ES2126558T3 - Composicion fotosensible electrodepositable que forman materia para fotoreserva. - Google Patents

Composicion fotosensible electrodepositable que forman materia para fotoreserva.

Info

Publication number
ES2126558T3
ES2126558T3 ES91112767T ES91112767T ES2126558T3 ES 2126558 T3 ES2126558 T3 ES 2126558T3 ES 91112767 T ES91112767 T ES 91112767T ES 91112767 T ES91112767 T ES 91112767T ES 2126558 T3 ES2126558 T3 ES 2126558T3
Authority
ES
Spain
Prior art keywords
photoreserve
depositable
electro
forming material
photosensitive composition
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Lifetime
Application number
ES91112767T
Other languages
English (en)
Inventor
Kurt G Olson
Michael G Sandale
Steven R Zawacky
Ii Charles F Kahle
Masayuki Nakajima
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PPG Industries Inc
Original Assignee
PPG Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PPG Industries Inc filed Critical PPG Industries Inc
Application granted granted Critical
Publication of ES2126558T3 publication Critical patent/ES2126558T3/es
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G03F7/164—Coating processes; Apparatus therefor using electric, electrostatic or magnetic means; powder coating
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/1053—Imaging affecting physical property or radiation sensitive material, or producing nonplanar or printing surface - process, composition, or product: radiation sensitive composition or product or process of making binder containing
    • Y10S430/1055—Radiation sensitive composition or product or process of making
    • Y10S430/106—Binder containing
    • Y10S430/107—Polyamide or polyurethane
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10S430/00—Radiation imagery chemistry: process, composition, or product thereof
    • Y10S430/136—Coating process making radiation sensitive element

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Manufacturing Of Printed Circuit Boards (AREA)
  • Materials For Photolithography (AREA)
  • Paints Or Removers (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

UNA COMPOSICION FOTOENDURECIBLE Y ELECTROPRECIPITABLE COMPUESTA POR UNA DISPERSION ACUOSA DE: (A) MATERIAL POLIMERO, CATIONICO, NEUTRALIZADO Y DISPERSIBLE EN AGUA QUE TIENE UNA INSATURACION SUSPENDIDA, (B) UN MATERIAL NO SATURADO Y NONIONICO Y (C) UN FOTOINICIADOR; CARACTERIZADO PORQUE PUEDE FORMAR REVESTIMIENTOS SUAVES, DELGADOS Y LIBRES DE PEQUEÑOS ORIFICIOS Y ADEMAS CARACTERIZADO PORQUE LA PELICULA PUEDE NO SOLUBILIZARSE SELECTIVAMENTE MEDIANTE EXPOSICION A RADIACION DISEÑADA DE TAL FORMA QUE LA ZONA NO EXPUESTA DE LA PELICULA ES SOLUBLE EN ACIDO ACUOSO DILUIDO Y LA ZONA EXPUESTA ES INSOLUBLE EN DICHO ACIDO ACUOSO.
ES91112767T 1990-08-02 1991-07-30 Composicion fotosensible electrodepositable que forman materia para fotoreserva. Expired - Lifetime ES2126558T3 (es)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US56205790A 1990-08-02 1990-08-02
US69735591A 1991-01-14 1991-01-14

Publications (1)

Publication Number Publication Date
ES2126558T3 true ES2126558T3 (es) 1999-04-01

Family

ID=27072823

Family Applications (1)

Application Number Title Priority Date Filing Date
ES91112767T Expired - Lifetime ES2126558T3 (es) 1990-08-02 1991-07-30 Composicion fotosensible electrodepositable que forman materia para fotoreserva.

Country Status (12)

Country Link
US (2) US5674660A (es)
EP (1) EP0469537B1 (es)
JP (1) JP2547904B2 (es)
KR (1) KR950001005B1 (es)
AR (1) AR248459A1 (es)
AT (1) ATE175280T1 (es)
AU (1) AU649695B2 (es)
BR (1) BR9103260A (es)
CA (1) CA2048164C (es)
DE (1) DE69130691T2 (es)
ES (1) ES2126558T3 (es)
MX (1) MX9100508A (es)

Families Citing this family (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH05343837A (ja) * 1992-06-05 1993-12-24 Taiyo Ink Mfg Ltd ソルダーレジストインキ組成物及びソルダーレジストパターン形成方法
JPH06164102A (ja) * 1992-11-25 1994-06-10 Nippon Paint Co Ltd 電着型感光性樹脂被膜の表面処理方法
US5721088A (en) * 1995-12-20 1998-02-24 Ppg Industries, Inc. Electrodepositable photoimageable compositions with improved edge coverage
WO1998012789A1 (en) * 1996-09-19 1998-03-26 Ericsson Inc. Battery charging methods and apparatuses
US6559222B1 (en) 1997-10-16 2003-05-06 Sun Chemical Corporation Photoneutralization of pH sensitive aqueous polymeric dispersions and methods for using same
US6268109B1 (en) 1999-10-12 2001-07-31 E. I. Du Pont De Nemours And Company Composite photosensitive element
JP4440590B2 (ja) * 2003-09-29 2010-03-24 関西ペイント株式会社 カチオン性塗料組成物及び塗膜形成方法
JP2005305689A (ja) * 2004-04-19 2005-11-04 Konica Minolta Medical & Graphic Inc 印刷版材料および印刷方法
US7537884B2 (en) * 2004-10-20 2009-05-26 National Taiwan University Method for forming self-synthesizing conductive or conjugated polymer film and application
EP2868681A1 (en) 2013-10-31 2015-05-06 ALLNEX AUSTRIA GmbH Waterborne curing compositions for electrodeposition and radiation curing and processes to obtain such compositions

Family Cites Families (57)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3501391A (en) * 1966-10-03 1970-03-17 Ford Motor Co Electrocoatacure process and paint binders therefor
US3501390A (en) * 1966-10-03 1970-03-17 Ford Motor Co Process for electrocoating and polymerizing by radiation
US3937679A (en) * 1968-10-31 1976-02-10 Ppg Industries, Inc. Electrodepositable compositions
JPS4836163B1 (es) * 1969-12-03 1973-11-01
US3738835A (en) * 1971-10-21 1973-06-12 Ibm Electrophoretic photoresist composition and a method of forming etch resistant masks
JPS5221526B2 (es) * 1972-01-10 1977-06-11
US3894922A (en) * 1972-01-12 1975-07-15 Ppg Industries Inc Electrodeposition method utilizing quaternary phosphonium group-containing resins
US3936405A (en) * 1972-08-16 1976-02-03 Ppg Industries, Inc. Novel pigment grinding vehicles
US4038232A (en) * 1972-12-19 1977-07-26 Ppg Industries, Inc. Electrodepositable compositions containing sulfonium resins and capped polyisocyanates
US3935087A (en) * 1972-12-22 1976-01-27 Ppg Industries, Inc. Method for electrodeposition of self-crosslinking cationic compositions
US3959106A (en) * 1974-03-27 1976-05-25 Ppg Industries, Inc. Method of electrodepositing quaternary sulfonium group-containing resins
US4039414A (en) * 1974-06-19 1977-08-02 Scm Corporation Ultraviolet curing of electrocoating compositions
US4066523A (en) * 1976-02-17 1978-01-03 Scm Corporation Dual cure cathodic electrocoating composition
US4166017A (en) * 1976-05-24 1979-08-28 Scm Corporation Process for cathodic electrocoating and photocuring
US4338232A (en) * 1977-12-27 1982-07-06 The Dow Chemical Company Radiation-curable resins
US4260720A (en) * 1979-10-31 1981-04-07 Ppg Industries, Inc. Novel mercapto chain extended products and their use in cationic electrodeposition
US4321304A (en) * 1980-10-02 1982-03-23 Ppg Industries, Inc. Beta-diketone-epoxy resin reaction products blended with monomeric or polymeric phosphonium salts useful for providing corrosion resistance
CA1255952A (en) * 1983-03-04 1989-06-20 Akihiro Furuta Positive type photoresist composition
DE3586263D1 (de) * 1984-03-07 1992-08-06 Ciba Geigy Ag Verfahren zur herstellung von abbildungen.
US4601916A (en) * 1984-07-18 1986-07-22 Kollmorgen Technologies Corporation Process for bonding metals to electrophoretically deposited resin coatings
US4877818A (en) * 1984-09-26 1989-10-31 Rohm And Haas Company Electrophoretically depositable photosensitive polymer composition
US4592816A (en) * 1984-09-26 1986-06-03 Rohm And Haas Company Electrophoretic deposition process
US4632891A (en) * 1984-10-04 1986-12-30 Ciba-Geigy Corporation Process for the production of images
GB8430377D0 (en) * 1984-12-01 1985-01-09 Ciba Geigy Ag Modified phenolic resins
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
JPS61247090A (ja) * 1985-04-24 1986-11-04 日本ペイント株式会社 半田スル−ホ−ルを有する回路板の製造方法
FI82866C (fi) * 1985-06-24 1991-04-25 Siemens Ag Foerfarande foer framstaellning av strukturerade vaermebestaendiga skikt och deras anvaendning.
EP0207188B1 (en) * 1985-06-29 1996-06-19 Dainippon Ink And Chemicals, Inc. Resin composition for solder resist ink
JPH0644150B2 (ja) * 1986-05-09 1994-06-08 関西ペイント株式会社 プリント配線フオトレジスト用電着塗料組成物
GB8614868D0 (en) * 1986-06-18 1986-07-23 Ciba Geigy Ag Metallic patterns
JPS6317592A (ja) * 1986-07-09 1988-01-25 三菱電機株式会社 プリント配線板の製造方法
US4751172A (en) * 1986-08-01 1988-06-14 Shipley Company Inc. Process for forming metal images
JPH0770812B2 (ja) * 1986-08-08 1995-07-31 関西ペイント株式会社 プリント回路板の形成方法
GB8620001D0 (en) * 1986-08-16 1986-09-24 Ciba Geigy Ag Production of images
ATE88026T1 (de) * 1986-09-11 1993-04-15 Siemens Ag Verfahren zur herstellung waermebestaendiger strukturierter schichten.
US4863827A (en) * 1986-10-20 1989-09-05 American Hoechst Corporation Postive working multi-level photoresist
JPS63178228A (ja) * 1987-01-20 1988-07-22 Fuji Photo Film Co Ltd ポジ型フオトレジスト組成物
JPS63182888A (ja) * 1987-01-26 1988-07-28 関西ペイント株式会社 プリント配線板の製造方法
US4863757A (en) * 1987-02-06 1989-09-05 Key-Tech, Inc. Printed circuit board
US4760013A (en) * 1987-02-17 1988-07-26 International Business Machines Corporation Sulfonium salt photoinitiators
GB8708747D0 (en) * 1987-04-11 1987-05-20 Ciba Geigy Ag Formation of image
EP0302827B1 (en) * 1987-08-05 1994-07-06 Ciba-Geigy Ag Process for the formation of images
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物
US5196098A (en) * 1988-01-04 1993-03-23 Shipley Company Inc. Apparatus and process for electrophoretic deposition
GB8801736D0 (en) * 1988-01-27 1988-02-24 Ciba Geigy Ag Method of making patterns
JPH0769613B2 (ja) * 1988-05-02 1995-07-31 三菱電機株式会社 プリント配線フオトレジスト用カチオン型電着塗装方法
KR940008381B1 (ko) * 1988-03-28 1994-09-12 간사이뻬인또 가부시끼가이샤 프린트 배선 포토레지스트의 전착 도장 방법
US5102775A (en) * 1988-09-30 1992-04-07 Kansai Paint Co., Ltd. Visible light sensitive electrodeposition coating composition and image-forming method using the same
JP2758039B2 (ja) * 1988-09-30 1998-05-25 関西ペイント株式会社 可視光感光性電着塗料用組成物及びそれを用いた画像形成方法
GB8827847D0 (en) * 1988-11-29 1988-12-29 Ciba Geigy Ag Method
JP2696419B2 (ja) * 1990-07-04 1998-01-14 日本石油株式会社 カチオン電着型ネガ型エッチングレジスト組成物
JPH0486666A (ja) * 1990-07-27 1992-03-19 Toagosei Chem Ind Co Ltd フォトレジスト膜形成用電着塗料組成物
JP2681546B2 (ja) * 1991-01-11 1997-11-26 日本石油株式会社 カチオン電着型ネガ型レジスト組成物
JPH04116181A (ja) * 1990-09-03 1992-04-16 Nippon Oil Co Ltd カチオン電着型ネガ型エッチングレジスト組成物
US5246816A (en) * 1990-09-03 1993-09-21 Nippon Oil Co., Ltd. Cationic electrodeposition negative type resist composition
US5403698A (en) * 1990-10-16 1995-04-04 Hitachi Chemical Company, Ltd. Negative type photosensitive electrodepositing resin composition
JPH0616978A (ja) * 1990-10-16 1994-01-25 Hitachi Chem Co Ltd ネガ型感光性電着塗料樹脂組成物、これを用いた電着塗装浴及びレジストパターンの製造法

Also Published As

Publication number Publication date
AU8147191A (en) 1992-02-13
US5595859A (en) 1997-01-21
CA2048164C (en) 1998-11-10
ATE175280T1 (de) 1999-01-15
DE69130691D1 (de) 1999-02-11
AU649695B2 (en) 1994-06-02
US5674660A (en) 1997-10-07
EP0469537A2 (en) 1992-02-05
BR9103260A (pt) 1992-02-18
MX9100508A (es) 1992-04-01
AR248459A1 (es) 1995-08-18
JPH04251847A (ja) 1992-09-08
JP2547904B2 (ja) 1996-10-30
KR920004903A (ko) 1992-03-28
CA2048164A1 (en) 1992-02-03
DE69130691T2 (de) 1999-07-22
KR950001005B1 (ko) 1995-02-06
EP0469537A3 (en) 1992-04-29
EP0469537B1 (en) 1998-12-30

Similar Documents

Publication Publication Date Title
ATE46438T1 (de) Enterischer ueberzug fuer pharmazeutische verabreichungsformen.
AR244328A1 (es) Una composicion detergente liquida acuosa en forma de gel para superficies duras y grasosas sin reforzador.
ES2126558T3 (es) Composicion fotosensible electrodepositable que forman materia para fotoreserva.
ATE47520T1 (de) Darmloesliche ueberzugsmasse fuer pharmazeutische verabreichungsformen.
BG101838A (en) Superabsorbing structure with a flat form
ES2078049T3 (es) Composicion alcalina dispersable en agua con pelicula protectora.
NO304176B1 (no) Antiallergisk sammensetning inneholdende cetirizin for oftalmisk eller nasal anvendelse
BR8905299A (pt) Inseticidas
FI864974A0 (fi) Vaetskeformiga sanitetsrengoerings- och avkalkningsmedel samt foerfarande foer deras framstaellning.
DK427484D0 (da) Biopolymerformuleringer
JPS53126286A (en) Semiconductor laser package
FI792888A7 (fi) Vähävaahtoisia pintaliimausaineita paperia varten.
IT7921277A0 (it) Stabilizzazione di silicati acquosi con l'uso dei siliconati alcalini di sililalchilfosfonato.
AR006565A1 (es) Suspensiones acuosas de beta-ciflutrina
ES2085146T3 (es) Dispersiones acuosas utiles en revestimientos que contienen ester de celulosa hidrolizado y resina acrilica.
JPS5614235A (en) Support for photographic paper
IT7919821A0 (it) Piastra di chiusura in qualita' di struttura di transito su ponti osimili strutture portanti.
DK529189A (da) Udvikling af straalingsfoelsomme midler samt en udviklingsvaeske herfor
ES266179Y (es) "presentador en forma de caja".
DE59107194D1 (de) Wässrige Polymerisatdispersionen
ES8102211A1 (es) Un procedimiento para la preparacion de fibras poliolefini- cas uniformemente hidrofilas y dispersables en agua
DE59106657D1 (de) Wässrige Polymerisatdispersionen.
ES2062791T3 (es) Composicion de coloide hidrofilo para un material fotografico.
JPS5329136A (en) Fixing device
Borisyuk et al. Finishing the ends of fiber lightguides.

Legal Events

Date Code Title Description
FG2A Definitive protection

Ref document number: 469537

Country of ref document: ES