EP1235091A3 - Optisches Projektionssystem und hiermit versehener Belichtungsapparat - Google Patents

Optisches Projektionssystem und hiermit versehener Belichtungsapparat Download PDF

Info

Publication number: EP1235091A3
Authority: EP; European Patent Office
Prior art keywords: lens; optical system; projection optical; lens group; fluorite
Prior art date: 2001-02-21
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Withdrawn

Application number

EP02003254A

Other languages

English (en)

French (fr)

Other versions

EP1235091A2 (de

Inventor

Takeshi c/o Nikon Corporation Suzuki

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Nikon Corp

Original Assignee

Nikon Corp

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

2001-02-21

Filing date

2002-02-21

Publication date

2004-01-28

2002-02-21 Application filed by Nikon Corp filed Critical Nikon Corp

2002-08-28 Publication of EP1235091A2 publication Critical patent/EP1235091A2/de

2004-01-28 Publication of EP1235091A3 publication Critical patent/EP1235091A3/de

Status Withdrawn legal-status Critical Current

Links

Classifications

- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
- H10P76/00—Manufacture or treatment of masks on semiconductor bodies, e.g. by lithography or photolithography
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/14—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation
- G02B13/143—Optical objectives specially designed for the purposes specified below for use with infrared or ultraviolet radiation for use with ultraviolet radiation
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

Physics & Mathematics (AREA)
General Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Toxicology (AREA)
Optics & Photonics (AREA)
Engineering & Computer Science (AREA)
Environmental & Geological Engineering (AREA)
Epidemiology (AREA)
Public Health (AREA)
Lenses (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)

EP02003254A 2001-02-21 2002-02-21 Optisches Projektionssystem und hiermit versehener Belichtungsapparat Withdrawn EP1235091A3 (de)

Applications Claiming Priority (2)

Application Number	Priority Date	Filing Date	Title
JP2001044760A JP2002244034A (ja)	2001-02-21	2001-02-21	投影光学系および該投影光学系を備えた露光装置
JP2001044760		2001-02-21

Publications (2)

Publication Number	Publication Date
EP1235091A2 EP1235091A2 (de)	2002-08-28
EP1235091A3 true EP1235091A3 (de)	2004-01-28

Family

ID=18906691

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
EP02003254A Withdrawn EP1235091A3 (de)	2001-02-21	2002-02-21	Optisches Projektionssystem und hiermit versehener Belichtungsapparat

Country Status (6)

Country	Link
US (1)	US6862078B2 (de)
EP (1)	EP1235091A3 (de)
JP (1)	JP2002244034A (de)
KR (1)	KR20020068467A (de)
CN (1)	CN1374560A (de)
TW (1)	TW518665B (de)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7869122B2 (en)	2004-01-14	2011-01-11	Carl Zeiss Smt Ag	Catadioptric projection objective
US8199400B2 (en)	2004-01-14	2012-06-12	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8913316B2 (en)	2004-05-17	2014-12-16	Carl Zeiss Smt Gmbh	Catadioptric projection objective with intermediate images

Families Citing this family (9)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE10064685A1 (de) *	2000-12-22	2002-07-04	Zeiss Carl	Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
JP2004086128A (ja) *	2002-07-04	2004-03-18	Nikon Corp	投影光学系、露光装置、およびデバイス製造方法
US6992753B2 (en)	2003-12-24	2006-01-31	Carl Zeiss Smt Ag	Projection optical system
US7706074B2 (en) *	2004-09-13	2010-04-27	Nikon Corporation	Projection optical system, method of manufacturing projection optical system, exposure apparatus, and exposure method
TWI428700B (zh) *	2005-01-14	2014-03-01	尼康股份有限公司	曝光方法、電子元件製造方法、曝光裝置及照明光學裝置
JP4315450B2 (ja) *	2005-03-11	2009-08-19	ソニー株式会社	ズームレンズ系及び撮像装置
JP2009536370A (ja) *	2006-05-05	2009-10-08	コーニングインコーポレイテッド	擬テレセントリック結像レンズの歪調整
KR100972314B1 (ko) *	2007-12-27	2010-07-26	(주)월드이엔지	모니터 부착용 메모 장치
CN104062761B (zh) *	2014-07-17	2016-06-22	张家港中贺自动化科技有限公司	一种宽谱线投影光学系统和光刻设备

Citations (4)

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EP0875778A1 (de) *	1997-03-18	1998-11-04	Nikon Corporation	Bildfocussierendes optisches System für ultraviolet Laser
EP1001314A2 (de) *	1998-11-10	2000-05-17	Nikon Corporation	Dauerhaftes optisches System für einen Projektionsbelichtingsapparat und Verfahren zu dessen Herstellung
EP1006388A2 (de) *	1998-11-30	2000-06-07	Carl Zeiss	Reduktions-Projektionsobjektiv der Mikrolithographie

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JPH1079345A (ja)	1996-09-04	1998-03-24	Nikon Corp	投影光学系及び露光装置
US5852490A (en)	1996-09-30	1998-12-22	Nikon Corporation	Projection exposure method and apparatus
JPH10197791A (ja)	1997-01-13	1998-07-31	Canon Inc	投影レンズ
JP3823436B2 (ja)	1997-04-03	2006-09-20	株式会社ニコン	投影光学系
JPH116957A (ja)	1997-04-25	1999-01-12	Nikon Corp	投影光学系および投影露光装置並びに投影露光方法
JPH10325922A (ja)	1997-05-26	1998-12-08	Nikon Corp	投影光学系
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US5990926A (en)	1997-07-16	1999-11-23	Nikon Corporation	Projection lens systems for excimer laser exposure lithography
JP3925576B2 (ja)	1997-07-24	2007-06-06	株式会社ニコン	投影光学系、該光学系を備えた露光装置、及び該装置を用いたデバイスの製造方法
JPH11133301A (ja)	1997-08-29	1999-05-21	Nikon Corp	投影光学系、露光装置及び半導体デバイスの製造方法
US5856884A (en)	1997-09-05	1999-01-05	Nikon Corporation	Projection lens systems
JPH1195095A (ja)	1997-09-22	1999-04-09	Nikon Corp	投影光学系
KR20010031779A (ko)	1997-11-07	2001-04-16	오노 시게오	투영 노광 장치, 투영 노광 방법 및 그 장치의 제조 방법
JPH11214293A (ja)	1998-01-22	1999-08-06	Nikon Corp	投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
JP3278407B2 (ja)	1998-02-12	2002-04-30	キヤノン株式会社	投影露光装置及びデバイス製造方法
JPH11297612A (ja)	1998-04-07	1999-10-29	Nikon Corp	投影光学系および投影露光装置
JPH11352398A (ja)	1998-06-10	1999-12-24	Nikon Corp	両側テレセントリック光学系
US6198576B1 (en)	1998-07-16	2001-03-06	Nikon Corporation	Projection optical system and exposure apparatus
DE69933973T2 (de) *	1998-07-29	2007-06-28	Carl Zeiss Smt Ag	Katadioptrisches optisches system und damit ausgestattete belichtungsvorrichtung
JP2000056218A (ja)	1998-08-10	2000-02-25	Nikon Corp	投影光学系およびそれを備えた露光装置ならびに半導体デバイス製造方法
JP2000056219A (ja)	1998-08-11	2000-02-25	Nikon Corp	投影光学系
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DE19855108A1 (de)	1998-11-30	2000-05-31	Zeiss Carl Fa	Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
JP2002531878A (ja)	1998-11-30	2002-09-24	カール−ツアイス−スチフツング	最少絞り収差を有する大開口数の投影レンズ
KR20000034967A (ko)	1998-11-30	2000-06-26	헨켈 카르스텐	수정-렌즈를 갖는 오브젝티브 및 투사 조명 장치
DE19942281A1 (de)	1999-05-14	2000-11-16	Zeiss Carl Fa	Projektionsobjektiv
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JP2000249917A (ja)	1998-12-28	2000-09-14	Nikon Corp	投影光学系、投影光学系の製造方法、照明光学系の製造方法、及び露光装置の製造方法
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JP2001051193A (en)	1999-06-03	2001-02-23	Nikon Corp	Projection optical system projection exposing device provided with the system and manufacture of device
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JP3359302B2 (ja)	1999-06-14	2002-12-24	キヤノン株式会社	投影露光装置
JP2000356741A (ja)	1999-06-14	2000-12-26	Canon Inc	投影光学系
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WO2001023933A1 (en) *	1999-09-29	2001-04-05	Nikon Corporation	Projection optical system
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EP1094350A3 (de)	1999-10-21	2001-08-16	Carl Zeiss	Optisches Projektionslinsensystem
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JP2001176789A (ja)	1999-12-21	2001-06-29	Nikon Corp	投影露光装置および該投影露光装置を用いたデバイスの製造方法
TW448307B (en)	1999-12-21	2001-08-01	Zeiss Stiftung	Optical projection system
EP1242843B1 (de)	1999-12-29	2006-03-22	Carl Zeiss SMT AG	Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
DE50112813D1 (de)	2000-05-04	2007-09-20	Zeiss Carl Smt Ag	Projektionsobjektiv, insbesondere für die Mikrolithographie
JP2001343582A (ja)	2000-05-30	2001-12-14	Nikon Corp	投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法

2001
- 2001-02-21 JP JP2001044760A patent/JP2002244034A/ja not_active Withdrawn
- 2001-12-28 US US10/029,210 patent/US6862078B2/en not_active Expired - Fee Related
2002
- 2002-01-22 TW TW091100921A patent/TW518665B/zh active
- 2002-02-07 CN CN02103545A patent/CN1374560A/zh active Pending
- 2002-02-20 KR KR1020020009036A patent/KR20020068467A/ko not_active Withdrawn
- 2002-02-21 EP EP02003254A patent/EP1235091A3/de not_active Withdrawn

Patent Citations (4)

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Publication number	Priority date	Publication date	Assignee	Title
US5805334A (en) *	1996-05-20	1998-09-08	Nikon Corporation	Catadioptric projection systems
EP0875778A1 (de) *	1997-03-18	1998-11-04	Nikon Corporation	Bildfocussierendes optisches System für ultraviolet Laser
EP1001314A2 (de) *	1998-11-10	2000-05-17	Nikon Corporation	Dauerhaftes optisches System für einen Projektionsbelichtingsapparat und Verfahren zu dessen Herstellung
EP1006388A2 (de) *	1998-11-30	2000-06-07	Carl Zeiss	Reduktions-Projektionsobjektiv der Mikrolithographie

Cited By (14)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US7869122B2 (en)	2004-01-14	2011-01-11	Carl Zeiss Smt Ag	Catadioptric projection objective
US8199400B2 (en)	2004-01-14	2012-06-12	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8208198B2 (en)	2004-01-14	2012-06-26	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8208199B2 (en)	2004-01-14	2012-06-26	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8289619B2 (en)	2004-01-14	2012-10-16	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8339701B2 (en)	2004-01-14	2012-12-25	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8355201B2 (en)	2004-01-14	2013-01-15	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8416490B2 (en)	2004-01-14	2013-04-09	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8730572B2 (en)	2004-01-14	2014-05-20	Carl Zeiss Smt Gmbh	Catadioptric projection objective
US8804234B2 (en)	2004-01-14	2014-08-12	Carl Zeiss Smt Gmbh	Catadioptric projection objective including an aspherized plate
US8908269B2 (en)	2004-01-14	2014-12-09	Carl Zeiss Smt Gmbh	Immersion catadioptric projection objective having two intermediate images
US8913316B2 (en)	2004-05-17	2014-12-16	Carl Zeiss Smt Gmbh	Catadioptric projection objective with intermediate images
US9019596B2 (en)	2004-05-17	2015-04-28	Carl Zeiss Smt Gmbh	Catadioptric projection objective with intermediate images
US9134618B2 (en)	2004-05-17	2015-09-15	Carl Zeiss Smt Gmbh	Catadioptric projection objective with intermediate images

Also Published As

Publication number	Publication date
KR20020068467A (ko)	2002-08-27
EP1235091A2 (de)	2002-08-28
TW518665B (en)	2003-01-21
CN1374560A (zh)	2002-10-16
JP2002244034A (ja)	2002-08-28
US20020167650A1 (en)	2002-11-14
US6862078B2 (en)	2005-03-01

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2003-12-12	PUAL	Search report despatched	Free format text: ORIGINAL CODE: 0009013
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2004-10-20	18W	Application withdrawn	Effective date: 20040901
2004-11-25	REG	Reference to a national code	Ref country code: DE Ref legal event code: 8566

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