DK2247771T3 - Vådkemisk fremgangsmåde til fremstilling af en højtemperatur-superleder - Google Patents

Vådkemisk fremgangsmåde til fremstilling af en højtemperatur-superleder

Info

Publication number
DK2247771T3
DK2247771T3 DK09701760.2T DK09701760T DK2247771T3 DK 2247771 T3 DK2247771 T3 DK 2247771T3 DK 09701760 T DK09701760 T DK 09701760T DK 2247771 T3 DK2247771 T3 DK 2247771T3
Authority
DK
Denmark
Prior art keywords
wetchemical
preparing
procedure
supervisor
temperature supervisor
Prior art date
Application number
DK09701760.2T
Other languages
English (en)
Inventor
Driessche Isabel Van
Pieter Vermeir
Serge Hoste
Michael Bäcker
Original Assignee
Basf Se
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Basf Se filed Critical Basf Se
Application granted granted Critical
Publication of DK2247771T3 publication Critical patent/DK2247771T3/da

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C18/00—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating
    • C23C18/02—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition
    • C23C18/12—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material
    • C23C18/1204—Chemical coating by decomposition of either liquid compounds or solutions of the coating forming compounds, without leaving reaction products of surface material in the coating; Contact plating by thermal decomposition characterised by the deposition of inorganic material other than metallic material inorganic material, e.g. non-oxide and non-metallic such as sulfides, nitrides based compounds
    • C23C18/1208—Oxides, e.g. ceramics
    • C23C18/1216—Metal oxides
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0324—Processes for depositing or forming copper oxide superconductor layers from a solution
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N—ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10N60/00—Superconducting devices
    • H10N60/01—Manufacture or treatment
    • H10N60/0268—Manufacture or treatment of devices comprising copper oxide
    • H10N60/0296—Processes for depositing or forming copper oxide superconductor layers
    • H10N60/0548—Processes for depositing or forming copper oxide superconductor layers by deposition and subsequent treatment, e.g. oxidation of pre-deposited material

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Physics & Mathematics (AREA)
  • Thermal Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Ceramic Engineering (AREA)
  • Materials Engineering (AREA)
  • Inorganic Chemistry (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Inorganic Compounds Of Heavy Metals (AREA)
  • Superconductors And Manufacturing Methods Therefor (AREA)
  • Superconductor Devices And Manufacturing Methods Thereof (AREA)
  • Chemically Coating (AREA)
DK09701760.2T 2008-01-17 2009-01-15 Vådkemisk fremgangsmåde til fremstilling af en højtemperatur-superleder DK2247771T3 (da)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102008004818A DE102008004818B4 (de) 2008-01-17 2008-01-17 Nasschemisches Verfahren zur Herstellung eines Hochtemperatursupraleiters
PCT/EP2009/000214 WO2009090062A2 (de) 2008-01-17 2009-01-15 Nasschemisches verfahren zur herstellung eines hochtemperatursupraleiters

Publications (1)

Publication Number Publication Date
DK2247771T3 true DK2247771T3 (da) 2017-11-13

Family

ID=40785811

Family Applications (1)

Application Number Title Priority Date Filing Date
DK09701760.2T DK2247771T3 (da) 2008-01-17 2009-01-15 Vådkemisk fremgangsmåde til fremstilling af en højtemperatur-superleder

Country Status (7)

Country Link
US (1) US8658571B2 (da)
EP (1) EP2247771B1 (da)
JP (1) JP2011510171A (da)
DE (1) DE102008004818B4 (da)
DK (1) DK2247771T3 (da)
ES (1) ES2645222T3 (da)
WO (1) WO2009090062A2 (da)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5591557B2 (ja) * 2010-02-16 2014-09-17 昭和電線ケーブルシステム株式会社 酸化物超電導線材の製造方法及び製造装置
JP5591558B2 (ja) * 2010-02-16 2014-09-17 昭和電線ケーブルシステム株式会社 酸化物超電導線材の製造方法
JP2012113860A (ja) * 2010-11-22 2012-06-14 Sumitomo Electric Ind Ltd 酸化物超電導薄膜線材とその製造方法
US9257628B2 (en) 2012-03-21 2016-02-09 Basf Se Process for producing nanoparticles and their use in the production of high-temperature superconductors
EP2960954A1 (de) * 2014-06-24 2015-12-30 Basf Se Verfahren zur Herstellung eines Komposits umfassend eine Hochtemperatursupraleiter(HTS)-Schicht
US11210905B2 (en) * 2019-06-17 2021-12-28 Aristocrat Technologies, Inc. Systems and methods for providing a multi-game bingo game

Family Cites Families (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01126227A (ja) * 1987-07-31 1989-05-18 Toray Ind Inc 超伝導材の製造方法
JP2810047B2 (ja) * 1988-03-04 1998-10-15 白水化学工業株式会社 超伝導体製造用安定溶液及び超導薄膜の製造方法
JPH01246133A (ja) * 1988-03-26 1989-10-02 Toray Ind Inc 超伝導体の製造方法
JPH01308826A (ja) * 1988-06-08 1989-12-13 Res Dev Corp Of Japan 超電導セラミック薄膜の形成方法
US4880772A (en) * 1988-06-09 1989-11-14 Battelle Memorial Institute Preparation of thin ceramic films via an aqueous solution route
JPH02120225A (ja) * 1988-10-28 1990-05-08 Mitsubishi Metal Corp 超電動セラミックス被膜または薄板の製造方法
JP2526386B2 (ja) * 1989-06-12 1996-08-21 科学技術庁無機材質研究所長 酸化物超電導線材およびテ―プ状体の製造法
US5066636A (en) * 1990-08-15 1991-11-19 Industrial Technology Research Institute Citrate/ethylenediamine gel method for forming high temperature superconductors
JP5064611B2 (ja) 1999-04-03 2012-10-31 インスティトゥート フュア フェストケルパー− ウント ヴェルクシュトッフオルシュング ドレースデン エー ファウ ニッケルベースの金属材料およびその製造方法
US6562761B1 (en) * 2000-02-09 2003-05-13 American Superconductor Corporation Coated conductor thick film precursor
US6765151B2 (en) * 1999-07-23 2004-07-20 American Superconductor Corporation Enhanced high temperature coated superconductors
JP3556586B2 (ja) * 2000-09-05 2004-08-18 株式会社東芝 酸化物超電導体の製造方法、酸化物超電導体用原料、および酸化物超電導体用原料の製造方法
JP3548801B2 (ja) * 2001-03-27 2004-07-28 独立行政法人産業技術総合研究所 特定の金属種に特定の配位子を配位させた金属錯体を含む溶液組成物、希土類超電導膜製造用溶液組成物、特定金属錯体の非結晶固形物、特定の金属種に特定の配位子を配位させた金属錯体を含む溶液の製造方法、希土類超電導膜製造用溶液の製造方法、及び超電導薄膜の形成方法。
US20040266628A1 (en) * 2003-06-27 2004-12-30 Superpower, Inc. Novel superconducting articles, and methods for forming and using same
DE102004041053B4 (de) 2004-08-25 2007-08-16 Trithor Gmbh Verfahren zur Herstellung dicker REBCO-Schichten für bandförmige Hochtemeperatur-Supraleiter
AU2005333196B2 (en) * 2004-10-01 2009-10-01 American Superconductor Corp. Thick superconductor films with improved performance
US7553799B2 (en) * 2005-06-02 2009-06-30 Ut-Battelle, Llc Chemical solution deposition method of fabricating highly aligned MgO templates
DE102005037047B3 (de) 2005-08-05 2006-12-28 Novar Gmbh Gebäudeleittechnik- oder Gefahrenmeldeanlage
DE102006018301B4 (de) * 2006-04-20 2009-07-16 Zenergy Power Gmbh Naß-chemische Verfahren zur Herstellung eines HTSL
DE602006021287D1 (de) * 2006-05-18 2011-05-26 Nexans Leiter, beschichtet mit einem polykristallinen Film verwendbar zur Herstellung von Hochtemperatursupraleitungsschichten

Also Published As

Publication number Publication date
US20100173785A1 (en) 2010-07-08
EP2247771B1 (de) 2017-07-26
WO2009090062A3 (de) 2010-01-21
JP2011510171A (ja) 2011-03-31
DE102008004818A1 (de) 2009-07-23
ES2645222T3 (es) 2017-12-04
DE102008004818B4 (de) 2010-07-15
EP2247771A2 (de) 2010-11-10
WO2009090062A2 (de) 2009-07-23
US8658571B2 (en) 2014-02-25

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