EP0924487A3 - Séchage à vide de matériau semi-conducteur - Google Patents

Séchage à vide de matériau semi-conducteur Download PDF

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Publication number
EP0924487A3
EP0924487A3 EP98124206A EP98124206A EP0924487A3 EP 0924487 A3 EP0924487 A3 EP 0924487A3 EP 98124206 A EP98124206 A EP 98124206A EP 98124206 A EP98124206 A EP 98124206A EP 0924487 A3 EP0924487 A3 EP 0924487A3
Authority
EP
European Patent Office
Prior art keywords
semiconductor material
vacuum drying
vacuum
prevail
drying
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP98124206A
Other languages
German (de)
English (en)
Other versions
EP0924487A2 (fr
EP0924487B1 (fr
Inventor
Wilhelm Schmidbauer
Hanns Dr. Wochner
Werner Ott
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Wacker Chemie AG
Original Assignee
Wacker Chemie AG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Wacker Chemie AG filed Critical Wacker Chemie AG
Publication of EP0924487A2 publication Critical patent/EP0924487A2/fr
Publication of EP0924487A3 publication Critical patent/EP0924487A3/fr
Application granted granted Critical
Publication of EP0924487B1 publication Critical patent/EP0924487B1/fr
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • F—MECHANICAL ENGINEERING; LIGHTING; HEATING; WEAPONS; BLASTING
    • F26—DRYING
    • F26B—DRYING SOLID MATERIALS OR OBJECTS BY REMOVING LIQUID THEREFROM
    • F26B5/00—Drying solid materials or objects by processes not involving the application of heat
    • F26B5/04—Drying solid materials or objects by processes not involving the application of heat by evaporation or sublimation of moisture under reduced pressure, e.g. in a vacuum

Landscapes

  • Engineering & Computer Science (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Molecular Biology (AREA)
  • Mechanical Engineering (AREA)
  • General Engineering & Computer Science (AREA)
  • Drying Of Solid Materials (AREA)
  • Cleaning Or Drying Semiconductors (AREA)
EP98124206A 1997-12-19 1998-12-17 Séchage à vide de matériau semi-conducteur Expired - Lifetime EP0924487B1 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE19756830A DE19756830A1 (de) 1997-12-19 1997-12-19 Vakuumtechnisches Trocknen von Halbleiterbruch
DE19756830 1997-12-19

Publications (3)

Publication Number Publication Date
EP0924487A2 EP0924487A2 (fr) 1999-06-23
EP0924487A3 true EP0924487A3 (fr) 1999-07-07
EP0924487B1 EP0924487B1 (fr) 2001-02-14

Family

ID=7852715

Family Applications (1)

Application Number Title Priority Date Filing Date
EP98124206A Expired - Lifetime EP0924487B1 (fr) 1997-12-19 1998-12-17 Séchage à vide de matériau semi-conducteur

Country Status (4)

Country Link
US (1) US6170171B1 (fr)
EP (1) EP0924487B1 (fr)
JP (1) JPH11265875A (fr)
DE (2) DE19756830A1 (fr)

Families Citing this family (18)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7270706B2 (en) * 2004-10-04 2007-09-18 Dow Corning Corporation Roll crusher to produce high purity polycrystalline silicon chips
FR2920046A1 (fr) * 2007-08-13 2009-02-20 Alcatel Lucent Sas Procede de post-traitement d'un support de transport pour le convoyage et le stockage atmospherique de substrats semi-conducteurs, et station de post-traitement pour la mise en oeuvre d'un tel procede
CN101561218B (zh) * 2008-04-16 2010-12-08 富葵精密组件(深圳)有限公司 真空氮气烘箱
US8756826B2 (en) * 2010-11-30 2014-06-24 Mei, Llc Liquid coalescence and vacuum dryer system and method
DE102011004916B4 (de) 2011-03-01 2013-11-28 Wacker Chemie Ag Vorrichtung und Verfahren zum Trocknen von Polysilicium
US10690413B2 (en) 2012-02-01 2020-06-23 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US11713924B2 (en) 2012-02-01 2023-08-01 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US12276454B2 (en) 2020-04-21 2025-04-15 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US12281847B2 (en) 2020-04-21 2025-04-22 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US9970708B2 (en) 2012-02-01 2018-05-15 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US12215925B2 (en) 2020-04-21 2025-02-04 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US10240867B2 (en) 2012-02-01 2019-03-26 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US10876792B2 (en) 2012-02-01 2020-12-29 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
DE102012218748B4 (de) 2012-10-15 2014-02-13 Wacker Chemie Ag Trocknen von Polysilicium
US10088230B2 (en) 2012-11-08 2018-10-02 Tekdry International, Inc. Dryer for portable electronics
WO2014153007A1 (fr) 2013-03-14 2014-09-25 Revive Electronics, LLC Procédés et appareils pour des dispositifs électroniques de séchage
US12584689B2 (en) 2020-04-21 2026-03-24 Revive Electronics, LLC Methods and apparatuses for drying electronic devices
US12510296B2 (en) 2020-04-21 2025-12-30 Revive Electronics, LLC Methods and apparatuses for drying electronic devices

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302521A (ja) * 1987-06-02 1988-12-09 Mitsubishi Electric Corp 半導体基板の乾燥装置
EP0421902A1 (fr) * 1989-10-06 1991-04-10 Ultrasons Annemasse Procédé de séchage sous vide de pièces diverses et dispositif de mise en oeuvre du procédé
EP0423377A1 (fr) * 1989-09-15 1991-04-24 International Business Machines Corporation Procédé et dispositif pour le séchage d'objets
EP0539607A1 (fr) * 1991-05-24 1993-05-05 Nikku Industry Co., Ltd. Appareil de sechage sous vide
US5263264A (en) * 1990-01-25 1993-11-23 Speedfam Clean System Company Limited Method and apparatus for drying wet work
US5732478A (en) * 1996-05-10 1998-03-31 Altos Engineering, Inc. Forced air vacuum drying

Family Cites Families (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4816081A (en) * 1987-02-17 1989-03-28 Fsi Corporation Apparatus and process for static drying of substrates
JPH0422125A (ja) * 1990-05-17 1992-01-27 Fujitsu Ltd 半導体ウエハの湿式処理方法
JP2644912B2 (ja) * 1990-08-29 1997-08-25 株式会社日立製作所 真空処理装置及びその運転方法
US5331487A (en) * 1992-01-16 1994-07-19 International Business Machines Corporation Direct access storage device with vapor phase lubricant system and a magnetic disk having a protective layer and immobile physically bonded lubricant layer
US5301701A (en) * 1992-07-30 1994-04-12 Nafziger Charles P Single-chamber cleaning, rinsing and drying apparatus and method therefor
DE69420474T2 (de) * 1993-06-30 2000-05-18 Applied Materials Inc Verfahren zum Spülen und Auspumpen einer Vakuumkammer bis Ultra-Hoch-Vakuum
US5791895A (en) * 1994-02-17 1998-08-11 Novellus Systems, Inc. Apparatus for thermal treatment of thin film wafer
US5551165A (en) * 1995-04-13 1996-09-03 Texas Instruments Incorporated Enhanced cleansing process for wafer handling implements

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS63302521A (ja) * 1987-06-02 1988-12-09 Mitsubishi Electric Corp 半導体基板の乾燥装置
EP0423377A1 (fr) * 1989-09-15 1991-04-24 International Business Machines Corporation Procédé et dispositif pour le séchage d'objets
EP0421902A1 (fr) * 1989-10-06 1991-04-10 Ultrasons Annemasse Procédé de séchage sous vide de pièces diverses et dispositif de mise en oeuvre du procédé
US5263264A (en) * 1990-01-25 1993-11-23 Speedfam Clean System Company Limited Method and apparatus for drying wet work
EP0539607A1 (fr) * 1991-05-24 1993-05-05 Nikku Industry Co., Ltd. Appareil de sechage sous vide
US5732478A (en) * 1996-05-10 1998-03-31 Altos Engineering, Inc. Forced air vacuum drying

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
PATENT ABSTRACTS OF JAPAN vol. 013, no. 139 (E - 738) 6 April 1989 (1989-04-06) *

Also Published As

Publication number Publication date
EP0924487A2 (fr) 1999-06-23
DE59800476D1 (de) 2001-03-22
JPH11265875A (ja) 1999-09-28
DE19756830A1 (de) 1999-07-01
EP0924487B1 (fr) 2001-02-14
US6170171B1 (en) 2001-01-09

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