CH633893A5 - Photosensitive single-layer film, process for its production and use of the film - Google Patents

Photosensitive single-layer film, process for its production and use of the film Download PDF

Info

Publication number: CH633893A5
Authority: CH; Switzerland
Prior art keywords: phase; film; water; photosensitive; diazo
Prior art date: 1975-06-19

Application number

CH534076A

Other languages

German (de)

English (en)

Inventor

Robert W Hallman

Original Assignee

Napp Systems Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1975-06-19

Filing date

1976-04-28

Publication date

1982-12-31

1976-04-28 Application filed by Napp Systems Inc filed Critical Napp Systems Inc

1982-12-31 Publication of CH633893A5 publication Critical patent/CH633893A5/de

Links

238000000034 method Methods 0.000 title claims description 12
239000002356 single layer Substances 0.000 title claims description 8
230000008569 process Effects 0.000 title claims description 6
238000004519 manufacturing process Methods 0.000 title description 8
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 claims description 34
239000000463 material Substances 0.000 claims description 28
239000000758 substrate Substances 0.000 claims description 27
239000002904 solvent Substances 0.000 claims description 19
150000008049 diazo compounds Chemical class 0.000 claims description 12
239000000839 emulsion Substances 0.000 claims description 11
230000005855 radiation Effects 0.000 claims description 11
NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 claims description 8
239000006185 dispersion Substances 0.000 claims description 8
239000010410 layer Substances 0.000 claims description 8
229920002689 polyvinyl acetate Polymers 0.000 claims description 6
239000011118 polyvinyl acetate Substances 0.000 claims description 6
238000007639 printing Methods 0.000 claims description 6
229920001577 copolymer Polymers 0.000 claims description 5
229920000642 polymer Polymers 0.000 claims description 5
NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 claims description 4
238000000576 coating method Methods 0.000 claims description 4
239000002245 particle Substances 0.000 claims description 4
QTBSBXVTEAMEQO-UHFFFAOYSA-M Acetate Chemical compound CC([O-])=O QTBSBXVTEAMEQO-UHFFFAOYSA-M 0.000 claims description 3
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 claims description 3
239000005977 Ethylene Substances 0.000 claims description 3
108010010803 Gelatin Proteins 0.000 claims description 3
BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 claims description 3
XTXRWKRVRITETP-UHFFFAOYSA-N Vinyl acetate Chemical compound CC(=O)OC=C XTXRWKRVRITETP-UHFFFAOYSA-N 0.000 claims description 3
150000001728 carbonyl compounds Chemical class 0.000 claims description 3
239000011248 coating agent Substances 0.000 claims description 3
239000007859 condensation product Substances 0.000 claims description 3
229920000159 gelatin Polymers 0.000 claims description 3
239000008273 gelatin Substances 0.000 claims description 3
235000019322 gelatine Nutrition 0.000 claims description 3
235000011852 gelatine desserts Nutrition 0.000 claims description 3
229910052709 silver Inorganic materials 0.000 claims description 3
239000004332 silver Substances 0.000 claims description 3
238000004040 coloring Methods 0.000 claims description 2
230000005670 electromagnetic radiation Effects 0.000 claims description 2
229910052736 halogen Inorganic materials 0.000 claims description 2
150000002367 halogens Chemical class 0.000 claims description 2
239000004908 Emulsion polymer Substances 0.000 claims 3
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims 2
230000001427 coherent effect Effects 0.000 claims 2
230000007423 decrease Effects 0.000 claims 1
239000004815 dispersion polymer Substances 0.000 claims 1
239000000975 dye Substances 0.000 claims 1
125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 18
239000000203 mixture Substances 0.000 description 10
229910052782 aluminium Inorganic materials 0.000 description 8
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 7
230000035515 penetration Effects 0.000 description 6
239000008399 tap water Substances 0.000 description 6
235000020679 tap water Nutrition 0.000 description 6
238000010521 absorption reaction Methods 0.000 description 5
238000007605 air drying Methods 0.000 description 5
239000011159 matrix material Substances 0.000 description 5
238000007645 offset printing Methods 0.000 description 5
239000000126 substance Substances 0.000 description 5
229910052724 xenon Inorganic materials 0.000 description 5
FHNFHKCVQCLJFQ-UHFFFAOYSA-N xenon atom Chemical compound [Xe] FHNFHKCVQCLJFQ-UHFFFAOYSA-N 0.000 description 5
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
DCKVNWZUADLDEH-UHFFFAOYSA-N sec-butyl acetate Chemical compound CCC(C)OC(C)=O DCKVNWZUADLDEH-UHFFFAOYSA-N 0.000 description 4
239000000243 solution Substances 0.000 description 4
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 3
HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
230000008901 benefit Effects 0.000 description 3
239000000084 colloidal system Substances 0.000 description 3
150000001875 compounds Chemical class 0.000 description 3
239000007788 liquid Substances 0.000 description 3
230000035699 permeability Effects 0.000 description 3
238000002360 preparation method Methods 0.000 description 3
239000005871 repellent Substances 0.000 description 3
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 2
206010034972 Photosensitivity reaction Diseases 0.000 description 2
KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
230000001680 brushing effect Effects 0.000 description 2
238000005266 casting Methods 0.000 description 2
239000004922 lacquer Substances 0.000 description 2
QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 2
239000003973 paint Substances 0.000 description 2
230000036211 photosensitivity Effects 0.000 description 2
239000011148 porous material Substances 0.000 description 2
239000000047 product Substances 0.000 description 2
230000009467 reduction Effects 0.000 description 2
239000011347 resin Substances 0.000 description 2
229920005989 resin Polymers 0.000 description 2
239000000377 silicon dioxide Substances 0.000 description 2
238000003892 spreading Methods 0.000 description 2
230000007480 spreading Effects 0.000 description 2
238000010186 staining Methods 0.000 description 2
229910052714 tellurium Inorganic materials 0.000 description 2
PORWMNRCUJJQNO-UHFFFAOYSA-N tellurium atom Chemical compound [Te] PORWMNRCUJJQNO-UHFFFAOYSA-N 0.000 description 2
238000009736 wetting Methods 0.000 description 2
229920000742 Cotton Polymers 0.000 description 1
101100346656 Drosophila melanogaster strat gene Proteins 0.000 description 1
229910019093 NaOCl Inorganic materials 0.000 description 1
229930040373 Paraformaldehyde Natural products 0.000 description 1
206010041662 Splinter Diseases 0.000 description 1
150000001242 acetic acid derivatives Chemical class 0.000 description 1
239000002253 acid Substances 0.000 description 1
230000002378 acidificating effect Effects 0.000 description 1
150000001252 acrylic acid derivatives Chemical class 0.000 description 1
229920006397 acrylic thermoplastic Polymers 0.000 description 1
239000000654 additive Substances 0.000 description 1
230000000996 additive effect Effects 0.000 description 1
238000004026 adhesive bonding Methods 0.000 description 1
239000007864 aqueous solution Substances 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
230000008859 change Effects 0.000 description 1
239000007795 chemical reaction product Substances 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
239000003086 colorant Substances 0.000 description 1
230000000052 comparative effect Effects 0.000 description 1
238000009833 condensation Methods 0.000 description 1
230000005494 condensation Effects 0.000 description 1
239000000109 continuous material Substances 0.000 description 1
230000002950 deficient Effects 0.000 description 1
FHIVAFMUCKRCQO-UHFFFAOYSA-N diazinon Chemical compound CCOP(=S)(OCC)OC1=CC(C)=NC(C(C)C)=N1 FHIVAFMUCKRCQO-UHFFFAOYSA-N 0.000 description 1
238000001035 drying Methods 0.000 description 1
230000001804 emulsifying effect Effects 0.000 description 1
229920001038 ethylene copolymer Polymers 0.000 description 1
125000000816 ethylene group Chemical class [H]C([H])([*:1])C([H])([H])[*:2] 0.000 description 1
210000003608 fece Anatomy 0.000 description 1
239000007888 film coating Substances 0.000 description 1
238000009501 film coating Methods 0.000 description 1
229920001519 homopolymer Polymers 0.000 description 1
-1 hot gluing Substances 0.000 description 1
WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
229910001867 inorganic solvent Inorganic materials 0.000 description 1
239000003049 inorganic solvent Substances 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
238000002386 leaching Methods 0.000 description 1
239000010871 livestock manure Substances 0.000 description 1
239000003960 organic solvent Substances 0.000 description 1
238000012856 packing Methods 0.000 description 1
229920002866 paraformaldehyde Polymers 0.000 description 1
230000000704 physical effect Effects 0.000 description 1
238000007747 plating Methods 0.000 description 1
229920003229 poly(methyl methacrylate) Polymers 0.000 description 1
229920006267 polyester film Polymers 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
108090000623 proteins and genes Proteins 0.000 description 1
238000005201 scrubbing Methods 0.000 description 1
SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
239000007787 solid Substances 0.000 description 1
238000003860 storage Methods 0.000 description 1
150000003440 styrenes Chemical class 0.000 description 1
ISXSCDLOGDJUNJ-UHFFFAOYSA-N tert-butyl prop-2-enoate Chemical compound CC(C)(C)OC(=O)C=C ISXSCDLOGDJUNJ-UHFFFAOYSA-N 0.000 description 1
238000010792 warming Methods 0.000 description 1
238000005406 washing Methods 0.000 description 1
239000000080 wetting agent Substances 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/04—Chromates
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/06—Silver salts

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Spectroscopy & Molecular Physics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Formation Of Insulating Films (AREA)

CH534076A 1975-06-19 1976-04-28 Photosensitive single-layer film, process for its production and use of the film CH633893A5 (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
US58833475A	1975-06-19	1975-06-19

Publications (1)

Publication Number	Publication Date
CH633893A5 true CH633893A5 (en)	1982-12-31

Family

ID=24353419

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CH534076A CH633893A5 (en)	1975-06-19	1976-04-28	Photosensitive single-layer film, process for its production and use of the film

Country Status (12)

Country	Link
JP (1)	JPS5936731B2 (da)
BE (1)	BE841797A (da)
CA (1)	CA1091969A (da)
CH (1)	CH633893A5 (da)
DE (1)	DE2626066A1 (da)
DK (1)	DK232276A (da)
FR (1)	FR2315110A1 (da)
GB (1)	GB1548764A (da)
IT (1)	IT1061234B (da)
NL (1)	NL7604774A (da)
NO (1)	NO762006L (da)
SE (1)	SE422847B (da)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS52154626A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS52154627A (en) *	1976-06-18	1977-12-22	Fuji Photo Film Co Ltd	Silver halide light sensitive material
JPS5518621A (en) *	1978-07-26	1980-02-08	Fuji Photo Film Co Ltd	Photosensitive lithographic printing plate
DE2834059A1 (de) *	1978-08-03	1980-02-14	Hoechst Ag	Lichtempfindliches kopiermaterial und verfahren zu seiner herstellung
JPS5823026A (ja) *	1981-08-04	1983-02-10	Nippon Paint Co Ltd	水現像性平版印刷版材
JPS58174939A (ja) *	1982-03-18	1983-10-14	Konishiroku Photo Ind Co Ltd	画像形成材料
US4551415A (en) *	1982-04-22	1985-11-05	E. I. Du Pont De Nemours And Company	Photosensitive coatings containing crosslinked beads
US4668604A (en) *	1982-04-22	1987-05-26	E.I. Du Pont De Nemours And Company	Positive-working photosensitive elements containing crosslinked beads and process of use
US4601970A (en) *	1982-04-22	1986-07-22	E. I. Du Pont De Nemours And Company	Dry photosensitive film containing crosslinked beads
DE3328019A1 (de) *	1982-09-21	1984-03-22	Polychrome Corp., 10702 Yonkers, N.Y.	Mit wasser entwickelbare druckplatte
GB2273366B (en) *	1992-11-18	1996-03-27	Du Pont	Forming images on radiation-sensitive plates
US5688627A (en) *	1996-07-02	1997-11-18	Precision Lithograining Corp.	Light sensitive diazonium compounds having both bisulfate and zincate parts, method of making the compounds and compositions utilizing them

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US3382069A (en) *	1964-06-18	1968-05-07	Azoplate Corp	Planographic printing plate
GB1469941A (en) *	1973-04-10	1977-04-06	Andrews Paper & Chem Co Inc	Diazotype reproduction layer

1976
- 1976-04-02 CA CA249,489A patent/CA1091969A/en not_active Expired
- 1976-04-12 GB GB14886/76A patent/GB1548764A/en not_active Expired
- 1976-04-28 CH CH534076A patent/CH633893A5/de not_active IP Right Cessation
- 1976-05-03 IT IT49301/76A patent/IT1061234B/it active
- 1976-05-03 FR FR7613143A patent/FR2315110A1/fr active Granted
- 1976-05-04 SE SE7605083A patent/SE422847B/xx unknown
- 1976-05-05 NL NL7604774A patent/NL7604774A/xx not_active Application Discontinuation
- 1976-05-13 BE BE167002A patent/BE841797A/xx not_active IP Right Cessation
- 1976-05-26 DK DK232276A patent/DK232276A/da not_active Application Discontinuation
- 1976-06-08 JP JP51067029A patent/JPS5936731B2/ja not_active Expired
- 1976-06-10 DE DE19762626066 patent/DE2626066A1/de not_active Withdrawn
- 1976-06-10 NO NO762006A patent/NO762006L/no unknown

Also Published As

Publication number	Publication date
SE7605083L (sv)	1976-12-20
NO762006L (da)	1976-12-21
DE2626066A1 (de)	1977-01-20
SE422847B (sv)	1982-03-29
BE841797A (fr)	1976-09-01
CA1091969A (en)	1980-12-23
FR2315110B1 (da)	1981-11-13
GB1548764A (en)	1979-07-18
FR2315110A1 (fr)	1977-01-14
JPS522520A (en)	1977-01-10
NL7604774A (nl)	1976-12-21
IT1061234B (it)	1983-02-28
DK232276A (da)	1976-12-20
JPS5936731B2 (ja)	1984-09-05

Legal Events

Date	Code	Title	Description
1986-12-31	PL	Patent ceased
2024-10-31	PL	Patent ceased

Publication	Publication Date	Title
DE1571816C3 (de)	1975-02-20	Verfahren zur Herstellung photographischer Bilder
DE1471707B2 (de)	1973-05-17	Verfahren zur herstellung einer sensibilisierten, insbesondere zur herstellung einer flachdruckform geeigneten photographischen platte
DE1671637B2 (de)	1975-02-27	Trockenflachdruckplatte und deren Verwendung
DE2401813A1 (de)	1974-09-05	Trockenuebertragungsblatt und verfahren zu seiner herstellung und fuer seine anwendung
DE2903454A1 (de)	1979-08-02	Lichtempfindliche latexbeschichtungsmasse und ihre verwendung
DE3115860A1 (de)	1982-02-04	"waermeempfindliches aufzeichnungsmaterial und unter seiner verwendung durchgefuehrtes aufzeichnungsverfahren"
DE2218821A1 (de)	1972-11-02	Polyamid-Diazoharzmasse
DE2314295A1 (de)	1973-10-18	Verfahren zur behandlung einer aluminiumoberflaeche einer platte und zur herstellung einer druckplatte aus der behandelten platte
DE2932035C2 (da)	1988-12-01
DE2626066A1 (de)	1977-01-20	Lichtempfindliches material, insbesondere mit wasser entwickelbare druckplatten
DE2120086A1 (de)	1971-12-09	Herstellung von fotografischen Färb auszugsbildern und deren Verwendung als Färb Probedrucke
DE965675C (de)	1957-06-13	Verfahren zur Herstellung von Druckformen, bei welchem von einem belichteten lichtempfindlichen Blatt Material auf die Druckplatte uebertragen wird
DE2036168A1 (de)	1971-02-04	Aufzeichnung und Reproduktion gefärbter Kolloidmuster
DE69811033T2 (de)	2003-06-26	Siebdruckschablone
DE1471668C3 (de)	1974-08-08	Registrierverfahren und Material zur Durchführung des Verfahrens
DE2302463C3 (de)	1974-10-17	Flexibler Zurichtebogen und Verfahren zur Herstellung einer Zurichtung daraus
DE1266767B (de)	1968-04-25	Lithographische Druckplatte
DE2259768C2 (de)	1984-01-26	Abbildungsmaterial, seine Verwendung sowie Verfahren zur Herstellung einer Abbildung
DE2807583A1 (de)	1978-08-31	Verfahren zur herstellung von siebdruck-schablonen, die dafuer verwendbaren beschichtungsmassen und copolymeren sowie die dabei erhaltenen siebdruckschablonen und ihre verwendung
DE218852C (da)
DE1671630B2 (de)	1976-07-29	Anwendung von lochfolien als schablonentraeger fuer siebdruck
DE2312496C2 (de)	1985-01-31	Verfahren zur Herstellung von leicht abschälbaren Negativdruckvorlagen
DE1522456A1 (de)	1969-07-31	Verfahren zur Herstellung von AEtzreserven und hierfuer geeignete Materialien
DE69711054T2 (de)	2002-10-17	Verfahren zur Herstellung einer positiv arbeitenden Druckplatte, von einem lithographischen Träger mit einem vernetzten hydrophilen Substrat ausgehend
DE1038917B (de)	1958-09-11	Photomechanisches Verfahren zur Herstellung von Druckformen und lichtempfindliche Blaetter fuer dieses Verfahren