ES2069974T3 - Procedimiento de formacion de un deposito que contiene silice sobre una superficie de un objeto de vidrio. - Google Patents

Procedimiento de formacion de un deposito que contiene silice sobre una superficie de un objeto de vidrio.

Info

Publication number
ES2069974T3
ES2069974T3 ES92402203T ES92402203T ES2069974T3 ES 2069974 T3 ES2069974 T3 ES 2069974T3 ES 92402203 T ES92402203 T ES 92402203T ES 92402203 T ES92402203 T ES 92402203T ES 2069974 T3 ES2069974 T3 ES 2069974T3
Authority
ES
Spain
Prior art keywords
procedure
formation
containing silicon
glass object
deposit containing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES92402203T
Other languages
English (en)
Inventor
Sami Dick
Bernard Genies
Lahcen Ougarane
Patrick Recourt
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Original Assignee
Air Liquide SA
LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Air Liquide SA, LAir Liquide SA pour lEtude et lExploitation des Procedes Georges Claude filed Critical Air Liquide SA
Application granted granted Critical
Publication of ES2069974T3 publication Critical patent/ES2069974T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/001—General methods for coating; Devices therefor
    • C03C17/003—General methods for coating; Devices therefor for hollow ware, e.g. containers
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C17/00—Surface treatment of glass, not in the form of fibres or filaments, by coating
    • C03C17/22—Surface treatment of glass, not in the form of fibres or filaments, by coating with other inorganic material
    • C03C17/23—Oxides
    • C03C17/245—Oxides by deposition from the vapour phase
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
    • C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
    • C23C16/40—Oxides
    • C23C16/401—Oxides containing silicon
    • C23C16/402—Silicon dioxide
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
    • C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
    • C23C16/453—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating passing the reaction gases through burners or torches, e.g. atmospheric pressure CVD
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2217/00—Coatings on glass
    • C03C2217/20—Materials for coating a single layer on glass
    • C03C2217/21—Oxides
    • C03C2217/213—SiO2
    • C—CHEMISTRY; METALLURGY
    • C03—GLASS; MINERAL OR SLAG WOOL
    • C03C—CHEMICAL COMPOSITION OF GLASSES, GLAZES OR VITREOUS ENAMELS; SURFACE TREATMENT OF GLASS; SURFACE TREATMENT OF FIBRES OR FILAMENTS MADE FROM GLASS, MINERALS OR SLAGS; JOINING GLASS TO GLASS OR OTHER MATERIALS
    • C03C2218/00—Methods for coating glass
    • C03C2218/10—Deposition methods
    • C03C2218/15—Deposition methods from the vapour phase
    • C03C2218/152—Deposition methods from the vapour phase by cvd

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials Engineering (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Geochemistry & Mineralogy (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Inorganic Chemistry (AREA)
  • Surface Treatment Of Glass (AREA)
  • Chemical Vapour Deposition (AREA)
  • Application Of Or Painting With Fluid Materials (AREA)
  • Stored Programmes (AREA)
  • Glass Compositions (AREA)

Abstract

SE FORMA UN DEPOSITO DE UNA CAPA A BASE DE SILICE SOBRE UNA SUPERFICIE DE UN OBJETO DE VIDRIO (1) PROYECTANDO SOBRE UNA SUPERFICIE CALIENTE DEL OBJETO,EN ATMOSFERA AMBIENTE NO CONFINADA, UNA MEZCLA GASEOSA QUE TIENE UN CONTENIDO DE SILANO INFERIOR A 2%, UN CONTENIDO DE OXIGENO COMPRENDIDO ENTRE 3,5 Y 30%, Y VENTAJOSAMENTE UN CONTENIDO DE HIDROGENO INFERIOR A 5%. LA SUPERFICIE DEL OBJETO A TRATAR ESTA VENTAJOSAMENTE CALENTADA (6) JUSTO ANTES DE SU PASO AL PUESTO DE INYECCION.
ES92402203T 1991-07-31 1992-07-31 Procedimiento de formacion de un deposito que contiene silice sobre una superficie de un objeto de vidrio. Expired - Lifetime ES2069974T3 (es)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR9109717A FR2679898B1 (fr) 1991-07-31 1991-07-31 Procede de formation d'une couche de silice sur une surface d'un objet en verre.

Publications (1)

Publication Number Publication Date
ES2069974T3 true ES2069974T3 (es) 1995-05-16

Family

ID=9415761

Family Applications (1)

Application Number Title Priority Date Filing Date
ES92402203T Expired - Lifetime ES2069974T3 (es) 1991-07-31 1992-07-31 Procedimiento de formacion de un deposito que contiene silice sobre una superficie de un objeto de vidrio.

Country Status (13)

Country Link
US (1) US5997948A (es)
EP (1) EP0526344B1 (es)
JP (1) JPH05201751A (es)
AR (1) AR247373A1 (es)
BR (1) BR9202962A (es)
CA (1) CA2074964C (es)
CZ (1) CZ283762B6 (es)
DE (1) DE69201613T2 (es)
ES (1) ES2069974T3 (es)
FR (1) FR2679898B1 (es)
MX (1) MX9204463A (es)
SK (1) SK236892A3 (es)
TR (1) TR28359A (es)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US20050044894A1 (en) * 2003-08-29 2005-03-03 Douglas Nelson Deposition of silica coatings on a substrate
ITPD20070272A1 (it) * 2007-08-03 2009-02-04 Nuova Ompi Srl Procedimento per la produzione di contenitori in vetro e prodotto ottenuto
JP5696024B2 (ja) * 2011-11-09 2015-04-08 株式会社東芝 化学的平坦化方法及び化学的平坦化装置

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
NL7005770A (es) * 1969-07-02 1971-01-05
JPS51144183A (en) * 1975-06-06 1976-12-10 Hitachi Ltd Semiconductor element containing surface protection film
JPS5354181A (en) * 1976-10-28 1978-05-17 Fujitsu Ltd Chemical evaporation apparatus
JPS5826052A (ja) * 1981-08-06 1983-02-16 Asahi Glass Co Ltd アルカリ拡散防止酸化ケイ素膜付ガラス体
JPS6244573A (ja) * 1985-08-20 1987-02-26 Nippon Sheet Glass Co Ltd 二酸化珪素含有被膜の製造方法
JPH01132769A (ja) * 1987-11-17 1989-05-25 Nec Corp 常圧ｃｖｄ装置

Also Published As

Publication number Publication date
CZ283762B6 (cs) 1998-06-17
EP0526344B1 (fr) 1995-03-08
US5997948A (en) 1999-12-07
FR2679898A1 (fr) 1993-02-05
MX9204463A (es) 1993-08-01
CA2074964C (fr) 2001-12-11
EP0526344A1 (fr) 1993-02-03
BR9202962A (pt) 1993-03-30
AR247373A1 (es) 1994-12-29
JPH05201751A (ja) 1993-08-10
DE69201613D1 (de) 1995-04-13
SK236892A3 (en) 1995-01-12
CZ236892A3 (en) 1993-02-17
TR28359A (tr) 1996-05-30
CA2074964A1 (fr) 1993-02-01
DE69201613T2 (de) 1995-07-06
FR2679898B1 (fr) 1993-11-05

Similar Documents

Publication Publication Date Title
MX170772B (es) Revestimientos en vidrio
DK0620781T3 (da) Lysgennemskinneligt varmebeskyttelseselement
ES2122365T3 (es) Silsesquioxano de hidrogeno vaporizado para precipitar un revestimiento.
MX171998B (es) Productos revestidos
ES2005468A6 (es) Procedimiento para formar sobre un sustrato un revestimiento de capas multiples del tipo de ceramica o parecido.
KR940014264A (ko) 산화실리콘막 형성방법
ES2020479A6 (es) Metodo y aparato para formar piroliticamente un revestimiento de oxido sobre un sustrato de vidrio caliente.
JPS53118367A (en) Manufacture of semiconductor
KR900008063A (ko) 시계 케이스등의 장신구류의 금속표층 및 그 형성방법
ES2069974T3 (es) Procedimiento de formacion de un deposito que contiene silice sobre una superficie de un objeto de vidrio.
FI852837A0 (fi) Polymerkompositon.
GB939095A (en) Method of producing deposit
UA32516C2 (uk) Спосіб очищення газів з використанням піноутворюючого реактиву та установка для його здійснення
DE59501664D1 (de) Mischung zum behandeln von siliciumhaltigen substraten
JPS647414A (en) Superconductive element of oxide type
DE60003154D1 (de) Kontaktglaskomponente zur anwendung in zündkerzen
ES360497A1 (es) Un procedimiento para la difusion del boro en una superfi- cie dada de un cuerpo semiconductor de silicio.
GB1134865A (en) Improvements in and relating to electric discharge lamps
JPS6414927A (en) Forming method of silicon nitride film or silicon oxynitride film
JPS5743432A (en) Semiconductor device
Lange Research of Microstructurally Developed Toughening Mechanisms in Ceramics
JPS5544741A (en) Manufacture of semiconductor device
KR910013598A (ko) 비정질 실리콘 태양전지
IT1224403B (it) Composizioni consolidanti ad elevate caratteristiche adesive e di permeabilita' ai gas e vapori
GEU1997257Y (en) Burden for Glaze Production

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 526344

Country of ref document: ES