EP0486943A1 - Dispositif pour l'excitation d'un champ à micro-ondes uniforme - Google Patents

Dispositif pour l'excitation d'un champ à micro-ondes uniforme Download PDF

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Publication number
EP0486943A1
EP0486943A1 EP91119433A EP91119433A EP0486943A1 EP 0486943 A1 EP0486943 A1 EP 0486943A1 EP 91119433 A EP91119433 A EP 91119433A EP 91119433 A EP91119433 A EP 91119433A EP 0486943 A1 EP0486943 A1 EP 0486943A1
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EP
European Patent Office
Prior art keywords
cavity resonator
microwave
coupling
cavity
resonator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP91119433A
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German (de)
English (en)
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EP0486943B1 (fr
Inventor
Michael Dr. Geisler
Michael Dipl.-Ing. Jung
Bernhard Dipl.-Ing. Kessler
Fritz Dipl.-Ing. Leuterer
Max Dipl.-Ing. Münich
Rolf Dipl.-Phys. Wilhelm
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Balzers und Leybold Deutschland Holding AG
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Leybold AG
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    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/3222—Antennas
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32192—Microwave generated discharge
    • H01J37/32211—Means for coupling power to the plasma
    • H01J37/32247—Resonators
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01P—WAVEGUIDES; RESONATORS, LINES, OR OTHER DEVICES OF THE WAVEGUIDE TYPE
    • H01P5/00—Coupling devices of the waveguide type
    • H01P5/08—Coupling devices of the waveguide type for linking dissimilar lines or devices

Definitions

  • the invention relates to a device according to the preamble of patent claim 1.
  • PCVD Plasma Enhanced Chemical Vapor Deposition
  • a microwave broad-beam ion source is already known, in which the microwaves are fed via an E01 round waveguide to an E010 cavity resonator, which is surrounded by a magnetic coil and is filled with gas to be ionized (DD-PS 248 904).
  • the bottom of the cavity resonator forms an emission electrode which, together with an extraction electrode, forms an extraction system to which a vacuum chamber connects.
  • a disadvantage of this ion source is that the microwave energy is radiated unevenly from the circular waveguide into the cavity resonator. Since the Round waveguide is smaller than the cavity resonator, the microwaves only radiate into a relatively small area.
  • cavity resonator antennas are already known which have round or rectangular openings in the resonator (Jacobsen, S. et al .: An Antenna Illuminated by a Cavity Resonator, In: Proc. Of the IEEE, November 1963, p. 1431 to 1435, DE-A-35 30 647) or slots (GB-A-654 224, US-A-2 996 715, DE-C-29 00 617, US-A-4 512 868, CH-PS'en 370 177, 368 248, 363 742, Patents Abstracts of Japan, E-570, January 7, 1988, Vol. 12 / No. 3, Publication No. 62-165 403) or quartz disks (EP-A-0 183 561 , EP-A-0 286 132).
  • quartz disks EP-A-0 183 561 , EP-A-0 286 132
  • a plasma etching device which has a microwave generator which is coupled to a rectangular waveguide (DE-C-27 16 592, FIG. 1).
  • a microwave generator which is coupled to a rectangular waveguide (DE-C-27 16 592, FIG. 1).
  • the end of an inner conductor of a coaxial waveguide protrudes into the waveguide.
  • the microwave of the waveguide also propagates in the coaxial waveguide via the antenna formed in this way.
  • an electric field of the microwaves propagates through an insulator and also a coupling device coupling between the microwaves and a plasma in a discharge current.
  • the waveguide that is connected to the microwave generator is not a cavity resonator.
  • the inner conductor is only provided and is looped directly through the partition between the waveguide and the discharge current
  • a device for generating microwave plasmas with great expansion and homogeneity which comprises a microwave generator, a cavity resonator, a coupling for the microwave generator to the cavity resonator, a wall-bound chamber, a partition between the cavity resonator and the chamber and one out has a plurality of coupling elements formed as solid bodies coupling element (DD-A-263 648).
  • the coupling elements are metallic coupling hooks which project via coupling holes from the waveguide leading to the microwave into another waveguide, to which a plasma chamber adjoins.
  • An essential component of this known microwave plasma supply is the line, which is closed off by an adapted absorber, which connects or couples the coupling elements arranged in a row on the vacuum or plasma side.
  • This coupling represents a disadvantage because the individual microwave antennas should be decoupled from one another as far as possible and should not be coupled to one another.
  • the plasma-side coupling of the antennas nullifies the decoupling that is achieved by feeding the antennas from a high-quality resonator. Areas of intense plasma form around the individual antennas, in which the electron density reaches its critical value of 0.75 x 10 ⁇ 12 cm ⁇ 3 for the excitation frequency. This means that a large part of the power fed into the vacuum-side antenna is completely reflected by the plasma.
  • the invention has for its object to provide a device with microwave couplers which allows microwaves to be radiated into a room over a large area as homogeneous fields, the microwave couplers being decoupled relative to one another in this room.
  • the advantage achieved with the invention is, in particular, that there is great regularity of the near field of the microwave feed antenna.
  • a particularly stable and uniform near-field distribution results for resonator lengths up to 1 m and longer and discharge pressures ⁇ 1 Pa.
  • this regularity leads to a uniform distribution of the plasma.
  • Plasma zone lengths that are greater than 1 m can be easily achieved with the invention.
  • glow discharges as are common in PCVD technology, microwave power densities on the order of 4 W / cm2 can be radiated.
  • the invention does not require a dielectric component that could be coated by the plasma or other sources housed in the recipient. With the invention it is also possible to feed several individual microwave sources in parallel.
  • a plasma-side decoupling of the antennas is achieved with the invention in that z. B. is given a bend towards the magnet system located in sufficient proximity, this magnet system preferably fulfilling the conditions of electron cyclotron resonance (ECR).
  • ECR electron cyclotron resonance
  • Magnet system and antennas are arranged so that the antennas are as direct as possible in the or Radiate plasma forming over the magnet system. Due to the ECR effect, a considerable part of the electromagnetic radiation is absorbed before it penetrates into the area of the neighboring antenna and thus causes a coupling of the neighboring antenna.
  • the 1 shows the principle of a coating system 1, which has an air-filled cavity resonator 2 for microwaves, a vacuum plasma chamber 3 with magnet yokes 4, 5 carrying permanent magnets and a rectangular waveguide 6 for feeding microwaves.
  • the rectangular waveguide 6 is connected to a further rectangular waveguide 7, which in turn is connected to a circulator 9 via an impedance transformer 8.
  • the circulator 9 has an adaptation resistor 10, shown here symbolically, which can be an adapted absorber and a power measurement, and is connected via a connector 11 to a microwave generator 12, for example a magnetron tube.
  • the operating frequency of the microwave generator 12 is, for. B. 2.45 GHz or 915 MHz.
  • a conveyor belt 13 is provided below the plasma chamber, on which a plurality of objects 14 to 20 to be coated are arranged.
  • Numerous shaft couplers 21 to 28 arranged linearly one behind the other are provided as elements essential to the invention. which can be seen through the broken area 40 of the resonator 2 and which protrude with an upper part in the rectangular waveguide 2 and with a lower part into the plasma chamber 3.
  • These wave couplers 21 to 28 couple microwave energy from the cavity 2 through a solid metal wall 29 into the plasma chamber 3.
  • the cavity resonator 2 is shown again in principle in FIG. 2a. While there is preferably air in this cavity resonator 2, a vacuum is present below the resonator 2, that is to say in the plasma chamber 4. The feeding of the microwave energy into the cavity 2 is indicated by an arrow 32.
  • the resonator consists z. B. from a 1 m long rectangular tube. At one end it can have a short-circuit plate (not shown) and at the other end a short-circuit slide (not shown).
  • the resonance frequency can be set with this slider.
  • the dimensions of the resonator 2 alone determine the field image for a given frequency and dielectric constant and thus the resulting resonance frequency.
  • the sinusoidal B and E fields are tapped capacitively or inductively at the positive and negative 0.707 values of the sine half-waves. Two taps therefore preferably take place per half-wave.
  • the positive half-wave is tapped differently than the negative half-wave in order to obtain a phase shift.
  • the inductive tap is provided in the positive half-wave, a first coupling web 21, 22, while a second coupling web 23, 24 is provided for the negative half-wave.
  • the positions of the coupling elements 21 to 28 coincide with the places where the amplitude of the electrical or magnetic alternating field is 0.7 times its maximum, so that all couplers 21 to 28 couple out the same field strength amplitude and power.
  • the couplers can also rotate the coupled field by a phase of any amount, so that they do not have to be arranged at ⁇ / 4 spacing.
  • the coupling damping does not have to be the same either.
  • the couplers are arranged such that the centers between any two couplers of the same type have the same longitudinal coordinate as the extremes of the standing wave within the resonator 2.
  • the couplers 21 to 28 introduce the microwave energy from the cavity resonator 2, in which air is located, into the plasma or vacuum chamber 3. With inductive coupling, they can therefore be regarded as a type of transformer.
  • a plane wave is then created by the suitable superposition of the waves of numerous point-shaped wave generators. While a single point wave generator generates a spherical wave, the superposition of numerous spherical waves results in a plane wave if the distance between the wave generators is much smaller than ⁇ / 2.
  • Such a flat wave is shaped by the various couplers 21 to 28, which are to be regarded as point sources, on the plasma chamber 3, so that a regular and uniform useful field results.
  • the outcouplers 21 to 28 act in their entirety like an antenna which emits a plane wave.
  • the spatial structure of the antenna shows a certain relationship to the phased array antennas, as they are known from radar technology (see E. Pehl: Microwave Technology, Volume 2, Antennas and Active Components, 2nd Edition, 1989, p. 79 ff.).
  • the winding sense of a coupling loop can be changed. Since the magnetic field lines in the waveguide have a different direction in each case with a different phase, the induced current flows in a different direction in a loop. If the loops are led out of the waveguide differently depending on the respective half-wave, the currents all flow in the same direction.
  • FIG. 3 shows a section through a cavity resonator 2 and a plasma chamber 3.
  • a plasma space 41 can be seen here, into which microwave energy is fed in via the waveguide 6 from a microwave source (not shown).
  • the standing wave formed in the interior 40 of the cavity resonator 2 is coupled into the interior 41 of the plasma chamber 3 via the couplers 21 to 28, of which only one coupler 25 can be seen in FIG. 3.
  • a gas or gas mixture which is to be ionized also arrives in this interior 41 via tubes 42, 43. The ionization is caused not only by the microwaves entering, but also by the Magnetic fields generated by the magnet systems 4, 5 with the permanent magnets 60, 61.
  • the interaction of the microwave with the appropriately dimensioned magnetic fields creates an electron cyclotron resonance, which increases the ionization.
  • the plasma chamber 3, the magnet systems 4, 5 and also the resonator 2 are heated during operation so that they have to be cooled.
  • water cooling is provided, the cooling tubes 44 to 46 of which lead to cooling rings 48 to 51.
  • a flange 47 is provided on the plasma chamber 2, which carries tube guides 52, 54 or seals 53.
  • a coupling loop (not shown in FIG. 3) is provided from the rectangular waveguide 6 to the cavity resonator 2.
  • a device for decoupling large microwave power from a first room into a second room is shown, in which an optically transparent medium between the two rooms is not required and in which overheating and disadvantageous coating of the decoupling device is avoided.
  • the advantage achieved with this device is, in particular, that the decoupler and / or the partition between the two rooms have only very little self-heating. In addition, contamination of the coupler in the plasma space and ignition of a discharge in the vacuum bushing between the primary and secondary parts of the coupler are prevented.
  • FIG. 4 shows a coupling element 101 according to the invention which has a primary antenna 102 and a secondary antenna 103. Between the two antennas there is a socket 104 which has an upper part 105 with a large outer diameter and a lower part 106 with a small outer diameter. The upper bush 105 is closed by a screw 107, the external thread of which engages in an internal thread of the part 105 of the bush 104.
  • the primary antenna 102 and the secondary antenna 103 are in the form of an open loop, one end 108, 109 of the loops each being connected to the socket 104.
  • the other end of the loop of the primary antenna 102 is connected to one end of a center electrode 111 via a screw 110, while the other end of this center electrode 111 is connected to a darkroom cap 112 to which the other end 113 of the secondary antenna 103 is connected.
  • the connection between the darkroom cap 112, the secondary antenna 103 and the center electrode 111 takes place via a screw 114.
  • the coupling element 101 shown in FIG. 4 can be inserted individually or together with several coupling elements of the same type in a partition between a plasma space and a microwave space.
  • FIG. 5 shows the coupling element 101 according to FIG. 4 again in section, this coupling element 101 being inserted into a partition 120.
  • partition 120 i.e. H. in room 121 is z. B. air, while in the room 122 below the partition 120 plasma is present.
  • the z. B. is a cavity resonator, a microwave propagates, preferably as a standing wave. Microwave energy is decoupled from this standing wave by the primary antenna 102 and coupled into the plasma of the room 122 by the secondary antenna 103.
  • Both antennas 102, 103 are connected to one another via a center electrode 111, which has the shape of a pin, which has a collar 124 approximately in its central region.
  • a ceramic disk 125, 126 is arranged above and below this collar 124, the lower ceramic disk 126 being supported by a seal 127 on the bottom 128 of the socket 104, which has an opening 129
  • a press-in disk 130 is provided, above which there is a locking screw 107, which engages with its external thread in the internal thread of the upper part 105 of the bushing 104.
  • the upper part 105 of the socket is seated on a projection 132 of a through hole 133 in the partition 120, via an elastomer seal 134.
  • the seal between the atmosphere in the space 121 and the vacuum in the space 122 is essentially provided by the elements 124, 126, 127 and 128 causes.
  • the ceramic disc 125 is used for power transmission and insulation between the center electrode 111 and the press washer 130.
  • the press washer 130 which is made of soft metal, for. B.
  • the pressing force which acts on the press-in disk 130, is pressed on with the locking screw 107.
  • the press-in disk 130 whose outer diameter has an oversize compared to the bore 135 in the bush 104, is first pressed in by means of a device. If the screw plug 107 is turned further, the combination of metal seal 130, lower ceramic disk 126, collar 124 of the center electrode 111, upper ceramic disk 125 and press-in disk 130 is tensioned. With a further increase in the tightening torque of the locking screw 107, the deformation on the sealing edge 136 of the collar 124 begins at the center electrode 111. If the tension is further increased, the metal sealing ring 127 also deforms.
  • the surface load in the package comprising the metal seal 127, the lower ceramic disk 126, the center electrode 111, the upper ceramic disk 125 and the press-in disk 130 is designed such that the metal surfaces are deformed in the order described only on the sealing surfaces takes place.
  • ceramic disks 125, 126 preferably those made of Al2O3 are used which have a thermal conductivity ⁇ which is about ten times less than the thermal conductivity ⁇ of the center electrode 111.
  • a correspondingly large area on the ceramic disk 125, 126 must be used for heat transfer. This area is made available by the collar 124 of the center electrode 111, since the top and bottom of the collar 124 are in good, two-dimensional contact with the ceramic disks 125, 126.
  • the heat dissipation above or below the ceramic disks 125, 126 is carried out on the one hand by the press-in disk 130 and on the other hand by the metal seal 127.
  • the compensation of the slightly different thermal expansion properties of the materials of the sealing electrode 111 and the sealing rings 130, 125, 126, 127 on the one hand and the material of the bush 104 on the other hand is achieved by the ratio between the thickness of the collar 124 of the center electrode 111 and the thickness of the ceramic disks 125, 126 set. Any displacement of the sealing surfaces relative to one another due to different thermal expansion of the ceramic-metal connection is prevented by a pronounced toothing with high pressing forces acting on these surfaces.
  • the press disk 130 can also be used as a spring element, e.g. B. made of copper beryllium, to secure the clamping forces even after considerable thermal overloads of the coupler 101.
  • the outer diameter of the press washer 130 increases due to the pressing process. As a result, a safe and microwave-usable contact is established between the outer edge of the press-in disk 130 and the inner wall of the socket 104.
  • the press-in disk 130 therefore behaves like the bottom of the socket 104 in terms of microwave technology.
  • the elastomer seal 134 which is created by the sealing of the coupling element 101 to the partition 120, is formed by a metallic cassette, formed from a sealing groove on the socket 105 and a sealing surface 132 on the partition 120, shielded from microwave fields and thereby protected from destruction. At the same time, this metallic contact of the socket 105, which is pressed by screws, serves for the transfer of heat.
  • the inside and outside diameters of the coaxial passage through the partition 120 can be changed within wide limits.
  • the diameter of the center electrode 111, its collar 124, the diameter of the ceramic disks 125, 126, the bores in the locking screw 107 or in the bottom of the socket 104 can be selected so that a wave resistance can be assigned to the coaxial feedthrough.
  • the electrical length of the coaxial feedthrough is preferably ⁇ / 2.
  • the darkroom cap 112 is made of metallic material and is designed in such a way that it prevents charge carriers from the plasma from penetrating into the insulation gap of the coaxial feedthrough. This prevents the maintenance of a dependent discharge in the isolation gap. Furthermore, the gaps between the coupling element 101 and the dividing wall 120 are dimensioned in such a way that the dark space distance is maintained so that an independent discharge cannot exist within a wide pressure range.
  • the darkroom cap 112 also permanently prevents coating or contamination of the coupling element 101. Upper part 105 and lower part 106 of the coupling element 101 can be cleaned by mechanical cleaning methods, eg. B. by brushing, glass bead blasting etc., clean easily.
  • the pot or bell shape of the darkroom cap 112 has also proven itself in microwave technology.
  • Both the primary antenna 102 and the secondary antenna 103 can be designed as an H-loop with l / ⁇ «1, where l is the developed length of the antenna loop, as a ring antenna or folding dipole antenna with l / ⁇ ⁇ > 1 or as capacitive coupling pins will.
  • the antennas 102, 103 are preferably designed as ring antennas. Both the rising and the descending antenna part should not have any major curvatures and should run as parallel as possible in some areas.
  • the base points of the antennas 102, 103 can be screwed on, soldered, welded or clamped. Radii and lengths, d. H. the geometry of the antennas 102, 103 are selected such that the voltages on the antennas or on the center electrode 111 are low in the area of the dark room cap 112 and largely also in the subsequent part of the coupling element 101.
  • the coupling attenuation between the waveguide resonator symbolized by the space 121 and a PCVD reactor symbolized by the space 122 can be set by the size of the primary antenna 102 or also by its orientation relative to the axis of the waveguide resonator.
  • FIG. 6 shows a partial section through a cavity resonator 2, which can be compared with the view in FIG. 3 if it is rotated through 180 °.
  • the cavity resonator 2 which is made of a metallic material, has two halves 200, 201, which can be connected to one another via connecting elements 202.
  • Several coupling loops are introduced in the upper half, of which only one coupling loop 203 can be seen in FIG. 6. These coupling loops are arranged one behind the other in the drawing plane.
  • a single coupling loop has the appearance of a coupling loop 25 according to FIG. 3, but the two webs of the loop are arranged perpendicular to the plane of the drawing.
  • the lower half 200 of the cavity resonator 2 has coupling loops similar to the upper half 201, of which only the coupling loop 204 is visible in FIG. 6. These coupling loops couple electromagnetic energy from the rectangular waveguide 6 consisting of metallic material, to which a microwave transmitter (not shown) is connected, into the cavity resonator 2.
  • the coupling loops 204 are carried out by electrically non-conductive seals 205, 206.
  • the upper half 201 of the cavity resonator 2 and the flange 47 of the plasma chamber 3 are connected to one another via connecting elements 207.
  • a soft iron yoke 5 with this flange 47 via connecting elements, for. B. screws 209 connected.
  • This soft iron yoke 5 has an outer leg 208 and an inner leg 210, the outer leg 208 being larger than the inner leg 210 and wherein both legs 208, 210 have a surface 211, 212 with a 45 ° inclination, which are aligned with one another.
  • the surface 211 of the larger leg 208 carries a south pole 213 of a permanent magnet, while the surface of the smaller leg 210 carries the associated north pole 214.
  • the magnetic field lines between the north pole 214 and the south pole 213 are indicated by 215.
  • a rectangular cooling tube 216 is integrated in the outer leg 208.
  • a vacuum seal 217 is provided on the underside of the smaller leg 210.
  • a claw 218 on which a glass or ceramic disc 219 rests is provided between the lower region of the smaller leg 210 on the one hand and the upper side of the upper half 201 of the cavity resonator 2 on the other hand.
  • a graphite foil 220 is located between this disc 219 and the claw 218.
  • a further graphite foil 221 is provided between the top edge of the disc 219 and a bottom edge of the smaller leg 210.
  • This film 221 is followed by a vacuum seal 222 in the direction of the plasma chamber 3.
  • B. can consist of metal, Calriz or Viton.
  • a space 223 is formed by the disk 219 and the upper side of the cavity resonator 2, into which microwave energy reaches via the couplers 203, which are guided through electrically non-conductive materials 224 in the cavity resonator 2.
  • the plasma-side couplers 203 lie behind the quartz or ceramic disk 219 and can therefore be operated independently of influences from the plasma chamber 3.
  • the arrangement according to FIG. 6 has the advantage that the antennas can be better oriented towards the resonance region of the magnetic field, the direction of propagation of the energy transport and the B field direction, ie. H. the direction of the magnetic field of the permanent magnet.
  • FIG. 7 shows a further variant of the invention, in which a plurality of loop-shaped couplers 230 are arranged one behind the other in the cavity resonator 2 and protrude into the plasma space 3 through electrically non-conductive bushings 231.
  • a quartz or ceramic dome 232 is placed over each coupler 230. These domes 232 are located between a south pole 233 and a north pole 234 of a permanent magnet, which is connected to a soft iron yoke 235, which rests on the top of the cavity resonator 2.
  • the magnetic field lines that run between the north and south poles are labeled 236.
  • the soft iron yoke 235 extends over the entire surface of the cavity resonator 2 and carries at its ends the boiler walls 237, 238 of the plasma chamber 3, which are only indicated in FIG. 7. Between the boiler walls 237, 238 and the soft iron yoke 235 there is a mechanical connection, e.g. B. via screws 239, 240. In addition, seals 241, 242 are provided between the yoke 235 and the non-magnetic boiler walls 237, 238.
  • seals 243, 244 are located in the central part of the upper side of the cavity resonator 2 and the lower side of the yoke 235 and between the upper side of the yoke 235 and lateral flanges 245, 246 at the lower end of a dome 232. These latter seals are designated by 247 and 248 . Between the part 249 of a coupler 230 projecting into the dome 232 and the seals 247, 248, a graphite disc 250, 251 is also provided on the underside of the dome 232.
  • the flanges 245, 246 are held by non-magnetic claws 252, 253, which are connected to the soft iron yoke 235 by screws 254, 255.
  • these couplers 230 are located between the permanent magnet poles 233, 234 of the same name.
  • each linear acceleration path of an electron is supplied by a waveguide resonator. It is also possible to supply both poles of the permanent magnets from a ring resonator.

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  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Plasma Technology (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Control Of Motors That Do Not Use Commutators (AREA)
  • Electron Sources, Ion Sources (AREA)
EP91119433A 1990-11-22 1991-11-14 Dispositif pour l'excitation d'un champ à micro-ondes uniforme Expired - Lifetime EP0486943B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE4037091A DE4037091C2 (de) 1990-11-22 1990-11-22 Vorrichtung für die Erzeugung eines homogenen Mikrowellenfeldes
DE4037091 1990-11-22

Publications (2)

Publication Number Publication Date
EP0486943A1 true EP0486943A1 (fr) 1992-05-27
EP0486943B1 EP0486943B1 (fr) 1995-02-15

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EP91119433A Expired - Lifetime EP0486943B1 (fr) 1990-11-22 1991-11-14 Dispositif pour l'excitation d'un champ à micro-ondes uniforme

Country Status (5)

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US (1) US5173640A (fr)
EP (1) EP0486943B1 (fr)
JP (1) JPH0563413A (fr)
DE (2) DE4037091C2 (fr)
ES (1) ES2070395T3 (fr)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE4239843A1 (de) * 1992-11-27 1994-06-01 Leybold Ag Vorrichtung für die Erzeugung von Plasma, insbesondere zum Beschichten von Substraten
FR2722213A1 (fr) * 1994-07-05 1996-01-12 Plasmion Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions
FR2746249A1 (fr) * 1996-03-13 1997-09-19 Mpa Ind Dispositif d'excitation d'un plasma par energie micro-ondes repartie, procede de fabrication, et application au depot de revetements minces
DE19812558A1 (de) * 1998-03-21 1999-09-30 Roth & Rau Oberflaechentechnik Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen
EP1984975A4 (fr) * 2006-01-31 2010-10-13 Univ Dublin City Procédé et appareil permettant de produire un plasma

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5283538A (en) * 1990-11-22 1994-02-01 Leybold Aktiengesellschaft Apparatus for coupling microwave power out of a first space into a second space
DE4119362A1 (de) * 1991-06-12 1992-12-17 Leybold Ag Teilchenquelle, insbesondere fuer reaktive ionenaetz- und plasmaunterstuetzte cvd-verfahren
DE19700141A1 (de) * 1997-01-04 1998-07-09 Gero Hochtemperaturoefen Gmbh Brennofen für die Hochtemperaturbehandlung von Materialien mit niedrigem dielektrischem Verlustfaktor
US5998774A (en) * 1997-03-07 1999-12-07 Industrial Microwave Systems, Inc. Electromagnetic exposure chamber for improved heating
US6153977A (en) * 1999-04-06 2000-11-28 Tokyo Seihinkaihatsu Kenkyusho ECR type plasma generating apparatus
US6265702B1 (en) 1999-04-28 2001-07-24 Industrial Microwave Systems, Inc. Electromagnetic exposure chamber with a focal region
KR19990068381A (ko) * 1999-05-11 1999-09-06 허방욱 마이크로웨이브플라즈마버너
DE19925493C1 (de) 1999-06-04 2001-01-18 Fraunhofer Ges Forschung Linear ausgedehnte Anordnung zur großflächigen Mikrowellenbehandlung und zur großflächigen Plasmaerzeugung
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WO1996001490A1 (fr) * 1994-07-05 1996-01-18 Plasmion Dispositif pour creer un faisceau d'ions d'energie ajustable notamment pour le traitement au defile et sous vide de surfaces de grandes dimensions
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FR2746249A1 (fr) * 1996-03-13 1997-09-19 Mpa Ind Dispositif d'excitation d'un plasma par energie micro-ondes repartie, procede de fabrication, et application au depot de revetements minces
DE19812558A1 (de) * 1998-03-21 1999-09-30 Roth & Rau Oberflaechentechnik Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen
DE19812558B4 (de) * 1998-03-21 2010-09-23 Roth & Rau Ag Vorrichtung zur Erzeugung linear ausgedehnter ECR-Plasmen
EP1984975A4 (fr) * 2006-01-31 2010-10-13 Univ Dublin City Procédé et appareil permettant de produire un plasma

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US5173640A (en) 1992-12-22
EP0486943B1 (fr) 1995-02-15
JPH0563413A (ja) 1993-03-12
DE4037091A1 (de) 1992-05-27
ES2070395T3 (es) 1995-06-01
DE4037091C2 (de) 1996-06-20
DE59104602D1 (de) 1995-03-23

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