CN109072006B - 致密的二氧化硅质膜形成用组合物 - Google Patents
致密的二氧化硅质膜形成用组合物 Download PDFInfo
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- CN109072006B CN109072006B CN201780026971.5A CN201780026971A CN109072006B CN 109072006 B CN109072006 B CN 109072006B CN 201780026971 A CN201780026971 A CN 201780026971A CN 109072006 B CN109072006 B CN 109072006B
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- film
- polysilazane
- treatment
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D183/00—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers
- C09D183/16—Coating compositions based on macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon, with or without sulfur, nitrogen, oxygen, or carbon only; Coating compositions based on derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B05—SPRAYING OR ATOMISING IN GENERAL; APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D—PROCESSES FOR APPLYING FLUENT MATERIALS TO SURFACES, IN GENERAL
- B05D3/00—Pretreatment of surfaces to which liquids or other fluent materials are to be applied; After-treatment of applied coatings, e.g. intermediate treating of an applied coating preparatory to subsequent applications of liquids or other fluent materials
- B05D3/007—After-treatment
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G77/00—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule
- C08G77/60—Macromolecular compounds obtained by reactions forming a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon in the main chain of the macromolecule in which all the silicon atoms are connected by linkages other than oxygen atoms
- C08G77/62—Nitrogen atoms
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
- C08K5/00—Use of organic ingredients
- C08K5/16—Nitrogen-containing compounds
- C08K5/17—Amines; Quaternary ammonium compounds
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08L—COMPOSITIONS OF MACROMOLECULAR COMPOUNDS
- C08L83/00—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers
- C08L83/16—Compositions of macromolecular compounds obtained by reactions forming in the main chain of the macromolecule a linkage containing silicon with or without sulfur, nitrogen, oxygen or carbon only; Compositions of derivatives of such polymers in which all the silicon atoms are connected by linkages other than oxygen atoms
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/20—Diluents or solvents
-
- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09D—COATING COMPOSITIONS, e.g. PAINTS, VARNISHES OR LACQUERS; FILLING PASTES; CHEMICAL PAINT OR INK REMOVERS; INKS; CORRECTING FLUIDS; WOODSTAINS; PASTES OR SOLIDS FOR COLOURING OR PRINTING; USE OF MATERIALS THEREFOR
- C09D7/00—Features of coating compositions, not provided for in group C09D5/00; Processes for incorporating ingredients in coating compositions
- C09D7/40—Additives
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P14/00—Formation of materials, e.g. in the shape of layers or pillars
- H10P14/60—Formation of materials, e.g. in the shape of layers or pillars of insulating materials
- H10P14/69—Inorganic materials
- H10P14/692—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses
- H10P14/6921—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon
- H10P14/6922—Inorganic materials composed of oxides, glassy oxides or oxide-based glasses containing silicon the material containing Si, O and at least one of H, N, C, F or other non-metal elements, e.g. SiOC, SiOC:H or SiONC
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- Chemical & Material Sciences (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Health & Medical Sciences (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Life Sciences & Earth Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Wood Science & Technology (AREA)
- Paints Or Removers (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Coating Of Shaped Articles Made Of Macromolecular Substances (AREA)
- Application Of Or Painting With Fluid Materials (AREA)
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2016092672A JP2017200861A (ja) | 2016-05-02 | 2016-05-02 | 緻密なシリカ質膜形成用組成物 |
| JP2016-092672 | 2016-05-02 | ||
| PCT/EP2017/060190 WO2017191049A1 (fr) | 2016-05-02 | 2017-04-28 | Composition destinée à former un film siliceux dense |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN109072006A CN109072006A (zh) | 2018-12-21 |
| CN109072006B true CN109072006B (zh) | 2021-07-27 |
Family
ID=58707501
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN201780026971.5A Active CN109072006B (zh) | 2016-05-02 | 2017-04-28 | 致密的二氧化硅质膜形成用组合物 |
Country Status (7)
| Country | Link |
|---|---|
| US (1) | US10563093B2 (fr) |
| EP (1) | EP3452556B1 (fr) |
| JP (2) | JP2017200861A (fr) |
| KR (1) | KR102068457B1 (fr) |
| CN (1) | CN109072006B (fr) |
| TW (1) | TWI698493B (fr) |
| WO (1) | WO2017191049A1 (fr) |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP6668287B2 (ja) * | 2017-04-04 | 2020-03-18 | メルク、パテント、ゲゼルシャフト、ミット、ベシュレンクテル、ハフツングMerck Patent GmbH | 膜形成組成物およびそれを用いた膜形成方法 |
| KR102192462B1 (ko) | 2017-12-14 | 2020-12-17 | 삼성에스디아이 주식회사 | 실리카 막 형성용 조성물, 실리카 막, 및 전자소자 |
| CN109821485B (zh) * | 2019-04-11 | 2021-12-10 | 湖北科技学院 | 用于动力锂电池热调控的相变储热胶囊的制备方法 |
| EP4247908B1 (fr) * | 2020-11-20 | 2025-01-08 | Merck Patent GmbH | Procédé de fabrication d'un film de de silicium azoté |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101835847A (zh) * | 2007-10-26 | 2010-09-15 | Az电子材料(日本)株式会社 | 能形成致密硅质薄膜的含聚硅氮烷的组合物 |
Family Cites Families (29)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE2243527A1 (de) | 1972-09-05 | 1974-04-18 | Bayer Ag | Formkoerper aus homogenen mischungen von siliciumcarbid und siliciumnitrid und verfahren zu ihrer herstellung |
| JPS60145903A (ja) | 1983-12-29 | 1985-08-01 | Toa Nenryo Kogyo Kk | 無機ポリシラザン及びその合成方法 |
| JPS6189230A (ja) | 1984-10-09 | 1986-05-07 | Toa Nenryo Kogyo Kk | ポリオルガノヒドロシラザンの製造方法 |
| JP2750406B2 (ja) | 1988-02-08 | 1998-05-13 | 東燃株式会社 | 改質ポリシラザン及びその製造法 |
| JP2651464B2 (ja) | 1987-08-13 | 1997-09-10 | 財団法人石油産業活性化センター | 改質ポリシラザン、その製造方法及びその用途 |
| JP2613787B2 (ja) | 1987-08-13 | 1997-05-28 | 財団法人石油産業活性化センター | 無機シラザン高重合体、その製造方法及びその用途 |
| JP2750405B2 (ja) | 1988-02-08 | 1998-05-13 | 東燃株式会社 | 改質ポリシラザン及びその製造法 |
| JP2700233B2 (ja) | 1988-12-26 | 1998-01-19 | 財団法人石油産業活性化センター | 共重合シラザンおよびその製造法 |
| JP2837436B2 (ja) | 1989-06-13 | 1998-12-16 | 日産自動車株式会社 | 自動変速機の変速制御装置 |
| JPH0331326A (ja) | 1989-06-29 | 1991-02-12 | Tonen Corp | ランダム共重合シラザン及びその製法 |
| JP2764081B2 (ja) | 1990-01-23 | 1998-06-11 | 三井化学株式会社 | 脂環式―脂肪族ジイソシアナートの製造方法 |
| JP3042537B2 (ja) | 1990-06-30 | 2000-05-15 | 東燃株式会社 | 改質ポリシラザン及びその製造方法 |
| JP3080104B2 (ja) | 1991-06-20 | 2000-08-21 | 東燃株式会社 | 熱硬化性共重合体及びその製造方法 |
| JP3283276B2 (ja) | 1991-12-04 | 2002-05-20 | 東燃ゼネラル石油株式会社 | 改質ポリシラザン及びその製造方法 |
| JP3290463B2 (ja) | 1992-05-29 | 2002-06-10 | 東燃ゼネラル石油株式会社 | 熱硬化性ケイ素ホウ素含有共重合体及びその製法 |
| JP3266861B2 (ja) | 1994-06-13 | 2002-03-18 | 株式会社半導体エネルギー研究所 | アクティブマトリクス装置 |
| JPH08176512A (ja) | 1994-12-26 | 1996-07-09 | Hitachi Chem Co Ltd | シリカ系被膜形成用塗布液、シリカ系被膜形成用塗布液の製造方法、シリカ系被膜及び半導体装置 |
| JPH08176511A (ja) | 1994-12-26 | 1996-07-09 | Hitachi Chem Co Ltd | シリカ系被膜形成用塗布液、シリカ系被膜形成用塗布液の製造法、シリカ系被膜および半導体装置 |
| JP4070828B2 (ja) | 1995-07-13 | 2008-04-02 | Azエレクトロニックマテリアルズ株式会社 | シリカ質セラミックス形成用組成物、同セラミックスの形成方法及び同セラミックス膜 |
| JP4030625B2 (ja) | 1997-08-08 | 2008-01-09 | Azエレクトロニックマテリアルズ株式会社 | アミン残基含有ポリシラザン及びその製造方法 |
| JP3904691B2 (ja) | 1997-10-17 | 2007-04-11 | Azエレクトロニックマテリアルズ株式会社 | ポリシラザン含有組成物及びシリカ質膜の形成方法 |
| US6756469B2 (en) | 2001-07-18 | 2004-06-29 | Kion Corporation | Polysilazane-modified polyamine hardeners for epoxy resins |
| JP4578993B2 (ja) * | 2005-02-02 | 2010-11-10 | Azエレクトロニックマテリアルズ株式会社 | ポリシラザン処理溶剤およびこの溶剤を用いるポリシラザンの処理方法 |
| JP5410207B2 (ja) | 2009-09-04 | 2014-02-05 | AzエレクトロニックマテリアルズIp株式会社 | シリカ質膜製造方法およびそれに用いるポリシラザン塗膜処理液 |
| JP6017256B2 (ja) | 2012-10-11 | 2016-10-26 | メルクパフォーマンスマテリアルズマニュファクチャリング合同会社 | ケイ素質緻密膜の形成方法 |
| RU2674676C2 (ru) * | 2014-08-13 | 2018-12-12 | Сикэ Текнолоджи Аг | Амин для низкоэмиссионных композиций эпоксидных смол |
| CN107428911A (zh) * | 2015-03-23 | 2017-12-01 | Sika技术股份公司 | 用于快速固化环氧树脂组合物的胺 |
| EP3205681A1 (fr) * | 2016-02-15 | 2017-08-16 | Sika Technology AG | Composition durcissable |
| EP3205682A1 (fr) * | 2016-02-15 | 2017-08-16 | Sika Technology AG | Durcisseur pour compositions à résine époxyde pauvres en émissions |
-
2016
- 2016-05-02 JP JP2016092672A patent/JP2017200861A/ja active Pending
-
2017
- 2017-04-28 JP JP2018553205A patent/JP6571296B2/ja active Active
- 2017-04-28 KR KR1020187032482A patent/KR102068457B1/ko active Active
- 2017-04-28 US US16/096,116 patent/US10563093B2/en active Active
- 2017-04-28 CN CN201780026971.5A patent/CN109072006B/zh active Active
- 2017-04-28 EP EP17723303.8A patent/EP3452556B1/fr active Active
- 2017-04-28 WO PCT/EP2017/060190 patent/WO2017191049A1/fr not_active Ceased
- 2017-05-01 TW TW106114403A patent/TWI698493B/zh active
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN101835847A (zh) * | 2007-10-26 | 2010-09-15 | Az电子材料(日本)株式会社 | 能形成致密硅质薄膜的含聚硅氮烷的组合物 |
Also Published As
| Publication number | Publication date |
|---|---|
| JP2017200861A (ja) | 2017-11-09 |
| KR20190004288A (ko) | 2019-01-11 |
| JP6571296B2 (ja) | 2019-09-04 |
| JP2019518811A (ja) | 2019-07-04 |
| KR102068457B1 (ko) | 2020-01-21 |
| US20190136088A1 (en) | 2019-05-09 |
| EP3452556A1 (fr) | 2019-03-13 |
| EP3452556B1 (fr) | 2020-04-15 |
| TW201807076A (zh) | 2018-03-01 |
| US10563093B2 (en) | 2020-02-18 |
| CN109072006A (zh) | 2018-12-21 |
| WO2017191049A1 (fr) | 2017-11-09 |
| TWI698493B (zh) | 2020-07-11 |
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| TR01 | Transfer of patent right |
Effective date of registration: 20221209 Address after: Darmstadt Patentee after: MERCK PATENT GmbH Address before: Luxemburg, Luxemburg Patentee before: AZ ELECTRONIC MATERIALS (LUXEMBOURG) S.A.R.L. |
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| TR01 | Transfer of patent right |