GR3023652T3 - Capacitively coupled radiofrequency plasma source - Google Patents

Capacitively coupled radiofrequency plasma source

Info

Publication number
GR3023652T3
GR3023652T3 GR970401296T GR970401296T GR3023652T3 GR 3023652 T3 GR3023652 T3 GR 3023652T3 GR 970401296 T GR970401296 T GR 970401296T GR 970401296 T GR970401296 T GR 970401296T GR 3023652 T3 GR3023652 T3 GR 3023652T3
Authority
GR
Greece
Prior art keywords
plasma source
capacitively coupled
radiofrequency plasma
plasma
coupled radiofrequency
Prior art date
Application number
GR970401296T
Other languages
English (en)
Inventor
Harold R Kaufman
Raymond S Robinson
Original Assignee
Kaufman & Robinson Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Kaufman & Robinson Inc filed Critical Kaufman & Robinson Inc
Publication of GR3023652T3 publication Critical patent/GR3023652T3/el

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J27/00—Ion beam tubes
    • H01J27/02—Ion sources; Ion guns
    • H01J27/16—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation
    • H01J27/18—Ion sources; Ion guns using high-frequency excitation, e.g. microwave excitation with an applied axial magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32082—Radio frequency generated discharge
    • H01J37/32091—Radio frequency generated discharge the radio frequency energy being capacitively coupled to the plasma
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32009—Arrangements for generation of plasma specially adapted for examination or treatment of objects, e.g. plasma sources
    • H01J37/32357—Generation remote from the workpiece, e.g. down-stream
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/32431—Constructional details of the reactor
    • H01J37/3266—Magnetic control means
    • H01J37/32688—Multi-cusp fields
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05H—PLASMA TECHNIQUE; PRODUCTION OF ACCELERATED ELECTRICALLY-CHARGED PARTICLES OR OF NEUTRONS; PRODUCTION OR ACCELERATION OF NEUTRAL MOLECULAR OR ATOMIC BEAMS
    • H05H1/00—Generating plasma; Handling plasma
    • H05H1/24—Generating plasma
    • H05H1/46—Generating plasma using applied electromagnetic fields, e.g. high frequency or microwave energy

Landscapes

  • Engineering & Computer Science (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electromagnetism (AREA)
  • Combustion & Propulsion (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Plasma Technology (AREA)
  • Chemical Vapour Deposition (AREA)
  • Lock And Its Accessories (AREA)
  • Injection Moulding Of Plastics Or The Like (AREA)
  • Input Circuits Of Receivers And Coupling Of Receivers And Audio Equipment (AREA)
GR970401296T 1990-08-31 1997-06-04 Capacitively coupled radiofrequency plasma source GR3023652T3 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US57679690A 1990-08-31 1990-08-31

Publications (1)

Publication Number Publication Date
GR3023652T3 true GR3023652T3 (en) 1997-09-30

Family

ID=24306028

Family Applications (2)

Application Number Title Priority Date Filing Date
GR92300058T GR920300058T1 (en) 1990-08-31 1992-08-31 Capacitively coupled radiofrequency plasma source
GR970401296T GR3023652T3 (en) 1990-08-31 1997-06-04 Capacitively coupled radiofrequency plasma source

Family Applications Before (1)

Application Number Title Priority Date Filing Date
GR92300058T GR920300058T1 (en) 1990-08-31 1992-08-31 Capacitively coupled radiofrequency plasma source

Country Status (8)

Country Link
EP (1) EP0474584B1 (el)
JP (1) JPH0810633B2 (el)
AT (1) ATE149781T1 (el)
CA (1) CA2049876C (el)
DE (2) DE69124882T2 (el)
DK (1) DK0474584T3 (el)
ES (1) ES2030376T3 (el)
GR (2) GR920300058T1 (el)

Families Citing this family (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5325021A (en) * 1992-04-09 1994-06-28 Clemson University Radio-frequency powered glow discharge device and method with high voltage interface
RU2121729C1 (ru) * 1996-11-18 1998-11-10 Татьяна Борисовна Антонова Газоразрядное устройство
RU2263995C2 (ru) * 2003-05-30 2005-11-10 Кошкин Валерий Викторович Устройство высокочастотное для вакуумно-плазменной обработки поверхности
US9536725B2 (en) 2013-02-05 2017-01-03 Clemson University Means of introducing an analyte into liquid sampling atmospheric pressure glow discharge
DE102015215051A1 (de) * 2015-08-06 2017-02-09 Terraplasma Gmbh Vorrichtung und Verfahren zum Erzeugen eines Plasmas, sowie Verwendung einer solchen Vorrichtung
CN107340139B (zh) * 2017-06-21 2020-06-02 北京卫星环境工程研究所 电推进航天器系统级点火试验溅射靶装置
WO2019152970A1 (en) 2018-02-05 2019-08-08 Clemson University Research Foundation Channeled fibers in separation of biologically active nanoparticles

Also Published As

Publication number Publication date
DE474584T1 (de) 1992-08-13
ATE149781T1 (de) 1997-03-15
DE69124882D1 (de) 1997-04-10
JPH0689798A (ja) 1994-03-29
EP0474584B1 (en) 1997-03-05
ES2030376T1 (es) 1992-11-01
CA2049876A1 (en) 1992-03-01
DK0474584T3 (da) 1997-09-08
ES2030376T3 (es) 1997-07-01
EP0474584A3 (en) 1992-07-15
GR920300058T1 (en) 1992-08-31
DE69124882T2 (de) 1997-09-04
CA2049876C (en) 1998-02-10
EP0474584A2 (en) 1992-03-11
JPH0810633B2 (ja) 1996-01-31

Similar Documents

Publication Publication Date Title
ATE259988T1 (de) Plasma-massenfilter
EP0502633A3 (en) Surface modification by accelerated plasma or ions
WO1999019898A3 (en) Method and apparatus to produce large inductive plasma for plasma processing
EP0343017A3 (en) Reactive ion etching apparatus
ATE168467T1 (de) Ionisationswandler mit sich gegenuberliegenden magneten
GR920300058T1 (en) Capacitively coupled radiofrequency plasma source
SI1356496T1 (sl) Naprava za površinsko obdelavo snovi z naparjenjem
WO1996032735A3 (en) HOLLOW BEAM ELECTRON TUBE HAVING TM0x0 RESONATORS, WHERE x IS GREATER THAN 1
WO2002021565A3 (en) Apparatus for magnetically scanning and/or switching a charged-particle beam
EP0475199A3 (en) A fast atom beam source
SG133405A1 (en) Vacuum arc evaporation apparatus
JPS57203781A (en) Plasma working device
JPS6421073A (en) Ion implanting device
CA2069767A1 (en) High accuracy beam blanker
JPS57194255A (en) Sputtering device
MY120155A (en) Color cathode ray tube
JPS56156763A (en) Finely working method and apparatus by plasma sputtering
JPS6481200A (en) Outside device for beaming ion to cyclotron
Evans Sputter Coating
JPS6443055A (en) Electromagnetic accelerator
JPS6430142A (en) Microwave ion source
JPS5796446A (en) Color picture tube
ZEREN Self-contained hot-hollow cathode gun source assembly(Patent Application)
UA5770A1 (uk) Спосіб обробки поверхонь діелектричних мішеней в вакуумі
RU94010897A (ru) Способ предохранения автоэлектронного катода от ионной бомбардировки