CN1202638A - 光敏性记录材料的制备方法 - Google Patents

光敏性记录材料的制备方法 Download PDF

Info

Publication number: CN1202638A
Authority: CN; China
Prior art keywords: layer; preparation; corona treatment; photosensitive layer; protective cover
Prior art date: 1997-03-20
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Pending

Application number

CN98106936A

Other languages

English (en)

Chinese (zh)

Inventor

T·泰尔瑟

S·瓦戈纳

S·菲利普

M·朱尔格

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Flint Group Germany GmbH

Original Assignee

BASF Drucksysteme GmbH

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-03-20

Filing date

1998-03-20

Publication date

1998-12-23

1998-03-20 Application filed by BASF Drucksysteme GmbH filed Critical BASF Drucksysteme GmbH

1998-12-23 Publication of CN1202638A publication Critical patent/CN1202638A/zh

Status Pending legal-status Critical Current

Links

239000000463 material Substances 0.000 title claims abstract description 66
238000004519 manufacturing process Methods 0.000 title abstract description 3
238000003851 corona treatment Methods 0.000 claims abstract description 54
230000001681 protective effect Effects 0.000 claims abstract description 51
238000002360 preparation method Methods 0.000 claims description 30
239000000758 substrate Substances 0.000 claims description 22
238000003475 lamination Methods 0.000 claims description 20
206010034972 Photosensitivity reaction Diseases 0.000 claims description 10
230000036211 photosensitivity Effects 0.000 claims description 10
150000001875 compounds Chemical class 0.000 claims description 9
229920002799 BoPET Polymers 0.000 claims description 6
239000005041 Mylar™ Substances 0.000 claims description 6
239000004952 Polyamide Substances 0.000 claims description 6
229920002647 polyamide Polymers 0.000 claims description 6
239000011230 binding agent Substances 0.000 claims description 4
239000002904 solvent Substances 0.000 claims description 4
230000004913 activation Effects 0.000 claims description 3
239000003505 polymerization initiator Substances 0.000 claims description 2
230000002441 reversible effect Effects 0.000 claims description 2
239000007787 solid Substances 0.000 claims description 2
125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 claims description 2
229920002554 vinyl polymer Polymers 0.000 claims description 2
238000001704 evaporation Methods 0.000 claims 1
230000003287 optical effect Effects 0.000 claims 1
238000010526 radical polymerization reaction Methods 0.000 claims 1
238000000034 method Methods 0.000 abstract description 6
239000002131 composite material Substances 0.000 abstract 2
239000010410 layer Substances 0.000 description 150
239000011248 coating agent Substances 0.000 description 16
238000000576 coating method Methods 0.000 description 16
PAYRUJLWNCNPSJ-UHFFFAOYSA-N Aniline Chemical compound NC1=CC=CC=C1 PAYRUJLWNCNPSJ-UHFFFAOYSA-N 0.000 description 10
239000000243 solution Substances 0.000 description 10
238000012360 testing method Methods 0.000 description 9
238000011010 flushing procedure Methods 0.000 description 8
238000012545 processing Methods 0.000 description 8
230000000694 effects Effects 0.000 description 7
238000003490 calendering Methods 0.000 description 6
238000003860 storage Methods 0.000 description 6
230000032798 delamination Effects 0.000 description 5
238000001035 drying Methods 0.000 description 5
239000000203 mixture Substances 0.000 description 5
239000007767 bonding agent Substances 0.000 description 4
239000000155 melt Substances 0.000 description 4
-1 polyethylene terephthalate Polymers 0.000 description 4
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
230000004927 fusion Effects 0.000 description 3
239000004615 ingredient Substances 0.000 description 3
239000002184 metal Substances 0.000 description 3
229920000139 polyethylene terephthalate Polymers 0.000 description 3
239000005020 polyethylene terephthalate Substances 0.000 description 3
NLHHRLWOUZZQLW-UHFFFAOYSA-N Acrylonitrile Chemical compound C=CC#N NLHHRLWOUZZQLW-UHFFFAOYSA-N 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
239000004820 Pressure-sensitive adhesive Substances 0.000 description 2
PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Chemical compound C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 description 2
239000002253 acid Substances 0.000 description 2
239000000853 adhesive Substances 0.000 description 2
230000001070 adhesive effect Effects 0.000 description 2
239000007864 aqueous solution Substances 0.000 description 2
125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 2
238000001816 cooling Methods 0.000 description 2
229920001577 copolymer Polymers 0.000 description 2
239000006185 dispersion Substances 0.000 description 2
150000002148 esters Chemical class 0.000 description 2
238000011156 evaluation Methods 0.000 description 2
239000003960 organic solvent Substances 0.000 description 2
239000004033 plastic Substances 0.000 description 2
229920003023 plastic Polymers 0.000 description 2
229920000642 polymer Polymers 0.000 description 2
238000005096 rolling process Methods 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
VOBUAPTXJKMNCT-UHFFFAOYSA-N 1-prop-2-enoyloxyhexyl prop-2-enoate Chemical compound CCCCCC(OC(=O)C=C)OC(=O)C=C VOBUAPTXJKMNCT-UHFFFAOYSA-N 0.000 description 1
KWVGIHKZDCUPEU-UHFFFAOYSA-N 2,2-dimethoxy-2-phenylacetophenone Chemical compound C=1C=CC=CC=1C(OC)(OC)C(=O)C1=CC=CC=C1 KWVGIHKZDCUPEU-UHFFFAOYSA-N 0.000 description 1
SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 1
VSKJLJHPAFKHBX-UHFFFAOYSA-N 2-methylbuta-1,3-diene;styrene Chemical compound CC(=C)C=C.C=CC1=CC=CC=C1.C=CC1=CC=CC=C1 VSKJLJHPAFKHBX-UHFFFAOYSA-N 0.000 description 1
VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
239000005977 Ethylene Substances 0.000 description 1
229920002633 Kraton (polymer) Polymers 0.000 description 1
CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
VVQNEPGJFQJSBK-UHFFFAOYSA-N Methyl methacrylate Chemical compound COC(=O)C(C)=C VVQNEPGJFQJSBK-UHFFFAOYSA-N 0.000 description 1
239000002671 adjuvant Substances 0.000 description 1
150000001336 alkenes Chemical class 0.000 description 1
230000004075 alteration Effects 0.000 description 1
125000003368 amide group Chemical group 0.000 description 1
150000001408 amides Chemical class 0.000 description 1
239000003963 antioxidant agent Substances 0.000 description 1
230000003078 antioxidant effect Effects 0.000 description 1
239000004760 aramid Substances 0.000 description 1
229920003235 aromatic polyamide Polymers 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
229910052799 carbon Inorganic materials 0.000 description 1
125000002915 carbonyl group Chemical group [*:2]C([*:1])=O 0.000 description 1
238000005266 casting Methods 0.000 description 1
239000003795 chemical substances by application Substances 0.000 description 1
239000012174 chinese wax Substances 0.000 description 1
239000012141 concentrate Substances 0.000 description 1
238000004132 cross linking Methods 0.000 description 1
230000007812 deficiency Effects 0.000 description 1
150000001993 dienes Chemical class 0.000 description 1
239000000975 dye Substances 0.000 description 1
229920001971 elastomer Polymers 0.000 description 1
125000005469 ethylenyl group Chemical group 0.000 description 1
230000007062 hydrolysis Effects 0.000 description 1
238000006460 hydrolysis reaction Methods 0.000 description 1
230000000977 initiatory effect Effects 0.000 description 1
238000011835 investigation Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
230000007774 longterm Effects 0.000 description 1
238000005259 measurement Methods 0.000 description 1
239000012188 paraffin wax Substances 0.000 description 1
230000010412 perfusion Effects 0.000 description 1
229920000728 polyester Polymers 0.000 description 1
239000013047 polymeric layer Substances 0.000 description 1
238000006116 polymerization reaction Methods 0.000 description 1
229920002635 polyurethane Polymers 0.000 description 1
239000004814 polyurethane Substances 0.000 description 1
229920002689 polyvinyl acetate Polymers 0.000 description 1
239000011118 polyvinyl acetate Substances 0.000 description 1
230000010076 replication Effects 0.000 description 1
239000005060 rubber Substances 0.000 description 1
239000000126 substance Substances 0.000 description 1
125000000999 tert-butyl group Chemical group [H]C([H])([H])C(*)(C([H])([H])[H])C([H])([H])[H] 0.000 description 1
238000012719 thermal polymerization Methods 0.000 description 1
229920001169 thermoplastic Polymers 0.000 description 1
229920000428 triblock copolymer Polymers 0.000 description 1
238000005406 washing Methods 0.000 description 1

Classifications

- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- G03F7/092—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers characterised by backside coating or layers, by lubricating-slip layers or means, by oxygen barrier layers or by stripping-release layers or means
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
- Y10S430/138—Corona discharge process

Landscapes

Engineering & Computer Science (AREA)
Architecture (AREA)
Structural Engineering (AREA)
Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Photosensitive Polymer And Photoresist Processing (AREA)
Materials For Photolithography (AREA)
Printing Plates And Materials Therefor (AREA)

CN98106936A 1997-03-20 1998-03-20 光敏性记录材料的制备方法 Pending CN1202638A (zh)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
DE19711696.5		1997-03-20
DE19711696A DE19711696C1 (de)	1997-03-20	1997-03-20	Verfahren zum Herstellen eines photopolymerisierbaren Aufzeichungsmaterials

Publications (1)

Publication Number	Publication Date
CN1202638A true CN1202638A (zh)	1998-12-23

Family

ID=7824055

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
CN98106936A Pending CN1202638A (zh)	1997-03-20	1998-03-20	光敏性记录材料的制备方法

Country Status (6)

Country	Link
US (1)	US6326128B1 (2)
EP (1)	EP0866373B1 (2)
JP (1)	JP4179658B2 (2)
CN (1)	CN1202638A (2)
BR (1)	BR9801872A (2)
DE (2)	DE19711696C1 (2)

Families Citing this family (19)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
EP0924568B1 (en) *	1997-11-27	2002-10-09	Agfa-Gevaert	Radiation-sensitive material containing a multilayer support material
US6327047B1 (en) *	1999-01-22	2001-12-04	Electronics For Imaging, Inc.	Automatic scanner calibration
US6268109B1 (en) *	1999-10-12	2001-07-31	E. I. Du Pont De Nemours And Company	Composite photosensitive element
IL133355A (en) *	1999-12-07	2003-10-31	Creo Il Ltd	Method and plate for digitally-imaged offset printing
DE10100514A1 (de) *	2001-01-08	2002-07-11	Basf Drucksysteme Gmbh	Verfahren zur Herstellung von thermisch vernetzten, lasergravierbaren Flexodruckelementen
US7063264B2 (en)	2001-12-24	2006-06-20	Digimarc Corporation	Covert variable information on identification documents and methods of making same
DE50205642D1 (de) *	2001-12-14	2006-04-06	Bayer Materialscience Ag	Verfahren zur Herstellung eines transparenten Flachfilms aus aliphatischem thermoplastischem Polyurethan
US7207494B2 (en)	2001-12-24	2007-04-24	Digimarc Corporation	Laser etched security features for identification documents and methods of making same
US7728048B2 (en) *	2002-12-20	2010-06-01	L-1 Secure Credentialing, Inc.	Increasing thermal conductivity of host polymer used with laser engraving methods and compositions
US7815124B2 (en)	2002-04-09	2010-10-19	L-1 Secure Credentialing, Inc.	Image processing techniques for printing identification cards and documents
ATE555911T1 (de)	2001-12-24	2012-05-15	L 1 Secure Credentialing Inc	Verfahren zur vollfarb-markierung von id- dokumenten
AU2002353174A1 (en)	2001-12-24	2003-07-15	Digimarc Id Systems, Llc	Laser engraving methods and compositions
US7694887B2 (en)	2001-12-24	2010-04-13	L-1 Secure Credentialing, Inc.	Optically variable personalized indicia for identification documents
US7824029B2 (en)	2002-05-10	2010-11-02	L-1 Secure Credentialing, Inc.	Identification card printer-assembler for over the counter card issuing
US7804982B2 (en)	2002-11-26	2010-09-28	L-1 Secure Credentialing, Inc.	Systems and methods for managing and detecting fraud in image databases used with identification documents
DE10258668A1 (de) *	2002-12-13	2004-06-24	Basf Ag	Verfahren zur Herstellung von Flexodruckformen mittels Lasergravur unter Verwendung von fotopolymeren Flexodruckelementen und fotopolymerisierbares Flexodruckelementen
US7763179B2 (en)	2003-03-21	2010-07-27	Digimarc Corporation	Color laser engraving and digital watermarking
CA2522551C (en)	2003-04-16	2009-12-22	Digimarc Corporation	Three dimensional data storage
US7682775B2 (en) *	2004-03-05	2010-03-23	E. I. Du Pont De Nemours And Company	Process for preparing a flexographic printing plate

Family Cites Families (23)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US4072527A (en)	1972-09-27	1978-02-07	E. I. Du Pont De Nemours And Company	Oxygen barrier layers for photopolymerizable elements
JPS5535278B2 (2) *	1974-03-18	1980-09-12
US4162919A (en)	1974-11-29	1979-07-31	Basf Aktiengesellschaft	Laminates for the manufacture of flexographic printing plates using block copolymers
US4427759A (en)	1982-01-21	1984-01-24	E. I. Du Pont De Nemours And Company	Process for preparing an overcoated photopolymer printing plate
US4460675A (en) *	1982-01-21	1984-07-17	E. I. Du Pont De Nemours And Company	Process for preparing an overcoated photopolymer printing plate
NL8501128A (nl) *	1985-04-18	1986-11-17	Stamicarbon	Werkwijze voor het bereiden van polyolefinevoorwerpen met grote hechtkracht voor polymere matrices, alsmede voor het bereiden van versterkte matrixmaterialen.
CA1325354C (en) *	1985-12-09	1993-12-21	Yasushi Umeda	Photosensitive resin base printing material
AU589722B2 (en)	1986-01-28	1989-10-19	Minnesota Mining And Manufacturing Company	Imageable material and process
DE3825782A1 (de)	1987-07-30	1989-02-09	Hercules Inc	Verfahren zur herstellung eines trockenfilm-photoresists
JP2747837B2 (ja) *	1989-03-10	1998-05-06	富士写真フイルム株式会社	支持体の帯電方法
JPH03161753A (ja)	1989-11-20	1991-07-11	Fuji Photo Film Co Ltd	湿し水不要感光性平版印刷版
US5175072A (en) *	1990-07-26	1992-12-29	Minnesota Mining And Manufacturing Company	Flexographic printing plate process
DE4202282A1 (de) *	1991-01-29	1992-08-20	Fuji Photo Film Co Ltd	Lichtempfindliches uebertragungsmaterial und bilderzeugungsverfahren
JPH05142777A (ja)	1991-11-21	1993-06-11	Hitachi Chem Co Ltd	感光性積層体及びその製造方法
DE4203608A1 (de) *	1992-02-07	1993-08-12	Basf Lacke & Farben	Verfahren zur photochemischen oder mechanischen herstellung flexibler druckformen
US5292617A (en) *	1992-03-31	1994-03-08	E. I. Du Pont De Nemours And Company	Photosensitive element having support with adjustable adhesion
DE4300856A1 (de) *	1993-01-15	1994-07-21	Basf Lacke & Farben	Lichtempfindliches Aufzeichnungselement und Verfahren zur Herstellung einer Reliefdruckplatte
WO1994023342A1 (fr) *	1993-03-31	1994-10-13	Nippon Zeon Co., Ltd.	Composition photosensible, cliche en caoutchouc photosensible et son procede de production, et cliche flexographique et son procede de production
US5425980A (en) *	1994-02-22	1995-06-20	Eastman Kodak Company	Use of glow discharge treatment to promote adhesion of aqueous coats to substrate
DE4415607A1 (de) *	1994-05-04	1995-11-09	Hoechst Ag	Lichtempfindliches Material und Verfahren zur Herstellung von Flachdruckplatten
US5698363A (en)	1995-07-10	1997-12-16	Konica Corporation	Image forming method
US5888697A (en) *	1996-07-03	1999-03-30	E. I. Du Pont De Nemours And Company	Flexographic printing element having a powder layer
US6074807A (en) *	1998-10-15	2000-06-13	Eastman Kodak Company	Imaging element containing an electrically-conductive layer containing acicular metal-containing particles and a transparent magnetic recording layer

1997
- 1997-03-20 DE DE19711696A patent/DE19711696C1/de not_active Expired - Fee Related
1998
- 1998-03-17 US US09/042,573 patent/US6326128B1/en not_active Expired - Fee Related
- 1998-03-18 EP EP98104902A patent/EP0866373B1/de not_active Expired - Lifetime
- 1998-03-18 DE DE59804280T patent/DE59804280D1/de not_active Expired - Fee Related
- 1998-03-20 JP JP07265998A patent/JP4179658B2/ja not_active Expired - Fee Related
- 1998-03-20 CN CN98106936A patent/CN1202638A/zh active Pending
- 1998-03-20 BR BR9801872-8A patent/BR9801872A/pt not_active Application Discontinuation

Also Published As

Publication number	Publication date
EP0866373B1 (de)	2002-06-05
DE19711696C1 (de)	1998-11-12
US6326128B1 (en)	2001-12-04
EP0866373A1 (de)	1998-09-23
BR9801872A (pt)	2001-03-20
JPH1124242A (ja)	1999-01-29
JP4179658B2 (ja)	2008-11-12
DE59804280D1 (de)	2002-07-11

Legal Events

Date	Code	Title
1998-12-23	C06	Publication
1998-12-23	PB01	Publication
2001-01-03	C01	Deemed withdrawal of patent application (patent law 1993)
2001-01-03	WD01	Invention patent application deemed withdrawn after publication

Publication	Publication Date	Title
JP4179658B2 (ja)	2008-11-12	感光性記録材料の製造方法
JP4416426B2 (ja)	2010-02-17	熱現像によるフレキソ印刷版の製造方法
US8288080B2 (en)	2012-10-16	Photopolymerizable flexographic printing elements and hard flexographic printing formes which are produced therefrom
JPS5869235A (ja)	1983-04-25	フレキソ印刷版用シンジオタクチツクポリブタジエン組成物
US20080248428A1 (en)	2008-10-09	Method for Producing Flexographic Printing Forms by Thermal Development
JPH05281713A (ja)	1993-10-29	可撓性印刷版の光化学的または機械的な製造法
WO2018181354A1 (ja)	2018-10-04	感光性ｃｔｐフレキソ印刷原版
DE102007008163B4 (de)	2013-06-06	Reliefdruckplatte sowie Verfahren zu ihrer Herstellung
US8545661B2 (en)	2013-10-01	Manufacture of organically developable, photopolymerizable flexo-graphic elements on flexible metallic supports
JP2004295120A (ja)	2004-10-21	感光性樹脂積層体およびそれを用いた印刷版材
JPH0147772B2 (2)	1989-10-16
EP0318780A2 (de)	1989-06-07	Lichtempfindliche Druckplatte für den Flexodruck
US6040116A (en)	2000-03-21	Photosensitive recording element having a recording layer and a top layer possessing different solubility properties, and its development in one operation
JP7243076B2 (ja)	2023-03-22	感光性ｃｔｐフレキソ印刷原版
JP3142289B2 (ja)	2001-03-07	記録層およびこれと異なる溶解特性を有する被覆層を有する感光性記録単位体ならびにこれを単一処理で現像する方法
JPH11149008A (ja)	1999-06-02	感光性転写材料およびカラーフィルターの製造方法
CN87104516A (zh)	1988-01-27	带焊接连线的其上加有编名的凸纹电路板
JPS6055335A (ja)	1985-03-30	感光性樹脂積層体の製造法
JPH05501314A (ja)	1993-03-11	水性または半水性で処理可能なフレキソグラフ印刷板用のレリーズ層
JPH10142782A (ja)	1998-05-29	カラープルーフ製造用低酸素感受性光重合性混合物
JPS63213846A (ja)	1988-09-06	受像シ−ト要素
JPH0784362A (ja)	1995-03-31	水性現像可能なフレキソグラフ印刷板
CA2047302A1 (en)	1992-01-20	Photopolymerizable printing plate for flexographic printing
JP3893568B2 (ja)	2007-03-14	帯電防止性感光性積層体およびその製造方法
JP3414048B2 (ja)	2003-06-09	水なし平版印刷版原版の製造方法