IL89648A - Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom - Google Patents

Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom

Info

Publication number: IL89648A
Authority: IL; Israel
Prior art keywords: novolak resins; thermal stability; prepared therefrom; positive photoresists; high thermal
Prior art date: 1988-03-31

Application number

IL89648A

Other languages

English (en)

Other versions

IL89648A0 (en

Inventor

Michael Lazarus Richard

William Kautz Randall

Suresh Dixit Sunit

Original Assignee

Thiokol Morton Inc

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-03-31

Filing date

1989-03-17

Publication date

1993-01-31

1988-08-02 Priority claimed from US07/227,404 external-priority patent/US4920028A/en

1989-03-17 Application filed by Thiokol Morton Inc filed Critical Thiokol Morton Inc

1989-09-28 Publication of IL89648A0 publication Critical patent/IL89648A0/xx

1993-01-31 Publication of IL89648A publication Critical patent/IL89648A/xx

Links

229920003986 novolac Polymers 0.000 title abstract 3
229920005989 resin Polymers 0.000 title abstract 3
239000011347 resin Substances 0.000 title abstract 3
229920002120 photoresistant polymer Polymers 0.000 title abstract 2
125000002485 formyl group Chemical class [H]C(*)=O 0.000 title 1
WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 abstract 6
150000003934 aromatic aldehydes Chemical class 0.000 abstract 3
239000000203 mixture Substances 0.000 abstract 3
229930192627 Naphthoquinone Natural products 0.000 abstract 1
ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
239000007859 condensation product Substances 0.000 abstract 1
238000009472 formulation Methods 0.000 abstract 1
150000002791 naphthoquinones Chemical class 0.000 abstract 1
150000002989 phenols Chemical class 0.000 abstract 1
239000003504 photosensitizing agent Substances 0.000 abstract 1
239000002243 precursor Substances 0.000 abstract 1

Classifications

- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- C08G8/08—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ
- C08G8/10—Condensation polymers of aldehydes or ketones with phenols only of aldehydes of formaldehyde, e.g. of formaldehyde formed in situ with phenol
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G8/00—Condensation polymers of aldehydes or ketones with phenols only
- C08G8/04—Condensation polymers of aldehydes or ketones with phenols only of aldehydes
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
- G03F7/0236—Condensation products of carbonyl compounds and phenolic compounds, e.g. novolak resins

Landscapes

Chemical & Material Sciences (AREA)
Physics & Mathematics (AREA)
Health & Medical Sciences (AREA)
Chemical Kinetics & Catalysis (AREA)
Medicinal Chemistry (AREA)
Polymers & Plastics (AREA)
Organic Chemistry (AREA)
Spectroscopy & Molecular Physics (AREA)
General Physics & Mathematics (AREA)
Phenolic Resins Or Amino Resins (AREA)
Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Materials For Photolithography (AREA)
Manufacturing Of Printed Circuit Boards (AREA)
Gas-Filled Discharge Tubes (AREA)
Inks, Pencil-Leads, Or Crayons (AREA)

IL89648A 1988-03-31 1989-03-17 Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom IL89648A (en)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
US17547388A	1988-03-31	1988-03-31
US29782888A	1988-04-22	1988-04-22
US07/227,404 US4920028A (en)	1988-03-31	1988-08-02	High contrast high thermal stability positive photoresists with mixed cresol and hydroxybenzaldehyde prepared novolak and photosensitive diazoquinone

Publications (2)

Publication Number	Publication Date
IL89648A0 IL89648A0 (en)	1989-09-28
IL89648A true IL89648A (en)	1993-01-31

Family

ID=27390543

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL89648A IL89648A (en)	1988-03-31	1989-03-17	Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom

Country Status (10)

Country	Link
EP (1)	EP0336604B1 (de)
JP (1)	JPH0776254B2 (de)
KR (1)	KR930006913B1 (de)
AT (1)	ATE118225T1 (de)
AU (1)	AU3235289A (de)
DE (1)	DE68921017T2 (de)
DK (1)	DK155089A (de)
HK (1)	HK158995A (de)
IL (1)	IL89648A (de)
NO (1)	NO891063L (de)

Families Citing this family (17)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
US5182184A (en) *	1990-02-05	1993-01-26	Morton International, Inc.	Novolak resins of lowered hydroxyl content and high contrast high thermal stability positive photoresists prepared therefrom
JPH03253860A (ja) *	1990-03-05	1991-11-12	Fuji Photo Film Co Ltd	ポジ型フオトレジスト組成物
JPH03294861A (ja) *	1990-04-13	1991-12-26	Mitsubishi Petrochem Co Ltd	ポジ型フォトレジスト組成物
JPH05323605A (ja) *	1992-05-27	1993-12-07	Sumitomo Chem Co Ltd	ポジ型レジスト組成物
JP3319092B2 (ja) *	1993-11-08	2002-08-26	住友化学工業株式会社	ポジ型レジスト組成物
EP0660186A1 (de) *	1993-12-20	1995-06-28	Mitsubishi Chemical Corporation	Lichtempfindliche Harzzusammensetzung und Verfahren zur Bildherstellung damit
JP3424341B2 (ja) *	1994-04-11	2003-07-07	住友化学工業株式会社	感光性樹脂組成物
JP3635598B2 (ja) *	1995-07-13	2005-04-06	富士写真フイルム株式会社	ポジ型フォトレジスト組成物
US5709977A (en) *	1995-07-13	1998-01-20	Fuji Photo Film Co., Ltd.	Positive working photoresist composition
JP2006010779A (ja) *	2004-06-22	2006-01-12	Nagase Chemtex Corp	有機膜組成物及びレジストパターン形成方法
KR101324645B1 (ko) *	2006-05-08	2013-11-01	주식회사 동진쎄미켐	포토레지스트 조성물
JP5581046B2 (ja) *	2009-01-09	2014-08-27	昭和電工株式会社	ノボラック樹脂の製造方法およびノボラック樹脂
CN102577712A (zh) *	2012-03-16	2012-07-18	广西钦州力顺机械有限公司	可于甘蔗蔗种下方施肥的甘蔗种植机
JP6070020B2 (ja) *	2012-09-28	2017-02-01	明和化成株式会社	ノボラック型フェノール樹脂の製造方法、ノボラック型フェノール樹脂、及びフォトレジスト組成物
WO2014069091A1 (ja) *	2012-10-30	2014-05-08	住友ベークライト株式会社	感光性樹脂組成物、硬化膜、保護膜、絶縁膜および電子装置
WO2014104126A1 (ja)	2012-12-26	2014-07-03	セントラル硝子株式会社	ヘキサフルオロイソプロパノール基を含むノボラック樹脂およびその製造方法、並びにその組成物
JP6555975B2 (ja) *	2015-08-07	2019-08-07	群栄化学工業株式会社	新規イミン基含有樹脂

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPS58134631A (ja) *	1982-01-08	1983-08-10	Konishiroku Photo Ind Co Ltd	感光性組成物
JPS62123444A (ja) *	1985-08-07	1987-06-04	Japan Synthetic Rubber Co Ltd	ポジ型感放射線性樹脂組成物
JPH0654381B2 (ja) *	1985-12-24	1994-07-20	日本合成ゴム株式会社	集積回路作製用ポジ型レジスト
EP0227487B1 (de) *	1985-12-27	1992-07-15	Japan Synthetic Rubber Co., Ltd.	Strahlungsempfindliche positiv arbeitende Kunststoffzusammensetzung
JPS62198852A (ja) *	1986-02-27	1987-09-02	Japan Synthetic Rubber Co Ltd	ポジ型感放射線性樹脂組成物
JPH0654389B2 (ja) *	1986-06-23	1994-07-20	日本合成ゴム株式会社	ポジ型感放射線性樹脂組成物

1989
- 1989-03-13 NO NO89891063A patent/NO891063L/no unknown
- 1989-03-17 IL IL89648A patent/IL89648A/xx unknown
- 1989-03-22 AT AT89302864T patent/ATE118225T1/de not_active IP Right Cessation
- 1989-03-22 EP EP89302864A patent/EP0336604B1/de not_active Expired - Lifetime
- 1989-03-22 DE DE68921017T patent/DE68921017T2/de not_active Expired - Fee Related
- 1989-03-30 DK DK155089A patent/DK155089A/da not_active IP Right Cessation
- 1989-03-31 KR KR1019890004163A patent/KR930006913B1/ko not_active Expired - Fee Related
- 1989-03-31 AU AU32352/89A patent/AU3235289A/en not_active Abandoned
- 1989-03-31 JP JP1078689A patent/JPH0776254B2/ja not_active Expired - Fee Related
1995
- 1995-10-12 HK HK158995A patent/HK158995A/en not_active IP Right Cessation

Also Published As

Publication number	Publication date
HK158995A (en)	1995-10-20
NO891063L (no)	1989-10-02
DK155089A (da)	1989-10-01
AU3235289A (en)	1989-10-05
IL89648A0 (en)	1989-09-28
EP0336604A3 (en)	1990-07-25
JPH0776254B2 (ja)	1995-08-16
KR890014613A (ko)	1989-10-24
DE68921017D1 (de)	1995-03-23
EP0336604A2 (de)	1989-10-11
KR930006913B1 (ko)	1993-07-24
JPH0284414A (ja)	1990-03-26
DE68921017T2 (de)	1995-06-01
EP0336604B1 (de)	1995-02-08
ATE118225T1 (de)	1995-02-15
NO891063D0 (no)	1989-03-13
DK155089D0 (da)	1989-03-30

Publication	Publication Date	Title
IL89648A0 (en)	1989-09-28	Mixed aldehyde novolak resins and high contrast high thermal stability positive photoresists prepared therefrom
FI900575A0 (fi)	1990-02-06	Med resorcinol modifierat fenolhartsbindemedel i haerdplaster.
PT798324E (pt)	2003-10-31	Resinas "novolac" de fenol/dieno, processo para a sua preparacao e composicoes a base de borracha contendo as referidas resinas
ES2048140T3 (es)	1995-03-16	Mezcla de agentes aglutinantes.
MX172758B (es)	1994-01-11	Composicion de capa protectora positiva
AU7383887A (en)	1987-12-10	New resin compositions based on phenolic resins
TW343225B (en)	1998-10-21	A water insoluble film forming novolak resin composition and process for producing the same
JPS5250393A (en)	1977-04-22	Process for preparing phenolic resins
JPS5610544A (en)	1981-02-03	Phenol resin molding compound
JPS55127553A (en)	1980-10-02	Photosensitive composition
AU7172987A (en)	1987-10-22	Modified phenolic foam catalysts and method
AU2685988A (en)	1989-07-20	Powder coating composition for metal reinforcing bars and metal reinforcing bars coated therewith
ATE72061T1 (de)	1992-02-15	Lichtempfindliche 1,2-naphthochinondiazid-4sulfons\|uremonoester und lichtempfindliche zusammensetzungen damit.
ES2050642T1 (es)	1994-06-01	Soluciones acuosas de resoles, procedimiento para su preparacion y aplicacion.
JPS5732240A (en)	1982-02-20	Production of bisphenol
JPS53127550A (en)	1978-11-07	Phenolic resin composition
EP0691377A3 (de)	1997-04-16	Flüssige Bindemittel
JPS5767619A (en)	1982-04-24	Resin for covering sand for castings
JPS5342239A (en)	1978-04-17	Molding materials of phenolic resin
JPS5388091A (en)	1978-08-03	Preparation of phenolic resin
JPS5329356A (en)	1978-03-18	Resol resin compositions
JPS52146494A (en)	1977-12-06	Preparation of phenolic resin
JPS5384096A (en)	1978-07-25	Preparation of phenolic resin
JPS5329392A (en)	1978-03-18	Preparation of phenolic resin
JPS54150456A (en)	1979-11-26	Resin composition for self-curable mold