FR2371708A1 - Masse de copiage photosensible - Google Patents
Masse de copiage photosensibleInfo
- Publication number
- FR2371708A1 FR2371708A1 FR7734403A FR7734403A FR2371708A1 FR 2371708 A1 FR2371708 A1 FR 2371708A1 FR 7734403 A FR7734403 A FR 7734403A FR 7734403 A FR7734403 A FR 7734403A FR 2371708 A1 FR2371708 A1 FR 2371708A1
- Authority
- FR
- France
- Prior art keywords
- mass
- photosensitive
- copiing
- water
- synthetic polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920003170 water-soluble synthetic polymer Polymers 0.000 abstract 2
- 239000004925 Acrylic resin Substances 0.000 abstract 1
- 229920000178 Acrylic resin Polymers 0.000 abstract 1
- 239000012670 alkaline solution Substances 0.000 abstract 1
- 125000005250 alkyl acrylate group Chemical group 0.000 abstract 1
- 125000004432 carbon atom Chemical group C* 0.000 abstract 1
- 239000007859 condensation product Substances 0.000 abstract 1
- 239000000470 constituent Substances 0.000 abstract 1
- 229920001577 copolymer Polymers 0.000 abstract 1
- 239000012954 diazonium Substances 0.000 abstract 1
- 150000001989 diazonium salts Chemical class 0.000 abstract 1
- 238000000034 method Methods 0.000 abstract 1
- 238000002360 preparation method Methods 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/016—Diazonium salts or compounds
- G03F7/021—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders
- G03F7/0212—Macromolecular diazonium compounds; Macromolecular additives, e.g. binders characterised by the polymeric binder or the macromolecular additives other than the diazo resins or the polymeric diazonium compounds
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
- Compositions Of Macromolecular Compounds (AREA)
- Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
- Materials For Photolithography (AREA)
- Printing Plates And Materials Therefor (AREA)
Abstract
L'invention est relative à une masse de copiage photosensible à effet négatif, contenant comme constituants essentiels au moins un produit de condensation de sel de diazonium, au moins un polymère synthétique hydrosoluble et au moins une résine acrylique soluble ou pouvant du moins gonfler dans une solution alcaline aqueuse, masse caractérisée par le fait que le polymère synthétique hydrosoluble est un copolymère d'un acrylate d'alkyle en C3 à C16 et d'une N-vinyl-N-alkylcarboxamide dont le radical alkyle et le radical d'acide carboxylique contiennent chacun de 1 à 6 atomes de carbone. Elle concerne également des procédés pour sa confection et sa mise en oeuvre.
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| DE2652304A DE2652304C2 (de) | 1976-11-17 | 1976-11-17 | Negativ arbeitendes lichtempfindliches Gemisch und damit hergestellte lichtempfindliche Flachdruckplatte |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| FR2371708A1 true FR2371708A1 (fr) | 1978-06-16 |
| FR2371708B1 FR2371708B1 (fr) | 1980-05-16 |
Family
ID=5993341
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| FR7734403A Granted FR2371708A1 (fr) | 1976-11-17 | 1977-11-16 | Masse de copiage photosensible |
Country Status (9)
| Country | Link |
|---|---|
| US (1) | US4179292A (fr) |
| JP (1) | JPS6048021B2 (fr) |
| BE (1) | BE860870A (fr) |
| DE (1) | DE2652304C2 (fr) |
| FR (1) | FR2371708A1 (fr) |
| GB (1) | GB1594259A (fr) |
| IT (1) | IT1092155B (fr) |
| NL (1) | NL7712572A (fr) |
| SE (1) | SE7712843L (fr) |
Families Citing this family (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4507053A (en) * | 1982-06-15 | 1985-03-26 | Frizzell Marvin L | Pump off control |
| JPS5953836A (ja) * | 1982-09-21 | 1984-03-28 | Fuji Photo Film Co Ltd | 感光性平版印刷版 |
| DE3329443A1 (de) * | 1983-08-16 | 1985-03-07 | Hoechst Ag, 6230 Frankfurt | Durch strahlung polymerisierbares gemisch und daraus hergestelltes kopiermaterial |
| US4539285A (en) * | 1984-03-14 | 1985-09-03 | American Hoechst Corporation | Photosensitive negative diazo composition with two acrylic polymers for photolithography |
| US5260161A (en) * | 1989-05-06 | 1993-11-09 | Konica Corporation | Photosensitive composition and photosensitive lithographic printing plate comprising in admixture a tetrapolymer and a diazo resin |
| DE69312182T2 (de) * | 1992-08-17 | 1997-12-11 | Konishiroku Photo Ind | Lichtempfindliche Zusammensetzung |
| DE102004029501A1 (de) * | 2004-06-18 | 2006-01-12 | Kodak Polychrome Graphics Gmbh | Modifizierte Polymere und ihre Verwendung bei der Herstellung von Lithographie-Druckplattenvorläufern |
Family Cites Families (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| GB1235281A (en) * | 1967-02-18 | 1971-06-09 | Howson Algraphy Ltd | Improvements in or relating to lithographic printing plates |
| JPS4825050B1 (fr) * | 1968-11-07 | 1973-07-26 | ||
| US3849392A (en) * | 1969-05-20 | 1974-11-19 | Kalle Ag | Process for the production of polycondensation products of aromatic diazonium compounds |
| US3679419A (en) * | 1969-05-20 | 1972-07-25 | Azoplate Corp | Light-sensitive diazo condensate containing reproduction material |
| DE2064080C3 (de) * | 1970-12-28 | 1983-11-03 | Hoechst Ag, 6230 Frankfurt | Lichtempfindliches Gemisch |
| US3715210A (en) * | 1971-02-19 | 1973-02-06 | Howson Algraphy Ltd | Lithographic printing plates |
| US3790382A (en) * | 1971-04-16 | 1974-02-05 | Minnesota Mining & Mfg | Fluorinated polyamide-diazo resin coating composition |
| US3751257A (en) * | 1971-04-16 | 1973-08-07 | Minnesota Mining & Mfg | Polyamide-diazo resin composition |
| US3817850A (en) * | 1971-05-18 | 1974-06-18 | American Can Co | Photopolymerizable epoxy systems containing substituted acyclic amides or substituted ureas as gelation inhibitors |
| US3997344A (en) * | 1974-07-05 | 1976-12-14 | American Can Company | Dry positive photopolymer imaging process involving heating and application of toner |
-
1976
- 1976-11-17 DE DE2652304A patent/DE2652304C2/de not_active Expired
-
1977
- 1977-11-14 SE SE7712843A patent/SE7712843L/ not_active Application Discontinuation
- 1977-11-15 NL NL7712572A patent/NL7712572A/xx not_active Application Discontinuation
- 1977-11-15 GB GB47439/77A patent/GB1594259A/en not_active Expired
- 1977-11-15 IT IT51814/77A patent/IT1092155B/it active
- 1977-11-16 US US05/851,875 patent/US4179292A/en not_active Expired - Lifetime
- 1977-11-16 BE BE182654A patent/BE860870A/fr unknown
- 1977-11-16 FR FR7734403A patent/FR2371708A1/fr active Granted
- 1977-11-17 JP JP52138395A patent/JPS6048021B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| DE2652304A1 (de) | 1978-05-18 |
| FR2371708B1 (fr) | 1980-05-16 |
| NL7712572A (nl) | 1978-05-19 |
| DE2652304C2 (de) | 1987-04-23 |
| JPS5364021A (en) | 1978-06-08 |
| JPS6048021B2 (ja) | 1985-10-24 |
| BE860870A (fr) | 1978-05-16 |
| IT1092155B (it) | 1985-07-06 |
| SE7712843L (sv) | 1978-05-18 |
| GB1594259A (en) | 1981-07-30 |
| US4179292A (en) | 1979-12-18 |
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Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| ST | Notification of lapse |