EP1869625A2 - Élément composite à plusieurs couches ayant une fonction électronique - Google Patents

Élément composite à plusieurs couches ayant une fonction électronique

Info

Publication number
EP1869625A2
EP1869625A2 EP06723879A EP06723879A EP1869625A2 EP 1869625 A2 EP1869625 A2 EP 1869625A2 EP 06723879 A EP06723879 A EP 06723879A EP 06723879 A EP06723879 A EP 06723879A EP 1869625 A2 EP1869625 A2 EP 1869625A2
Authority
EP
European Patent Office
Prior art keywords
components
multilayer composite
composite body
layers
common
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP06723879A
Other languages
German (de)
English (en)
Inventor
Andreas Ullmann
Alexander Knobloch
Merlin Welker
Walter Fix
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PolyIC GmbH and Co KG
Original Assignee
PolyIC GmbH and Co KG
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PolyIC GmbH and Co KG filed Critical PolyIC GmbH and Co KG
Publication of EP1869625A2 publication Critical patent/EP1869625A2/fr
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/16—Printed circuits incorporating printed electric components, e.g. printed resistors, capacitors or inductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P10/00—Bonding of wafers, substrates or parts of devices
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077—Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/07718—Constructional details, e.g. mounting of circuits in the carrier the record carrier being manufactured in a continuous process, e.g. using endless rolls
    • G—PHYSICS
    • G06—COMPUTING OR CALCULATING; COUNTING
    • G06K—GRAPHICAL DATA READING; PRESENTATION OF DATA; RECORD CARRIERS; HANDLING RECORD CARRIERS
    • G06K19/00—Record carriers for use with machines and with at least a part designed to carry digital markings
    • G06K19/06—Record carriers for use with machines and with at least a part designed to carry digital markings characterised by the kind of the digital marking, e.g. shape, nature, code
    • G06K19/067—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components
    • G06K19/07—Record carriers with conductive marks, printed circuits or semiconductor circuit elements, e.g. credit or identity cards also with resonating or responding marks without active components with integrated circuit chips
    • G06K19/077—Constructional details, e.g. mounting of circuits in the carrier
    • G06K19/07749—Constructional details, e.g. mounting of circuits in the carrier the record carrier being capable of non-contact communication, e.g. constructional details of the antenna of a non-contact smart card
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/202—Integrated devices comprising a common active layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K1/00—Printed circuits
    • H05K1/02—Details
    • H05K1/03—Use of materials for the substrate
    • H05K1/0393—Flexible materials
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10166—Transistor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/10—Details of components or other objects attached to or integrated in a printed circuit board
    • H05K2201/10007—Types of components
    • H05K2201/10174—Diode
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K19/00—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00
    • H10K19/10—Integrated devices, or assemblies of multiple devices, comprising at least one organic element specially adapted for rectifying, amplifying, oscillating or switching, covered by group H10K10/00 comprising field-effect transistors

Definitions

  • the invention relates to a multilayer composite body with electronic function, in particular an electronic assembly comprising a plurality of organic electronic components.
  • Electronic components are known, for example from WO 02/15264.
  • an electronic device is fabricated by sequentially depositing the various functional layers (conductive, semiconducting, insulating, and again conducting layers) on a substrate.
  • Several electronic components can be combined on a board, as described for example in DE 101 51 440 C1.
  • a disadvantage of the assemblies currently used is that for a more complex assembly, a plurality of individual components individually and sequentially prepared, electrically connected and arranged must be. This requires various costly work and process steps.
  • Object of the present invention is to provide a structure for an assembly available that is simple, mass production suitable and inexpensive to implement and in which a variety of essential electronic components, ie active and passive components alike, as a transistor, field-effect transistor , electrical contact, resistance, conductor resistance, coil, capacitor, Rectifier or the like can be combined as desired and in particular with a diode.
  • essential electronic components ie active and passive components alike, as a transistor, field-effect transistor , electrical contact, resistance, conductor resistance, coil, capacitor, Rectifier or the like can be combined as desired and in particular with a diode.
  • the invention relates to a multilayer composite body, comprising at least two different electronic components, which are common at least two, each applied in one operation layers, which may be homogeneous or structured.
  • one of the layers that is common to the components of the composite according to the invention is a homogeneous or structured semiconducting layer and / or another, for example also a layer, which may not be structured due to its high viscosity during application.
  • all components of the composite body so different components and any number thereof, simultaneously and on the same substrate, for example in a continuous process, produced.
  • some components include layers that have no functionality in the device.
  • the carrier layer ie the substrate common to all the components.
  • all components of a multilayer composite body are built up of contiguous layers, wherein some of the layers are structured and again other homogeneous layers are homogeneous. These layers are produced simultaneously for all the components present in the composite body and, if appropriate, structured suitably for the respective component.
  • the multilayer composite body assemblies are preferably realized, in which at least one diode and another different component are included.
  • Realized rectifier wherein at least two different components, a diode and a capacitance in the composite body are present.
  • a complex rectifier can also be realized in the multilayer composite body if at least three different components, at least two diodes, a capacitance and through-contact are contained in the assembly forming the composite body.
  • the multilayer composite body has, for example, at least three different components, a diode, a capacitance and a transistor.
  • At least four different components are used to construct a transponder in the multilayer composite body.
  • the multilayer composite body can in principle contain all sorts of components such as transistor, field-effect transistor, electrical contact, resistance, conductor resistance, coil, capacitor, rectifier or the like as often as desired and in particular with one or more diode (s) in combination.
  • components such as transistor, field-effect transistor, electrical contact, resistance, conductor resistance, coil, capacitor, rectifier or the like as often as desired and in particular with one or more diode (s) in combination.
  • the multilayer composite body in the two conductive layers has two different - with respect to their work function - different materials.
  • the conductive layer which is in contact with the semiconducting layer is made of silver and the material of the counterelectrode is then a material with different work function, in particular a base material such as copper, nickel, chromium, cobalt or the like.
  • all components be prepared by four structured layers and their well-thought superimposition in a manufacturing process.
  • the typical structure seen from bottom to top, is the sequence substrate, conductive layer, semiconducting layer, insulating layer and upper, conductive layer.
  • a "bottom-up" layer sequence is also conceivable and encompassed by the inventive idea.
  • the two conductive layers of the composite body are made of different materials, which in particular have different work function or different Fermi level.
  • This is realized for example by the use of metallic layers of two dissimilar metals and / or alloys.
  • Particularly preferred is the use of silver as an electrode adjacent to the semiconducting layer, in particular as a conductive layer in contact with the semiconductor layer and another metal / alloy with a work function different from silver as counterelectrode.
  • FIG. 1 shows a schematic cross section through a fully integrated printable electronics, such as is required for a complete transponder circuit.
  • FIG. 2 again shows all the components which can also be seen in FIG. 1, but here the semiconductive layer at the location of the diode is not drawn to the level of the upper electrode of the other components, but the upper electrode of the diode is deeper here placed.
  • FIG. 3 shows a structure for the voltage supply, in which case the components diode, capacitor and through contact are produced simultaneously on a substrate.
  • FIG. 4 shows a composite body which has an electrical
  • the substrate 1 can be seen below.
  • insulating materials with a smooth surface can be used, flexible and rigid materials can equally be used.
  • flexible films such as PET film or other polymer plastic films, glass, quartz, ceramic or other are used in place.
  • the layer 2 following the substrate 1 is the first conductive layer or the lower electrode 2, which is applied in a structured manner.
  • the source and drain electrodes are produced here, which are covered by the following semiconductor layer.
  • the conductive layer 2 only conductive materials can be used, it is immaterial whether it is organic or inorganic or a composite material.
  • the work function is adjusted to the Fermi level of the semiconductor so that the difference to the Fermi level of the Semiconductor is preferably 0.3 eV or less. Then it is ensured that the charge carriers pass smoothly from the semiconducting material into the conducting one.
  • the first and lower electrode layers are followed by the semiconducting layer 3, which may be applied unstructured because of its viscosity.
  • Preferred materials for the semiconducting layer are organic materials such as P3AT, P3DHTT, regioregular polyalkylthiophenes, polyfluorene derivatives, PPVs, in general and / or other polymers, for example with a conjugated main chain or a freely mobile one
  • Electron pair in the main chain used.
  • the semiconductive layer 3 can also be applied structured by printing, for example.
  • the insulating layer 4 is made of, for example, soluble printable material.
  • materials for the insulating layer organic, soluble materials such as e.g. Polystyrene derivatives, PMMA or generally insulating polymers used.
  • the structured insulating layer 4 is followed by an upper conductive layer 5, which in turn is preferably structured.
  • conductive organic and inorganic materials and / or composite materials are used. Particular preference is given to using metals whose work function differs from that of the material of the lower conductive layer (counterelectrode).
  • materials are used whose work function in the range of 3 to 5 eV, in particular from 3.0 eV to 4.6 eV or more, for example, is here copper, nickel, chromium, cobalt, manganese, etc. successfully used.
  • the following components are now realized on the substrate 1 of FIG.
  • FIG. 2 again shows all the components and all layers which can also be seen in FIG. 1, but here the semiconductive layer 3 at the location of the diode c does not become electrical through-contact up to the level of the upper electrode 5 of the other components a, transistor b, capacitor d and resistor e pulled, but the upper electrode 5 of the diode c is here deeper, to the level of the insulating layer 4, set.
  • layer 1 is the substrate, layer 2, a conductive layer and 3 the semiconductor layer, 4 the insulating layer and 5 the counter-electrode, which in turn is structured.
  • the sequence of components is provided as follows: far left outside is the through-hole 1, next to the diode c and subsequent to the diode c, the capacitor d.
  • the composite body shown here can rectify the alternating voltage originating from an antenna.
  • the semiconductor is slightly thicker in the diode region c applied, which can be achieved for example via a at a simultaneous production of the components by a decor pressure.
  • FIG. 4 shows a multilayer composite body which combines an electrical contact, a transistor and a resistor or a coil.
  • this layer structure and this arrangement of the components electrical contact a, transistor b, and resistor or coil e at least PFETs (polymer field effect transistor), inverters, ring oscillators, flip-flops, frequency dividers and / or counters can be constructed.
  • PFETs polymer field effect transistor
  • the layer structure again corresponds to that known from the other figures. Although no diode is realized here, the conductive material of the upper electrode 5 and the lower electrode 2 may be quite different, especially in terms of its work function.
  • the encapsulation and / or sealing of the components which may comprise a wide variety of materials and / or laminates, is still recommended as topmost layer or finish.
  • the encapsulation / seal may be made of a rigid or flexible material.
  • the essential components of electronic devices can be produced side by side and / or in succession on a substrate by continuously applied and / or structured layers, such as transistor, field effect transistor, electrical contact, resistance, track resistance, inductance, diode, capacitor and rectifiers are realized.
  • the gate electrode Due to the cost-effective and mass production suitable production of all components of the assembly at the same time and in a continuous process can be contained in individual components layers that have no special function there, for example, in a field effect transistor and / or in a capacitor, the gate electrode have a work function different from the source / drain electrode, wherein the difference of the work function here has no functionality.
  • a semiconductor is present, which is unnecessary at the site and not functional.
  • the essential components of complex electronic devices can be produced side by side and / or one after another on a substrate by continuously applied and / or structured layers, such as field effect transistor, electrical contact, resistance, conductor resistance, coil, Diode, capacitor and rectifier.
  • the invention opens up for the first time a possibility for a structure of an entire assembly such as an RFID tag, wherein the entire day can be realized with all components in a manufacturing process. As a result, a cost-effective and mass production suitable manufacturing method is described for the first time.

Landscapes

  • Engineering & Computer Science (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Computer Hardware Design (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Theoretical Computer Science (AREA)
  • Semiconductor Integrated Circuits (AREA)
  • Thin Film Transistor (AREA)
  • Fixed Capacitors And Capacitor Manufacturing Machines (AREA)
  • Parts Printed On Printed Circuit Boards (AREA)

Abstract

L'invention concerne un élément composite à plusieurs couches ayant une fonction électronique, notamment un ensemble électronique comprenant plusieurs composants électroniques organiques. L'invention est caractérisée en ce qu'elle permet la réalisation d'un ensemble complet tel qu'une étiquette RFID, la totalité de l'étiquette pouvant être faite avec tous les composants en un processus de fabrication.
EP06723879A 2005-04-15 2006-03-31 Élément composite à plusieurs couches ayant une fonction électronique Withdrawn EP1869625A2 (fr)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
DE102005017655A DE102005017655B4 (de) 2005-04-15 2005-04-15 Mehrschichtiger Verbundkörper mit elektronischer Funktion
PCT/EP2006/002916 WO2006108514A2 (fr) 2005-04-15 2006-03-31 Élément composite à plusieurs couches ayant une fonction électronique

Publications (1)

Publication Number Publication Date
EP1869625A2 true EP1869625A2 (fr) 2007-12-26

Family

ID=37084894

Family Applications (1)

Application Number Title Priority Date Filing Date
EP06723879A Withdrawn EP1869625A2 (fr) 2005-04-15 2006-03-31 Élément composite à plusieurs couches ayant une fonction électronique

Country Status (8)

Country Link
US (1) US7812343B2 (fr)
EP (1) EP1869625A2 (fr)
JP (1) JP4977126B2 (fr)
KR (1) KR101244124B1 (fr)
CN (1) CN101160594B (fr)
DE (1) DE102005017655B4 (fr)
TW (1) TWI314369B (fr)
WO (1) WO2006108514A2 (fr)

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102005031448A1 (de) 2005-07-04 2007-01-11 Polyic Gmbh & Co. Kg Aktivierbare optische Schicht
WO2007141686A1 (fr) * 2006-06-07 2007-12-13 Nxp B.V. Puce À semiconducteur, TRANSPONDEuR et MÉTHODe de fabrication d'un TRANSPONDEuR
DE102007046679B4 (de) 2007-09-27 2012-10-31 Polyic Gmbh & Co. Kg RFID-Transponder
DE102008036736B4 (de) * 2008-08-07 2010-04-29 Abb Ag Elektrisches Installationsschaltgerät mit einer elektronischen Baugruppe
DE102008061928A1 (de) * 2008-12-15 2010-06-17 Polylc Gmbh & Co. Kg Organisch elektronische Schaltung
DE102013102052B4 (de) 2013-03-01 2018-07-26 Infineon Technologies Ag Chip-Anordnung

Family Cites Families (253)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US65757A (en) * 1867-06-11 Improved lifter foe the lids of pitchers
GB723598A (en) 1951-09-07 1955-02-09 Philips Nv Improvements in or relating to methods of producing electrically conductive mouldings from plastics
US3512052A (en) 1968-01-11 1970-05-12 Gen Motors Corp Metal-insulator-semiconductor voltage variable capacitor with controlled resistivity dielectric
DE2102735B2 (de) 1971-01-21 1979-05-10 Transformatoren Union Ag, 7000 Stuttgart Einrichtung zur Regelung des Mengendurchsatzes von Mühlen und Brechern
US3769096A (en) 1971-03-12 1973-10-30 Bell Telephone Labor Inc Pyroelectric devices
AU488652B2 (en) 1973-09-26 1976-04-01 Commonwealth Scientific And Industrial Research Organisation Improvements in or relating to security tokens
JPS543594B2 (fr) 1973-10-12 1979-02-24
DE2407110C3 (de) 1974-02-14 1981-04-23 Siemens AG, 1000 Berlin und 8000 München Sensor zum Nachweis einer in einem Gas oder einer Flüssigkeit einthaltenen Substanz
JPS54101176A (en) 1978-01-26 1979-08-09 Shinetsu Polymer Co Contact member for push switch
US4442019A (en) 1978-05-26 1984-04-10 Marks Alvin M Electroordered dipole suspension
US4246298A (en) 1979-03-14 1981-01-20 American Can Company Rapid curing of epoxy resin coating compositions by combination of photoinitiation and controlled heat application
JPS5641938U (fr) 1979-09-10 1981-04-17
US4340057A (en) 1980-12-24 1982-07-20 S. C. Johnson & Son, Inc. Radiation induced graft polymerization
US4472627A (en) 1982-09-30 1984-09-18 The United States Of America As Represented By The Secretary Of The Treasury Authenticating and anti-counterfeiting device for currency
JPS59145576A (ja) 1982-11-09 1984-08-21 ザイトレツクス・コ−ポレ−シヨン プログラム可能なｍｏｓトランジスタ
DE3321071A1 (de) 1983-06-10 1984-12-13 Basf Ag Druckschalter
DE3338597A1 (de) 1983-10-24 1985-05-02 GAO Gesellschaft für Automation und Organisation mbH, 8000 München Datentraeger mit integriertem schaltkreis und verfahren zur herstellung desselben
US4554229A (en) 1984-04-06 1985-11-19 At&T Technologies, Inc. Multilayer hybrid integrated circuit
JPS6265472A (ja) 1985-09-18 1987-03-24 Toshiba Corp Ｍｉｓ型半導体素子
US4726659A (en) 1986-02-24 1988-02-23 Rca Corporation Display device having different alignment layers
US4926052A (en) 1986-03-03 1990-05-15 Kabushiki Kaisha Toshiba Radiation detecting device
EP0268370B1 (fr) 1986-10-13 1995-06-28 Canon Kabushiki Kaisha Commutateur
GB2215307B (en) 1988-03-04 1991-10-09 Unisys Corp Electronic component transportation container
KR900702481A (ko) 1988-06-21 1990-12-07 원본미기재 휴대용 전자 토큰 제조방법
US5364735A (en) 1988-07-01 1994-11-15 Sony Corporation Multiple layer optical record medium with protective layers and method for producing same
US4937119A (en) 1988-12-15 1990-06-26 Hoechst Celanese Corp. Textured organic optical data storage media and methods of preparation
US5892244A (en) 1989-01-10 1999-04-06 Mitsubishi Denki Kabushiki Kaisha Field effect transistor including πconjugate polymer and liquid crystal display including the field effect transistor
FR2644920B1 (fr) 1989-03-21 1993-09-24 France Etat Dispositif d'affichage polychrome a memoire du type photoconducteur-electroluminescent
US6331356B1 (en) 1989-05-26 2001-12-18 International Business Machines Corporation Patterns of electrically conducting polymers and their application as electrodes or electrical contacts
DE69018348T2 (de) 1989-07-25 1995-08-03 Matsushita Electric Ind Co Ltd Speicherbauelement aus organischem Halbleiter mit einer MISFET-Struktur und sein Kontrollverfahren.
FI84862C (fi) 1989-08-11 1992-01-27 Vaisala Oy Kapacitiv fuktighetsgivarkonstruktion och foerfarande foer framstaellning daerav.
DE3942663A1 (de) 1989-12-22 1991-06-27 Gao Ges Automation Org Datentraeger mit einem fluessigkristall-sicherheitselement
US5206525A (en) 1989-12-27 1993-04-27 Nippon Petrochemicals Co., Ltd. Electric element capable of controlling the electric conductivity of π-conjugated macromolecular materials
FI91573C (sv) 1990-01-04 1994-07-11 Neste Oy Sätt att framställa elektroniska och elektro-optiska komponenter och kretsar
JP2969184B2 (ja) 1990-04-09 1999-11-02 カシオ計算機株式会社 薄膜トランジスタメモリ
FR2664430B1 (fr) 1990-07-04 1992-09-18 Centre Nat Rech Scient Transistor a effet de champ en couche mince de structure mis, dont l'isolant et le semiconducteur sont realises en materiaux organiques.
US5202677A (en) 1991-01-31 1993-04-13 Crystal Images, Inc. Display apparatus using thermochromic material
DE4103675C2 (de) 1991-02-07 1993-10-21 Telefunken Microelectron Schaltung zur Spannungsüberhöhung von Wechselspannungs-Eingangssignalen
FR2673041A1 (fr) 1991-02-19 1992-08-21 Gemplus Card Int Procede de fabrication de micromodules de circuit integre et micromodule correspondant.
EP0501456A3 (fr) 1991-02-26 1992-09-09 Sony Corporation Ordinateur de jeux vidéo muni d'un lecteur de disques optiques
US5408109A (en) 1991-02-27 1995-04-18 The Regents Of The University Of California Visible light emitting diodes fabricated from soluble semiconducting polymers
US5332315A (en) 1991-04-27 1994-07-26 Gec Avery Limited Apparatus and sensor unit for monitoring changes in a physical quantity with time
JP3224829B2 (ja) 1991-08-15 2001-11-05 株式会社東芝 有機電界効果型素子
JPH0580530A (ja) 1991-09-24 1993-04-02 Hitachi Ltd 薄膜パターン製造方法
US5173835A (en) 1991-10-15 1992-12-22 Motorola, Inc. Voltage variable capacitor
WO1993009469A1 (fr) 1991-10-30 1993-05-13 Fraunhofer-Gesellschaft zur Förderung der angewandten Forschung e.V. Dispositif d'exposition lumineuse
JP2709223B2 (ja) 1992-01-30 1998-02-04 三菱電機株式会社 非接触形携帯記憶装置
FR2696043B1 (fr) 1992-09-18 1994-10-14 Commissariat Energie Atomique Support à réseau d'éléments résistifs en polymère conducteur et son procédé de fabrication.
EP0603939B1 (fr) 1992-12-21 1999-06-16 Koninklijke Philips Electronics N.V. Polymère conducteur de type N et méthode de préparation d'un tel polymère
DE4243832A1 (de) 1992-12-23 1994-06-30 Daimler Benz Ag Tastsensoranordnung
JP3457348B2 (ja) 1993-01-15 2003-10-14 株式会社東芝 半導体装置の製造方法
FR2701117B1 (fr) 1993-02-04 1995-03-10 Asulab Sa Système de mesures électrochimiques à capteur multizones, et son application au dosage du glucose.
EP0615256B1 (fr) 1993-03-09 1998-09-23 Koninklijke Philips Electronics N.V. Méthode de fabrication d'une configuration d'un polymère électroconducteur à la surface d'un substrat et procédé de métallisation de cette configuration
US5567550A (en) 1993-03-25 1996-10-22 Texas Instruments Incorporated Method of making a mask for making integrated circuits
DE4312766C2 (de) 1993-04-20 1997-02-27 Telefunken Microelectron Schaltung zur Spannungsüberhöhung
JPH0722669A (ja) 1993-07-01 1995-01-24 Mitsubishi Electric Corp 可塑性機能素子
EP0722563A4 (fr) 1993-08-24 1998-03-04 Metrika Lab Inc Nouveau dispositif electronique d'analyse jetable
JP3460863B2 (ja) 1993-09-17 2003-10-27 三菱電機株式会社 半導体装置の製造方法
FR2710413B1 (fr) 1993-09-21 1995-11-03 Asulab Sa Dispositif de mesure pour capteurs amovibles.
US5556706A (en) 1993-10-06 1996-09-17 Matsushita Electric Industrial Co., Ltd. Conductive layered product and method of manufacturing the same
IL111151A (en) 1994-10-03 1998-09-24 News Datacom Ltd Secure access systems
US6028649A (en) 1994-04-21 2000-02-22 Reveo, Inc. Image display systems having direct and projection viewing modes
EP0708987B1 (fr) 1994-05-16 2003-08-13 Koninklijke Philips Electronics N.V. Dispositif a semi-conducteur pourvu d'un materiau a semi-conducteur organique
IL110318A (en) 1994-05-23 1998-12-27 Al Coat Ltd Solutions containing polyaniline for making transparent electrodes for liquid crystal devices
US5684884A (en) 1994-05-31 1997-11-04 Hitachi Metals, Ltd. Piezoelectric loudspeaker and a method for manufacturing the same
JP3246189B2 (ja) 1994-06-28 2002-01-15 株式会社日立製作所 半導体表示装置
US5528222A (en) 1994-09-09 1996-06-18 International Business Machines Corporation Radio frequency circuit and memory in thin flexible package
US5574291A (en) 1994-12-09 1996-11-12 Lucent Technologies Inc. Article comprising a thin film transistor with low conductivity organic layer
US5630986A (en) 1995-01-13 1997-05-20 Bayer Corporation Dispensing instrument for fluid monitoring sensors
DE19506907A1 (de) 1995-02-28 1996-09-05 Telefunken Microelectron Schaltungsanordnung zur Variation eines Eingangssignals mit bestimmter Eingangsspannung und bestimmtem Eingangsstrom
JP3068430B2 (ja) 1995-04-25 2000-07-24 富山日本電気株式会社 固体電解コンデンサ及びその製造方法
JPH08328031A (ja) 1995-06-02 1996-12-13 Sharp Corp フルカラー液晶表示装置およびその製造方法
JPH0933645A (ja) 1995-07-21 1997-02-07 Oki Electric Ind Co Ltd トランスポンダの電源回路
US5652645A (en) 1995-07-24 1997-07-29 Anvik Corporation High-throughput, high-resolution, projection patterning system for large, flexible, roll-fed, electronic-module substrates
US5707894A (en) 1995-10-27 1998-01-13 United Microelectronics Corporation Bonding pad structure and method thereof
US5625199A (en) 1996-01-16 1997-04-29 Lucent Technologies Inc. Article comprising complementary circuit with inorganic n-channel and organic p-channel thin film transistors
EP0785457A3 (fr) 1996-01-17 1998-10-14 Nippon Telegraph And Telephone Corporation Dispositif optique et dispositif d'affichage à trois dimensions
US6326640B1 (en) 1996-01-29 2001-12-04 Motorola, Inc. Organic thin film transistor with enhanced carrier mobility
GB2310493B (en) 1996-02-26 2000-08-02 Unilever Plc Determination of the characteristics of fluid
JP3080579B2 (ja) 1996-03-06 2000-08-28 富士機工電子株式会社 エアリア・グリッド・アレイ・パッケージの製造方法
DE19610284A1 (de) 1996-03-15 1997-08-07 Siemens Ag Antennenspule
JP2000512428A (ja) 1996-06-12 2000-09-19 ザ トラスティーズ オブ プリンストン ユニバーシテイ 有機多色表示器製造のための薄膜パターン化
DE19629656A1 (de) 1996-07-23 1998-01-29 Boehringer Mannheim Gmbh Diagnostischer Testträger mit mehrschichtigem Testfeld und Verfahren zur Bestimmung von Analyt mit dessen Hilfe
US5693956A (en) 1996-07-29 1997-12-02 Motorola Inverted oleds on hard plastic substrate
DE19648937A1 (de) 1996-11-26 1997-05-15 Meonic Sys Eng Gmbh Elektronisches Etikett
US6259506B1 (en) 1997-02-18 2001-07-10 Spectra Science Corporation Field activated security articles including polymer dispersed liquid crystals, and including micro-encapsulated field affected materials
US5946551A (en) 1997-03-25 1999-08-31 Dimitrakopoulos; Christos Dimitrios Fabrication of thin film effect transistor comprising an organic semiconductor and chemical solution deposited metal oxide gate dielectric
US6344662B1 (en) 1997-03-25 2002-02-05 International Business Machines Corporation Thin-film field-effect transistor with organic-inorganic hybrid semiconductor requiring low operating voltages
US5841325A (en) 1997-05-12 1998-11-24 Hewlett-Packard Company Fully-integrated high-speed interleaved voltage-controlled ring oscillator
KR100248392B1 (ko) 1997-05-15 2000-09-01 정선종 유기물전계효과트랜지스터와결합된유기물능동구동전기발광소자및그소자의제작방법
EP0968537B1 (fr) 1997-08-22 2012-05-02 Creator Technology B.V. Procede de fabrication d'un transistor a effet de champ constitue principalement de materiaux organiques
ES2199705T1 (es) 1997-09-11 2004-03-01 Prec Dynamics Corp Transpondor de identificacion con circuito integrado consistente de materiales organicos.
EP1296280A1 (fr) * 1997-09-11 2003-03-26 Precision Dynamics Corporation Etiquette d'identification RF comportant une puce consistant de matériaux organiques
US6251513B1 (en) 1997-11-08 2001-06-26 Littlefuse, Inc. Polymer composites for overvoltage protection
JPH11142810A (ja) 1997-11-12 1999-05-28 Nintendo Co Ltd 携帯型情報処理装置
WO1999030432A1 (fr) 1997-12-05 1999-06-17 Koninklijke Philips Electronics N.V. Repondeur d'identification
US5997817A (en) 1997-12-05 1999-12-07 Roche Diagnostics Corporation Electrochemical biosensor test strip
US5998805A (en) 1997-12-11 1999-12-07 Motorola, Inc. Active matrix OED array with improved OED cathode
US6083104A (en) 1998-01-16 2000-07-04 Silverlit Toys (U.S.A.), Inc. Programmable toy with an independent game cartridge
RU2183882C2 (ru) 1998-01-28 2002-06-20 Тин Филм Электроникс Аса Способ формирования электропроводящих или полупроводниковых трехмерных структур и способы уничтожения этих структур
US6087196A (en) 1998-01-30 2000-07-11 The Trustees Of Princeton University Fabrication of organic semiconductor devices using ink jet printing
US6045977A (en) 1998-02-19 2000-04-04 Lucent Technologies Inc. Process for patterning conductive polyaniline films
DE19816860A1 (de) 1998-03-06 1999-11-18 Deutsche Telekom Ag Chipkarte, insbesondere Guthabenkarte
US6033202A (en) 1998-03-27 2000-03-07 Lucent Technologies Inc. Mold for non - photolithographic fabrication of microstructures
US6369793B1 (en) 1998-03-30 2002-04-09 David C. Zimman Printed display and battery
AU3552699A (en) 1998-04-10 1999-11-01 E-Ink Corporation Electronic displays using organic-based field effect transistors
WO2000070552A1 (fr) 1999-05-17 2000-11-23 The Goodyear Tire & Rubber Company Indice de modulation programmable pour transpondeur
GB9808061D0 (en) 1998-04-16 1998-06-17 Cambridge Display Tech Ltd Polymer devices
US6350996B1 (en) 1998-04-24 2002-02-26 Canon Kabushiki Kaisha Light emitting diode device
GB9808806D0 (en) 1998-04-24 1998-06-24 Cambridge Display Tech Ltd Selective deposition of polymer films
JP3466954B2 (ja) * 1998-04-24 2003-11-17 キヤノン株式会社 発光ダイオード装置及びその製造方法
TW410478B (en) 1998-05-29 2000-11-01 Lucent Technologies Inc Thin-film transistor monolithically integrated with an organic light-emitting diode
US6107920A (en) 1998-06-09 2000-08-22 Motorola, Inc. Radio frequency identification tag having an article integrated antenna
US5967048A (en) 1998-06-12 1999-10-19 Howard A. Fromson Method and apparatus for the multiple imaging of a continuous web
KR100282393B1 (ko) 1998-06-17 2001-02-15 구자홍 유기이엘(el)디스플레이소자제조방법
EP1093663A2 (fr) 1998-06-19 2001-04-25 Thin Film Electronics ASA Circuit a transistors complementaires inorganique/organique integres a couches minces
DE19836174C2 (de) 1998-08-10 2000-10-12 Illig Maschinenbau Adolf Heizung zum Erwärmen von thermoplastischen Kunststoffplatten und Verfahren zum Einstellen der Temperatur dieser Heizung
US6215130B1 (en) 1998-08-20 2001-04-10 Lucent Technologies Inc. Thin film transistors
JP4689825B2 (ja) 1998-08-26 2011-05-25 センサーズ・フォー・メデセン・アンド・サイエンス・インコーポレーテッド 光学式検知装置
JP4493741B2 (ja) 1998-09-04 2010-06-30 株式会社半導体エネルギー研究所 半導体装置の作製方法
EP0996176B8 (fr) 1998-10-13 2005-10-19 Sony Deutschland GmbH Méthode de fabrication d'un dispositif d'affichage émetteur de lumière à matrice active
DE19851703A1 (de) 1998-10-30 2000-05-04 Inst Halbleiterphysik Gmbh Verfahren zur Herstellung von elektronischen Strukturen
US6384804B1 (en) 1998-11-25 2002-05-07 Lucent Techonologies Inc. Display comprising organic smart pixels
US6506438B2 (en) 1998-12-15 2003-01-14 E Ink Corporation Method for printing of transistor arrays on plastic substrates
US6321571B1 (en) 1998-12-21 2001-11-27 Corning Incorporated Method of making glass structures for flat panel displays
US6114088A (en) 1999-01-15 2000-09-05 3M Innovative Properties Company Thermal transfer element for forming multilayer devices
DE60003281T2 (de) 1999-01-15 2004-05-06 3M Innovative Properties Co., Saint Paul Thermisches Übertragungsverfahren.
DE19902029A1 (de) 1999-01-20 2000-07-27 Philips Corp Intellectual Pty Spannungsfester Dünnschichtkondensator mit Interdigitalstruktur
GB2347013A (en) 1999-02-16 2000-08-23 Sharp Kk Charge-transport structures
ES2255768T3 (es) 1999-02-22 2006-07-01 Nippon Steel Corporation Lamina de acero galvanizado de alta resistencia, con excelente adherencia de un baño metalico y conformabilidad bajo presion y lamina de acero galvanizado aleado de alta resistencia y metodo para su produccion.
WO2000052457A1 (fr) 1999-03-02 2000-09-08 Helix Biopharma Corporation Dispositif biocapteur a carte
US6180956B1 (en) 1999-03-03 2001-01-30 International Business Machine Corp. Thin film transistors with organic-inorganic hybrid materials as semiconducting channels
US6207472B1 (en) 1999-03-09 2001-03-27 International Business Machines Corporation Low temperature thin film transistor fabrication
KR100495740B1 (ko) 1999-03-29 2005-06-17 세이코 엡슨 가부시키가이샤 조성물, 막의 제조방법, 및 기능 소자와 이의 제조방법
US6514801B1 (en) 1999-03-30 2003-02-04 Seiko Epson Corporation Method for manufacturing thin-film transistor
US6498114B1 (en) 1999-04-09 2002-12-24 E Ink Corporation Method for forming a patterned semiconductor film
US6072716A (en) 1999-04-14 2000-06-06 Massachusetts Institute Of Technology Memory structures and methods of making same
US6387736B1 (en) 1999-04-26 2002-05-14 Agilent Technologies, Inc. Method and structure for bonding layers in a semiconductor device
FR2793089B3 (fr) 1999-04-28 2001-06-08 Rene Liger Transpondeur a antenne integree
DE19919448A1 (de) 1999-04-29 2000-11-02 Miele & Cie Kühlgerät und Verfahren zur Verkeimungsindikation
US6736985B1 (en) 1999-05-05 2004-05-18 Agere Systems Inc. High-resolution method for patterning a substrate with micro-printing
DE19921024C2 (de) 1999-05-06 2001-03-08 Wolfgang Eichelmann Videospielanlage
US6383664B2 (en) 1999-05-11 2002-05-07 The Dow Chemical Company Electroluminescent or photocell device having protective packaging
JP4136185B2 (ja) 1999-05-12 2008-08-20 パイオニア株式会社 有機エレクトロルミネッセンス多色ディスプレイ及びその製造方法
EP1052594A1 (fr) 1999-05-14 2000-11-15 Sokymat S.A. Transpondeur et moule ainsi que leur procédé de fabrication
TW556357B (en) 1999-06-28 2003-10-01 Semiconductor Energy Lab Method of manufacturing an electro-optical device
DE50013674D1 (de) 1999-07-06 2006-12-14 Elmos Semiconductor Ag CMOS kompatibler SOI-Prozess
US6366017B1 (en) 1999-07-14 2002-04-02 Agilent Technologies, Inc/ Organic light emitting diodes with distributed bragg reflector
JP2001085272A (ja) 1999-07-14 2001-03-30 Matsushita Electric Ind Co Ltd 可変容量コンデンサ
DE19933757A1 (de) 1999-07-19 2001-01-25 Giesecke & Devrient Gmbh Chipkarte mit integrierter Batterie
WO2001008242A1 (fr) * 1999-07-21 2001-02-01 E Ink Corporation Procedes preferes de production d'elements de circuits electriques utilises pour commander un affichage electronique
DE19935527A1 (de) 1999-07-28 2001-02-08 Giesecke & Devrient Gmbh Aktive Folie für Chipkarten mit Display
DE19937262A1 (de) 1999-08-06 2001-03-01 Siemens Ag Anordnung mit Transistor-Funktion
US6593690B1 (en) 1999-09-03 2003-07-15 3M Innovative Properties Company Large area organic electronic devices having conducting polymer buffer layers and methods of making same
JP4595143B2 (ja) 1999-09-06 2010-12-08 双葉電子工業株式会社 有機ｅｌデバイスとその製造方法
EP1085320A1 (fr) 1999-09-13 2001-03-21 Interuniversitair Micro-Elektronica Centrum Vzw Dispositif à base de matériaux organiques pour la détection d'un analyte dans un échantillon
US6517995B1 (en) 1999-09-14 2003-02-11 Massachusetts Institute Of Technology Fabrication of finely featured devices by liquid embossing
WO2001023131A1 (fr) 1999-09-28 2001-04-05 Sumitomo Heavy Industries, Ltd. Procede et dispositif de perçage par laser
US6340822B1 (en) 1999-10-05 2002-01-22 Agere Systems Guardian Corp. Article comprising vertically nano-interconnected circuit devices and method for making the same
JP2004538618A (ja) 1999-10-11 2004-12-24 コーニンクレッカ　フィリップス　エレクトロニクス　エヌ　ヴィ 集積回路
US6335539B1 (en) 1999-11-05 2002-01-01 International Business Machines Corporation Method for improving performance of organic semiconductors in bottom electrode structure
US6284562B1 (en) 1999-11-17 2001-09-04 Agere Systems Guardian Corp. Thin film transistors
JP2001147659A (ja) 1999-11-18 2001-05-29 Sony Corp 表示装置
EP1103916A1 (fr) 1999-11-24 2001-05-30 Infineon Technologies AG Carte à puce
US6621098B1 (en) 1999-11-29 2003-09-16 The Penn State Research Foundation Thin-film transistor and methods of manufacturing and incorporating a semiconducting organic material
US6136702A (en) 1999-11-29 2000-10-24 Lucent Technologies Inc. Thin film transistors
US6197663B1 (en) 1999-12-07 2001-03-06 Lucent Technologies Inc. Process for fabricating integrated circuit devices having thin film transistors
AU781584B2 (en) * 1999-12-21 2005-06-02 Flexenable Limited Solution processed devices
CN100375310C (zh) 1999-12-21 2008-03-12 造型逻辑有限公司 喷墨制作的集成电路
BR0016661B1 (pt) 1999-12-21 2013-11-26 Métodos para formação de um dispositivo eletrônico, dispositivo eletrônico e dispositivo de exibição
US7002451B2 (en) 2000-01-11 2006-02-21 Freeman Jeffrey R Package location system
JP2002162652A (ja) 2000-01-31 2002-06-07 Fujitsu Ltd シート状表示装置、樹脂球状体、及びマイクロカプセル
US6706159B2 (en) 2000-03-02 2004-03-16 Diabetes Diagnostics Combined lancet and electrochemical analyte-testing apparatus
TW497120B (en) 2000-03-06 2002-08-01 Toshiba Corp Transistor, semiconductor device and manufacturing method of semiconductor device
JP3614747B2 (ja) 2000-03-07 2005-01-26 Ｎｅｃエレクトロニクス株式会社 昇圧回路、それを搭載したｉｃカード及びそれを搭載した電子機器
DE10012204A1 (de) 2000-03-13 2001-09-20 Siemens Ag Einrichtung zum Kennzeichnen von Stückgut
EP1134694A1 (fr) 2000-03-16 2001-09-19 Infineon Technologies AG Document avec circuit électronique intégré
JP2001267578A (ja) 2000-03-17 2001-09-28 Sony Corp 薄膜半導体装置及びその製造方法
CA2403646A1 (fr) 2000-03-28 2001-10-04 Inverness Medical Technology, Inc. Procede de fabrication en continu de capteur electrochimque jetable
US6906842B2 (en) 2000-05-24 2005-06-14 Schott North America, Inc. Electrochromic devices
US6535057B2 (en) 2000-05-29 2003-03-18 Stmicroelectronics Ltd. Programmable glitch filter
US6329226B1 (en) 2000-06-01 2001-12-11 Agere Systems Guardian Corp. Method for fabricating a thin-film transistor
EP1210643A2 (fr) 2000-06-06 2002-06-05 Koninklijke Philips Electronics N.V. Affichage a cristaux liquides et son procede de fabrication
DE10032260B4 (de) 2000-07-03 2004-04-29 Texas Instruments Deutschland Gmbh Schaltungsanordnung zur Verdoppelung der Spannung einer Batterie
DE10033112C2 (de) 2000-07-07 2002-11-14 Siemens Ag Verfahren zur Herstellung und Strukturierung organischer Feldeffekt-Transistoren (OFET), hiernach gefertigter OFET und seine Verwendung
US6483473B1 (en) 2000-07-18 2002-11-19 Marconi Communications Inc. Wireless communication device and method
DE10120687A1 (de) 2001-04-27 2002-10-31 Siemens Ag Verkapseltes organisch-elektronisches Bauteil, Verfahren zu seiner Herstellung und seine Verwendung
US20040029310A1 (en) 2000-08-18 2004-02-12 Adoft Bernds Organic field-effect transistor (ofet), a production method therefor, an integrated circut constructed from the same and their uses
WO2002015264A2 (fr) * 2000-08-18 2002-02-21 Siemens Aktiengesellschaft Composant electronique organique encapsule, son procede de production et son utilisation
JP2002068324A (ja) 2000-08-30 2002-03-08 Nippon Sanso Corp 断熱容器
DE10043204A1 (de) 2000-09-01 2002-04-04 Siemens Ag Organischer Feld-Effekt-Transistor, Verfahren zur Strukturierung eines OFETs und integrierte Schaltung
US6699728B2 (en) 2000-09-06 2004-03-02 Osram Opto Semiconductors Gmbh Patterning of electrodes in oled devices
DE10044842A1 (de) 2000-09-11 2002-04-04 Siemens Ag Organischer Gleichrichter, Schaltung, RFID-Tag und Verwendung eines organischen Gleichrichters
DE10045192A1 (de) 2000-09-13 2002-04-04 Siemens Ag Organischer Datenspeicher, RFID-Tag mit organischem Datenspeicher, Verwendung eines organischen Datenspeichers
DE10047171A1 (de) 2000-09-22 2002-04-18 Siemens Ag Elektrode und/oder Leiterbahn für organische Bauelemente und Herstellungverfahren dazu
KR20020036916A (ko) 2000-11-11 2002-05-17 주승기 실리콘 박막의 결정화 방법 및 이에 의해 제조된 반도체소자
DE10058559A1 (de) 2000-11-24 2002-05-29 Interactiva Biotechnologie Gmb System zur Abwicklung eines Warentransfers und Warenvorrats-Behälter
US6859093B1 (en) * 2000-11-28 2005-02-22 Precision Dynamics Corporation Rectifying charge storage device with bi-stable states
US6414543B1 (en) * 2000-11-28 2002-07-02 Precision Dynamics Corporation Rectifying charge storage element
KR100390522B1 (ko) 2000-12-01 2003-07-07 피티플러스(주) 결정질 실리콘 활성층을 포함하는 박막트랜지스터 제조 방법
DE10061297C2 (de) 2000-12-08 2003-05-28 Siemens Ag Verfahren zur Sturkturierung eines OFETs
EP1215725A3 (fr) 2000-12-18 2005-03-23 cubit electronics Gmbh Assemblage utilisé pour supporter des dispositifs électriques et transpondeur sans contacts
KR100388272B1 (ko) * 2000-12-26 2003-06-19 삼성에스디아이 주식회사 티알에스 소자
GB2371910A (en) 2001-01-31 2002-08-07 Seiko Epson Corp Display devices
DE10105914C1 (de) 2001-02-09 2002-10-10 Siemens Ag Organischer Feldeffekt-Transistor mit fotostrukturiertem Gate-Dielektrikum und ein Verfahren zu dessen Erzeugung
EP1237207B1 (fr) 2001-03-02 2012-01-04 FUJIFILM Corporation Méthode de production d'un dispositif organique à couche mince
JP2002289355A (ja) * 2001-03-26 2002-10-04 Pioneer Electronic Corp 有機半導体ダイオード及び有機エレクトロルミネセンス素子表示装置
DE10117663B4 (de) 2001-04-09 2004-09-02 Samsung SDI Co., Ltd., Suwon Verfahren zur Herstellung von Matrixanordnungen auf Basis verschiedenartiger organischer leitfähiger Materialien
KR20030024690A (ko) * 2001-04-17 2003-03-26 코닌클리케 필립스 일렉트로닉스 엔.브이. 저 황산염 및 고 금속 이온 함량을 갖는 전도성 투명중합체 층을 포함하는 ｌｅｄ
DE10120686A1 (de) 2001-04-27 2002-11-07 Siemens Ag Verfahren zur Erzeugung dünner homogener Schichten mit Hilfe der Siebdrucktechnik, Vorrichtung zur Durchführung des Verfahren und ihre Verwendung
US6781868B2 (en) 2001-05-07 2004-08-24 Advanced Micro Devices, Inc. Molecular memory device
US20020170897A1 (en) 2001-05-21 2002-11-21 Hall Frank L. Methods for preparing ball grid array substrates via use of a laser
EP1393389B1 (fr) 2001-05-23 2018-12-05 Flexenable Limited Formation de motif sur des dispositifs
DE10126860C2 (de) 2001-06-01 2003-05-28 Siemens Ag Organischer Feldeffekt-Transistor, Verfahren zu seiner Herstellung und Verwendung zum Aufbau integrierter Schaltungen
DE10126859A1 (de) 2001-06-01 2002-12-12 Siemens Ag Verfahren zur Erzeugung von leitfähigen Strukturen mittels Drucktechnik sowie daraus hergestellte aktive Bauelemente für integrierte Schaltungen
US6870180B2 (en) 2001-06-08 2005-03-22 Lucent Technologies Inc. Organic polarizable gate transistor apparatus and method
JP2003017248A (ja) 2001-06-27 2003-01-17 Sony Corp 電界発光素子
DE20111825U1 (de) 2001-07-20 2002-01-17 Lammering, Thomas, Dipl.-Ing., 33335 Gütersloh Printmedium
DE10141440A1 (de) 2001-08-23 2003-03-13 Daimler Chrysler Ag Tripodegelenk
JP2003089259A (ja) 2001-09-18 2003-03-25 Hitachi Ltd パターン形成方法およびパターン形成装置
US7351660B2 (en) 2001-09-28 2008-04-01 Hrl Laboratories, Llc Process for producing high performance interconnects
US6679036B2 (en) 2001-10-15 2004-01-20 Shunchi Crankshaft Co., Ltd. Drive gear shaft structure of a self-moving type mower
DE10151440C1 (de) 2001-10-18 2003-02-06 Siemens Ag Organisches Elektronikbauteil, Verfahren zu seiner Herstellung und seine Verwendung
DE10153656A1 (de) 2001-10-31 2003-05-22 Infineon Technologies Ag Verfahren zur Verringerung des Kontaktwiderstandes in organischen Feldeffekttransistoren durch Aufbringen einer reaktiven, die organische Halbleiterschicht im Kontaktbereich regio-selektiv dotierenden Zwischenschicht
DE10160732A1 (de) 2001-12-11 2003-06-26 Siemens Ag Organischer Feld-Effekt-Transistor mit verschobener Schwellwertspannung und Verwendung dazu
DE10163267A1 (de) 2001-12-21 2003-07-03 Giesecke & Devrient Gmbh Blattgut mit einem elektrischen Schaltkreis sowie Vorrichtung und Verfahren zur Bearbeitung des Blattguts
US6819181B2 (en) * 2001-12-21 2004-11-16 Motorola, Inc. Method and structure for integrated circuit interference isolation enhancement
DE10209400A1 (de) 2002-03-04 2003-10-02 Infineon Technologies Ag Transponderschaltung mit einer Gleichrichterschaltung sowie Verfahren zur Herstellung einer Transponderschaltung mit einer Gleichrichterschaltung
US6596569B1 (en) 2002-03-15 2003-07-22 Lucent Technologies Inc. Thin film transistors
US7204425B2 (en) 2002-03-18 2007-04-17 Precision Dynamics Corporation Enhanced identification appliance
DE10212640B4 (de) 2002-03-21 2004-02-05 Siemens Ag Logische Bauteile aus organischen Feldeffekttransistoren
DE10219905B4 (de) 2002-05-03 2011-06-22 OSRAM Opto Semiconductors GmbH, 93055 Optoelektronisches Bauelement mit organischen funktionellen Schichten und zwei Trägern sowie Verfahren zur Herstellung eines solchen optoelektronischen Bauelements
US6812509B2 (en) 2002-06-28 2004-11-02 Palo Alto Research Center Inc. Organic ferroelectric memory cells
DE10229168A1 (de) 2002-06-28 2004-01-29 Infineon Technologies Ag Laminat mit einer als Antennenstruktur ausgebildeten elektrisch leitfähigen Schicht
EP1383179A2 (fr) * 2002-07-17 2004-01-21 Pioneer Corporation Dispositif semiconducteur organique
AT502890B1 (de) 2002-10-15 2011-04-15 Atomic Austria Gmbh Elektronisches überwachungssystem zur kontrolle bzw. erfassung einer aus mehreren sportartikeln bestehenden sportartikelkombination
US6870183B2 (en) 2002-11-04 2005-03-22 Advanced Micro Devices, Inc. Stacked organic memory devices and methods of operating and fabricating
US20060118778A1 (en) 2002-11-05 2006-06-08 Wolfgang Clemens Organic electronic component with high-resolution structuring and method for the production thereof
US20060035423A1 (en) 2002-11-19 2006-02-16 Walter Fix Organic electronic component comprising the same organic material for at least two functional layers
US7442954B2 (en) 2002-11-19 2008-10-28 Polyic Gmbh & Co. Kg Organic electronic component comprising a patterned, semi-conducting functional layer and a method for producing said component
US7088145B2 (en) 2002-12-23 2006-08-08 3M Innovative Properties Company AC powered logic circuitry
EP1434281A3 (fr) 2002-12-26 2007-10-24 Konica Minolta Holdings, Inc. Méthode de fabrication d'un transistor à couche mince, substrat et circuit électrique
WO2004063806A1 (fr) * 2003-01-09 2004-07-29 Polyic Gmbh & Co. Kg Platine ou substrat pour un appareil electronique organique et utilisation de ladite platine
US8665247B2 (en) 2003-05-30 2014-03-04 Global Oled Technology Llc Flexible display
US6950157B2 (en) 2003-06-05 2005-09-27 Eastman Kodak Company Reflective cholesteric liquid crystal display with complementary light-absorbing layer
DE10330064B3 (de) 2003-07-03 2004-12-09 Siemens Ag Logikgatter mit potentialfreier Gate-Elektrode für organische integrierte Schaltungen
DE10330063A1 (de) 2003-07-03 2005-02-03 Siemens Ag Verfahren zur Strukturierung und Integration organischer Schichten unter Schutz
DE10335336B4 (de) * 2003-08-01 2011-06-16 Polyic Gmbh & Co. Kg Feldeffektbauelemente und Kondensatoren mit Elektrodenanordnung in einer Schichtebene
DE10338277A1 (de) 2003-08-20 2005-03-17 Siemens Ag Organischer Kondensator mit spannungsgesteuerter Kapazität
DE10340641A1 (de) 2003-09-03 2005-04-07 Siemens Ag Strukturierung von Gate-Dielektrika in organischen Feldeffekt-Transistoren
JP4400327B2 (ja) 2003-09-11 2010-01-20 セイコーエプソン株式会社 タイル状素子用配線形成方法
US7122828B2 (en) 2003-09-24 2006-10-17 Lucent Technologies, Inc. Semiconductor devices having regions of induced high and low conductivity, and methods of making the same
US7358530B2 (en) 2003-12-12 2008-04-15 Palo Alto Research Center Incorporated Thin-film transistor array with ring geometry

Non-Patent Citations (1)

* Cited by examiner, † Cited by third party
Title
See references of WO2006108514A2 *

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CN101160594B (zh) 2014-03-05
TW200707818A (en) 2007-02-16
KR20080002833A (ko) 2008-01-04
WO2006108514A3 (fr) 2007-04-05
DE102005017655B4 (de) 2008-12-11
US20080203383A1 (en) 2008-08-28
US7812343B2 (en) 2010-10-12
JP4977126B2 (ja) 2012-07-18
CN101160594A (zh) 2008-04-09
JP2008536227A (ja) 2008-09-04
DE102005017655A1 (de) 2006-11-02
TWI314369B (en) 2009-09-01
WO2006108514A2 (fr) 2006-10-19
KR101244124B1 (ko) 2013-03-14

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