DK2249392T3 - Omvendt ledende halvlederenhed - Google Patents

Omvendt ledende halvlederenhed Download PDF

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Publication number
DK2249392T3
DK2249392T3 DK10154064.9T DK10154064T DK2249392T3 DK 2249392 T3 DK2249392 T3 DK 2249392T3 DK 10154064 T DK10154064 T DK 10154064T DK 2249392 T3 DK2249392 T3 DK 2249392T3
Authority
DK
Denmark
Prior art keywords
semiconductor device
conductive semiconductor
reverse conductive
reverse
semiconductor
Prior art date
Application number
DK10154064.9T
Other languages
English (en)
Inventor
Arnost Kopta
Arx Christoph Von
Liutauras Storasta
Munaf Rahimo
Raffael Schnell
Original Assignee
Abb Power Grids Switzerland Ag
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Abb Power Grids Switzerland Ag filed Critical Abb Power Grids Switzerland Ag
Application granted granted Critical
Publication of DK2249392T3 publication Critical patent/DK2249392T3/da

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D62/00Semiconductor bodies, or regions thereof, of devices having potential barriers
    • H10D62/10Shapes, relative sizes or dispositions of the regions of the semiconductor bodies; Shapes of the semiconductor bodies
    • H10D62/13Semiconductor regions connected to electrodes carrying current to be rectified, amplified or switched, e.g. source or drain regions
    • H10D62/141Anode or cathode regions of thyristors; Collector or emitter regions of gated bipolar-mode devices, e.g. of IGBTs
    • H10D62/142Anode regions of thyristors or collector regions of gated bipolar-mode devices
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • H10D12/441Vertical IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/01Manufacture or treatment
    • H10D12/031Manufacture or treatment of IGBTs
    • H10D12/032Manufacture or treatment of IGBTs of vertical IGBTs
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D12/00Bipolar devices controlled by the field effect, e.g. insulated-gate bipolar transistors [IGBT]
    • H10D12/411Insulated-gate bipolar transistors [IGBT]
    • H10D12/441Vertical IGBTs
    • H10D12/461Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions
    • H10D12/481Vertical IGBTs having non-planar surfaces, e.g. having trenches, recesses or pillars in the surfaces of the emitter, base or collector regions having gate structures on slanted surfaces, on vertical surfaces, or in grooves, e.g. trench gate IGBTs
DK10154064.9T 2009-04-29 2010-02-19 Omvendt ledende halvlederenhed DK2249392T3 (da)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
EP09159009 2009-04-29

Publications (1)

Publication Number Publication Date
DK2249392T3 true DK2249392T3 (da) 2020-08-17

Family

ID=40972804

Family Applications (1)

Application Number Title Priority Date Filing Date
DK10154064.9T DK2249392T3 (da) 2009-04-29 2010-02-19 Omvendt ledende halvlederenhed

Country Status (5)

Country Link
US (1) US8212283B2 (da)
EP (1) EP2249392B1 (da)
JP (1) JP5697891B2 (da)
CN (1) CN101877352B (da)
DK (1) DK2249392T3 (da)

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US8729914B2 (en) * 2010-11-10 2014-05-20 Infineon Technologies Ag Detection of the conduction state of an RC-IGBT
KR101303422B1 (ko) * 2011-03-28 2013-09-05 주식회사 엘지실트론 단결정 잉곳의 제조방법 및 이에 의해 제조된 단결정 잉곳과 웨이퍼
JP6037495B2 (ja) * 2011-10-17 2016-12-07 ローム株式会社 半導体装置およびその製造方法
JP5742711B2 (ja) * 2011-12-28 2015-07-01 株式会社デンソー 半導体装置
US9018674B2 (en) 2012-04-06 2015-04-28 Infineon Technologies Ag Reverse conducting insulated gate bipolar transistor
WO2014086016A1 (zh) * 2012-12-06 2014-06-12 中国科学院微电子研究所 Rc-igbt及其制作方法
JP6234696B2 (ja) * 2013-04-16 2017-11-22 ローム株式会社 半導体装置
GB2520617B (en) 2013-10-22 2020-12-30 Abb Schweiz Ag RC-IGBT with freewheeling SiC diode
CN105830221B (zh) 2013-12-23 2017-11-03 Abb 技术有限公司 反向传导半导体装置
JP6427589B2 (ja) 2014-02-14 2018-11-21 アーベーベー・シュバイツ・アーゲー 2つの補助エミッタ導体経路を有する半導体モジュール
US9159819B2 (en) 2014-02-20 2015-10-13 Infineon Technologies Ag Semiconductor device and RC-IGBT with zones directly adjoining a rear side electrode
CN104979379A (zh) * 2014-04-03 2015-10-14 中国科学院微电子研究所 半导体器件的集电极结构及ti-igbt
WO2016001182A2 (en) 2014-06-30 2016-01-07 Abb Technology Ag Semiconductor device
CN107004578B (zh) * 2014-09-15 2020-01-24 Abb瑞士股份有限公司 用于制造包括薄半导体晶圆的半导体器件的方法
CN107112353B (zh) 2014-12-23 2020-12-22 Abb电网瑞士股份公司 反向传导半导体装置
CN105448972B (zh) * 2014-12-25 2019-04-19 深圳深爱半导体股份有限公司 反向导通绝缘栅双极型晶体管
WO2016198388A1 (en) 2015-06-09 2016-12-15 Abb Schweiz Ag Method for manufacturing an edge termination for a silicon carbide power semiconductor device
EP3154091A1 (en) 2015-10-07 2017-04-12 ABB Technology AG Reverse-conducting semiconductor device
CN108701617B (zh) 2015-12-02 2019-11-29 Abb瑞士股份有限公司 用于制造半导体装置的方法
EP3176812A1 (en) 2015-12-02 2017-06-07 ABB Schweiz AG Semiconductor device and method for manufacturing such a semiconductor device
JP6817777B2 (ja) * 2015-12-16 2021-01-20 ローム株式会社 半導体装置
EP3223316A1 (en) 2016-03-24 2017-09-27 ABB Technology AG Wide bandgap power semiconductor device and method for manufacturing such a device
DE102016110035B4 (de) 2016-05-31 2020-09-10 Infineon Technologies Ag Elektrische Baugruppe, die eine bipolare Schaltvorrichtung und einen selbstleitenden Transistor mit breiter Bandlücke umfasst, und eine elektrische Baugruppe, die eine bipolare Schaltvorrichtung und einen selbstleitenden Junction-Feldeffekttransistor umfasst, der einen Halbleiterbereich aus Siliziumcarbid umfasst
EP3255676A1 (en) 2016-06-09 2017-12-13 ABB Schweiz AG Vertical power semiconductor device and method for operating such a device
JP6854598B2 (ja) * 2016-07-06 2021-04-07 ローム株式会社 半導体装置
EP3306672A1 (en) 2016-10-07 2018-04-11 ABB Schweiz AG Semiconductor device
EP3539215B1 (en) 2016-11-14 2020-01-22 ABB Schweiz AG Switching of paralleled reverse conducting igbt and wide bandgap switch
JP6854654B2 (ja) 2017-01-26 2021-04-07 ローム株式会社 半導体装置
CN108417549B (zh) 2017-02-09 2021-09-24 株式会社东芝 半导体装置及电气设备
US10439038B2 (en) 2017-02-09 2019-10-08 Kabushiki Kaisha Toshiba Semiconductor device and electrical apparatus
US10446539B2 (en) * 2017-02-24 2019-10-15 Nxp B.V. Electrostatic discharge (ESD) protection device and method for operating an ESD protection device
CN113169226B (zh) * 2018-12-19 2024-05-31 三菱电机株式会社 半导体装置
CN109728085B (zh) * 2018-12-29 2021-10-22 安建科技(深圳)有限公司 一种逆导型绝缘栅双极性晶体管
CN109830531A (zh) * 2019-01-15 2019-05-31 上海华虹宏力半导体制造有限公司 Rc-igbt器件及其制造方法
GB2584698B (en) 2019-06-12 2022-09-14 Mqsemi Ag Non-punch-through reverse-conducting power semiconductor device and method for producing same
JP7404702B2 (ja) 2019-08-09 2023-12-26 富士電機株式会社 半導体装置
CN112201688B (zh) * 2020-08-25 2023-04-07 株洲中车时代半导体有限公司 逆导型igbt芯片
CN112768447B (zh) * 2021-01-11 2024-11-12 杭州士兰集昕微电子有限公司 逆导型绝缘栅双极型晶体管及其制造方法
CN114335157B (zh) * 2021-12-17 2024-01-19 贵州振华风光半导体股份有限公司 一种纵向双极结型晶体管版图结构
JP7719731B2 (ja) * 2022-01-07 2025-08-06 株式会社東芝 半導体装置
JP7834617B2 (ja) 2022-09-14 2026-03-24 株式会社東芝 半導体装置
EP4679506A1 (en) * 2024-07-09 2026-01-14 Hitachi Energy Ltd Power semiconductor device
EP4687396A1 (en) 2024-08-01 2026-02-04 Hitachi Energy Ltd Semiconductor device

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JPH0828506B2 (ja) 1988-11-07 1996-03-21 三菱電機株式会社 半導体装置およびその製造方法
ATE167245T1 (de) 1994-12-02 1998-06-15 Walter Steiner Wäschetrockner
DE10250575B4 (de) * 2002-10-30 2010-04-15 Infineon Technologies Ag IGBT mit monolithisch integrierter antiparalleler Diode
JP2005057235A (ja) 2003-07-24 2005-03-03 Mitsubishi Electric Corp 絶縁ゲート型バイポーラトランジスタ及びその製造方法、並びに、インバータ回路
JP4415767B2 (ja) 2004-06-14 2010-02-17 サンケン電気株式会社 絶縁ゲート型半導体素子、及びその製造方法
DE102005019178A1 (de) * 2005-04-25 2006-11-02 Infineon Technologies Ag Halbleiterbauelement, insbesondere rückwärts leitender IGBT
JP5157201B2 (ja) * 2006-03-22 2013-03-06 株式会社デンソー 半導体装置
DE102006050338B4 (de) * 2006-10-25 2011-12-29 Infineon Technologies Austria Ag Halbleiterbauelement mit verbessertem Speicherladung zu Dioden-Softness Trade-off
EP2073271A1 (en) 2007-12-19 2009-06-24 ABB Technology AG Reverse-conducting insulated gate bipolar transistor and method for manufacturing such a reverse-conducting insulated gate bipolar transistor
EP2086012A1 (en) 2007-12-19 2009-08-05 ABB Technology AG Reverse-conducting insulated gate bipolar transistor and method for manufacturing such a reverse-conducting insulated gate bipolar transistor
EP2184781A1 (en) * 2008-11-05 2010-05-12 ABB Technology AG Reverse-conducting semiconductor device

Also Published As

Publication number Publication date
JP5697891B2 (ja) 2015-04-08
EP2249392A2 (en) 2010-11-10
CN101877352A (zh) 2010-11-03
US20100276727A1 (en) 2010-11-04
EP2249392A3 (en) 2011-08-03
US8212283B2 (en) 2012-07-03
JP2010263215A (ja) 2010-11-18
CN101877352B (zh) 2015-09-09
EP2249392B1 (en) 2020-05-20

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