DK1210294T3 - Höjfyldt SiO2-dispersion, fremgangsmåde til fremstilling og anvendelse heraf - Google Patents

Höjfyldt SiO2-dispersion, fremgangsmåde til fremstilling og anvendelse heraf

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Publication number
DK1210294T3
DK1210294T3 DK00965941T DK00965941T DK1210294T3 DK 1210294 T3 DK1210294 T3 DK 1210294T3 DK 00965941 T DK00965941 T DK 00965941T DK 00965941 T DK00965941 T DK 00965941T DK 1210294 T3 DK1210294 T3 DK 1210294T3
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DK
Denmark
Prior art keywords
bis
von
porendurchmesser
die
sio2
Prior art date
Application number
DK00965941T
Other languages
Danish (da)
English (en)
Inventor
Fritz Schwertfeger
Johann Weis
Peter Ritter
Achim Molter
Wolfgang Schweren
Volker Frey
Hans-Peter Scherm
Original Assignee
Wacker Chemie Gmbh
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
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First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=7921359&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=DK1210294(T3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Wacker Chemie Gmbh filed Critical Wacker Chemie Gmbh
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Publication of DK1210294T3 publication Critical patent/DK1210294T3/da

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    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B82—NANOTECHNOLOGY
    • B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
    • B82Y30/00—Nanotechnology for materials or surface science, e.g. nanocomposites
    • C—CHEMISTRY; METALLURGY
    • C01—INORGANIC CHEMISTRY
    • C01B—NON-METALLIC ELEMENTS; COMPOUNDS THEREOF; METALLOIDS OR COMPOUNDS THEREOF NOT COVERED BY SUBCLASS C01C
    • C01B33/00—Silicon; Compounds thereof
    • C01B33/113—Silicon oxides; Hydrates thereof
    • C01B33/12—Silica; Hydrates thereof, e.g. lepidoic silicic acid
    • C01B33/14—Colloidal silica, e.g. dispersions, gels, sols
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/06—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction
    • C03B19/066—Other methods of shaping glass by sintering, e.g. by cold isostatic pressing of powders and subsequent sintering, by hot pressing of powders, by sintering slurries or dispersions not undergoing a liquid phase reaction for the production of quartz or fused silica articles
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B19/00—Other methods of shaping glass
    • C03B19/12—Other methods of shaping glass by liquid-phase reaction processes
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03B—MANUFACTURE, SHAPING, OR SUPPLEMENTARY PROCESSES
    • C03B20/00—Processes specially adapted for the production of quartz or fused silica articles, not otherwise provided for
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
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    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/01—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics
    • C04B35/14—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products based on oxide ceramics based on silica
    • C—CHEMISTRY; METALLURGY
    • C04—CEMENTS; CONCRETE; ARTIFICIAL STONE; CERAMICS; REFRACTORIES
    • C04B—LIME, MAGNESIA; SLAG; CEMENTS; COMPOSITIONS THEREOF, e.g. MORTARS, CONCRETE OR LIKE BUILDING MATERIALS; ARTIFICIAL STONE; CERAMICS; REFRACTORIES; TREATMENT OF NATURAL STONE
    • C04B35/00—Shaped ceramic products characterised by their composition; Ceramics compositions; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/622—Forming processes; Processing powders of inorganic compounds preparatory to the manufacturing of ceramic products
    • C04B35/626—Preparing or treating the powders individually or as batches ; preparing or treating macroscopic reinforcing agents for ceramic products, e.g. fibres; mechanical aspects section B
    • C04B35/62605—Treating the starting powders individually or as mixtures
    • C04B35/62625—Wet mixtures
    • C04B35/6263—Wet mixtures characterised by their solids loadings, i.e. the percentage of solids
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    • C04B38/00—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof
    • C04B38/0051—Porous mortars, concrete, artificial stone or ceramic ware; Preparation thereof characterised by the pore size, pore shape or kind of porosity
    • C04B38/0064—Multimodal pore size distribution
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    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/30—Constituents and secondary phases not being of a fibrous nature
    • C04B2235/34—Non-metal oxides, non-metal mixed oxides, or salts thereof that form the non-metal oxides upon heating, e.g. carbonates, nitrates, (oxy)hydroxides, chlorides
    • C04B2235/3418—Silicon oxide, silicic acids or oxide forming salts thereof, e.g. silica sol, fused silica, silica fume, cristobalite, quartz or flint
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    • C04B2235/52—Constituents or additives characterised by their shapes
    • C04B2235/528—Spheres
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    • C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54—Particle size related information
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    • C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54—Particle size related information
    • C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5445—Particle size related information expressed by the size of the particles or aggregates thereof submicron sized, i.e. from 0,1 to 1 micron
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    • C04B2235/02—Composition of constituents of the starting material or of secondary phases of the final product
    • C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
    • C04B2235/54—Particle size related information
    • C04B2235/5418—Particle size related information expressed by the size of the particles or aggregates thereof
    • C04B2235/5454—Particle size related information expressed by the size of the particles or aggregates thereof nanometer sized, i.e. below 100 nm
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    • C04B2235/50—Constituents or additives of the starting mixture chosen for their shape or used because of their shape or their physical appearance
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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Ceramic Engineering (AREA)
  • Structural Engineering (AREA)
  • Dispersion Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Nanotechnology (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • General Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • Composite Materials (AREA)
  • Physics & Mathematics (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Silicon Compounds (AREA)
  • Glass Melting And Manufacturing (AREA)
  • Powder Metallurgy (AREA)
  • Press-Shaping Or Shaping Using Conveyers (AREA)
  • Catalysts (AREA)
  • Porous Artificial Stone Or Porous Ceramic Products (AREA)
  • Compositions Of Oxide Ceramics (AREA)
DK00965941T 1999-09-09 2000-09-07 Höjfyldt SiO2-dispersion, fremgangsmåde til fremstilling og anvendelse heraf DK1210294T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19943103A DE19943103A1 (de) 1999-09-09 1999-09-09 Hochgefüllte SiO2-Dispersion, Verfahren zu ihrer Herstellung und Verwendung
PCT/EP2000/008752 WO2001017902A1 (fr) 1999-09-09 2000-09-07 DISPERSION DE SiO2 A HAUT COEFFICIENT DE CHARGE, PROCEDES PERMETTANT DE LA PREPARER

Publications (1)

Publication Number Publication Date
DK1210294T3 true DK1210294T3 (da) 2005-08-15

Family

ID=7921359

Family Applications (1)

Application Number Title Priority Date Filing Date
DK00965941T DK1210294T3 (da) 1999-09-09 2000-09-07 Höjfyldt SiO2-dispersion, fremgangsmåde til fremstilling og anvendelse heraf

Country Status (12)

Country Link
US (1) US6699808B1 (fr)
EP (2) EP1506947A3 (fr)
JP (1) JP2003508334A (fr)
KR (1) KR100517814B1 (fr)
CN (2) CN1221471C (fr)
AT (1) ATE295335T1 (fr)
CA (1) CA2384288A1 (fr)
DE (2) DE19943103A1 (fr)
DK (1) DK1210294T3 (fr)
ES (1) ES2240171T3 (fr)
PT (1) PT1210294E (fr)
WO (1) WO2001017902A1 (fr)

Families Citing this family (60)

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DE10044163A1 (de) * 2000-09-07 2002-04-04 Wacker Chemie Gmbh Elektrophoretisch nachverdichtete SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung
DE10114484C2 (de) * 2001-03-24 2003-10-16 Heraeus Quarzglas Verfahren für die Herstellung eines Komposit-Werkstoffs mit einem SiO¶2¶-Gehalt von mindestens 99 Gew.-%, und Verwendung des nach dem Verfahren erhaltenen Komposit-Werkstoffs
DE10131494A1 (de) * 2001-07-02 2003-05-28 Nanogate Technologies Gmbh Partikuläre Beschichtung
DE10156137B4 (de) * 2001-11-15 2004-08-19 Wacker-Chemie Gmbh Verfahren zur Herstellung eines Kieselglastiegels mit kristallinen Bereichen aus einem porösen Kieselglasgrünkörper
DE10158521B4 (de) * 2001-11-29 2005-06-02 Wacker-Chemie Gmbh In Teilbereichen oder vollständig verglaster SiO2-Formkörper und Verfahren zu seiner Herstellung
EP1478604A1 (fr) * 2002-02-28 2004-11-24 Siemens Aktiengesellschaft Masses ceramiques ayant une teneur importante en matieres solides destinees a la fabrication de materiaux et produits ceramiques presentant une faible contraction
DE10211958A1 (de) 2002-03-18 2003-10-16 Wacker Chemie Gmbh Hochreines Silica-Pulver, Verfahren und Vorrichtung zu seiner Herstellung
DE10221498A1 (de) * 2002-05-14 2003-12-04 Basf Ag Kondensatoren hoher Energiedichte
DE10243954B3 (de) * 2002-09-20 2004-07-08 Heraeus Quarzglas Gmbh & Co. Kg Verfahren für die Herstellung eines opaken Quarzglas-Kompositwerkstoffs sowie Verwendung desselben
KR100688300B1 (ko) * 2002-11-22 2007-03-02 닛폰 에어로실 가부시키가이샤 고농도 실리카 슬러리
DE10256267A1 (de) * 2002-12-03 2004-06-24 Degussa Ag Dispersion, Streichfarbe und Aufnahmemedium
DE10260320B4 (de) * 2002-12-20 2006-03-30 Wacker Chemie Ag Verglaster SiO2-Formkörper, Verfahren zu seiner Herstellung und Vorrichtung
DE10319300B4 (de) * 2003-04-29 2006-03-30 Wacker Chemie Ag Verfahren zur Herstellung eines Formkörpers aus Kieselglas
JP2005053728A (ja) * 2003-08-01 2005-03-03 Dsl Japan Co Ltd 高吸油性および高い構造性を有する非晶質シリカ粒子
FR2858611B1 (fr) * 2003-08-07 2006-11-24 Saint Gobain Ct Recherches Procede de fabrication d'une piece en silice amorphe frittee, moule et barbotine mis en oeuvre dans ce procede
DE10339676A1 (de) * 2003-08-28 2005-03-24 Wacker-Chemie Gmbh SiO2-Formkörper, Verfahren zu ihrer Herstellung und Verwendung
JP2005097103A (ja) * 2003-09-22 2005-04-14 Heraeus Quarzglas Gmbh & Co Kg 複合材料からキャスティングを製造する方法とセラミックもしくはガラス質の複合材料のキャスティング
DE10358065A1 (de) * 2003-12-11 2005-07-28 Wacker-Chemie Gmbh Vorrichtung zur Herstellung von Fused Silica
DE10360464A1 (de) * 2003-12-22 2005-07-14 Wacker-Chemie Gmbh Dispersion die mindestens 2 Arten von Partikeln enthält
ATE469863T1 (de) * 2004-05-04 2010-06-15 Cabot Corp Verfahren zur herstellung einer dispersion von metalloxid-aggregatteilchen mit einem gewünschten aggregatteilchendurchmesser
DE102004030093A1 (de) * 2004-06-22 2006-01-12 Degussa Ag Metalloxid-Sol, damit hergestellte Schicht und Formkörper
DE102004036602A1 (de) * 2004-07-28 2006-03-23 Degussa Ag Hochgefüllte, wässerige Metalloxid-Dispersion
KR100843057B1 (ko) 2004-07-28 2008-07-01 에보니크 데구사 게엠베하 고도로 충전된 수성 금속 산화물 분산액
US20060141486A1 (en) * 2004-12-29 2006-06-29 Coonan Everett W Porous substrates and arrays comprising the same
AT504168B1 (de) * 2006-09-14 2008-08-15 Montanuniv Leoben Verfahren zur herstellung eines insbesondere porösen keramischen formkörpers und damit hergestellter formkörper
DE102006046619A1 (de) * 2006-09-29 2008-04-03 Heraeus Quarzglas Gmbh & Co. Kg Streichfähiger SiO2-Schlicker für die Herstellung von Quarzglas, Verfahren zur Herstellung von Quarzglas unter Einsatz des Schlickers
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CA2384288A1 (fr) 2001-03-15
KR20020048402A (ko) 2002-06-22
DE19943103A1 (de) 2001-03-15
EP1210294B1 (fr) 2005-05-11
EP1506947A3 (fr) 2005-03-02
WO2001017902A1 (fr) 2001-03-15
PT1210294E (pt) 2005-08-31
EP1506947A2 (fr) 2005-02-16
DE50010303D1 (de) 2005-06-16
CN1221471C (zh) 2005-10-05
ES2240171T3 (es) 2005-10-16
CN1736861A (zh) 2006-02-22
JP2003508334A (ja) 2003-03-04
CN1373737A (zh) 2002-10-09

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