EP2599114A4 - Zones de soin dynamique - Google Patents

Zones de soin dynamique

Info

Publication number
EP2599114A4
EP2599114A4 EP11813143.2A EP11813143A EP2599114A4 EP 2599114 A4 EP2599114 A4 EP 2599114A4 EP 11813143 A EP11813143 A EP 11813143A EP 2599114 A4 EP2599114 A4 EP 2599114A4
Authority
EP
European Patent Office
Prior art keywords
care areas
dynamic care
dynamic
areas
care
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP11813143.2A
Other languages
German (de)
English (en)
Other versions
EP2599114B1 (fr
EP2599114A2 (fr
Inventor
Ashok V Kulkarni
Chien-Huei Adam Chen
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
KLA Corp
Original Assignee
KLA Tencor Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by KLA Tencor Corp filed Critical KLA Tencor Corp
Publication of EP2599114A2 publication Critical patent/EP2599114A2/fr
Publication of EP2599114A4 publication Critical patent/EP2599114A4/fr
Application granted granted Critical
Publication of EP2599114B1 publication Critical patent/EP2599114B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B23/00—Testing or monitoring of control systems or parts thereof
    • G05B23/02—Electric testing or monitoring
    • G05B23/0205—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults
    • G05B23/0259—Electric testing or monitoring by means of a monitoring system capable of detecting and responding to faults characterized by the response to fault detection
    • G05B23/0297—Reconfiguration of monitoring system, e.g. use of virtual sensors; change monitoring method as a response to monitoring results
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B19/00—Program-control systems
    • G05B19/02—Program-control systems electric
    • G05B19/418—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM]
    • G05B19/41875—Total factory control, i.e. centrally controlling a plurality of machines, e.g. direct or distributed numerical control [DNC], flexible manufacturing systems [FMS], integrated manufacturing systems [IMS] or computer integrated manufacturing [CIM] characterised by quality surveillance of production
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/23—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by multiple measurements, corrections, marking or sorting processes
    • G—PHYSICS
    • G05—CONTROLLING; REGULATING
    • G05B—CONTROL OR REGULATING SYSTEMS IN GENERAL; FUNCTIONAL ELEMENTS OF SUCH SYSTEMS; MONITORING OR TESTING ARRANGEMENTS FOR SUCH SYSTEMS OR ELEMENTS
    • G05B2219/00—Program-control systems
    • G05B2219/30—Nc systems
    • G05B2219/45—Nc applications
    • G05B2219/45031—Manufacturing semiconductor wafers
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10P—GENERIC PROCESSES OR APPARATUS FOR THE MANUFACTURE OR TREATMENT OF DEVICES COVERED BY CLASS H10
    • H10P74/00—Testing or measuring during manufacture or treatment of wafers, substrates or devices
    • H10P74/20—Testing or measuring during manufacture or treatment of wafers, substrates or devices characterised by the properties tested or measured, e.g. structural or electrical properties
    • H10P74/203—Structural properties, e.g. testing or measuring thicknesses, line widths, warpage, bond strengths or physical defects
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
    • Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
    • Y02P90/00—Enabling technologies with a potential contribution to greenhouse gas [GHG] emissions mitigation
    • Y02P90/02—Total factory control, e.g. smart factories, flexible manufacturing systems [FMS] or integrated manufacturing systems [IMS]

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Automation & Control Theory (AREA)
  • General Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Quality & Reliability (AREA)
  • Testing Or Measuring Of Semiconductors Or The Like (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Investigating Or Analysing Biological Materials (AREA)
EP11813143.2A 2010-07-30 2011-07-27 Détermination de zones de test pour des plaquettes de silicium Active EP2599114B1 (fr)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US36964110P 2010-07-30 2010-07-30
US13/174,556 US8781781B2 (en) 2010-07-30 2011-06-30 Dynamic care areas
PCT/US2011/045610 WO2012015973A2 (fr) 2010-07-30 2011-07-27 Zones de soin dynamique

Publications (3)

Publication Number Publication Date
EP2599114A2 EP2599114A2 (fr) 2013-06-05
EP2599114A4 true EP2599114A4 (fr) 2016-12-28
EP2599114B1 EP2599114B1 (fr) 2018-01-10

Family

ID=45527601

Family Applications (1)

Application Number Title Priority Date Filing Date
EP11813143.2A Active EP2599114B1 (fr) 2010-07-30 2011-07-27 Détermination de zones de test pour des plaquettes de silicium

Country Status (5)

Country Link
US (1) US8781781B2 (fr)
EP (1) EP2599114B1 (fr)
JP (1) JP2013535837A (fr)
KR (1) KR101863976B1 (fr)
WO (1) WO2012015973A2 (fr)

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US10514685B2 (en) * 2014-06-13 2019-12-24 KLA—Tencor Corp. Automatic recipe stability monitoring and reporting
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US9727047B2 (en) * 2014-10-14 2017-08-08 Kla-Tencor Corp. Defect detection using structural information
US10483081B2 (en) 2014-10-22 2019-11-19 Kla-Tencor Corp. Self directed metrology and pattern classification
US10267746B2 (en) 2014-10-22 2019-04-23 Kla-Tencor Corp. Automated pattern fidelity measurement plan generation
US9286675B1 (en) 2014-10-23 2016-03-15 Applied Materials Israel Ltd. Iterative defect filtering process
US10018571B2 (en) 2015-05-28 2018-07-10 Kla-Tencor Corporation System and method for dynamic care area generation on an inspection tool
US10062543B2 (en) 2015-06-23 2018-08-28 Kla-Tencor Corp. Determining multi-patterning step overlay error
US9735064B2 (en) * 2015-07-29 2017-08-15 Globalfoundries Inc. Charge dynamics effect for detection of voltage contrast defect and determination of shorting location
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US10600175B2 (en) * 2017-03-24 2020-03-24 Kla-Tencor Corporation Dynamic care areas for defect detection
US10648925B2 (en) * 2017-06-05 2020-05-12 Kla-Tencor Corporation Repeater defect detection
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US11776859B2 (en) 2018-12-19 2023-10-03 Kla Corporation Care area based swath speed for throughput and sensitivity improvement
US11087449B2 (en) * 2019-10-24 2021-08-10 KLA Corp. Deep learning networks for nuisance filtering
US11615993B2 (en) 2019-11-21 2023-03-28 Kla Corporation Clustering sub-care areas based on noise characteristics
US12165306B2 (en) 2021-03-16 2024-12-10 Kla Corporation Segmentation of design care areas with a rendered design image
US11887296B2 (en) * 2021-07-05 2024-01-30 KLA Corp. Setting up care areas for inspection of a specimen
US20250123225A1 (en) * 2023-10-17 2025-04-17 Kla Corporation Spectra delta metrology

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US8781781B2 (en) 2014-07-15
KR101863976B1 (ko) 2018-06-01
EP2599114B1 (fr) 2018-01-10
EP2599114A2 (fr) 2013-06-05
WO2012015973A2 (fr) 2012-02-02
JP2013535837A (ja) 2013-09-12
WO2012015973A3 (fr) 2012-04-26
KR20130092559A (ko) 2013-08-20
US20120029858A1 (en) 2012-02-02

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