DK0906635T3 - Fremgangsmåde til anvendelse af en ikke fordampelig getter - Google Patents

Fremgangsmåde til anvendelse af en ikke fordampelig getter

Info

Publication number
DK0906635T3
DK0906635T3 DK97929213T DK97929213T DK0906635T3 DK 0906635 T3 DK0906635 T3 DK 0906635T3 DK 97929213 T DK97929213 T DK 97929213T DK 97929213 T DK97929213 T DK 97929213T DK 0906635 T3 DK0906635 T3 DK 0906635T3
Authority
DK
Denmark
Prior art keywords
metal wall
evaporative getter
getter
chamber
vaporizable getter
Prior art date
Application number
DK97929213T
Other languages
Danish (da)
English (en)
Inventor
Cristoforo Benvenuti
Original Assignee
Org Europeene De Rech
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Org Europeene De Rech filed Critical Org Europeene De Rech
Application granted granted Critical
Publication of DK0906635T3 publication Critical patent/DK0906635T3/da

Links

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18Means for absorbing or adsorbing gas, e.g. by gettering
    • H01J7/183Composition or manufacture of getters
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J7/00Details not provided for in the preceding groups and common to two or more basic types of discharge tubes or lamps
    • H01J7/14Means for obtaining or maintaining the desired pressure within the vessel
    • H01J7/18Means for absorbing or adsorbing gas, e.g. by gettering
    • HELECTRICITY
    • H05ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05HPLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H7/00Details of devices of the types covered by groups H05H9/00, H05H11/00, H05H13/00
    • H05H7/14Vacuum chambers

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Compressors, Vaccum Pumps And Other Relevant Systems (AREA)
  • Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
  • Common Detailed Techniques For Electron Tubes Or Discharge Tubes (AREA)
  • Fats And Perfumes (AREA)
  • Solid-Sorbent Or Filter-Aiding Compositions (AREA)
  • Image-Pickup Tubes, Image-Amplification Tubes, And Storage Tubes (AREA)
  • Physical Vapour Deposition (AREA)
  • Thermal Insulation (AREA)
  • Finger-Pressure Massage (AREA)
DK97929213T 1996-06-19 1997-06-18 Fremgangsmåde til anvendelse af en ikke fordampelig getter DK0906635T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
FR9607625A FR2750248B1 (fr) 1996-06-19 1996-06-19 Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter
PCT/EP1997/003180 WO1997049109A1 (fr) 1996-06-19 1997-06-18 Dispositif de pompage par getter non evaporable et procede de mise en oeuvre de ce getter

Publications (1)

Publication Number Publication Date
DK0906635T3 true DK0906635T3 (da) 2003-06-23

Family

ID=9493210

Family Applications (1)

Application Number Title Priority Date Filing Date
DK97929213T DK0906635T3 (da) 1996-06-19 1997-06-18 Fremgangsmåde til anvendelse af en ikke fordampelig getter

Country Status (14)

Country Link
US (1) US6468043B1 (fr)
EP (1) EP0906635B1 (fr)
JP (1) JP4620187B2 (fr)
AT (1) ATE233946T1 (fr)
AU (1) AU3340497A (fr)
CA (1) CA2258118C (fr)
DE (1) DE69719507T2 (fr)
DK (1) DK0906635T3 (fr)
ES (1) ES2193382T3 (fr)
FR (1) FR2750248B1 (fr)
NO (1) NO317454B1 (fr)
PT (1) PT906635E (fr)
RU (1) RU2193254C2 (fr)
WO (1) WO1997049109A1 (fr)

Families Citing this family (23)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
IT1312248B1 (it) * 1999-04-12 2002-04-09 Getters Spa Metodo per aumentare la produttivita' di processi di deposizione distrati sottili su un substrato e dispositivi getter per la
US7315115B1 (en) 2000-10-27 2008-01-01 Canon Kabushiki Kaisha Light-emitting and electron-emitting devices having getter regions
IT1319141B1 (it) * 2000-11-28 2003-09-23 Getters Spa Unita' di accelerazione e focalizzazione, a vuoto migliorato, diimpiantatori ionici per la produzione di dispositivi a semiconduttore
ITMI20012389A1 (it) * 2001-11-12 2003-05-12 Getters Spa Catodo cavo con getter integrato per lampade a scarica e metodi per la sua realizzazione
DE10209423A1 (de) * 2002-03-05 2003-09-18 Schwerionenforsch Gmbh Beschichtung aus einer Gettermetall-Legierung sowie Anordnung und Verfahren zur Herstellung derselben
ITMI20031178A1 (it) * 2003-06-11 2004-12-12 Getters Spa Depositi multistrato getter non evaporabili ottenuti per
US7810491B2 (en) 2004-01-22 2010-10-12 European Organization for Nuclear Research-CERN Evacuable flat panel solar collector
US7888891B2 (en) * 2004-03-29 2011-02-15 National Cerebral And Cardiovascular Center Particle beam accelerator
RU2269838C1 (ru) * 2004-12-28 2006-02-10 Общество с ограниченной ответственностью "Ядерные технологии" Способ удаления активных газов и их смесей из замкнутого объема
GB0523838D0 (en) * 2005-11-23 2006-01-04 Oxford Instr Analytical Ltd X-Ray detector and method
ITMI20070301A1 (it) * 2007-02-16 2008-08-17 Getters Spa Supporti comprendenti materiali getter e sorgenti di metalli alcalini o alcalino-terrosi per sistemi di termoregolazione basati su effetto tunnel
EP1983548A1 (fr) * 2007-04-20 2008-10-22 ICT Integrated Circuit Testing Gesellschaft für Halbleiterprüftechnik mbH Chambre d'émetteur, appareil à particule chargée et son procédé de fonctionnement
EP2071188A1 (fr) 2007-12-10 2009-06-17 VARIAN S.p.A. Dispositif pour le dépôt de getters non évaporables (NEGs) et procédé de dépôt utilisant un tel dispositif
BRPI0822888A8 (pt) * 2008-06-11 2019-01-22 Srb Energy Res Sarl painel solar a vácuo de alta eficácia
CN102691640B (zh) * 2012-05-29 2015-12-02 储琦 一种抽气系统及工艺
RU2513563C2 (ru) * 2012-08-17 2014-04-20 Федеральное государственное унитарное предприятие "Научно-производственное предприятие "Исток" (ФГУП "НПП "Исток") Спеченный неиспаряющийся геттер
JP6835592B2 (ja) 2014-06-26 2021-02-24 サエス・ゲッターズ・エッセ・ピ・ア ゲッターポンプシステム
DE102016123146A1 (de) 2016-06-03 2017-12-07 Movatec Gmbh Vakuumgerät und Verfahren zur Beschichtung von Bauteilen
EP3546748B1 (fr) * 2016-11-28 2021-06-30 Inter-University Research Institute Corporation High Energy Accelerator Research Organization Récipient revêtus de sorbeur non évaporatif, chambre, procédé de fabrication, et appareil de fabrication
FR3072788B1 (fr) 2017-10-24 2020-05-29 Commissariat A L'energie Atomique Et Aux Energies Alternatives Source de rayonnement infrarouge modulable
JP7837011B2 (ja) 2021-05-20 2026-03-30 大学共同利用機関法人 高エネルギー加速器研究機構 非蒸発型ゲッタコーティング装置、非蒸発型ゲッタコーティング容器・配管の製造方法、非蒸発型ゲッタコーティング容器・配管
FR3128307A1 (fr) 2021-10-14 2023-04-21 Safran Electronics & Defense Getter non evaporable activable a faible temperature, dispositif de pompage et enceinte contenant un tel getter
CN116575005B (zh) * 2023-05-10 2024-01-16 中国科学院近代物理研究所 一种TiZrCo真空吸气剂薄膜及其制备方法与应用

Family Cites Families (24)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
CA622379A (en) * 1961-06-20 Union Carbide Corporation Getters
NL52890C (fr) * 1936-06-21
US2175695A (en) * 1937-11-27 1939-10-10 Gen Electric Gettering
BE476526A (fr) * 1946-10-05
GB828982A (en) * 1956-12-28 1960-02-24 Gen Electric Improvements in evacuated and gas-filled devices and methods of manufacturing
US3544829A (en) * 1968-02-03 1970-12-01 Tokyo Shibaura Electric Co Low pressure mercury vapour discharge lamp
US4038738A (en) * 1975-01-10 1977-08-02 Uddeholms Aktiebolag Method and means for the production of bar stock from metal powder
US4097195A (en) * 1975-02-12 1978-06-27 Varian Associates, Inc. High vacuum pump
US4050914A (en) * 1976-07-26 1977-09-27 S.A.E.S. Getters S.P.A. Accelerator for charged particles
JPS5459662A (en) * 1977-10-20 1979-05-14 Nippon Oxygen Co Ltd Preparation of thermos in metal
DE3814389A1 (de) * 1988-04-28 1989-11-09 Kernforschungsanlage Juelich Verfahren zur restgasminderung in hochvakuumanlagen durch getterschichten und deren erzeugung sowie entsprechend beschichtete hochvakuumanlagen
JPH03147298A (ja) * 1989-11-01 1991-06-24 Mitsubishi Electric Corp 加速器用真空容器
JPH03239869A (ja) * 1990-02-13 1991-10-25 Japan Steel Works Ltd:The 真空チャンバー
JP2967785B2 (ja) * 1990-04-24 1999-10-25 株式会社日本製鋼所 ゲツターポンプ装置
SU1814818A3 (ru) * 1990-12-25 1995-05-10 Институт металлургии и обогащения АН КазССР Способ формирования металлических покрытий на поверхности диэлектрика
JP2561570Y2 (ja) * 1991-08-06 1998-01-28 株式会社日本製鋼所 高真空排気装置
JP2721602B2 (ja) * 1991-08-26 1998-03-04 株式会社日本製鋼所 水素吸蔵合金による水素排気方法及び装置
EP0563465B1 (fr) * 1991-12-10 1997-11-05 Shell Internationale Researchmaatschappij B.V. Procédé et dispositif pour créer le vide
JP3290697B2 (ja) * 1992-04-30 2002-06-10 株式会社東芝 真空排気装置
IT1255438B (it) * 1992-07-17 1995-10-31 Getters Spa Pompa getter non evaporabile
IT1255439B (it) * 1992-07-17 1995-10-31 Getters Spa Pompa getter non evaporabile
JPH07233785A (ja) * 1994-02-23 1995-09-05 Ishikawajima Harima Heavy Ind Co Ltd 非蒸発型ゲッターポンプ
JP3309193B2 (ja) * 1994-03-17 2002-07-29 株式会社日立製作所 真空ダクト内表面処理方法および真空ダクト内表面処理装置
US5688708A (en) * 1996-06-24 1997-11-18 Motorola Method of making an ultra-high vacuum field emission display

Also Published As

Publication number Publication date
EP0906635B1 (fr) 2003-03-05
ES2193382T3 (es) 2003-11-01
JP2001503830A (ja) 2001-03-21
PT906635E (pt) 2003-07-31
FR2750248B1 (fr) 1998-08-28
US6468043B1 (en) 2002-10-22
ATE233946T1 (de) 2003-03-15
AU3340497A (en) 1998-01-07
NO985927L (no) 1998-12-17
JP4620187B2 (ja) 2011-01-26
DE69719507D1 (de) 2003-04-10
DE69719507T2 (de) 2004-02-19
CA2258118C (fr) 2010-08-17
CA2258118A1 (fr) 1997-12-24
EP0906635A1 (fr) 1999-04-07
WO1997049109A1 (fr) 1997-12-24
FR2750248A1 (fr) 1997-12-26
NO317454B1 (no) 2004-11-01
NO985927D0 (no) 1998-12-17
RU2193254C2 (ru) 2002-11-20

Similar Documents

Publication Publication Date Title
AU3340497A (en) Pumping device by non-vaporisable getter and method for using this getter
MXPA04000297A (es) Pelicula depositada en fase vapor.
WO2002090245A3 (fr) Procedes de fabrication de dispositifs a microstructure
ATE434684T1 (de) Keramischer wandverkleidungsverbund
TW200620490A (en) Method of forming a thin film component
AU5054499A (en) Coating
DE60015395D1 (de) Speicher, der zwischen verarbeitenden threads geteilt ist
WO2002082045A3 (fr) Mosaiques de capteurs a couche mince micro-usines pour la detection de gaz contenant h2, nh3 et du soufre, et leur procede de fabrication
DE60226784D1 (de) Turbolader mit verstellbaren leitschaufeln
DE50202449D1 (de) Beschichtungsverfahren und beschichtung
SE0002448D0 (sv) method of producig powder metal components
AU2003224129A1 (en) Substrates having a biofilm-inhibiting coating
DE59200391D1 (de) Einrichtung zur inertgasversorgung einer mehrstufigen trockenlaufenden vakuumpumpe.
WO2003071577A3 (fr) Source d'etincelle de canal concue pour produire un faisceau electronique stable
TW200506082A (en) Shutter disk and blade for physical vapor deposition chamber
AU6722898A (en) Arrangement and method for improving vacuum in a very high vacuum system
DE69103942D1 (de) Hochdruck-Metalldampfentladungslampe.
DK1448301T3 (da) Fremgangsmåde til fyldning af en brönd i et substrat
AU6278698A (en) Optimization of sio2, film conformality in atmospheric pressure chemical vapor deposition
ES2173548T3 (es) Disposicion de filtro.
TW200638138A (en) Polarized light illuminator
ATE185581T1 (de) Beschichtungszusammensetzung
TW200531837A (en) Slotted substrates and methods of forming
AU2003262170A1 (en) Exhaust chamber comprising an envelope defining a gas circulation passage
TW328913B (en) Trap for collecting solid, and a vacuum pump therefor