EP2461387A4 - Dampfablagerungsmaterial für eine organische vorrichtung und verfahren zur herstellung der organischen vorrichtung - Google Patents

Dampfablagerungsmaterial für eine organische vorrichtung und verfahren zur herstellung der organischen vorrichtung

Info

Publication number
EP2461387A4
EP2461387A4 EP10804372A EP10804372A EP2461387A4 EP 2461387 A4 EP2461387 A4 EP 2461387A4 EP 10804372 A EP10804372 A EP 10804372A EP 10804372 A EP10804372 A EP 10804372A EP 2461387 A4 EP2461387 A4 EP 2461387A4
Authority
EP
European Patent Office
Prior art keywords
organic device
deposition material
vapor deposition
manufacturing
manufacturing organic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Withdrawn
Application number
EP10804372A
Other languages
English (en)
French (fr)
Other versions
EP2461387A1 (de
Inventor
Masayuki Hayashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UDC Ireland Ltd
Original Assignee
UDC Ireland Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UDC Ireland Ltd filed Critical UDC Ireland Ltd
Publication of EP2461387A1 publication Critical patent/EP2461387A1/de
Publication of EP2461387A4 publication Critical patent/EP2461387A4/de
Withdrawn legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H10K85/342—Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising iridium
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K11/00—Luminescent materials, e.g. electroluminescent or chemiluminescent
    • C09K11/06—Luminescent materials, e.g. electroluminescent or chemiluminescent containing organic luminescent materials
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/06—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the coating material
    • C23C14/12—Organic material
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05B—ELECTRIC HEATING; ELECTRIC LIGHT SOURCES NOT OTHERWISE PROVIDED FOR; CIRCUIT ARRANGEMENTS FOR ELECTRIC LIGHT SOURCES, IN GENERAL
    • H05B33/00—Electroluminescent light sources
    • H05B33/10—Apparatus or processes specially adapted to the manufacture of electroluminescent light sources
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K71/00—Manufacture or treatment specially adapted for the organic devices covered by this subclass
    • H10K71/10—Deposition of organic active material
    • H10K71/16—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering
    • H10K71/164—Deposition of organic active material using physical vapour deposition [PVD], e.g. vacuum deposition or sputtering using vacuum deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K85/00—Organic materials used in the body or electrodes of devices covered by this subclass
    • H10K85/30—Coordination compounds
    • H10K85/341—Transition metal complexes, e.g. Ru(II)polypyridine complexes
    • H10K85/346—Transition metal complexes, e.g. Ru(II)polypyridine complexes comprising platinum
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10—Non-macromolecular compounds
    • C09K2211/1003—Carbocyclic compounds
    • C09K2211/1007—Non-condensed systems
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09K—MATERIALS FOR MISCELLANEOUS APPLICATIONS, NOT PROVIDED FOR ELSEWHERE
    • C09K2211/00—Chemical nature of organic luminescent or tenebrescent compounds
    • C09K2211/10—Non-macromolecular compounds
    • C09K2211/1003—Carbocyclic compounds
    • C09K2211/1011—Condensed systems
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K2101/00—Properties of the organic materials covered by group H10K85/00
    • H10K2101/10—Triplet emission
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10K—ORGANIC ELECTRIC SOLID-STATE DEVICES
    • H10K50/00—Organic light-emitting devices
    • H10K50/10—OLEDs or polymer light-emitting diodes [PLED]
    • H10K50/11—OLEDs or polymer light-emitting diodes [PLED] characterised by the electroluminescent [EL] layers
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/29—Coated or structually defined flake, particle, cell, strand, strand portion, rod, filament, macroscopic fiber or mass thereof
    • Y10T428/2982—Particulate matter [e.g., sphere, flake, etc.]

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Organic Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Inorganic Chemistry (AREA)
  • Electroluminescent Light Sources (AREA)
  • Physical Vapour Deposition (AREA)
EP10804372A 2009-07-31 2010-07-26 Dampfablagerungsmaterial für eine organische vorrichtung und verfahren zur herstellung der organischen vorrichtung Withdrawn EP2461387A4 (de)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2009179957 2009-07-31
JP2009219311 2009-09-24
PCT/JP2010/062538 WO2011013626A1 (ja) 2009-07-31 2010-07-26 有機デバイス用蒸着材料及び有機デバイスの製造方法

Publications (2)

Publication Number Publication Date
EP2461387A1 EP2461387A1 (de) 2012-06-06
EP2461387A4 true EP2461387A4 (de) 2013-01-23

Family

ID=43529282

Family Applications (1)

Application Number Title Priority Date Filing Date
EP10804372A Withdrawn EP2461387A4 (de) 2009-07-31 2010-07-26 Dampfablagerungsmaterial für eine organische vorrichtung und verfahren zur herstellung der organischen vorrichtung

Country Status (7)

Country Link
US (1) US20120135239A1 (de)
EP (1) EP2461387A4 (de)
JP (1) JP4801211B2 (de)
KR (1) KR101235776B1 (de)
CN (1) CN102473854B (de)
TW (1) TWI486467B (de)
WO (1) WO2011013626A1 (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5662893B2 (ja) * 2011-07-25 2015-02-04 富士フイルム株式会社 光電変換素子用蒸着材料及び光電変換素子、センサ、撮像素子
KR20140140417A (ko) * 2013-05-29 2014-12-09 삼성디스플레이 주식회사 유기 발광 소자
JP6111171B2 (ja) * 2013-09-02 2017-04-05 東京エレクトロン株式会社 成膜方法及び成膜装置
KR20160049974A (ko) * 2014-10-28 2016-05-10 가부시키가이샤 한도오따이 에네루기 켄큐쇼 발광 소자, 발광 장치, 전자기기, 및 조명 장치

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US6197218B1 (en) * 1997-02-24 2001-03-06 Superior Micropowders Llc Photoluminescent phosphor powders, methods for making phosphor powders and devices incorporating same
EP1367655A1 (de) * 2001-09-03 2003-12-03 Matsushita Electric Industrial Co., Ltd. "halbleiter-lichtemissionsbauelement, lichtemissionsvorrichtung und herstellungsverfahren für ein halbleiter-lichtemissionsbauelement"
US20050181948A1 (en) * 2002-03-28 2005-08-18 Wassilios Grammenos Phenethylacrylamide, methods for the production thereof and agents containing the same
EP2418264A1 (de) * 2009-04-10 2012-02-15 Idemitsu Kosan Co., Ltd. Organisches elektrolumineszenz-verbundelement und verfahren zu seiner herstellung

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EP1367655A1 (de) * 2001-09-03 2003-12-03 Matsushita Electric Industrial Co., Ltd. "halbleiter-lichtemissionsbauelement, lichtemissionsvorrichtung und herstellungsverfahren für ein halbleiter-lichtemissionsbauelement"
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See also references of WO2011013626A1 *

Also Published As

Publication number Publication date
US20120135239A1 (en) 2012-05-31
JP2011091025A (ja) 2011-05-06
EP2461387A1 (de) 2012-06-06
TWI486467B (zh) 2015-06-01
WO2011013626A1 (ja) 2011-02-03
JP4801211B2 (ja) 2011-10-26
KR20120030163A (ko) 2012-03-27
CN102473854A (zh) 2012-05-23
KR101235776B1 (ko) 2013-02-21
TW201116638A (en) 2011-05-16
CN102473854B (zh) 2013-04-17

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