CN1013208B - 表面处理的方法和装置 - Google Patents
表面处理的方法和装置Info
- Publication number
- CN1013208B CN1013208B CN88106041A CN88106041A CN1013208B CN 1013208 B CN1013208 B CN 1013208B CN 88106041 A CN88106041 A CN 88106041A CN 88106041 A CN88106041 A CN 88106041A CN 1013208 B CN1013208 B CN 1013208B
- Authority
- CN
- China
- Prior art keywords
- coating
- furnace
- gas
- forming
- treated
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Images
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/36—Carbonitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/34—Nitrides
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/442—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating using fluidised bed process
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4481—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by evaporation using carrier gas in contact with the source material
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/448—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials
- C23C16/4488—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for generating reactive gas streams, e.g. by evaporation or sublimation of precursor materials by in situ generation of reactive gas by chemical or electrochemical reaction
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Inorganic Chemistry (AREA)
- Electrochemistry (AREA)
- Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
- Devices And Processes Conducted In The Presence Of Fluids And Solid Particles (AREA)
- Crucibles And Fluidized-Bed Furnaces (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP62201330A JPS6447844A (en) | 1987-08-12 | 1987-08-12 | Method and apparatus for treating surface |
| JP201330/87 | 1987-08-12 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN1031570A CN1031570A (zh) | 1989-03-08 |
| CN1013208B true CN1013208B (zh) | 1991-07-17 |
Family
ID=16439225
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN88106041A Expired CN1013208B (zh) | 1987-08-12 | 1988-08-12 | 表面处理的方法和装置 |
Country Status (10)
| Country | Link |
|---|---|
| US (1) | US4892759A (2) |
| EP (1) | EP0303191B1 (2) |
| JP (1) | JPS6447844A (2) |
| KR (1) | KR920004849B1 (2) |
| CN (1) | CN1013208B (2) |
| AU (1) | AU610922B2 (2) |
| CA (1) | CA1336150C (2) |
| DE (1) | DE3852355T2 (2) |
| ES (1) | ES2069538T3 (2) |
| IN (1) | IN171675B (2) |
Families Citing this family (18)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5227195A (en) * | 1989-04-04 | 1993-07-13 | Sri International | Low temperature method of forming materials using one or more metal reactants and a halogen-containing reactant to form one or more reactive intermediates |
| ES2087933T3 (es) * | 1990-08-10 | 1996-08-01 | Toyoda Chuo Kenkyusho Kk | Metodo para la formacion de una capa de nitruro o carbonitruro. |
| US5171734A (en) * | 1991-04-22 | 1992-12-15 | Sri International | Coating a substrate in a fluidized bed maintained at a temperature below the vaporization temperature of the resulting coating composition |
| JP3189507B2 (ja) * | 1992-06-30 | 2001-07-16 | 株式会社豊田中央研究所 | 表面処理装置 |
| US6093303A (en) | 1998-08-12 | 2000-07-25 | Swagelok Company | Low temperature case hardening processes |
| US6165597A (en) * | 1998-08-12 | 2000-12-26 | Swagelok Company | Selective case hardening processes at low temperature |
| WO2000047794A1 (en) * | 1999-02-08 | 2000-08-17 | Quality Heat Technologies Pty. Ltd. | Surface treatment method and treatment apparatus |
| US6547888B1 (en) | 2000-01-28 | 2003-04-15 | Swagelok Company | Modified low temperature case hardening processes |
| DE60138383D1 (de) | 2000-06-29 | 2009-05-28 | Borgwarner Inc | Verfahren zur herstellung eines mit karbid beschichteten stahlkörpers |
| CN101268209B (zh) | 2005-07-21 | 2012-07-18 | 哈德技术有限公司 | 金属物体的双重表面处理 |
| AU2010236044B2 (en) * | 2005-07-21 | 2012-09-27 | Hard Technologies Pty Ltd | Duplex Surface Treatment of Metal Objects |
| CN102165087B (zh) * | 2008-10-16 | 2013-11-27 | 博格华纳公司 | 第5族金属源碳化物涂覆的钢质物品及其制造方法 |
| ES2342708B2 (es) * | 2010-02-09 | 2011-01-27 | Asociacion De La Industria Navarra Ain | Procedimiento para la fabricacion de recubrimientos ceramicos para baldosas y baldosa asi obtenida. |
| US20140312030A1 (en) * | 2013-04-23 | 2014-10-23 | Paul D. Steneck | Microwave heat treatment apparatus and method |
| US20150125333A1 (en) * | 2013-11-05 | 2015-05-07 | Gerald J. Bruck | Below surface laser processing of a fluidized bed |
| JP6303014B2 (ja) * | 2013-12-19 | 2018-03-28 | ポスコPosco | 加熱装置及びこれを含むコーティング器具 |
| WO2017156069A1 (en) * | 2016-03-08 | 2017-09-14 | Arcanum Alloys, Inc. | Methods for metal coating |
| CN111283215B (zh) * | 2020-02-24 | 2021-06-11 | 北京科技大学 | 一种气-固流化制备无氧钝化钛及钛合金粉末制品的方法 |
Family Cites Families (9)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4461656A (en) * | 1983-03-15 | 1984-07-24 | Ross John A | Low temperature hardening of the surface of a ferrous metal workpiece in a fluidized bed furnace |
| AU570799B2 (en) * | 1984-05-17 | 1988-03-24 | Toyota Chuo Kenkyusho K.K. | Vapour phase coating of carbide in fluidised bed |
| JPS60251274A (ja) * | 1984-05-28 | 1985-12-11 | Toyota Central Res & Dev Lab Inc | 窒化物被覆方法 |
| JPS6156272A (ja) * | 1984-08-27 | 1986-03-20 | Toyota Motor Corp | 流動層ガス浸炭方法とその装置 |
| JPS61157672A (ja) * | 1984-12-28 | 1986-07-17 | Nissan Motor Co Ltd | 熱処理方法 |
| US4623400A (en) * | 1985-02-22 | 1986-11-18 | Procedyne Corp. | Hard surface coatings for metals in fluidized beds |
| JPS6280258A (ja) * | 1985-10-03 | 1987-04-13 | Toyota Central Res & Dev Lab Inc | 表面処理方法及びその装置 |
| JPH0819514B2 (ja) * | 1986-07-07 | 1996-02-28 | 株式会社豊田中央研究所 | 表面処理方法およびその装置 |
| JP2584217B2 (ja) * | 1986-11-18 | 1997-02-26 | 株式会社豊田中央研究所 | 表面処理方法 |
-
1987
- 1987-08-12 JP JP62201330A patent/JPS6447844A/ja active Granted
-
1988
- 1988-08-04 DE DE3852355T patent/DE3852355T2/de not_active Expired - Fee Related
- 1988-08-04 ES ES88112735T patent/ES2069538T3/es not_active Expired - Lifetime
- 1988-08-04 EP EP88112735A patent/EP0303191B1/en not_active Expired - Lifetime
- 1988-08-05 IN IN562/MAS/88A patent/IN171675B/en unknown
- 1988-08-05 US US07/228,423 patent/US4892759A/en not_active Expired - Fee Related
- 1988-08-11 CA CA000574402A patent/CA1336150C/en not_active Expired - Fee Related
- 1988-08-12 CN CN88106041A patent/CN1013208B/zh not_active Expired
- 1988-08-12 AU AU20987/88A patent/AU610922B2/en not_active Ceased
- 1988-08-12 KR KR1019880010271A patent/KR920004849B1/ko not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE3852355D1 (de) | 1995-01-19 |
| CN1031570A (zh) | 1989-03-08 |
| ES2069538T3 (es) | 1995-05-16 |
| KR920004849B1 (ko) | 1992-06-19 |
| AU610922B2 (en) | 1991-05-30 |
| EP0303191A2 (en) | 1989-02-15 |
| AU2098788A (en) | 1989-02-16 |
| JPH0514787B2 (2) | 1993-02-25 |
| CA1336150C (en) | 1995-07-04 |
| EP0303191A3 (en) | 1990-10-31 |
| KR890003984A (ko) | 1989-04-19 |
| US4892759A (en) | 1990-01-09 |
| DE3852355T2 (de) | 1995-04-27 |
| EP0303191B1 (en) | 1994-12-07 |
| IN171675B (2) | 1992-12-05 |
| JPS6447844A (en) | 1989-02-22 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C13 | Decision | ||
| GR02 | Examined patent application | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant | ||
| C19 | Lapse of patent right due to non-payment of the annual fee | ||
| CF01 | Termination of patent right due to non-payment of annual fee |