokio/Tokyo Thermischer schreibkopf
US4783369A (en) * 1985-03-23 1988-11-08 Canon Kabushiki Kaisha Heat-generating resistor and heat-generating resistance element using same
DE3609975A1 (de) * 1985-03-25 1986-10-02 Canon K.K., Tokio/Tokyo Thermoaufzeichnungskopf
GB2176443B (en) * 1985-06-10 1990-11-14 Canon Kk Liquid jet recording head and recording system incorporating the same
US4682143A (en) * 1985-10-30 1987-07-21 Advanced Micro Devices, Inc. Thin film chromium-silicon-carbon resistor
JPS62245602A (ja) * 1986-04-17 1987-10-26 鐘淵化学工業株式会社 温度検出器
US4878770A (en) * 1987-09-09 1989-11-07 Analog Devices, Inc. IC chips with self-aligned thin film resistors
US5243320A (en) * 1988-02-26 1993-09-07 Gould Inc. Resistive metal layers and method for making same
US5605609A (en) * 1988-03-03 1997-02-25 Asahi Glass Company Ltd. Method for forming low refractive index film comprising silicon dioxide
US5354446A (en) * 1988-03-03 1994-10-11 Asahi Glass Company Ltd. Ceramic rotatable magnetron sputtering cathode target and process for its production
JP2911186B2 (ja) * 1989-07-10 1999-06-23 科学技術振興事業団 複合酸化物薄膜
KR960005321B1 (ko) * 1990-04-24 1996-04-23 가부시끼가이샤 히다찌세이사꾸쇼 박막저항체를 갖는 전자회로소자 및 그 제조방법
US5420562A (en) * 1993-09-28 1995-05-30 Motorola, Inc. Resistor having geometry for enhancing radio frequency performance
JP2019090723A (ja) * 2017-11-15 2019-06-13 ミネベアミツミ株式会社 ひずみゲージ
JP2019090722A (ja) * 2017-11-15 2019-06-13 ミネベアミツミ株式会社 ひずみゲージ

Family Cites Families (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
BE578799A (fr) * 1958-05-21
US3203830A (en) * 1961-11-24 1965-08-31 Int Resistance Co Electrical resistor
US3477935A (en) * 1966-06-07 1969-11-11 Union Carbide Corp Method of forming thin film resistors by cathodic sputtering
US3652750A (en) * 1967-03-30 1972-03-28 Reinhard Glang Chromium-silicon monoxide film resistors
US3506556A (en) * 1968-02-28 1970-04-14 Ppg Industries Inc Sputtering of metal oxide films in the presence of hydrogen and oxygen
US3703456A (en) * 1969-12-22 1972-11-21 Gen Electric Method of making resistor thin films by reactive sputtering from a composite source
US3763026A (en) * 1969-12-22 1973-10-02 Gen Electric Method of making resistor thin films by reactive sputtering from a composite source
US3738926A (en) * 1972-03-28 1973-06-12 Bell Canada Method and apparatus for controlling the electrical properties of sputtered films
US4021277A (en) * 1972-12-07 1977-05-03 Sprague Electric Company Method of forming thin film resistor
US4048039A (en) * 1975-03-07 1977-09-13 Balzers Patent Und Beteiligungs-Ag Method of producing a light transmitting absorbing coating on substrates
US3996551A (en) * 1975-10-20 1976-12-07 The United States Of America As Represented By The Secretary Of The Navy Chromium-silicon oxide thin film resistors
US4051297A (en) * 1976-08-16 1977-09-27 Shatterproof Glass Corporation Transparent article and method of making the same
DE2724498C2 (de) 1977-05-31 1982-06-03 Siemens AG, 1000 Berlin und 8000 München Elektrischer Schichtwiderstand und Verfahren zu seiner Herstellung

Also Published As

Publication number Publication date
JPS5945201B2 (ja) 1984-11-05
JPS541898A (en) 1979-01-09
FR2393410A1 (fr) 1978-12-29
DE2724498C2 (de) 1982-06-03
FR2393410B1 (fr) 1981-09-11
DE2724498A1 (de) 1978-12-14
US4414274A (en) 1983-11-08
GB1570841A (en) 1980-07-09

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PL Patent ceased
PL Patent ceased