JP2000507041A - 陰極線管の製造方法と陰極線管 - Google Patents

陰極線管の製造方法と陰極線管

Info

Publication number: JP2000507041A
Authority: JP; Japan
Prior art keywords: layer; cathode ray; ray tube; silicon dioxide; manufacturing
Prior art date: 1997-01-17
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Abandoned

Application number

JP10529169A

Other languages

English (en)

Japanese (ja)

Other versions

JP2000507041A5 (de

Inventor

デルフォールトアンドレファン

ヨハネスマリアアザリナアントニウスコンペン

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Koninklijke Philips NV

Original Assignee

Philips Electronics NV

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1997-01-17

Filing date

1998-01-12

Publication date

2000-06-06

1998-01-12 Application filed by Philips Electronics NV filed Critical Philips Electronics NV

2000-06-06 Publication of JP2000507041A publication Critical patent/JP2000507041A/ja

2005-09-08 Publication of JP2000507041A5 publication Critical patent/JP2000507041A5/ja

Status Abandoned legal-status Critical Current

Links

238000004519 manufacturing process Methods 0.000 title claims abstract description 15
238000000034 method Methods 0.000 claims abstract description 43
238000011282 treatment Methods 0.000 claims abstract description 19
239000000126 substance Substances 0.000 claims abstract description 17
238000004544 sputter deposition Methods 0.000 claims abstract description 15
229910004298 SiO 2 Inorganic materials 0.000 claims abstract description 7
GRPQBOKWXNIQMF-UHFFFAOYSA-N indium(3+) oxygen(2-) tin(4+) Chemical compound [Sn+4].[O-2].[In+3] GRPQBOKWXNIQMF-UHFFFAOYSA-N 0.000 claims abstract 2
VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 claims description 66
235000012239 silicon dioxide Nutrition 0.000 claims description 33
239000000377 silicon dioxide Substances 0.000 claims description 33
AMGQUBHHOARCQH-UHFFFAOYSA-N indium;oxotin Chemical compound [In].[Sn]=O AMGQUBHHOARCQH-UHFFFAOYSA-N 0.000 claims description 13
230000003667 anti-reflective effect Effects 0.000 claims description 9
239000011248 coating agent Substances 0.000 claims description 9
238000000576 coating method Methods 0.000 claims description 9
239000000463 material Substances 0.000 claims description 9
239000002184 metal Substances 0.000 claims description 6
229910052751 metal Inorganic materials 0.000 claims description 6
238000005530 etching Methods 0.000 claims description 5
239000004020 conductor Substances 0.000 claims description 3
230000004313 glare Effects 0.000 claims description 3
239000011358 absorbing material Substances 0.000 claims description 2
230000003213 activating effect Effects 0.000 claims 1
230000002265 prevention Effects 0.000 claims 1
230000000694 effects Effects 0.000 abstract description 13
238000009987 spinning Methods 0.000 abstract description 7
-1 TEOS compound Chemical class 0.000 abstract description 4
238000001035 drying Methods 0.000 abstract description 3
239000010410 layer Substances 0.000 description 149
238000005507 spraying Methods 0.000 description 9
230000008901 benefit Effects 0.000 description 7
BOTDANWDWHJENH-UHFFFAOYSA-N Tetraethyl orthosilicate Chemical compound CCO[Si](OCC)(OCC)OCC BOTDANWDWHJENH-UHFFFAOYSA-N 0.000 description 6
229910001887 tin oxide Inorganic materials 0.000 description 5
239000003795 chemical substances by application Substances 0.000 description 4
239000002245 particle Substances 0.000 description 4
XOLBLPGZBRYERU-UHFFFAOYSA-N tin dioxide Chemical compound O=[Sn]=O XOLBLPGZBRYERU-UHFFFAOYSA-N 0.000 description 4
OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 3
150000001875 compounds Chemical class 0.000 description 3
238000010894 electron beam technology Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
229910010413 TiO 2 Inorganic materials 0.000 description 2
GWEVSGVZZGPLCZ-UHFFFAOYSA-N Titan oxide Chemical compound O=[Ti]=O GWEVSGVZZGPLCZ-UHFFFAOYSA-N 0.000 description 2
230000004913 activation Effects 0.000 description 2
230000001476 alcoholic effect Effects 0.000 description 2
239000003518 caustics Substances 0.000 description 2
238000005229 chemical vapour deposition Methods 0.000 description 2
230000001627 detrimental effect Effects 0.000 description 2
239000007789 gas Substances 0.000 description 2
238000010438 heat treatment Methods 0.000 description 2
239000010955 niobium Substances 0.000 description 2
230000008569 process Effects 0.000 description 2
239000000758 substrate Substances 0.000 description 2
OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 2
229910018072 Al 2 O 3 Inorganic materials 0.000 description 1
208000027418 Wounds and injury Diseases 0.000 description 1
230000001464 adherent effect Effects 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
239000007900 aqueous suspension Substances 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
230000015572 biosynthetic process Effects 0.000 description 1
238000012993 chemical processing Methods 0.000 description 1
230000006378 damage Effects 0.000 description 1
230000002950 deficient Effects 0.000 description 1
239000002355 dual-layer Substances 0.000 description 1
230000005672 electromagnetic field Effects 0.000 description 1
239000011521 glass Substances 0.000 description 1
230000006872 improvement Effects 0.000 description 1
208000014674 injury Diseases 0.000 description 1
150000002500 ions Chemical class 0.000 description 1
239000004816 latex Substances 0.000 description 1
229920000126 latex Polymers 0.000 description 1
229910044991 metal oxide Inorganic materials 0.000 description 1
150000004706 metal oxides Chemical class 0.000 description 1
229910000484 niobium oxide Inorganic materials 0.000 description 1
URLJKFSTXLNXLG-UHFFFAOYSA-N niobium(5+);oxygen(2-) Chemical compound [O-2].[O-2].[O-2].[O-2].[O-2].[Nb+5].[Nb+5] URLJKFSTXLNXLG-UHFFFAOYSA-N 0.000 description 1
230000003287 optical effect Effects 0.000 description 1
230000035699 permeability Effects 0.000 description 1
230000003068 static effect Effects 0.000 description 1
230000001629 suppression Effects 0.000 description 1
239000000725 suspension Substances 0.000 description 1
238000007704 wet chemistry method Methods 0.000 description 1

Classifications

- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J29/00—Details of cathode-ray tubes or of electron-beam tubes of the types covered by group H01J31/00
- H01J29/86—Vessels; Containers; Vacuum locks
- H01J29/867—Means associated with the outside of the vessel for shielding, e.g. magnetic shields
- H01J29/868—Screens covering the input or output face of the vessel, e.g. transparent anti-static coatings, X-ray absorbing layers
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2209/00—Apparatus and processes for manufacture of discharge tubes
- H01J2209/01—Generalised techniques
- H01J2209/012—Coating
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J2229/00—Details of cathode ray tubes or electron beam tubes
- H01J2229/89—Optical components associated with the vessel
- H01J2229/8913—Anti-reflection, anti-glare, viewing angle and contrast improving treatments or devices

Landscapes

Vessels, Lead-In Wires, Accessory Apparatuses For Cathode-Ray Tubes (AREA)
Formation Of Various Coating Films On Cathode Ray Tubes And Lamps (AREA)
Surface Treatment Of Optical Elements (AREA)

JP10529169A 1997-01-17 1998-01-12 陰極線管の製造方法と陰極線管 Abandoned JP2000507041A (ja)

Applications Claiming Priority (3)

Application Number	Priority Date	Filing Date	Title
EP97200060		1997-01-17
EP97200060.8		1997-01-17
PCT/IB1998/000027 WO1998032152A1 (en)	1997-01-17	1998-01-12	Method of manufacturing a cathode ray tube and a cathode ray tube

Publications (2)

Publication Number	Publication Date
JP2000507041A true JP2000507041A (ja)	2000-06-06
JP2000507041A5 JP2000507041A5 (de)	2005-09-08

Family

ID=8227920

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP10529169A Abandoned JP2000507041A (ja)	1997-01-17	1998-01-12	陰極線管の製造方法と陰極線管

Country Status (6)

Country	Link
EP (1)	EP0894331B1 (de)
JP (1)	JP2000507041A (de)
CN (1)	CN1199228C (de)
DE (1)	DE69817711T2 (de)
TW (1)	TW392189B (de)
WO (1)	WO1998032152A1 (de)

Families Citing this family (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
DE69935050D1 (de) *	1998-07-23	2007-03-22	Konica Corp	Durchsichtiges Element zur Dämpfung von elektromagnetischen Wellen
CA2396799C (en) *	2000-01-26	2012-04-24	Sola International Holdings Ltd.	Anti-static, anti-reflection coating
US20130202817A1 (en) *	2012-02-02	2013-08-08	James DeCoux	Antistatic coating

Family Cites Families (6)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH0719551B2 (ja) *	1985-04-22	1995-03-06	東レ株式会社	電磁波シールド性を有する光学フィルター
DE3629996A1 (de) *	1986-09-03	1988-03-17	Flachglas Ag	Vorsatzaggregat fuer die kathodenstrahlroehre von monitoren, fernsehapparaten und dergleichen
US5189337A (en) *	1988-09-09	1993-02-23	Hitachi, Ltd.	Ultrafine particles for use in a cathode ray tube or an image display face plate
EP0405304A3 (en) *	1989-06-29	1992-06-03	Siemens Aktiengesellschaft	Thin film resistors whose surface resistance values are comprised between 1m-ohms and several g-ohms and process of making it
EP0649160B1 (de) *	1993-10-18	2001-09-19	Philips Electronics N.V.	Verfahren zur Herstellung einer Beschichtung auf einen Bildschirm und Anzeigevorrichtung die diese enthalt
JPH08211399A (ja) *	1995-02-08	1996-08-20	Teijin Ltd	液晶表示パネル用フィルム透明電極の製造方法

1997
- 1997-06-02 TW TW086107537A patent/TW392189B/zh not_active IP Right Cessation
1998
- 1998-01-12 JP JP10529169A patent/JP2000507041A/ja not_active Abandoned
- 1998-01-12 EP EP98900024A patent/EP0894331B1/de not_active Expired - Lifetime
- 1998-01-12 CN CN98800033.4A patent/CN1199228C/zh not_active Expired - Fee Related
- 1998-01-12 WO PCT/IB1998/000027 patent/WO1998032152A1/en not_active Ceased
- 1998-01-12 DE DE69817711T patent/DE69817711T2/de not_active Expired - Fee Related

Also Published As

Publication number	Publication date
WO1998032152A1 (en)	1998-07-23
CN1216152A (zh)	1999-05-05
EP0894331B1 (de)	2003-09-03
EP0894331A1 (de)	1999-02-03
DE69817711D1 (de)	2003-10-09
DE69817711T2 (de)	2004-07-15
TW392189B (en)	2000-06-01
CN1199228C (zh)	2005-04-27

Legal Events

Date

Code

Title

Description

2005-01-27

A521

Request for written amendment filed

Free format text: JAPANESE INTERMEDIATE CODE: A523

Effective date: 20050111

2005-01-27

A621

Written request for application examination

Free format text: JAPANESE INTERMEDIATE CODE: A621