ES2030376T1 - Fuente de plasma de radiofrecuencia capacitivamente acoplada. - Google Patents

Fuente de plasma de radiofrecuencia capacitivamente acoplada.

Info

Publication number
ES2030376T1
ES2030376T1 ES199191630060T ES91630060T ES2030376T1 ES 2030376 T1 ES2030376 T1 ES 2030376T1 ES 199191630060 T ES199191630060 T ES 199191630060T ES 91630060 T ES91630060 T ES 91630060T ES 2030376 T1 ES2030376 T1 ES 2030376T1
Authority
ES
Spain
Prior art keywords
plasma source
capacitively coupled
accelerated
radiofrequency plasma
plasma
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
ES199191630060T
Other languages
English (en)
Other versions
ES2030376T3 (es
Inventor
Harold R. Kaufman
Raymond S. Robinson
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Kaufman and Robinson Inc
Original Assignee
Kaufman and Robinson Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaufman and Robinson Inc filed Critical Kaufman and Robinson Inc
Publication of ES2030376T1 publication Critical patent/ES2030376T1/es
Application granted granted Critical
Publication of ES2030376T3 publication Critical patent/ES2030376T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Lock And Its Accessories (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)

Abstract

UN PAR DE ELECTRODOS DE TAMAÑO NO SIMILAR (84, 70) SON GUIADOS POR UNA FUENTE DE RADIOFRECUENCIA PARA CREAR UN PLASMA. UN CAMPO MAGNETICO (100) ESTA ORIENTADO DE FORMA QUE SEA PARALELO A UNA SUPERFICIE DEL ELECTRODO PEQUEÑO (84). LA RESISTENCIA DEL CAMPO AUMENTA EN CUALQUIER LADO DEL ELECTRODO PEQUEÑO (84). SEGUN SE MUESTRA, LOS IONES SE ACELERAN ELECTROSTATICAMENTE FUERA DEL PLASMA, PERO PODRAN ACELERARSE TAMBIEN MAGNETICAMENTE, LOS ELECTRONES PUEDEN EXTRAERSE, ALTERNATIVAMENTE, O NO PODRAN SER UN MECANISMO ACELERADO.
ES91630060T 1990-08-31 1991-08-29 Fuente de plasma con acoplamiento capacitivo de radiofrecuencia. Expired - Lifetime ES2030376T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57679690A 1990-08-31 1990-08-31

Publications (2)

Publication Number Publication Date
ES2030376T1 true ES2030376T1 (es) 1992-11-01
ES2030376T3 ES2030376T3 (es) 1997-07-01

Family

ID=24306028

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91630060T Expired - Lifetime ES2030376T3 (es) 1990-08-31 1991-08-29 Fuente de plasma con acoplamiento capacitivo de radiofrecuencia.

Country Status (8)

Country Link
EP (1) EP0474584B1 (es)
JP (1) JPH0810633B2 (es)
AT (1) ATE149781T1 (es)
CA (1) CA2049876C (es)
DE (2) DE474584T1 (es)
DK (1) DK0474584T3 (es)
ES (1) ES2030376T3 (es)
GR (2) GR920300058T1 (es)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325021A (en) * 1992-04-09 1994-06-28 Clemson University Radio-frequency powered glow discharge device and method with high voltage interface
RU2121729C1 (ru) * 1996-11-18 1998-11-10 Татьяна Борисовна Антонова Газоразрядное устройство
RU2263995C2 (ru) * 2003-05-30 2005-11-10 Кошкин Валерий Викторович Устройство высокочастотное для вакуумно-плазменной обработки поверхности
US9536725B2 (en) 2013-02-05 2017-01-03 Clemson University Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge
DE102015215051A1 (de) * 2015-08-06 2017-02-09 Terraplasma Gmbh Vorrichtung und Verfahren zum Erzeugen eines Plasmas, sowie Verwendung einer solchen Vorrichtung
CN107340139B (zh) * 2017-06-21 2020-06-02 北京卫星环境工程研究所 电推进航天器系统级点火试验溅射靶装置
US11596876B2 (en) 2018-02-05 2023-03-07 Clemson University Research Foundation Channeled fibers in separation of biologically active nanoparticles

Also Published As

Publication number Publication date
DE69124882D1 (de) 1997-04-10
EP0474584A2 (en) 1992-03-11
JPH0810633B2 (ja) 1996-01-31
DK0474584T3 (da) 1997-09-08
ES2030376T3 (es) 1997-07-01
CA2049876C (en) 1998-02-10
EP0474584B1 (en) 1997-03-05
GR920300058T1 (en) 1992-08-31
CA2049876A1 (en) 1992-03-01
GR3023652T3 (en) 1997-09-30
EP0474584A3 (en) 1992-07-15
JPH0689798A (ja) 1994-03-29
DE69124882T2 (de) 1997-09-04
ATE149781T1 (de) 1997-03-15
DE474584T1 (de) 1992-08-13

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