DK434885A - Fotosensible polymersammensaetninger, fremgangsmaade til elektroforetisk aflejring af disse og deres anvendelse til dannelse af film paa substrater - Google Patents

Fotosensible polymersammensaetninger, fremgangsmaade til elektroforetisk aflejring af disse og deres anvendelse til dannelse af film paa substrater Download PDF

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Publication number
DK434885A
DK434885A DK434885A DK434885A DK434885A DK 434885 A DK434885 A DK 434885A DK 434885 A DK434885 A DK 434885A DK 434885 A DK434885 A DK 434885A DK 434885 A DK434885 A DK 434885A
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DK
Denmark
Prior art keywords
photosensible
movies
electrophoretic
disposal
substrates
Prior art date
Application number
DK434885A
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English (en)
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DK168802B1 (da
DK434885D0 (da
Inventor
William David Emmons
Mark Robert Winkle
Original Assignee
Rohm & Haas
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Application filed by Rohm & Haas filed Critical Rohm & Haas
Publication of DK434885D0 publication Critical patent/DK434885D0/da
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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25D—PROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00—Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/138—Corona discharge process

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Chemical & Material Sciences (AREA)
  • Metallurgy (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Electroplating Methods And Accessories (AREA)
  • Chemically Coating (AREA)
  • Paints Or Removers (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
DK434885A 1984-09-26 1985-09-25 Negativt virkende fotoresist, der kan aflejres elektroforetisk og fremkaldes med vandigt medium, fremgangsmåde til dannelse af et negativt polymerbillede på en ledende overflade af et substrat under anvendelse af fotoresisten samt fotoresistens anvendelse til dannelse af film på substrater DK168802B1 (da)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US06/654,821 US4592816A (en) 1984-09-26 1984-09-26 Electrophoretic deposition process
US65482184 1984-09-26
CN86100150A CN86100150A (zh) 1984-09-26 1986-01-11 感光聚合物组合物及其电泳沉积工艺过程

Publications (3)

Publication Number Publication Date
DK434885D0 DK434885D0 (da) 1985-09-25
DK434885A true DK434885A (da) 1986-03-27
DK168802B1 DK168802B1 (da) 1994-06-13

Family

ID=67809744

Family Applications (1)

Application Number Title Priority Date Filing Date
DK434885A DK168802B1 (da) 1984-09-26 1985-09-25 Negativt virkende fotoresist, der kan aflejres elektroforetisk og fremkaldes med vandigt medium, fremgangsmåde til dannelse af et negativt polymerbillede på en ledende overflade af et substrat under anvendelse af fotoresisten samt fotoresistens anvendelse til dannelse af film på substrater

Country Status (19)

Country Link
US (1) US4592816A (da)
EP (1) EP0176356B1 (da)
JP (1) JPH081519B2 (da)
KR (1) KR920005775B1 (da)
CN (2) CN86100150A (da)
AU (1) AU586189B2 (da)
BR (1) BR8504640A (da)
CA (1) CA1257803A (da)
DE (1) DE3566047D1 (da)
DK (1) DK168802B1 (da)
FI (1) FI80350C (da)
HK (1) HK58289A (da)
IE (1) IE58622B1 (da)
IL (1) IL76491A (da)
MX (1) MX165458B (da)
NO (1) NO168857C (da)
PH (1) PH22139A (da)
SG (1) SG8489G (da)
ZA (1) ZA857435B (da)

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Also Published As

Publication number Publication date
IL76491A (en) 1989-07-31
SG8489G (en) 1989-07-14
EP0176356A3 (en) 1986-08-20
BR8504640A (pt) 1986-07-15
CN86100150A (zh) 1987-07-22
FI80350B (fi) 1990-01-31
DK168802B1 (da) 1994-06-13
ZA857435B (en) 1987-11-25
JPH081519B2 (ja) 1996-01-10
NO853738L (no) 1986-04-01
KR860002735A (ko) 1986-04-28
US4592816A (en) 1986-06-03
IL76491A0 (en) 1986-01-31
CA1257803A (en) 1989-07-25
AU586189B2 (en) 1989-07-06
MX165458B (es) 1992-11-11
JPS6180240A (ja) 1986-04-23
DE3566047D1 (en) 1988-12-08
EP0176356A2 (en) 1986-04-02
EP0176356B1 (en) 1988-11-02
DK434885D0 (da) 1985-09-25
AU4786285A (en) 1986-04-10
FI853691A0 (fi) 1985-09-25
PH22139A (en) 1988-06-01
IE58622B1 (en) 1993-10-20
HK58289A (en) 1989-07-28
CN1058431A (zh) 1992-02-05
FI80350C (fi) 1990-05-10
IE852343L (en) 1986-03-26
NO168857C (no) 1992-04-08
KR920005775B1 (ko) 1992-07-18
FI853691L (fi) 1986-03-27
NO168857B (no) 1991-12-30

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B1 Patent granted (law 1993)
PBP Patent lapsed