EP3067444A2 - Separation de revetements decoratifs en alliage palladium-fer sur des substances metalliques - Google Patents

Separation de revetements decoratifs en alliage palladium-fer sur des substances metalliques Download PDF

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Publication number
EP3067444A2
EP3067444A2 EP16156476.0A EP16156476A EP3067444A2 EP 3067444 A2 EP3067444 A2 EP 3067444A2 EP 16156476 A EP16156476 A EP 16156476A EP 3067444 A2 EP3067444 A2 EP 3067444A2
Authority
EP
European Patent Office
Prior art keywords
palladium
iron
objects
alloy
coating
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP16156476.0A
Other languages
German (de)
English (en)
Other versions
EP3067444B1 (fr
EP3067444A3 (fr
Inventor
Claudia GARHÖFER-ONDREICSKA
Christian GARHÖFER
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ing W Garhofer GmbH
W Garhofer Ing GmbH
Original Assignee
Ing W Garhofer GmbH
W Garhofer Ing GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Ing W Garhofer GmbH, W Garhofer Ing GmbH filed Critical Ing W Garhofer GmbH
Publication of EP3067444A2 publication Critical patent/EP3067444A2/fr
Publication of EP3067444A3 publication Critical patent/EP3067444A3/fr
Application granted granted Critical
Publication of EP3067444B1 publication Critical patent/EP3067444B1/fr
Active legal-status Critical Current
Anticipated expiration legal-status Critical

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Classifications

    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/56Electroplating: Baths therefor from solutions of alloys
    • C25D3/567Electroplating: Baths therefor from solutions of alloys containing more than 50% by weight of platinum group metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/20Electroplating: Baths therefor from solutions of iron
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D3/00Electroplating: Baths therefor
    • C25D3/02Electroplating: Baths therefor from solutions
    • C25D3/50Electroplating: Baths therefor from solutions of platinum group metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/10Electroplating with more than one layer of the same or of different metals
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/60Electroplating characterised by the structure or texture of the layers
    • C25D5/605Surface topography of the layers, e.g. rough, dendritic or nodular layers
    • C25D5/611Smooth layers
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/627Electroplating characterised by the visual appearance of the layers, e.g. colour, brightness or mat appearance
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D7/00Electroplating characterised by the article coated
    • C25D7/005Jewels; Clockworks; Coins
    • CCHEMISTRY; METALLURGY
    • C25ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
    • C25DPROCESSES FOR THE ELECTROLYTIC OR ELECTROPHORETIC PRODUCTION OF COATINGS; ELECTROFORMING; APPARATUS THEREFOR
    • C25D5/00Electroplating characterised by the process; Pretreatment or after-treatment of workpieces
    • C25D5/34Pretreatment of metallic surfaces to be electroplated

Definitions

  • the present invention is directed to an electrolytic bath composition for depositing white, high-gloss, crack-free, abrasion and corrosion-resistant palladium-iron alloys from alkaline aqueous baths, objects and articles coated with these alloys, and a process for producing the coated objects Items.
  • the electrolytes are out JP, 2001-192885 A, are also based on ammonium salts and contain additional brighteners and possibly different alloying metals such as iron or tellurium.
  • JP, 2001-181887 A describes palladium-iron alloy baths which are also based on ammonium salts and additionally contain EDTA.
  • strong chelating agents are generally undesirable in electrolytes since they introduce difficulties in wastewater treatment.
  • JP, 10-046384 A describes palladium alloy baths for the electronics industry. Iron as alloying metal is mentioned, the electrolytes are based on ammonium salts. The examples, however, relate only to palladium-cobalt alloys. Alloys of palladium-iron, palladium-nickel, palladium-rhodium and palladium-ruthenium should be produced in the same way.
  • DE2657925 describes ammonia-free, semi-glossy to bright palladium and palladium alloy baths for electrical engineering, but iron is not mentioned as alloying metal.
  • the object of the present invention to develop baths from which high gloss, binary palladium-iron alloys can be deposited without any addition of other metals and.
  • the alloy baths during operation should not present an odor nuisance or health hazard through the release of irritating gases or vapors, and moreover contain no strong complexing agents such as EDTA or NTA, which would cause problems in wastewater treatment.
  • the production is to be cheapened by the use of such alloy baths, and resources of the expensive palladium are spared.
  • Such alloys are therefore particularly well suited for any metallic white decorative coating, e.g. of costume jewelery, but also for industrial applications, especially in the electronics industry.
  • the baths contain 0.5-15 g / l of palladium, 0.2-2 g / l of iron, conductive salts, brighteners and wetting agents. It is possible to deposit layer thicknesses> 5 ⁇ high-gloss, crack-free. The corrosion resistance is comparable to pure palladium, the abrasion resistance is better than pure palladium.
  • the invention relates to a novel electrolyte bath for the cathodic deposition of binary alloys and / or layer sequences to form white, corrosion-resistant, crack-free and high-gloss coatings on at least on their surface metallic or electrically conductive or conductive coated objects, which bath as electrolyte at least one complex Palladium compound and at least one iron salt, and characterized in that it - for the deposition of a PdFe alloy containing 5-15 wt .-% Fe - as aqueous, alkaline solution is present and in addition to containing as metal compounds, as a further essential component at least one wetting agent from the group of amphoteric surfactants and additionally at least one of the additives contained in galvanic palladium in the usual manner brightener and conductive salts, pH stabilizers and stress reducer.
  • the pH of the new alloy bath should be maintained in the range of 7.5 - 9, since at lower pH values (approximately between 7 and 7.5) the incorporation rates of iron decrease. At higher pH values (approximately between 9 and 10), burns occur in the high current density range.
  • the pH is advantageously adjusted by means of sodium or potassium hydroxide.
  • the iron content of the deposited alloy at 5-15 wt .-% Fe, since at incorporation rates> 15 wt .- Fe Fe the layers are cracked, and at incorporation rates ⁇ 5% by weight, the deposition receives a milky appearance.
  • palladium in divalent form e.g. as palladium chloride, sulfate, nitrate, and iron
  • the ferric salt e.g. be present as sulfate, chloride, nitrate or citrate in the electrolyte bath.
  • an electrolyte bath is advantageously provided for the deposition of a coating, which is characterized in that it has a content of palladium of 0.5 to 15 g / l, preferably from 2 to 8 g / l, and particularly preferably from 4 to 6 g / l, and iron of 0.2 to 2 g / l, preferably from 0.5 to 1.5 g / l.
  • the wetting agents essential to the extraordinary properties of the novel alloy coatings in particular from the group of amphoteric surfactants, e.g. Betaine and sulfobetaines are advantageously added to the electrolyte in amounts of 0.5-2 g / l.
  • the new electrolyte bath As for other components of the new electrolyte bath than the essential metal compounds and wetting agents, it has proven to be advantageous if it contains brighteners. Such brighteners for palladium baths are known and come for example from the group of substituted aromatic N-heterocycles. It has also proved to be advantageous if the electrolyte contains stress reducers such as saccharin or organic sulfonates.
  • conductive salts and pH stabilizers such as sodium or potassium sulfate, nitrate, chloride, citrate, tartrate or malonate, and possibly further surface-active or wetting agents, for example alkyl ether sulfonates, alkyl ether phosphates or fatty alcohol alkoxylates.
  • All conductive salts or pH stabilizers used in the invention are sodium or potassium salts.
  • ammonia or ammonium salts When using ammonia or ammonium salts at elevated temperatures of about 50 ° C, ammonia is constantly expelled. As a result, the pH of the bath constantly adjusted and continuous work is much more difficult. In addition, there is a constant odor nuisance and health hazard for the operator of the electrolyte.
  • no organic acids or salts are used which, when the bath is heated at elevated temperature, release vapors which can lead to an odor nuisance and / or health hazard to the operators of the electrolyte, e.g. Propionic acid / propionates, acetic acid / acetates.
  • Another very important object of the invention are objects or articles, in particular jewelery or decorative articles, and further electro-technical or electronic components and components of a preferably physiologically acceptable metal, in particular brass, zinc, tin, iron or steel, or from alloys thereof or else from a conductive plastic with a coating of a binary alloy of palladium and iron deposited from an abovementioned electrolyte bath, in which the iron content is from 5 to 12% by weight, to which in particular reference is made to claim 7 becomes.
  • a preferably physiologically acceptable metal in particular brass, zinc, tin, iron or steel, or from alloys thereof or else from a conductive plastic with a coating of a binary alloy of palladium and iron deposited from an abovementioned electrolyte bath, in which the iron content is from 5 to 12% by weight, to which in particular reference is made to claim 7 becomes.
  • the total thickness of the binary palladium-iron coating to be achieved in the context of the invention is 0.1 to 5 ⁇ m, in particular about 0.5 to 3 ⁇ m, depending on the field of use.
  • the intermediate layer of adhesive gold has a thickness of 0.05 to 0.3 microns.
  • the new objects or articles will have a final layer of one with rhodium and ruthenium, preferably in the weight% ratio of (70 to 90) to (30 to 10), especially about 80 to 20 , formed alloy.
  • the working temperature of the electrolyte baths according to the invention is between 35 and 75 ° C.
  • the current density can be set to between 0.01 and 10 amps / dm 2 , depending on the type of coating system.
  • insoluble anodes those made of a material selected from the group consisting of platinized titanium and iridium-transition metal mixed oxide or combinations of these materials are preferably used. Particular preference is given to using platinized titanium anodes.
  • This palladium-iron alloy can be either final or final layer, or further coated by methods known per se. Further z. B. intermediate or final coatings may, as mentioned above, gold-containing or other noble metal-containing layers, such as those of rhodium, platinum, ruthenium or their alloys.
  • the base material is first copper-plated, then coated with palladium and finally receives the desired finish by coating with gold, rhodium or other precious metals or their alloys.
  • a thickness of the palladium layer of about 0.5-5 microns is recommended. Usually a layer thickness of about 1 ⁇ m is considered sufficient.
  • rhodium-ruthenium alloy instead of a rhodium final layer. If, for example, an alloy in the ratio by weight of rhodium to ruthenium of 80:20 is deposited as the final layer, in addition to the savings in the intermediate layers mentioned above, 20% of the very expensive rhodium would be saved.
  • the invention further relates to a per se conventional method for cathodic deposition of the binary alloys according to the invention with an Fe content of 5-15% by weight on at least on their surface metallic or electrically conductive or conductive coated objects or articles using the electrolyte according to the invention according to claim 15.
  • the invention further relates to the use of the electrolyte bath according to the invention for the cathodic deposition of binary alloys on at least on their surface metallic or electrically conductive or conductive coated objects or articles according to claim 16.
  • the jewelry blank is rinsed in deionized water, dekapiert in 5% sulfuric acid solution for 30 s and in an acidic copper bath with 50 g / l Cu and 60 g / l sulfuric acid ("IWG Cu 550", product of the company. Ing. Garhöfer GesmbH), 20 ⁇ m copper are deposited in a shiny, shiny finish at 4 A / dm 2 and 25 ° C. The blank is rinsed again.
  • the corrosion resistance of the palladium-iron alloy in comparison with a coating of a pure palladium electrolyte (Gapal TS, product of Garhöfer GesmbH), produced on the same base material in the SO 2 test is equally good.
  • a brass disc in the palladium-iron electrolyte of example 1 and a brass disc in a pure palladium electrolyte (Gapal TS, product of Garhöfer GesmbH) were coated with 2 .mu.m. Ansch manend both discs were abraded. The pure palladium was rubbed much earlier than the palladium-iron alloy.
  • a jewelery blank made of die-cast zinc is electrolytically degreased in a weakly alkaline cyanide-free cleaner (degreasing 1018, product of the company Ing. W. Garhöfer GesmbH) at 25 ° C. for 30 seconds at 10 A / dm 2 .
  • a weakly alkaline cyanide-free cleaner degreasing 1018, product of the company Ing. W. Garhöfer GesmbH
  • the jewelry blank is rinsed in deionized water and in an alkaline cyanide Vorkupferbad with 22 g / l Cu and 34 g / l KCN ("Cuproga", product of the company Ing. W. Garhöfer GesmbH) were 5 microns of copper at 1 A / dm 2 and 50 ° C deposited.
  • the pre-coppered jewelry blank is then dekapiert in 5% sulfuric acid solution for 30 s and in an acidic copper bath with 50 g / l Cu and 60 g / l sulfuric acid ("IWG Cu 550", product of the company Ing. W. Garhöfer GesmbH) 15 ⁇ m copper leveling and high gloss deposited at 4 A / dm 2 and 25 ° C.
  • the thus coppered part is rinsed and pre-immersed in a 10% KCN solution.

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  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Electrochemistry (AREA)
  • Materials Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Electroplating And Plating Baths Therefor (AREA)
EP16156476.0A 2015-03-09 2016-02-19 Deposition de revetements decoratifs en alliage palladium-fer sur des substances metalliques Active EP3067444B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
ATA50188/2015A AT516876B1 (de) 2015-03-09 2015-03-09 Abscheidung von dekorativen Palladium-Eisen-Legierungsbeschichtungen auf metallischen Substanzen

Publications (3)

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EP3067444A2 true EP3067444A2 (fr) 2016-09-14
EP3067444A3 EP3067444A3 (fr) 2016-12-07
EP3067444B1 EP3067444B1 (fr) 2019-03-27

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AT (1) AT516876B1 (fr)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US10612149B1 (en) 2019-09-05 2020-04-07 Chow Sang Sang Jewellery Company Limited Platinum electrodeposition bath and uses thereof
EP3733930A1 (fr) * 2019-05-03 2020-11-04 IWG Ing. W. Garhöfer Gesellschaft m. b. H. Système de revêtement destiné à l'application par dépôt galvanique sur un lingot
AT523922A4 (de) * 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2657925A1 (de) 1976-12-21 1978-06-22 Siemens Ag Ammoniakfreies, waessriges bad zur galvanischen abscheidung von palladium bzw. palladiumlegierungen
JPH1046384A (ja) 1996-05-10 1998-02-17 Lucent Technol Inc パラジウム合金メッキ浴
JP2001181887A (ja) 1999-12-24 2001-07-03 Bikutoria:Kk パラジウム/鉄合金メッキ液及びパラジウム合金メッキ基材
JP2001192885A (ja) 1999-10-27 2001-07-17 Kojima Kagaku Yakuhin Kk パラジウムめっき液

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DE2906783A1 (de) * 1979-02-22 1980-10-16 Degussa Verfahren zur vorbehandlung von leichtmetallen vor dem galvanisieren
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US6251249B1 (en) * 1996-09-20 2001-06-26 Atofina Chemicals, Inc. Precious metal deposition composition and process
EP1396559A4 (fr) * 1999-10-27 2006-10-11 Kojima Chemicals Co Ltd Solution de galvanoplastie de palladium
JP4811880B2 (ja) * 2006-01-06 2011-11-09 エントン インコーポレイテッド 艶消し金属層を堆積するための電解液および工程
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Publication number Priority date Publication date Assignee Title
DE2657925A1 (de) 1976-12-21 1978-06-22 Siemens Ag Ammoniakfreies, waessriges bad zur galvanischen abscheidung von palladium bzw. palladiumlegierungen
JPH1046384A (ja) 1996-05-10 1998-02-17 Lucent Technol Inc パラジウム合金メッキ浴
JP2001192885A (ja) 1999-10-27 2001-07-17 Kojima Kagaku Yakuhin Kk パラジウムめっき液
JP2001181887A (ja) 1999-12-24 2001-07-03 Bikutoria:Kk パラジウム/鉄合金メッキ液及びパラジウム合金メッキ基材

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Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP3733930A1 (fr) * 2019-05-03 2020-11-04 IWG Ing. W. Garhöfer Gesellschaft m. b. H. Système de revêtement destiné à l'application par dépôt galvanique sur un lingot
US10612149B1 (en) 2019-09-05 2020-04-07 Chow Sang Sang Jewellery Company Limited Platinum electrodeposition bath and uses thereof
AT523922A4 (de) * 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen
AT523922B1 (de) * 2020-09-08 2022-01-15 Iwg Ing W Garhoefer Ges M B H Elektrolytbad für Palladium-Ruthenium-Beschichtungen
EP3964610A1 (fr) * 2020-09-08 2022-03-09 IWG Ing. W. Garhöfer Gesellschaft m. b. H. Bain d'électrodéposition pour revêtements palladium-ruthénium

Also Published As

Publication number Publication date
AT516876A1 (de) 2016-09-15
EP3067444B1 (fr) 2019-03-27
EP3067444A3 (fr) 2016-12-07
AT516876B1 (de) 2016-11-15

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