IL93378A - Deposition process of a coating of the ceramic type based on carbides, nitrides or carbonitrides on a metallic substrate and element comprising a coating obtained by this procedure - Google Patents

Deposition process of a coating of the ceramic type based on carbides, nitrides or carbonitrides on a metallic substrate and element comprising a coating obtained by this procedure

Info

Publication number: IL93378A
Authority: IL; Israel
Prior art keywords: metallic; coating; precursor; chromium; vapour phase
Prior art date: 1989-02-16

Application number

IL9337890A

Other languages

English (en)

Other versions

IL93378A0 (en

Original Assignee

Nitruvid

C3F Comp Franc Forges Fond

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1989-02-16

Filing date

1990-02-13

Publication date

1994-08-26

1990-02-13 Application filed by Nitruvid, C3F Comp Franc Forges Fond filed Critical Nitruvid

1990-11-29 Publication of IL93378A0 publication Critical patent/IL93378A0/xx

1994-08-26 Publication of IL93378A publication Critical patent/IL93378A/en

Links

238000000576 coating method Methods 0.000 title claims abstract description 45
239000011248 coating agent Substances 0.000 title claims abstract description 43
239000000758 substrate Substances 0.000 title claims abstract description 35
238000000034 method Methods 0.000 title claims abstract description 21
239000000919 ceramic Substances 0.000 title claims abstract description 14
150000004767 nitrides Chemical class 0.000 title claims abstract description 13
150000001247 metal acetylides Chemical class 0.000 title claims abstract description 8
238000005137 deposition process Methods 0.000 title claims description 7
239000002243 precursor Substances 0.000 claims abstract description 40
229910052751 metal Inorganic materials 0.000 claims abstract description 25
230000008021 deposition Effects 0.000 claims abstract description 18
230000008569 process Effects 0.000 claims abstract description 18
125000002524 organometallic group Chemical group 0.000 claims abstract description 14
229910052719 titanium Inorganic materials 0.000 claims abstract description 14
229910052804 chromium Inorganic materials 0.000 claims abstract description 11
229910052750 molybdenum Inorganic materials 0.000 claims abstract description 11
229910052721 tungsten Inorganic materials 0.000 claims abstract description 11
229910052720 vanadium Inorganic materials 0.000 claims abstract description 11
229910052726 zirconium Inorganic materials 0.000 claims abstract description 11
229910052748 manganese Inorganic materials 0.000 claims abstract description 10
229910052758 niobium Inorganic materials 0.000 claims abstract description 9
229910052715 tantalum Inorganic materials 0.000 claims abstract description 9
229910052742 iron Inorganic materials 0.000 claims abstract description 8
IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 claims description 56
229910052757 nitrogen Inorganic materials 0.000 claims description 30
239000007789 gas Substances 0.000 claims description 26
239000010936 titanium Substances 0.000 claims description 24
UFGZSIPAQKLCGR-UHFFFAOYSA-N chromium carbide Chemical compound [Cr]#C[Cr]C#[Cr] UFGZSIPAQKLCGR-UHFFFAOYSA-N 0.000 claims description 20
239000000203 mixture Substances 0.000 claims description 20
229910003470 tongbaite Inorganic materials 0.000 claims description 20
239000011651 chromium Substances 0.000 claims description 16
AWNBGWWVMCBBST-UHFFFAOYSA-N chromium;cumene Chemical compound [Cr].CC(C)C1=CC=CC=C1.CC(C)C1=CC=CC=C1 AWNBGWWVMCBBST-UHFFFAOYSA-N 0.000 claims description 13
125000000217 alkyl group Chemical group 0.000 claims description 11
238000009792 diffusion process Methods 0.000 claims description 11
WYURNTSHIVDZCO-UHFFFAOYSA-N Tetrahydrofuran Chemical compound C1CCOC1 WYURNTSHIVDZCO-UHFFFAOYSA-N 0.000 claims description 10
PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 claims description 8
229910000831 Steel Inorganic materials 0.000 claims description 8
150000001875 compounds Chemical class 0.000 claims description 8
239000010959 steel Substances 0.000 claims description 8
125000003118 aryl group Chemical group 0.000 claims description 7
235000012721 chromium Nutrition 0.000 claims description 6
229910052734 helium Inorganic materials 0.000 claims description 6
125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 claims description 6
QGZKDVFQNNGYKY-UHFFFAOYSA-N Ammonia Chemical compound N QGZKDVFQNNGYKY-UHFFFAOYSA-N 0.000 claims description 4
OAKJQQAXSVQMHS-UHFFFAOYSA-N Hydrazine Chemical compound NN OAKJQQAXSVQMHS-UHFFFAOYSA-N 0.000 claims description 4
JUJWROOIHBZHMG-UHFFFAOYSA-N Pyridine Chemical compound C1=CC=NC=C1 JUJWROOIHBZHMG-UHFFFAOYSA-N 0.000 claims description 4
150000004945 aromatic hydrocarbons Chemical class 0.000 claims description 3
HVURSIGIEONDKB-UHFFFAOYSA-N benzene;chromium Chemical compound [Cr].C1=CC=CC=C1.C1=CC=CC=C1 HVURSIGIEONDKB-UHFFFAOYSA-N 0.000 claims description 3
239000010941 cobalt Substances 0.000 claims description 3
229910017052 cobalt Inorganic materials 0.000 claims description 3
229910052759 nickel Inorganic materials 0.000 claims description 3
150000002902 organometallic compounds Chemical class 0.000 claims description 3
239000010935 stainless steel Substances 0.000 claims description 3
229910001220 stainless steel Inorganic materials 0.000 claims description 3
YLQBMQCUIZJEEH-UHFFFAOYSA-N tetrahydrofuran Natural products C=1C=COC=1 YLQBMQCUIZJEEH-UHFFFAOYSA-N 0.000 claims description 3
POILWHVDKZOXJZ-ARJAWSKDSA-M (z)-4-oxopent-2-en-2-olate Chemical compound C\C([O-])=C\C(C)=O POILWHVDKZOXJZ-ARJAWSKDSA-M 0.000 claims description 2
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical group [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 claims description 2
229910001069 Ti alloy Inorganic materials 0.000 claims description 2
229910001093 Zr alloy Inorganic materials 0.000 claims description 2
229910021529 ammonia Inorganic materials 0.000 claims description 2
229910052799 carbon Inorganic materials 0.000 claims description 2
238000010276 construction Methods 0.000 claims description 2
230000004907 flux Effects 0.000 claims description 2
125000005843 halogen group Chemical group 0.000 claims description 2
125000004435 hydrogen atom Chemical group [H]* 0.000 claims description 2
230000001590 oxidative effect Effects 0.000 claims description 2
UMJSCPRVCHMLSP-UHFFFAOYSA-N pyridine Natural products COC1=CC=CN=C1 UMJSCPRVCHMLSP-UHFFFAOYSA-N 0.000 claims description 2
PCCVSPMFGIFTHU-UHFFFAOYSA-N tetracyanoquinodimethane Chemical compound N#CC(C#N)=C1C=CC(=C(C#N)C#N)C=C1 PCCVSPMFGIFTHU-UHFFFAOYSA-N 0.000 claims description 2
TYYBBNOTQFVVKN-UHFFFAOYSA-N chromium(2+);cyclopenta-1,3-diene Chemical compound [Cr+2].C=1C=C[CH-]C=1.C=1C=C[CH-]C=1 TYYBBNOTQFVVKN-UHFFFAOYSA-N 0.000 claims 2
229910000601 superalloy Inorganic materials 0.000 claims 2
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 claims 1
239000002184 metal Substances 0.000 abstract description 8
238000004140 cleaning Methods 0.000 abstract 1
238000011282 treatment Methods 0.000 description 27
238000006243 chemical reaction Methods 0.000 description 13
238000009434 installation Methods 0.000 description 10
238000005554 pickling Methods 0.000 description 10
XEEYBQQBJWHFJM-UHFFFAOYSA-N iron Substances [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 9
239000011572 manganese Substances 0.000 description 9
238000007373 indentation Methods 0.000 description 7
239000010955 niobium Substances 0.000 description 7
238000012360 testing method Methods 0.000 description 7
239000011261 inert gas Substances 0.000 description 6
230000000750 progressive effect Effects 0.000 description 6
239000003446 ligand Substances 0.000 description 5
206010017076 Fracture Diseases 0.000 description 4
238000010438 heat treatment Methods 0.000 description 4
239000001257 hydrogen Substances 0.000 description 4
229910052739 hydrogen Inorganic materials 0.000 description 4
230000001965 increasing effect Effects 0.000 description 4
241001422033 Thestylus Species 0.000 description 3
238000001816 cooling Methods 0.000 description 3
239000001307 helium Substances 0.000 description 3
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 3
239000011733 molybdenum Substances 0.000 description 3
239000003921 oil Substances 0.000 description 3
230000005855 radiation Effects 0.000 description 3
230000009257 reactivity Effects 0.000 description 3
230000001105 regulatory effect Effects 0.000 description 3
239000000126 substance Substances 0.000 description 3
239000010937 tungsten Substances 0.000 description 3
WFDIJRYMOXRFFG-UHFFFAOYSA-N Acetic anhydride Chemical compound CC(=O)OC(C)=O WFDIJRYMOXRFFG-UHFFFAOYSA-N 0.000 description 2
WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 2
NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 2
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 2
150000001412 amines Chemical class 0.000 description 2
238000013459 approach Methods 0.000 description 2
230000005587 bubbling Effects 0.000 description 2
-1 carbides nitrides Chemical class 0.000 description 2
230000000052 comparative effect Effects 0.000 description 2
238000006073 displacement reaction Methods 0.000 description 2
229910052735 hafnium Inorganic materials 0.000 description 2
150000002500 ions Chemical class 0.000 description 2
230000004048 modification Effects 0.000 description 2
238000012986 modification Methods 0.000 description 2
238000005121 nitriding Methods 0.000 description 2
NFHFRUOZVGFOOS-UHFFFAOYSA-N palladium;triphenylphosphane Chemical compound [Pd].C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1.C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 NFHFRUOZVGFOOS-UHFFFAOYSA-N 0.000 description 2
238000005086 pumping Methods 0.000 description 2
238000006748 scratching Methods 0.000 description 2
230000002393 scratching effect Effects 0.000 description 2
239000007787 solid Substances 0.000 description 2
238000006467 substitution reaction Methods 0.000 description 2
238000005979 thermal decomposition reaction Methods 0.000 description 2
238000007669 thermal treatment Methods 0.000 description 2
230000007704 transition Effects 0.000 description 2
BNJMRELGMDUDDB-UHFFFAOYSA-N $l^{1}-sulfanylbenzene Chemical compound [S]C1=CC=CC=C1 BNJMRELGMDUDDB-UHFFFAOYSA-N 0.000 description 1
WYRSGXAIHNMKOL-UHFFFAOYSA-N $l^{1}-sulfanylethane Chemical compound CC[S] WYRSGXAIHNMKOL-UHFFFAOYSA-N 0.000 description 1
ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical compound N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 1
229910000604 Ferrochrome Inorganic materials 0.000 description 1
NINIDFKCEFEMDL-UHFFFAOYSA-N Sulfur Chemical group [S] NINIDFKCEFEMDL-UHFFFAOYSA-N 0.000 description 1
239000005864 Sulphur Substances 0.000 description 1
ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 1
QCWXUUIWCKQGHC-UHFFFAOYSA-N Zirconium Chemical compound [Zr] QCWXUUIWCKQGHC-UHFFFAOYSA-N 0.000 description 1
XOCOGOKSCFJZHQ-UHFFFAOYSA-N [Cr].C1(=CC=CC=C1)C(C)C.C1(=CC=CC=C1)C(C)C.[He] Chemical compound [Cr].C1(=CC=CC=C1)C(C)C.C1(=CC=CC=C1)C(C)C.[He] XOCOGOKSCFJZHQ-UHFFFAOYSA-N 0.000 description 1
230000002159 abnormal effect Effects 0.000 description 1
230000009471 action Effects 0.000 description 1
230000006978 adaptation Effects 0.000 description 1
230000001070 adhesive effect Effects 0.000 description 1
235000019270 ammonium chloride Nutrition 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
125000004432 carbon atom Chemical group C* 0.000 description 1
230000008859 change Effects 0.000 description 1
238000002144 chemical decomposition reaction Methods 0.000 description 1
230000006835 compression Effects 0.000 description 1
238000007906 compression Methods 0.000 description 1
239000000470 constituent Substances 0.000 description 1
230000002089 crippling effect Effects 0.000 description 1
230000007547 defect Effects 0.000 description 1
238000011161 development Methods 0.000 description 1
125000005265 dialkylamine group Chemical group 0.000 description 1
229910003460 diamond Inorganic materials 0.000 description 1
239000010432 diamond Substances 0.000 description 1
238000010790 dilution Methods 0.000 description 1
239000012895 dilution Substances 0.000 description 1
229910001873 dinitrogen Inorganic materials 0.000 description 1
238000009826 distribution Methods 0.000 description 1
230000000694 effects Effects 0.000 description 1
238000009661 fatigue test Methods 0.000 description 1
230000006872 improvement Effects 0.000 description 1
230000001939 inductive effect Effects 0.000 description 1
238000009413 insulation Methods 0.000 description 1
239000007788 liquid Substances 0.000 description 1
238000005259 measurement Methods 0.000 description 1
GUCVJGMIXFAOAE-UHFFFAOYSA-N niobium atom Chemical compound [Nb] GUCVJGMIXFAOAE-UHFFFAOYSA-N 0.000 description 1
230000000737 periodic effect Effects 0.000 description 1
238000007747 plating Methods 0.000 description 1
229920000642 polymer Polymers 0.000 description 1
238000002360 preparation method Methods 0.000 description 1
238000004321 preservation Methods 0.000 description 1
230000001681 protective effect Effects 0.000 description 1
238000010791 quenching Methods 0.000 description 1
230000000171 quenching effect Effects 0.000 description 1
230000004044 response Effects 0.000 description 1
229910052710 silicon Inorganic materials 0.000 description 1
239000010703 silicon Substances 0.000 description 1
238000004381 surface treatment Methods 0.000 description 1
238000005496 tempering Methods 0.000 description 1
238000001149 thermolysis Methods 0.000 description 1
RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 1
LEONUFNNVUYDNQ-UHFFFAOYSA-N vanadium atom Chemical compound [V] LEONUFNNVUYDNQ-UHFFFAOYSA-N 0.000 description 1
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 1
ZVWKZXLXHLZXLS-UHFFFAOYSA-N zirconium nitride Chemical compound [Zr]#N ZVWKZXLXHLZXLS-UHFFFAOYSA-N 0.000 description 1

Classifications

- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/02—Pretreatment of the material to be coated
- C23C16/0227—Pretreatment of the material to be coated by cleaning or etching
- C23C16/0245—Pretreatment of the material to be coated by cleaning or etching by etching with a plasma
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/22—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the deposition of inorganic material, other than metallic material
- C23C16/30—Deposition of compounds, mixtures or solid solutions, e.g. borides, carbides, nitrides
- C23C16/32—Carbides
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C28/00—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D
- C23C28/04—Coating for obtaining at least two superposed coatings either by methods not provided for in a single one of groups C23C2/00 - C23C26/00 or by combinations of methods provided for in subclasses C23C and C25C or C25D only coatings of inorganic non-metallic material

Landscapes

Chemical & Material Sciences (AREA)
Engineering & Computer Science (AREA)
Mechanical Engineering (AREA)
Organic Chemistry (AREA)
Metallurgy (AREA)
Chemical Kinetics & Catalysis (AREA)
Materials Engineering (AREA)
General Chemical & Material Sciences (AREA)
Inorganic Chemistry (AREA)
Physics & Mathematics (AREA)
Plasma & Fusion (AREA)
Chemical Vapour Deposition (AREA)
Physical Vapour Deposition (AREA)
Chemically Coating (AREA)
Other Surface Treatments For Metallic Materials (AREA)
Solid-Phase Diffusion Into Metallic Material Surfaces (AREA)
Ceramic Capacitors (AREA)
Application Of Or Painting With Fluid Materials (AREA)
Carbon And Carbon Compounds (AREA)

IL9337890A 1989-02-16 1990-02-13 Deposition process of a coating of the ceramic type based on carbides, nitrides or carbonitrides on a metallic substrate and element comprising a coating obtained by this procedure IL93378A (en)

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
FR8902048A FR2643087B1 (fr)	1989-02-16	1989-02-16	Procede de depot d'un revetement de type ceramique sur un substrat metallique et element comportant un revetement obtenu par ce procede

Publications (2)

Publication Number	Publication Date
IL93378A0 IL93378A0 (en)	1990-11-29
IL93378A true IL93378A (en)	1994-08-26

Family

ID=9378851

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
IL9337890A IL93378A (en)	1989-02-16	1990-02-13	Deposition process of a coating of the ceramic type based on carbides, nitrides or carbonitrides on a metallic substrate and element comprising a coating obtained by this procedure

Country Status (10)

Country	Link
US (1)	US5302422A (ja)
EP (1)	EP0387113B1 (ja)
JP (1)	JPH032374A (ja)
AT (1)	ATE99001T1 (ja)
CA (1)	CA2010119A1 (ja)
DE (1)	DE69005331T2 (ja)
FI (1)	FI93556C (ja)
FR (1)	FR2643087B1 (ja)
IL (1)	IL93378A (ja)
ZA (1)	ZA901151B (ja)

Families Citing this family (32)

* Cited by examiner, † Cited by third party
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US5830540A (en) *	1994-09-15	1998-11-03	Eltron Research, Inc.	Method and apparatus for reactive plasma surfacing
WO1996031899A1 (en) *	1995-04-07	1996-10-10	Advanced Energy Industries, Inc.	Adjustable energy quantum thin film plasma processing system
FR2738017A1 (fr) *	1995-08-25	1997-02-28	M3D	Procede de revetement d'un carbure ou d'un carbonitrure mixte de ti et de zr par depot chimique en phase vapeur (cvd) et dispositif destine a former un revetement ceramique a partir d'au moins deux precurseurs metalliques
US6162513A (en) *	1996-04-19	2000-12-19	Korea Institute Of Science And Technology	Method for modifying metal surface
JP4022048B2 (ja) *	2001-03-06	2007-12-12	株式会社神戸製鋼所	ダイヤモンドライクカーボン硬質多層膜成形体およびその製造方法
PT1598456E (pt) *	2004-05-17	2008-12-29	Braecker Ag	Viajante e processo para a sua produção
FR2904007B1 (fr) *	2006-07-21	2008-11-21	Toulouse Inst Nat Polytech	Procede de depot de revetements ceramiques non oxydes.
JP2011521106A (ja) *	2008-05-13	2011-07-21	サブ−ワン・テクノロジー・インコーポレーテッド	太陽熱およびその他の応用例におけるパイプの内面および外面のコーティング方法
WO2010017185A1 (en)	2008-08-04	2010-02-11	Agc Flat Glass North America, Inc.	Plasma source and methods for depositing thin film coatings using plasma enhanced chemical vapor deposition
MY191327A (en)	2014-12-05	2022-06-16	Agc Flat Glass Na Inc	Plasma source utilizing a macro-particle reduction coating and method of using a plasma source utilizing a macro-particle reduction coating for deposition of thin film coatings and modification of surfaces
KR102272311B1 (ko)	2014-12-05	2021-07-06	에이쥐씨 글래스 유럽	중공형 음극 플라즈마 소스
US9721765B2 (en)	2015-11-16	2017-08-01	Agc Flat Glass North America, Inc.	Plasma device driven by multiple-phase alternating or pulsed electrical current
US10573499B2 (en)	2015-12-18	2020-02-25	Agc Flat Glass North America, Inc.	Method of extracting and accelerating ions
US10242846B2 (en)	2015-12-18	2019-03-26	Agc Flat Glass North America, Inc.	Hollow cathode ion source
FR3056602B1 (fr) *	2016-09-28	2021-01-01	Commissariat Energie Atomique	Procede de fabrication par dli-mocvd d'un composant nucleaire avec revetement de crc amorphe
FR3056601B1 (fr) *	2016-09-28	2020-12-25	Commissariat Energie Atomique	Procede de fabrication d'un composant nucleaire a substrat metallique par dli-mocvd
EP3520118B1 (fr)	2016-09-28	2020-08-05	Commissariat à l'Énergie Atomique et aux Énergies Alternatives	Composant nucléaire avec revetement de cr metastable, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
EP3520119B1 (fr)	2016-09-28	2020-07-29	Commissariat à l'Énergie Atomique et aux Énergies Alternatives	Composant nucléaire composite, procédé de fabrication par dli-mocvd et utilisations contre l'oxydation/hydruration
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1989
- 1989-02-16 FR FR8902048A patent/FR2643087B1/fr not_active Expired - Fee Related
1990
- 1990-02-12 DE DE69005331T patent/DE69005331T2/de not_active Expired - Fee Related
- 1990-02-12 AT AT90400374T patent/ATE99001T1/de not_active IP Right Cessation
- 1990-02-12 EP EP90400374A patent/EP0387113B1/fr not_active Expired - Lifetime
- 1990-02-13 IL IL9337890A patent/IL93378A/en not_active IP Right Cessation
- 1990-02-15 FI FI900758A patent/FI93556C/fi not_active IP Right Cessation
- 1990-02-15 CA CA002010119A patent/CA2010119A1/en not_active Abandoned
- 1990-02-15 ZA ZA901151A patent/ZA901151B/xx unknown
- 1990-02-16 JP JP2035992A patent/JPH032374A/ja active Pending
1992
- 1992-11-13 US US07/975,999 patent/US5302422A/en not_active Expired - Fee Related

Also Published As

Publication number	Publication date
FI900758A0 (fi)	1990-02-15
DE69005331D1 (de)	1994-02-03
EP0387113B1 (fr)	1993-12-22
FR2643087B1 (fr)	1991-06-07
IL93378A0 (en)	1990-11-29
US5302422A (en)	1994-04-12
EP0387113A1 (fr)	1990-09-12
ZA901151B (en)	1991-09-25
FR2643087A1 (fr)	1990-08-17
FI93556C (fi)	1995-04-25
JPH032374A (ja)	1991-01-08
ATE99001T1 (de)	1994-01-15
DE69005331T2 (de)	1994-06-09
FI93556B (fi)	1995-01-13
CA2010119A1 (en)	1990-08-16

Legal Events

Date	Code	Title	Description
1996-05-14	KB	Patent renewed
2001-06-14	RH	Patent void

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Archer	1981	The plasma-assisted chemical vapour deposition of TiC, TiN and TiCxN1− x
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JPH04301084A (ja)	1992-10-23	耐摩耗性部材およびその製造法
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CA2314356A1 (en)	2000-04-20	Anti-coking coatings for refractory alloys used in the petroleum field
Reynoldson	1995	Advances in surface treatments using fluidised beds
Abisset et al.	1998	Low-temperature MOCVD of V–C–N coatings using bis (arene) vanadium as precursors
Manory	1990	Some principles for understanding surface modification of metals by glow discharge processes
JPS6360282A (ja)	1988-03-16	プラズマ蒸着式基体表面被覆方法
JPS6360285A (ja)	1988-03-16	プラズマ蒸着式基体表面被覆方法