NL193122C - Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. - Google Patents

Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. Download PDF

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Publication number
NL193122C
NL193122C NL9220016A NL9220016A NL193122C NL 193122 C NL193122 C NL 193122C NL 9220016 A NL9220016 A NL 9220016A NL 9220016 A NL9220016 A NL 9220016A NL 193122 C NL193122 C NL 193122C
Authority
NL
Netherlands
Prior art keywords
composition
vinyl ether
vinyl
formulation
curing
Prior art date
Application number
NL9220016A
Other languages
English (en)
Dutch (nl)
Other versions
NL9220016A (nl
NL193122B (nl
Inventor
Stephen Craig Lapin
James Ronald Snyder
Eugene Valentine Sitzmann
Darryl Keith Barnes
George David Green
Original Assignee
Allied Signal Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Allied Signal Inc filed Critical Allied Signal Inc
Publication of NL9220016A publication Critical patent/NL9220016A/nl
Publication of NL193122B publication Critical patent/NL193122B/xx
Application granted granted Critical
Publication of NL193122C publication Critical patent/NL193122C/nl

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/68—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the catalysts used
    • B—PERFORMING OPERATIONS; TRANSPORTING
    • B33—ADDITIVE MANUFACTURING TECHNOLOGY
    • B33Y—ADDITIVE MANUFACTURING, i.e. MANUFACTURING OF THREE-DIMENSIONAL [3D] OBJECTS BY ADDITIVE DEPOSITION, ADDITIVE AGGLOMERATION OR ADDITIVE LAYERING, e.g. BY 3D PRINTING, STEREOLITHOGRAPHY OR SELECTIVE LASER SINTERING
    • B33Y70/00—Materials specially adapted for additive manufacturing
    • C—CHEMISTRY; METALLURGY
    • C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0037—Production of three-dimensional images
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0385—Macromolecular compounds which are rendered insoluble or differentially wettable using epoxidised novolak resin

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Medicinal Chemistry (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Manufacturing & Machinery (AREA)
  • Engineering & Computer Science (AREA)
  • Epoxy Resins (AREA)
  • Macromonomer-Based Addition Polymer (AREA)
  • Polymerisation Methods In General (AREA)
NL9220016A 1991-05-01 1992-04-15 Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren. NL193122C (nl)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
US69389091A 1991-05-01 1991-05-01
US69389091 1991-05-01
US85539292A 1992-03-26 1992-03-26
US85539292 1992-03-26
US9203168 1992-04-15
PCT/US1992/003168 WO1992020014A1 (en) 1991-05-01 1992-04-15 Stereolithography using vinyl ether-epoxide polymers

Publications (3)

Publication Number Publication Date
NL9220016A NL9220016A (nl) 1994-02-01
NL193122B NL193122B (nl) 1998-07-01
NL193122C true NL193122C (nl) 1998-11-03

Family

ID=27105258

Family Applications (1)

Application Number Title Priority Date Filing Date
NL9220016A NL193122C (nl) 1991-05-01 1992-04-15 Stereolithografie onder gebruikmaking van vinyletherepoxydepolymeren.

Country Status (11)

Country Link
US (1) US5437964A (it)
JP (1) JP2667934B2 (it)
BE (1) BE1005001A4 (it)
CA (1) CA2102107C (it)
DE (1) DE4291255T1 (it)
FR (1) FR2676061B1 (it)
GB (1) GB2273297B (it)
IT (1) IT1263117B (it)
NL (1) NL193122C (it)
SE (1) SE503956C2 (it)
WO (1) WO1992020014A1 (it)

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US5418112A (en) * 1993-11-10 1995-05-23 W. R. Grace & Co.-Conn. Photosensitive compositions useful in three-dimensional part-building and having improved photospeed
US5494618A (en) * 1994-06-27 1996-02-27 Alliedsignal Inc. Increasing the useful range of cationic photoinitiators in stereolithography
US5705116A (en) * 1994-06-27 1998-01-06 Sitzmann; Eugene Valentine Increasing the useful range of cationic photoinitiators in stereolithography
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EP0831127B1 (en) * 1995-05-12 2003-09-03 Asahi Denka Kogyo Kabushiki Kaisha Stereolithographic resin composition and stereolithographic method
US5707780A (en) 1995-06-07 1998-01-13 E. I. Du Pont De Nemours And Company Photohardenable epoxy composition
US5648194A (en) * 1995-08-03 1997-07-15 Shipley Company, L.L.C. Photoresist composition comprising an alkali-soluble resin, a quinone diazide compound and a vinyl ether
US5932309A (en) 1995-09-28 1999-08-03 Alliedsignal Inc. Colored articles and compositions and methods for their fabrication
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US5783136A (en) * 1996-09-09 1998-07-21 Ford Global Technologies, Inc. Method of preparing a stereolithographically produced prototype for experimental stress analysis
JP3765896B2 (ja) 1996-12-13 2006-04-12 Ｊｓｒ株式会社 光学的立体造形用光硬化性樹脂組成物
FR2757530A1 (fr) * 1996-12-24 1998-06-26 Rhodia Chimie Sa Utilisation pour la stereophotolithographie - d'une composition liquide photoreticulable par voie cationique comprenant un photoamorceur du type sels d'onium ou de complexes organometalliques
US5889084A (en) * 1997-01-30 1999-03-30 Ncr Corporation UV or visible light initiated cationic cured ink for ink jet printing
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US6054250A (en) * 1997-02-18 2000-04-25 Alliedsignal Inc. High temperature performance polymers for stereolithography
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US5858605A (en) * 1997-03-08 1999-01-12 Shipley Company, L.L.C. Acid labile photoactive composition
US6025017A (en) * 1997-05-21 2000-02-15 Ncr Corporation Photopolymerizable coating formulation for thermal transfer media
US5977018A (en) * 1997-06-30 1999-11-02 Ncr Corporation Reactive paper and ink for indelible print
ATE212734T1 (de) * 1997-06-30 2002-02-15 Siemens Ag Reaktionsharzmischungen und deren verwendung
US5992314A (en) * 1997-06-30 1999-11-30 Ncr Corporation UV curable adhesive for stencil media
US6028212A (en) * 1997-12-16 2000-02-22 Morton International, Inc. Solid vinyl ether terminated urethane curing agent
US6040040A (en) * 1998-01-28 2000-03-21 Ncr Corporation Multi-layer thermal transfer media from selectively curable formulations
US6262825B1 (en) 1999-08-24 2001-07-17 Napp Systems, Inc. Apparatus and method for the enhanced imagewise exposure of a photosensitive material
DE60008778T2 (de) 1999-11-05 2005-02-10 Z Corp., Burlington Verfahren für dreidimensionales drucken
US20010050031A1 (en) 2000-04-14 2001-12-13 Z Corporation Compositions for three-dimensional printing of solid objects
US6376148B1 (en) 2001-01-17 2002-04-23 Nanotek Instruments, Inc. Layer manufacturing using electrostatic imaging and lamination
US6893489B2 (en) 2001-12-20 2005-05-17 Honeywell International Inc. Physical colored inks and coatings
WO2004113042A2 (en) 2003-05-21 2004-12-29 Z Corporation Thermoplastic powder material system for appearance models from 3d printing systems
US7005232B2 (en) 2003-06-16 2006-02-28 Napp Systems, Inc. Highly reflective substrates for the digital processing of photopolymer printing plates
JP4235698B2 (ja) 2003-08-21 2009-03-11 旭化成ケミカルズ株式会社 感光性組成物およびその硬化物
US7261542B2 (en) 2004-03-18 2007-08-28 Desktop Factory, Inc. Apparatus for three dimensional printing using image layers
ATE527099T1 (de) * 2004-03-22 2011-10-15 Huntsman Adv Mat Switzerland Photohärtbare zusammensetzungen
CN101014664B (zh) * 2004-06-04 2012-10-10 设计者分子公司 可自由基固化的聚酯及其使用方法
US7875688B2 (en) * 2004-06-04 2011-01-25 Designer Molecules, Inc. Free-radical curable polyesters and methods for use thereof
CN101568422B (zh) 2006-12-08 2013-02-13 3D系统公司 使用过氧化物固化的三维印刷材料体系和方法
JP5129267B2 (ja) 2007-01-10 2013-01-30 スリーディー システムズ インコーポレーテッド 改良された色、物品性能及び使用の容易さ、を持つ３次元印刷材料システム
US7968626B2 (en) 2007-02-22 2011-06-28 Z Corporation Three dimensional printing material system and method using plasticizer-assisted sintering
WO2008111283A1 (ja) * 2007-03-09 2008-09-18 Daicel Chemical Industries, Ltd. 光硬化性樹脂組成物
US7868113B2 (en) 2007-04-11 2011-01-11 Designer Molecules, Inc. Low shrinkage polyester thermosetting resins
US8158748B2 (en) 2008-08-13 2012-04-17 Designer Molecules, Inc. Hetero-functional compounds and methods for use thereof
BE1019331A5 (nl) 2010-05-10 2012-06-05 Flooring Ind Ltd Sarl Vloerpaneel en werkwijzen voor het vervaardigen van vloerpanelen.
US8816021B2 (en) 2010-09-10 2014-08-26 Designer Molecules, Inc. Curable composition with rubber-like properties
ITVI20110333A1 (it) * 2011-12-23 2013-06-24 Ettore Maurizio Costabeber Macchina stereolitografica con gruppo ottico perfezionato
WO2014204450A1 (en) * 2013-06-19 2014-12-24 Hewlett-Packard Development Company, L.P. Compositions for three-dimensional (3d) printing
EP3758916A4 (en) * 2018-03-02 2021-10-27 Formlabs, Inc. LATENT CURING RESINS AND RELATED PROCESSES
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Also Published As

Publication number Publication date
FR2676061B1 (fr) 2000-03-31
SE9303557D0 (sv) 1993-10-29
CA2102107A1 (en) 1992-11-02
FR2676061A1 (fr) 1992-11-06
JPH06507738A (ja) 1994-09-01
GB2273297B (en) 1995-11-22
NL9220016A (nl) 1994-02-01
NL193122B (nl) 1998-07-01
GB2273297A (en) 1994-06-15
CA2102107C (en) 2002-07-16
BE1005001A4 (fr) 1993-03-16
SE9303557L (sv) 1993-11-22
ITTO920368A1 (it) 1993-10-29
US5437964A (en) 1995-08-01
IT1263117B (it) 1996-07-30
JP2667934B2 (ja) 1997-10-27
GB9321979D0 (en) 1994-02-16
ITTO920368A0 (it) 1992-04-29
DE4291255T1 (de) 1994-05-05
WO1992020014A1 (en) 1992-11-12
SE503956C2 (sv) 1996-10-07

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BC A request for examination has been filed
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Owner name: VANTICO AG;CIBA SPECIALTY CHEMICALS HOLDING INC.

V1 Lapsed because of non-payment of the annual fee

Effective date: 20041101