IT1041472B - Dispositivo a fascio laser per la fabbricazione di circuiti integrati a semiconduttore - Google Patents

Dispositivo a fascio laser per la fabbricazione di circuiti integrati a semiconduttore

Info

Publication number
IT1041472B
IT1041472B IT69059/75A IT6905975A IT1041472B IT 1041472 B IT1041472 B IT 1041472B IT 69059/75 A IT69059/75 A IT 69059/75A IT 6905975 A IT6905975 A IT 6905975A IT 1041472 B IT1041472 B IT 1041472B
Authority
IT
Italy
Prior art keywords
manufacture
laser beam
integrated circuits
semiconductor integrated
beam device
Prior art date
Application number
IT69059/75A
Other languages
English (en)
Original Assignee
Western Electric Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Western Electric Co filed Critical Western Electric Co
Application granted granted Critical
Publication of IT1041472B publication Critical patent/IT1041472B/it

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
    • G03F7/704—Scanned exposure beam, e.g. raster-, rotary- and vector scanning
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K26/00—Working by laser beam, e.g. welding, cutting or boring
    • B23K26/08—Devices involving relative movement between laser beam and workpiece
    • B23K26/083—Devices involving movement of the workpiece in at least one axial direction
    • B23K26/0838—Devices involving movement of the workpiece in at least one axial direction by using an endless conveyor belt
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/02—Elements
    • C08K3/08—Metals
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08K—Use of inorganic or non-macromolecular organic substances as compounding ingredients
    • C08K3/00—Use of inorganic substances as compounding ingredients
    • C08K3/34—Silicon-containing compounds
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01B—CABLES; CONDUCTORS; INSULATORS; SELECTION OF MATERIALS FOR THEIR CONDUCTIVE, INSULATING OR DIELECTRIC PROPERTIES
    • H01B3/00—Insulators or insulating bodies characterised by the insulating materials; Selection of materials for their insulating or dielectric properties
    • H01B3/002—Inhomogeneous material in general
    • H01B3/004—Inhomogeneous material in general with conductive additives or conductive layers
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
    • B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
    • B23K2101/00—Articles made by soldering, welding or cutting
    • B23K2101/007—Marks, e.g. trade marks

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Polymers & Plastics (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Organic Chemistry (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Mechanical Engineering (AREA)
  • Plasma & Fusion (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Laser Beam Processing (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Manufacture Or Reproduction Of Printing Formes (AREA)
  • Laser Beam Printer (AREA)
IT69059/75A 1974-08-09 1975-08-08 Dispositivo a fascio laser per la fabbricazione di circuiti integrati a semiconduttore IT1041472B (it)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US496150A US3925785A (en) 1974-08-09 1974-08-09 Pattern generating apparatus

Publications (1)

Publication Number Publication Date
IT1041472B true IT1041472B (it) 1980-01-10

Family

ID=23971460

Family Applications (1)

Application Number Title Priority Date Filing Date
IT69059/75A IT1041472B (it) 1974-08-09 1975-08-08 Dispositivo a fascio laser per la fabbricazione di circuiti integrati a semiconduttore

Country Status (8)

Country Link
US (1) US3925785A (it)
JP (1) JPS5326114B2 (it)
CA (1) CA1048661A (it)
DE (1) DE2535561C3 (it)
FR (1) FR2281596A1 (it)
GB (1) GB1495651A (it)
IT (1) IT1041472B (it)
NL (1) NL163632C (it)

Families Citing this family (20)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
SE399628B (sv) * 1975-02-13 1978-02-20 Westerberg Erik Gerhard Natana Drivanordning, speciellt for anvendning vid en avsokningsanordning for framstellning av masker for mikrokretsar
US4023088A (en) * 1975-07-23 1977-05-10 White, Letcher T. Radiation-to-a.c. converter
JPS5548949A (en) * 1978-10-02 1980-04-08 Jones Geraint A C Scribing device and method
US4209240A (en) * 1978-10-10 1980-06-24 California Institute Of Technology Reticle exposure apparatus and method
US4424519A (en) 1979-05-24 1984-01-03 American Hoechst Corporation System and method for producing artwork for printed circuit boards
US4404569A (en) * 1979-05-24 1983-09-13 American Hoechst Corporation System and method for producing artwork for printed circuit boards
US4390277A (en) * 1980-07-31 1983-06-28 Mcdonnell Douglas Corporation Flat sheet scatterometer
USRE33931E (en) * 1981-12-21 1992-05-19 American Semiconductor Equipment Technologies Laser pattern generating system
DE3270459D1 (en) * 1981-12-31 1986-05-15 Ibm A method and apparatus for providing a uniform illumination of an area
US4608578A (en) * 1983-11-14 1986-08-26 Matrix Instruments Inc. Braked media transport for laser scanners
JPS6238413A (ja) * 1985-08-13 1987-02-19 Toshiba Corp 光走査機構
US5635976A (en) * 1991-07-17 1997-06-03 Micronic Laser Systems Ab Method and apparatus for the production of a structure by focused laser radiation on a photosensitively coated substrate
US5808268A (en) * 1996-07-23 1998-09-15 International Business Machines Corporation Method for marking substrates
JP3213882B2 (ja) * 1997-03-21 2001-10-02 住友重機械工業株式会社 レーザ加工装置及び加工方法
JP2000131629A (ja) * 1998-10-27 2000-05-12 Fuji Photo Film Co Ltd 画像記録装置
DE10116060B4 (de) * 2001-03-30 2005-01-13 Tesa Scribos Gmbh Lithograph mit Triggermaske und Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium
DE10116058B4 (de) * 2001-03-30 2006-05-11 Tesa Scribos Gmbh Verfahren zum Herstellen digitaler Hologramme in einem Speichermedium und Lithograph zum Herstellen digitaler Hologramme in einem Speichermedium
JP4199003B2 (ja) * 2001-04-12 2008-12-17 テーザ スクリボス ゲゼルシャフト ミット ベシュレンクテル ハフツング １次元トリガマスクを有するリソグラフ及び記憶媒体にデジタルホログラムを生成する方法
RU2328364C2 (ru) * 2006-08-21 2008-07-10 Общество с ограниченной ответственностью "АГРОЭЛ" Устройство для лазерной обработки поверхностей
KR101536983B1 (ko) * 2014-02-25 2015-07-15 삼목강업주식회사 스프링용 레이저 마킹 시스템

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3293515A (en) * 1963-09-24 1966-12-20 John F Langs Long travel linearly reciprocating electric motor
US3573849A (en) * 1969-02-04 1971-04-06 Bell Telephone Labor Inc Pattern generating apparatus
US3573847A (en) * 1969-08-22 1971-04-06 Olivetti General Electric Spa Character recorder
US3622742A (en) * 1970-05-27 1971-11-23 Bell Telephone Labor Inc Laser machining method and apparatus

Also Published As

Publication number Publication date
NL7509491A (nl) 1976-02-11
NL163632B (nl) 1980-04-15
DE2535561B2 (de) 1979-06-28
US3925785A (en) 1975-12-09
FR2281596A1 (fr) 1976-03-05
NL163632C (nl) 1980-09-15
JPS5326114B2 (it) 1978-07-31
DE2535561A1 (de) 1976-02-26
DE2535561C3 (de) 1980-02-28
GB1495651A (en) 1977-12-21
CA1048661A (en) 1979-02-13
JPS5141968A (it) 1976-04-08
FR2281596B1 (it) 1977-12-16

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