EP0010222A1 - Plaque de commande pour un écran plat à plasma de reproduction d'image - Google Patents

Plaque de commande pour un écran plat à plasma de reproduction d'image Download PDF

Info

Publication number
EP0010222A1
EP0010222A1 EP79103758A EP79103758A EP0010222A1 EP 0010222 A1 EP0010222 A1 EP 0010222A1 EP 79103758 A EP79103758 A EP 79103758A EP 79103758 A EP79103758 A EP 79103758A EP 0010222 A1 EP0010222 A1 EP 0010222A1
Authority
EP
European Patent Office
Prior art keywords
control
control plate
plate
glass
glass solder
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP79103758A
Other languages
German (de)
English (en)
Other versions
EP0010222B1 (fr
Inventor
Burkhard Dipl.-Phys. Littwin
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Siemens AG
Siemens Corp
Original Assignee
Siemens AG
Siemens Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Siemens AG, Siemens Corp filed Critical Siemens AG
Priority to AT79103758T priority Critical patent/ATE101T1/de
Publication of EP0010222A1 publication Critical patent/EP0010222A1/fr
Application granted granted Critical
Publication of EP0010222B1 publication Critical patent/EP0010222B1/fr
Expired legal-status Critical Current

Links

Images

Classifications

    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01JELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J17/00Gas-filled discharge tubes with solid cathode
    • H01J17/02Details
    • H01J17/04Electrodes; Screens
    • H01J17/12Control electrodes

Definitions

  • the invention relates to a control plate for a flat plasma display screen with a carrier plate which carries on one side of the plate parallel control electrode tracks corresponding to the lines of the screen and on the other side of the plate perpendicular to these control electrode tracks parallel to the columns of the screen and which is continuous with the control electrode tracks at their crossing points Has tax holes.
  • such a control plate serves for matrix control of the individual pixels.
  • the control hole is released at the intersection of the row and the column.
  • electrons are discharged from the plasma of the gas discharge space behind the control plate into the acceleration space located in front of the control plate. There they are accelerated and generate a light spot on the image point in front of the selected crossing point on the front panel of the screen.
  • control plate The structure of a control plate is also described in this DE-OS. It consists of a glass carrier plate with the control electron tracks on both sides of the plate. The control holes are made by chemical etching.
  • control holes are then not only limited by the requirement for sufficient mechanical stability and a sufficient number of control holes, but also by the fact that no or only half-actuated control holes must not allow electrons to pass through and that the electrical penetration of the the acceleration anode attached to the front plate remains as small as possible through the control holes on the discharge space.
  • the present invention has for its object to design the structure of a control plate so that it meets the requirements for mechanical stability and in terms of electrical properties in the same way.
  • the carrier plate is constructed in a sandwich-like manner from at least three layers, of which the middle one consists of metal and the outer one of insulator material.
  • the outer layers consist of glass plates which are sintered onto the middle metallic layer via a respective glass solder layer.
  • the glass solder layers lying on the metallic layer consist of a metallized glass solder sprayed and sintered onto the metallic layer and the outer layers of a sprayed thereon ; th and sintered stable glass solder exist.
  • the glass solder layer of crystallizing glass solder adjacent to the metallic layer adheres better than stable glass solder; the layer of stable glass solder gives a smoother surface than crystallizing glass solder.
  • Stable is understood to mean that the glass solder remains amorphous, while the crystallizing glass solder crystallizes above a certain temperature and also remains crystalline after cooling.
  • both a selective chemical etching of the individual layers can be carried out one after the other, as is known per se for example from DE-AS 20 13 196 for a metallic layer structure, and a method can be used with an ion beam or laser beam.
  • the construction according to the invention has the advantage that the heat generated during the etching or drilling can be dissipated through the metallic middle layer, so that cracks in the glass layers which would impair the mechanical stability are not caused by thermal shock. Overall is beneficial if the whole
  • Control plate in its average coefficient of thermal expansion is adapted to that of the screen.
  • the metallic middle layer can also be used as a potential-determining electrode for the control. It preferably consists of a metal whose coefficient of thermal expansion is matched to that of the glass, such as a NiFeCo alloy (Vacovit). It is advantageous if the surfaces of the metallic middle layer consist of aluminum.
  • the drawing schematically shows a section through a control plate constructed according to the invention perpendicular to the plate surfaces, a control hole being detected.
  • 1 denotes a metallic middle layer made of a NiFeCo alloy with a thickness of, for example, 80 ⁇ m.
  • a glass solder layer 2 or 3 is connected on both sides of the layer surfaces.
  • On the glass solder layer 2 is a layer of glass 4, on which glass solder layer 3, a glass layer 5, both for example, 80 / um thick glass plates.
  • These layers 1 and 5 form the carrier plate of the control plate.
  • On the outside of the glass layer 4 there is a metallic control electrode track 6, cut transversely to their longitudinal direction.
  • a metallic control electrode track 7 is cut longitudinally. In the area of the control hole, all layers 1 to 5 of the carrier plate and the two control electrode tracks 6, 7 lie one above the other, the two control electrode tracks 6, 7 marking the matrix point as an overlap of the corresponding row and column.
  • the control hole runs perpendicular to the control plate surfaces through all carrier plate layers 1 to 5 and through the control electrode tracks 6 and 7. It is produced, for example, by thermal etching.
  • the carrier plate is created beforehand as follows: the metal layer 1 is sprayed on both sides and the glass layers 4, 5 on one side with glass solder powder (e.g. Schott 8596). After the powder has dried, the layers 1, 4 and 5 are pressed together between two flat metal plates at a temperature of, for example, 520 ° C., which allows the glass solder powder to sinter together. This creates the glass solder layers 2 and 3, which hold the metal layer 1 and the glass layers 4, 5 together.
  • glass solder powder e.g. Schott 8596
  • the metallic control electrode tracks are then applied to the carrier plate. This is expediently done galvanically by depositing metal layers over a photoresist mask onto a thin, previously vapor-deposited continuous contact layer.
  • control holes are etched free in several steps.
  • the control holes in the control electrode tracks 6, 7 have already been created by appropriate covering during galvanic deposition.
  • a second masking leaves only the control points to be etched into the glass layers 4 and 5.
  • the control holes are created through the glass layers 4.5 to the glass solder layers 2.3.
  • the glass solder layers 2, 3 are then etched with nitric acid solution, mixed with a little hydrofluoric acid, until the control holes expose the metal layer 1.
  • the further etching of the control holes through the metal layer 1 is carried out using an iron chloride solution, the glass solder layers 2, 3 serving as a mask for this etching.
  • This step etching causes relatively minor undercuts in the direction of the plate.
  • the previously etched layer serves as a mask for the subsequent etching.
  • control holes into the control plate by means of ion beam processes or laser beam processes.
  • the laser beam process in particular allows precise drilling.
  • the metallic middle layer 1 dissipates the heat generated during drilling, so that no local thermal stresses can arise in the glass layers 4, 5. There is no risk of cracking.

Landscapes

  • Gas-Filled Discharge Tubes (AREA)
  • Cathode-Ray Tubes And Fluorescent Screens For Display (AREA)
EP79103758A 1978-10-12 1979-10-02 Plaque de commande pour un écran plat à plasma de reproduction d'image Expired EP0010222B1 (fr)

Priority Applications (1)

Application Number Priority Date Filing Date Title
AT79103758T ATE101T1 (de) 1978-10-12 1979-10-02 Steuerplatte fuer einen flachen plasmabildschirm.

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE2844512A DE2844512C2 (de) 1978-10-12 1978-10-12 Steuerplatte zur Matrixansteuerung einzelner Bildpunkte nach Zeile und Spalte auf einem Bildschirm in flachen Plasmabildwiedergabevorrichtungen
DE2844512 1978-10-12

Publications (2)

Publication Number Publication Date
EP0010222A1 true EP0010222A1 (fr) 1980-04-30
EP0010222B1 EP0010222B1 (fr) 1981-07-01

Family

ID=6052037

Family Applications (1)

Application Number Title Priority Date Filing Date
EP79103758A Expired EP0010222B1 (fr) 1978-10-12 1979-10-02 Plaque de commande pour un écran plat à plasma de reproduction d'image

Country Status (5)

Country Link
US (1) US4329617A (fr)
EP (1) EP0010222B1 (fr)
JP (1) JPS5578440A (fr)
AT (1) ATE101T1 (fr)
DE (1) DE2844512C2 (fr)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0189858A3 (fr) * 1985-01-31 1986-10-29 Siemens Aktiengesellschaft Unité de commande et son procédé de fabrication, en particulier pour dispositifs d'affichage
EP0240769A3 (en) * 1986-03-25 1990-02-14 Nokia Unterhaltungselektronik (Deutschland) Gmbh Control plate for image reproduction devices

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2154053A (en) * 1984-02-08 1985-08-29 Philips Electronic Associated High resolution channel multiplier dynodes
US4504565A (en) * 1984-04-17 1985-03-12 Markem Corporation Radiation imageable compositions containing hollow ceramic microspheres
JPH0666130B2 (ja) * 1985-04-25 1994-08-24 富士通株式会社 ガス放電パネルの製造方法
US5721468A (en) * 1992-02-06 1998-02-24 U.S. Philips Corporation Flat-panel type picture display device with electron propagation ducts
US6956210B2 (en) * 2003-10-15 2005-10-18 Micron Tchnology, Inc. Methods for preparing samples for atom probe analysis

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1966500A1 (de) * 1968-10-02 1972-12-21 Burroughs Corp Mehrfarben-Anzeigevorrichtung mit mehreren Leuchtstoffarben
GB1389191A (en) * 1972-03-24 1975-04-03 Sperry Rand Corp Electrode structures
DE2601925A1 (de) * 1975-01-24 1976-07-29 Hitachi Ltd Gasentladungsanzeigeelement
DE2615721A1 (de) * 1976-04-09 1977-10-13 Siemens Ag Gasentladungsanzeigevorrichtung

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3755704A (en) * 1970-02-06 1973-08-28 Stanford Research Inst Field emission cathode structures and devices utilizing such structures
US3753022A (en) * 1971-04-26 1973-08-14 Us Army Miniature, directed, electron-beam source
US3744247A (en) * 1971-09-14 1973-07-10 Nasa Single grid accelerator for an ion thrustor
NL7600419A (nl) * 1976-01-16 1977-07-19 Philips Nv Kleurenbeeldbuis en werkwijze ter vervaardiging daarvan.
DE2750587A1 (de) * 1977-11-11 1979-05-17 Siemens Ag Gasentladungsanzeigevorrichtung mit abstandselementen
US4160191A (en) * 1977-12-27 1979-07-03 Hausfeld David A Self-sustaining plasma discharge display device

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1966500A1 (de) * 1968-10-02 1972-12-21 Burroughs Corp Mehrfarben-Anzeigevorrichtung mit mehreren Leuchtstoffarben
GB1389191A (en) * 1972-03-24 1975-04-03 Sperry Rand Corp Electrode structures
DE2601925A1 (de) * 1975-01-24 1976-07-29 Hitachi Ltd Gasentladungsanzeigeelement
DE2615721A1 (de) * 1976-04-09 1977-10-13 Siemens Ag Gasentladungsanzeigevorrichtung

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0189858A3 (fr) * 1985-01-31 1986-10-29 Siemens Aktiengesellschaft Unité de commande et son procédé de fabrication, en particulier pour dispositifs d'affichage
EP0240769A3 (en) * 1986-03-25 1990-02-14 Nokia Unterhaltungselektronik (Deutschland) Gmbh Control plate for image reproduction devices

Also Published As

Publication number Publication date
DE2844512C2 (de) 1980-11-20
US4329617A (en) 1982-05-11
EP0010222B1 (fr) 1981-07-01
DE2844512B1 (de) 1980-03-20
JPS5578440A (en) 1980-06-13
ATE101T1 (de) 1981-07-15

Similar Documents

Publication Publication Date Title
DE3604917C2 (fr)
DE3106368C2 (de) Gleichstrom-Gasentladungsanzeigevorrichtung
EP0048839A1 (fr) Ecran de visualisation plat, procédés pour sa fabrication et son utilisation
DE2539234A1 (de) Feldemissionsgeraet und verfahren zu seiner herstellung
DE2700424A1 (de) Farbbildroehre und verfahren zu deren herstellung
EP0010222B1 (fr) Plaque de commande pour un écran plat à plasma de reproduction d'image
DE3200670C2 (fr)
DE2855142A1 (de) Leuchtschirm fuer bildanzeigeroehren und verfahren zu seiner herstellung
EP0031921B1 (fr) Dispositif d'affichage à décharge à gaz comportant au moins un cadre d'écartement limitant l'espace de post-accélération
EP0662703B1 (fr) Emetteur d'électrons thermo-ionique réglable
EP0142765A2 (fr) Méthode pour la fabrication d'un dispositif d'affichage et dispositif d'affichage fabriqué selon cette méthode
DE2342923C2 (de) Verfahren zur Herstellung einer Zweiphasen-Ladungsverschlebeanordnung und nach diesem Verfahren hergestellte Zweiphasen-Ladungs Verschiebeanordnung
DE2421512A1 (de) Gasentladungs-anzeigetafel und verfahren zu ihrer herstellung
DE60034624T2 (de) Verfahren zur Herstellung einer Plasmaanzeigetafel
EP0154797A2 (fr) Procédé de fabrication de plaques multicanaux et leur utilisation
DE2420001A1 (de) Speichertarget fuer eine kathodenstrahlroehre und verfahren zu dessen herstellung
EP0204198B1 (fr) Structure de canaux d'un multiplicateur d'électrons
EP0240769A2 (fr) Plaque de commande pour des dispositifs de reproduction d'images
DE2633619C2 (de) Speicherplatte für eine Kathodenstrahlröhre und Verfahren zu deren Herstellung
DE3036591A1 (de) Gasentladungsbildwiedergabepaneel mit hohlen kathoden
DE2615681C2 (de) Anzeigevorrichtung mit einem Gasentladungsraum als Elektronenquelle, mit einem Elektronennachbeschleunigungsraum und mit einem Leuchtschirm
DE3534030A1 (de) Elektronensteuereinheit und verfahren zu deren herstellung, insbesondere fuer gasentladungsanzeigevorrichtungen
DE3328884C2 (fr)
DE2157766C3 (de) Gasentladungs-Anzeigevorrichtung
DE3545385A1 (de) Verfahren zur herstellung einer solarzellenanordnung

Legal Events

Date Code Title Description
PUAI Public reference made under article 153(3) epc to a published international application that has entered the european phase

Free format text: ORIGINAL CODE: 0009012

AK Designated contracting states

Designated state(s): AT CH FR GB IT NL SE

17P Request for examination filed
ITF It: translation for a ep patent filed
GRAA (expected) grant

Free format text: ORIGINAL CODE: 0009210

AK Designated contracting states

Designated state(s): AT CH FR GB IT NL SE

REF Corresponds to:

Ref document number: 101

Country of ref document: AT

Date of ref document: 19810715

Kind code of ref document: T

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: CH

Payment date: 19831219

Year of fee payment: 5

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: SE

Payment date: 19840930

Year of fee payment: 6

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: FR

Payment date: 19841022

Year of fee payment: 6

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: AT

Payment date: 19861003

Year of fee payment: 8

PGFP Annual fee paid to national office [announced via postgrant information from national office to epo]

Ref country code: NL

Payment date: 19861031

Year of fee payment: 8

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: AT

Effective date: 19871002

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: SE

Effective date: 19871003

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: CH

Effective date: 19871031

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: NL

Effective date: 19880501

NLV4 Nl: lapsed or anulled due to non-payment of the annual fee
GBPC Gb: european patent ceased through non-payment of renewal fee
PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: FR

Free format text: LAPSE BECAUSE OF NON-PAYMENT OF DUE FEES

Effective date: 19880630

REG Reference to a national code

Ref country code: CH

Ref legal event code: PL

REG Reference to a national code

Ref country code: FR

Ref legal event code: ST

PG25 Lapsed in a contracting state [announced via postgrant information from national office to epo]

Ref country code: GB

Effective date: 19881118

PLBE No opposition filed within time limit

Free format text: ORIGINAL CODE: 0009261

STAA Information on the status of an ep patent application or granted ep patent

Free format text: STATUS: NO OPPOSITION FILED WITHIN TIME LIMIT