ITTO920368A0 - Stereolitografia con impiego di polimeri etere vinilico-epossido - Google Patents

Stereolitografia con impiego di polimeri etere vinilico-epossido

Info

Publication number
ITTO920368A0
ITTO920368A0 IT92TO368A ITTO920368A ITTO920368A0 IT TO920368 A0 ITTO920368 A0 IT TO920368A0 IT 92TO368 A IT92TO368 A IT 92TO368A IT TO920368 A ITTO920368 A IT TO920368A IT TO920368 A0 ITTO920368 A0 IT TO920368A0
Authority
IT
Italy
Prior art keywords
stereolithography
vinyl ether
epoxide polymers
epoxide
polymers
Prior art date
Application number
IT92TO368A
Other languages
English (en)
Inventor
Stephen Craig Lapin
James Ronald Snyder
Eugene Valentine Sitzmann
Darryl Keith Barnes
George David Green
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Publication of ITTO920368A0 publication Critical patent/ITTO920368A0/it
Publication of ITTO920368A1 publication Critical patent/ITTO920368A1/it
Application granted granted Critical
Publication of IT1263117B publication Critical patent/IT1263117B/it

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
ITTO920368A 1991-05-01 1992-04-29 Stereolitografia con impiego di polimeri etere vinilico-epossido IT1263117B (it)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US69389091A 1991-05-01 1991-05-01
US85539292A 1992-03-26 1992-03-26

Publications (3)

Publication Number Publication Date
ITTO920368A0 true ITTO920368A0 (it) 1992-04-29
ITTO920368A1 ITTO920368A1 (it) 1993-10-29
IT1263117B IT1263117B (it) 1996-07-30

Family

ID=27105258

Family Applications (1)

Application Number Title Priority Date Filing Date
ITTO920368A IT1263117B (it) 1991-05-01 1992-04-29 Stereolitografia con impiego di polimeri etere vinilico-epossido

Country Status (11)

Country Link
US (1) US5437964A (it)
JP (1) JP2667934B2 (it)
BE (1) BE1005001A4 (it)
CA (1) CA2102107C (it)
DE (1) DE4291255T1 (it)
FR (1) FR2676061B1 (it)
GB (1) GB2273297B (it)
IT (1) IT1263117B (it)
NL (1) NL193122C (it)
SE (1) SE503956C2 (it)
WO (1) WO1992020014A1 (it)

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US5496682A (en) * 1993-10-15 1996-03-05 W. R. Grace & Co.-Conn. Three dimensional sintered inorganic structures using photopolymerization
US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
US5639413A (en) * 1995-03-30 1997-06-17 Crivello; James Vincent Methods and compositions related to stereolithography
EP0831127B1 (en) * 1995-05-12 2003-09-03 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographic resin composition and stereolithographic method
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5648194A (en) * 1995-08-03 1997-07-15 Shipley Company, L.L.C. Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5932309A (en) 1995-09-28 1999-08-03 Alliedsignal Inc. Colored articles and compositions and methods for their fabrication
US7332537B2 (en) 1996-09-04 2008-02-19 Z Corporation Three dimensional printing material system and method
US5783136A (en) * 1996-09-09 1998-07-21 Ford Global Technologies, Inc. Method of preparing a stereolithographically produced prototype for experimental stress analysis
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US5889084A (en) * 1997-01-30 1999-03-30 Ncr Corporation UV or visible light initiated cationic cured ink for ink jet printing
GB9702658D0 (en) 1997-02-10 1997-04-02 Imperial College Fabrication method and apparatus
US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
EP0960354A1 (en) * 1997-02-14 1999-12-01 Alliedsignal Inc. High temperature performance polymers for stereolithography
US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6025017A (en) * 1997-05-21 2000-02-15 Ncr Corporation Photopolymerizable coating formulation for thermal transfer media
US5977018A (en) * 1997-06-30 1999-11-02 Ncr Corporation Reactive paper and ink for indelible print
ATE212734T1 (de) * 1997-06-30 2002-02-15 Siemens Ag Reaktionsharzmischungen und deren verwendung
US5992314A (en) * 1997-06-30 1999-11-30 Ncr Corporation UV curable adhesive for stencil media
US6028212A (en) * 1997-12-16 2000-02-22 Morton International, Inc. Solid vinyl ether terminated urethane curing agent
US6040040A (en) * 1998-01-28 2000-03-21 Ncr Corporation Multi-layer thermal transfer media from selectively curable formulations
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
DE60008778T2 (de) 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
US6376148B1 (en) 2001-01-17 2002-04-23 Nanotek Instruments, Inc. Layer manufacturing using electrostatic imaging and lamination
US6893489B2 (en) 2001-12-20 2005-05-17 Honeywell International Inc. Physical colored inks and coatings
WO2004113042A2 (en) 2003-05-21 2004-12-29 Z Corporation Thermoplastic powder material system for appearance models from 3d printing systems
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
JP4235698B2 (ja) 2003-08-21 2009-03-11 旭化成ケミカルズ株式会社 感光性組成物およびその硬化物
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
ATE527099T1 (de) * 2004-03-22 2011-10-15 Huntsman Adv Mat Switzerland Photohärtbare zusammensetzungen
CN101014664B (zh) * 2004-06-04 2012-10-10 设计者分子公司 可自由基固化的聚酯及其使用方法
US7875688B2 (en) * 2004-06-04 2011-01-25 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
CN101568422B (zh) 2006-12-08 2013-02-13 3D系统公司 使用过氧化物固化的三维印刷材料体系和方法
JP5129267B2 (ja) 2007-01-10 2013-01-30 スリーディー システムズ インコーポレーテッド 改良された色、物品性能及び使用の容易さ、を持つ３次元印刷材料システム
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
WO2008111283A1 (ja) * 2007-03-09 2008-09-18 Daicel Chemical Industries, Ltd. 光硬化性樹脂組成物
US7868113B2 (en) 2007-04-11 2011-01-11 Designer Molecules, Inc. Low shrinkage polyester thermosetting resins
US8158748B2 (en) 2008-08-13 2012-04-17 Designer Molecules, Inc. Hetero-functional compounds and methods for use thereof
BE1019331A5 (nl) 2010-05-10 2012-06-05 Flooring Ind Ltd Sarl Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen.
US8816021B2 (en) 2010-09-10 2014-08-26 Designer Molecules, Inc. Curable composition with rubber-like properties
ITVI20110333A1 (it) * 2011-12-23 2013-06-24 Ettore Maurizio Costabeber Macchina stereolitografica con gruppo ottico perfezionato
WO2014204450A1 (en) * 2013-06-19 2014-12-24 Hewlett-Packard Development Company, L.P. Compositions for three-dimensional (3d) printing
EP3758916A4 (en) * 2018-03-02 2021-10-27 Formlabs, Inc. LATENT CURING RESINS AND RELATED PROCESSES
US11638979B2 (en) * 2020-06-09 2023-05-02 Applied Materials, Inc. Additive manufacturing of polishing pads
US11612978B2 (en) 2020-06-09 2023-03-28 Applied Materials, Inc. Additive manufacturing of polishing pads

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Also Published As

Publication number Publication date
FR2676061B1 (fr) 2000-03-31
SE9303557D0 (sv) 1993-10-29
CA2102107A1 (en) 1992-11-02
FR2676061A1 (fr) 1992-11-06
JPH06507738A (ja) 1994-09-01
GB2273297B (en) 1995-11-22
NL9220016A (nl) 1994-02-01
NL193122C (nl) 1998-11-03
NL193122B (nl) 1998-07-01
GB2273297A (en) 1994-06-15
CA2102107C (en) 2002-07-16
BE1005001A4 (fr) 1993-03-16
SE9303557L (sv) 1993-11-22
ITTO920368A1 (it) 1993-10-29
US5437964A (en) 1995-08-01
IT1263117B (it) 1996-07-30
JP2667934B2 (ja) 1997-10-27
GB9321979D0 (en) 1994-02-16
DE4291255T1 (de) 1994-05-05
WO1992020014A1 (en) 1992-11-12
SE503956C2 (sv) 1996-10-07

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Legal Events

Date Code Title Description
0001 Granted
TA Fee payment date (situation as of event date), data collected since 19931001

Effective date: 19970430