JP2000515193A - イソモノオレフィン/パラ―アルキルスチレンコポリマーのハロゲン化方法 - Google Patents
イソモノオレフィン/パラ―アルキルスチレンコポリマーのハロゲン化方法Info
- Publication number
- JP2000515193A JP2000515193A JP10507127A JP50712798A JP2000515193A JP 2000515193 A JP2000515193 A JP 2000515193A JP 10507127 A JP10507127 A JP 10507127A JP 50712798 A JP50712798 A JP 50712798A JP 2000515193 A JP2000515193 A JP 2000515193A
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- JP
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- Prior art keywords
- copolymer
- oxidizing agent
- azobis
- para
- weight
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000000034 method Methods 0.000 title claims abstract description 47
- 229920001577 copolymer Polymers 0.000 title claims abstract description 42
- 230000002140 halogenating effect Effects 0.000 title claims description 24
- 239000007800 oxidant agent Substances 0.000 claims abstract description 37
- 238000005658 halogenation reaction Methods 0.000 claims abstract description 33
- 229910052736 halogen Inorganic materials 0.000 claims abstract description 28
- 150000002367 halogens Chemical class 0.000 claims abstract description 28
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 claims abstract description 26
- 230000026030 halogenation Effects 0.000 claims abstract description 26
- 229910000039 hydrogen halide Inorganic materials 0.000 claims abstract description 11
- 239000012433 hydrogen halide Substances 0.000 claims abstract description 11
- JLBJTVDPSNHSKJ-UHFFFAOYSA-N 4-Methylstyrene Chemical compound CC1=CC=C(C=C)C=C1 JLBJTVDPSNHSKJ-UHFFFAOYSA-N 0.000 claims abstract description 10
- VQTUBCCKSQIDNK-UHFFFAOYSA-N Isobutene Chemical group CC(C)=C VQTUBCCKSQIDNK-UHFFFAOYSA-N 0.000 claims abstract description 8
- 238000011065 in-situ storage Methods 0.000 claims abstract description 8
- 229920000642 polymer Polymers 0.000 claims description 29
- CPELXLSAUQHCOX-UHFFFAOYSA-N Hydrogen bromide Chemical group Br CPELXLSAUQHCOX-UHFFFAOYSA-N 0.000 claims description 25
- 239000003795 chemical substances by application Substances 0.000 claims description 24
- GDTBXPJZTBHREO-UHFFFAOYSA-N bromine Chemical compound BrBr GDTBXPJZTBHREO-UHFFFAOYSA-N 0.000 claims description 23
- 239000003999 initiator Substances 0.000 claims description 23
- WKBOTKDWSSQWDR-UHFFFAOYSA-N Bromine atom Chemical compound [Br] WKBOTKDWSSQWDR-UHFFFAOYSA-N 0.000 claims description 17
- 229910052794 bromium Inorganic materials 0.000 claims description 17
- 239000000203 mixture Substances 0.000 claims description 16
- 238000005893 bromination reaction Methods 0.000 claims description 15
- 230000031709 bromination Effects 0.000 claims description 14
- OZAIFHULBGXAKX-UHFFFAOYSA-N 2-(2-cyanopropan-2-yldiazenyl)-2-methylpropanenitrile Chemical compound N#CC(C)(C)N=NC(C)(C)C#N OZAIFHULBGXAKX-UHFFFAOYSA-N 0.000 claims description 11
- 239000007795 chemical reaction product Substances 0.000 claims description 11
- PPBRXRYQALVLMV-UHFFFAOYSA-N Styrene Natural products C=CC1=CC=CC=C1 PPBRXRYQALVLMV-UHFFFAOYSA-N 0.000 claims description 10
- 229910000042 hydrogen bromide Inorganic materials 0.000 claims description 10
- -1 alkyl styrene Chemical compound 0.000 claims description 9
- 239000000839 emulsion Substances 0.000 claims description 5
- 125000001188 haloalkyl group Chemical group 0.000 claims description 5
- GYAZFWRAWZSHCP-UHFFFAOYSA-N 2-[(2-cyano-4,4-dimethylpentan-2-yl)diazenyl]-2,4,4-trimethylpentanenitrile Chemical compound CC(C)(C)CC(C)(C#N)N=NC(C)(C#N)CC(C)(C)C GYAZFWRAWZSHCP-UHFFFAOYSA-N 0.000 claims description 4
- 150000002825 nitriles Chemical class 0.000 claims description 4
- 239000003960 organic solvent Substances 0.000 claims description 4
- 230000001590 oxidative effect Effects 0.000 claims description 4
- 150000001875 compounds Chemical class 0.000 claims description 3
- 150000003254 radicals Chemical class 0.000 claims 9
- RCEJCSULJQNRQQ-UHFFFAOYSA-N 2-methylbutanenitrile Chemical compound CCC(C)C#N RCEJCSULJQNRQQ-UHFFFAOYSA-N 0.000 claims 3
- WVRLZGYZLCMBOU-UHFFFAOYSA-N 5,5-dimethylhexanenitrile Chemical compound CC(C)(C)CCCC#N WVRLZGYZLCMBOU-UHFFFAOYSA-N 0.000 claims 1
- 125000000118 dimethyl group Chemical group [H]C([H])([H])* 0.000 claims 1
- QYZFTMMPKCOTAN-UHFFFAOYSA-N n-[2-(2-hydroxyethylamino)ethyl]-2-[[1-[2-(2-hydroxyethylamino)ethylamino]-2-methyl-1-oxopropan-2-yl]diazenyl]-2-methylpropanamide Chemical compound OCCNCCNC(=O)C(C)(C)N=NC(C)(C)C(=O)NCCNCCO QYZFTMMPKCOTAN-UHFFFAOYSA-N 0.000 claims 1
- 238000006243 chemical reaction Methods 0.000 abstract description 28
- 239000012429 reaction media Substances 0.000 abstract description 5
- 239000011541 reaction mixture Substances 0.000 description 13
- VLKZOEOYAKHREP-UHFFFAOYSA-N n-Hexane Chemical compound CCCCCC VLKZOEOYAKHREP-UHFFFAOYSA-N 0.000 description 10
- 239000000126 substance Substances 0.000 description 10
- 229910052739 hydrogen Inorganic materials 0.000 description 7
- 239000000243 solution Substances 0.000 description 7
- 239000002904 solvent Substances 0.000 description 7
- 239000002253 acid Substances 0.000 description 6
- 239000006227 byproduct Substances 0.000 description 6
- 239000004568 cement Substances 0.000 description 6
- 239000001257 hydrogen Substances 0.000 description 6
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 5
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 4
- 239000007864 aqueous solution Substances 0.000 description 4
- 229920005549 butyl rubber Polymers 0.000 description 4
- 150000002978 peroxides Chemical class 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000001172 regenerating effect Effects 0.000 description 4
- VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 4
- UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- 229920001971 elastomer Polymers 0.000 description 3
- 150000002431 hydrogen Chemical class 0.000 description 3
- 238000006386 neutralization reaction Methods 0.000 description 3
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZAMOUSCENKQFHK-UHFFFAOYSA-N Chlorine atom Chemical compound [Cl] ZAMOUSCENKQFHK-UHFFFAOYSA-N 0.000 description 2
- HEDRZPFGACZZDS-UHFFFAOYSA-N Chloroform Chemical compound ClC(Cl)Cl HEDRZPFGACZZDS-UHFFFAOYSA-N 0.000 description 2
- RRHGJUQNOFWUDK-UHFFFAOYSA-N Isoprene Chemical compound CC(=C)C=C RRHGJUQNOFWUDK-UHFFFAOYSA-N 0.000 description 2
- 238000005481 NMR spectroscopy Methods 0.000 description 2
- CBENFWSGALASAD-UHFFFAOYSA-N Ozone Chemical compound [O-][O+]=O CBENFWSGALASAD-UHFFFAOYSA-N 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 2
- AGEZXYOZHKGVCM-UHFFFAOYSA-N benzyl bromide Chemical compound BrCC1=CC=CC=C1 AGEZXYOZHKGVCM-UHFFFAOYSA-N 0.000 description 2
- 230000015572 biosynthetic process Effects 0.000 description 2
- 125000001246 bromo group Chemical group Br* 0.000 description 2
- 239000003518 caustics Substances 0.000 description 2
- 239000000460 chlorine Substances 0.000 description 2
- 229910052801 chlorine Inorganic materials 0.000 description 2
- MVPPADPHJFYWMZ-UHFFFAOYSA-N chlorobenzene Chemical compound ClC1=CC=CC=C1 MVPPADPHJFYWMZ-UHFFFAOYSA-N 0.000 description 2
- 125000000664 diazo group Chemical group [N-]=[N+]=[*] 0.000 description 2
- 239000000806 elastomer Substances 0.000 description 2
- 229920001198 elastomeric copolymer Polymers 0.000 description 2
- 239000011521 glass Substances 0.000 description 2
- WQYVRQLZKVEZGA-UHFFFAOYSA-N hypochlorite Chemical compound Cl[O-] WQYVRQLZKVEZGA-UHFFFAOYSA-N 0.000 description 2
- 239000007788 liquid Substances 0.000 description 2
- 125000002496 methyl group Chemical group [H]C([H])([H])* 0.000 description 2
- 239000008267 milk Substances 0.000 description 2
- 210000004080 milk Anatomy 0.000 description 2
- 235000013336 milk Nutrition 0.000 description 2
- 239000001301 oxygen Substances 0.000 description 2
- 229910052760 oxygen Inorganic materials 0.000 description 2
- VLTRZXGMWDSKGL-UHFFFAOYSA-N perchloric acid Chemical class OCl(=O)(=O)=O VLTRZXGMWDSKGL-UHFFFAOYSA-N 0.000 description 2
- 229920005604 random copolymer Polymers 0.000 description 2
- 239000000376 reactant Substances 0.000 description 2
- 238000005406 washing Methods 0.000 description 2
- BZSXEZOLBIJVQK-UHFFFAOYSA-N 2-methylsulfonylbenzoic acid Chemical compound CS(=O)(=O)C1=CC=CC=C1C(O)=O BZSXEZOLBIJVQK-UHFFFAOYSA-N 0.000 description 1
- XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
- LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 1
- VGGSQFUCUMXWEO-UHFFFAOYSA-N Ethene Chemical compound C=C VGGSQFUCUMXWEO-UHFFFAOYSA-N 0.000 description 1
- 239000005977 Ethylene Substances 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 1
- IMNFDUFMRHMDMM-UHFFFAOYSA-N N-Heptane Chemical compound CCCCCCC IMNFDUFMRHMDMM-UHFFFAOYSA-N 0.000 description 1
- OFBQJSOFQDEBGM-UHFFFAOYSA-N Pentane Chemical compound CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
- 239000005708 Sodium hypochlorite Substances 0.000 description 1
- 150000007513 acids Chemical class 0.000 description 1
- 150000001298 alcohols Chemical class 0.000 description 1
- 125000001931 aliphatic group Chemical group 0.000 description 1
- 150000001413 amino acids Chemical class 0.000 description 1
- 125000003118 aryl group Chemical group 0.000 description 1
- CODNYICXDISAEA-UHFFFAOYSA-N bromine monochloride Chemical compound BrCl CODNYICXDISAEA-UHFFFAOYSA-N 0.000 description 1
- 230000015556 catabolic process Effects 0.000 description 1
- 125000001309 chloro group Chemical group Cl* 0.000 description 1
- 238000007796 conventional method Methods 0.000 description 1
- 230000007423 decrease Effects 0.000 description 1
- 238000006731 degradation reaction Methods 0.000 description 1
- 150000001993 dienes Chemical class 0.000 description 1
- 238000006251 dihalogenation reaction Methods 0.000 description 1
- 239000003085 diluting agent Substances 0.000 description 1
- 230000000694 effects Effects 0.000 description 1
- 150000002170 ethers Chemical class 0.000 description 1
- 230000009477 glass transition Effects 0.000 description 1
- 229920005555 halobutyl Polymers 0.000 description 1
- 125000005843 halogen group Chemical group 0.000 description 1
- 238000010438 heat treatment Methods 0.000 description 1
- 229910000041 hydrogen chloride Inorganic materials 0.000 description 1
- IXCSERBJSXMMFS-UHFFFAOYSA-N hydrogen chloride Substances Cl.Cl IXCSERBJSXMMFS-UHFFFAOYSA-N 0.000 description 1
- XMBWDFGMSWQBCA-UHFFFAOYSA-N hydrogen iodide Chemical compound I XMBWDFGMSWQBCA-UHFFFAOYSA-N 0.000 description 1
- 229910000043 hydrogen iodide Inorganic materials 0.000 description 1
- PEYVWSJAZONVQK-UHFFFAOYSA-N hydroperoxy(oxo)borane Chemical compound OOB=O PEYVWSJAZONVQK-UHFFFAOYSA-N 0.000 description 1
- 238000010952 in-situ formation Methods 0.000 description 1
- 230000000977 initiatory effect Effects 0.000 description 1
- CBEQRNSPHCCXSH-UHFFFAOYSA-N iodine monobromide Chemical compound IBr CBEQRNSPHCCXSH-UHFFFAOYSA-N 0.000 description 1
- 239000000463 material Substances 0.000 description 1
- 229910052751 metal Inorganic materials 0.000 description 1
- 239000002184 metal Substances 0.000 description 1
- 239000000178 monomer Substances 0.000 description 1
- 229910052757 nitrogen Inorganic materials 0.000 description 1
- 150000001451 organic peroxides Chemical class 0.000 description 1
- 238000007254 oxidation reaction Methods 0.000 description 1
- KHIWWQKSHDUIBK-UHFFFAOYSA-N periodic acid Chemical compound OI(=O)(=O)=O KHIWWQKSHDUIBK-UHFFFAOYSA-N 0.000 description 1
- 150000004965 peroxy acids Chemical class 0.000 description 1
- JRKICGRDRMAZLK-UHFFFAOYSA-L peroxydisulfate Chemical compound [O-]S(=O)(=O)OOS([O-])(=O)=O JRKICGRDRMAZLK-UHFFFAOYSA-L 0.000 description 1
- 125000001997 phenyl group Chemical group [H]C1=C([H])C([H])=C(*)C([H])=C1[H] 0.000 description 1
- 238000001556 precipitation Methods 0.000 description 1
- 150000005375 primary alkyl halides Chemical class 0.000 description 1
- 150000005376 secondary alkyl halides Chemical class 0.000 description 1
- XUXNAKZDHHEHPC-UHFFFAOYSA-M sodium bromate Chemical compound [Na+].[O-]Br(=O)=O XUXNAKZDHHEHPC-UHFFFAOYSA-M 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- PFUVRDFDKPNGAV-UHFFFAOYSA-N sodium peroxide Chemical compound [Na+].[Na+].[O-][O-] PFUVRDFDKPNGAV-UHFFFAOYSA-N 0.000 description 1
- CRWJEUDFKNYSBX-UHFFFAOYSA-N sodium;hypobromite Chemical compound [Na+].Br[O-] CRWJEUDFKNYSBX-UHFFFAOYSA-N 0.000 description 1
- 125000001424 substituent group Chemical group 0.000 description 1
- 238000006467 substitution reaction Methods 0.000 description 1
- 239000000758 substrate Substances 0.000 description 1
- CMPGARWFYBADJI-UHFFFAOYSA-L tungstic acid Chemical compound O[W](O)(=O)=O CMPGARWFYBADJI-UHFFFAOYSA-L 0.000 description 1
- AQLJVWUFPCUVLO-UHFFFAOYSA-N urea hydrogen peroxide Chemical compound OO.NC(N)=O AQLJVWUFPCUVLO-UHFFFAOYSA-N 0.000 description 1
Classifications
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
- C08F8/20—Halogenation
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F8/00—Chemical modification by after-treatment
- C08F8/18—Introducing halogen atoms or halogen-containing groups
- C08F8/20—Halogenation
- C08F8/22—Halogenation by reaction with free halogens
Landscapes
- Chemical & Material Sciences (AREA)
- General Chemical & Material Sciences (AREA)
- Health & Medical Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Organic Chemistry (AREA)
- Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
- Organic Low-Molecular-Weight Compounds And Preparation Thereof (AREA)
Abstract
Description
Claims (1)
- 【特許請求の範囲】 1.C4〜C7イソモノオレフィンとパラ−アルキルスチレンのコポリマーのハロ ゲン化方法であって、前記コポリマーをラジカル開始剤の存在下ラジカルハロ ゲン化条件下にハロゲン化剤及び過酸化水素と接触させること、及び少なくと も約0.05モル%のハロアルキル基を含むハロゲン化されたコポリマーを回 収することを含む方法。 2.前記ハロゲン化剤が元素状臭素である、請求項1の方法。 3.過酸化水素のハロゲン化剤に対するモル比が約0.1乃至約3の範囲内であ る、請求項1の方法。 4.前記モル比が少なくとも約1である、請求項3の方法。 5.有機溶媒中の前記コポリマーの溶液を液体臭素と接触させ、前記ラジカルハ ロゲン化条件が光への暴露を含む、請求項1の方法。 6.前記ラジカル開始剤が、アゾビスイソブチロニトリル、アゾビス(2−メチ ルブチロ)ニトリル、2,2’−アゾビス(2,4,4トリメチルペンタンニ トリル)、及びアゾビス(2,4ジメチルバレロ)ニトリルから成る群から選 択されるビス−アゾ化合物である、請求項1の方法。 7.前記コポリマーが少なくとも約80重量%のイソブチレンと約0.5から2 0重量%までのパラ−メチルスチレンを含む、請求項1の方法。 8.前記酸化剤がエマルジョンの形態である、請求項1の方法。 9.C4〜C7イソモノオレフィンとパラ−アルキルスチレンのコポリマーのハロ ゲン化方法であって、 a) 前記コポリマーをラジカルハロゲン化条件下にハロゲン化剤及び有機ラジ カル開始剤と接触させて、部分的にハロゲン化されたコポリマー及び現場で 生成されたハロゲン化水素を含む反応生成物混合物を形成すること、 b) 工程(a)からの前記反応生成物混合物を、前記ハロゲン化水素を遊離のハ ロゲンに転化することができる酸化剤と接触させること、及び c) 少なくとも約0.05モル%のハロアルキル基を含むハロゲン化されたコ ポリマーが得られるまで前記ハロゲン化を続けること、 を含む方法。 10.前記ハロゲン化剤が元素状臭素であり、前記ハロゲン化水素がHBrである 、請求項9の方法。 11.前記酸化剤が過酸化水素である、請求項9の方法。 12.前記ハロゲン化剤の少なくとも約50重量%が工程(a)において消費された 後工程(a)からの反応生成物混合物を工程(b)において前記酸化剤と接触させる 、請求項9の方法。 13.前記酸化剤の前記ハロゲン化剤に対するモル比が約0.1乃至約3の範囲内 である、請求項9の方法。 14.前記モル比が少なくとも約1である、請求項13の方法。 15.前記ラジカル開始剤が、アゾビスイソブチロニトリル、アゾビス(2−メチ ルブチロ)ニトリル、2,2’−アゾビス(2,4,4トリメチルペンタンニ トリル)、及びアゾビス(2,4ジメチルバレロ)ニトリルから成る群から選 択されるビス−アゾ化合物である、請求項9の方法。 16.C4〜C7イソモノオレフィンとパラ−アルキルスチレンのコポリマーを臭素 化するための多段階方法であって、 a) 第1の反応器領域において有機溶媒中の前記コポリマーの溶液を形成する こと、 b) 前記溶液をラジカル臭素化条件下に元素状臭素及び有機ラジカル開始剤と 接触させて、部分的に臭素化されたコポリマー及び現場で生成された臭素化 水素を含む反応生成物混合物を形成すること、 c) 前記反応生成物混合物を第2の反応器領域に移し、前記混合物を、前記臭 素化水素を遊離の臭素に転化することができる酸化剤と接触させること、及 び d) 少なくとも約0.05モル%のブロモアルキル基を含む臭素化されたコポ リマーが得られるまで、前記第2の反応器領域において臭素化を続けること 、を含む方法。 17.前記ラジカル開始剤が、アゾビスイソブチロニトリル、アゾビス(2−メチ ルブチロ)ニトリル、2,2’−アゾビス(トリメチルペンタンニトリル)、 及びアゾビス(2,4ジメチル)から成る群から選択されるビス−アゾ化合物 である、請求項16の方法。 18.工程(d)からの前記コポリマーが少なくとも約10.0モル%のブロモアルキ ル基を含む、請求項16の方法。 19.前記臭素の少なくとも約50重量%が工程(b)において消費される、請求項 16の方法。 20.工程(b)からの前記混合物と前記酸化剤の接触が前記第1の反応器領域と第 2の反応器領域の間に位置する混合領域において生じる、請求項16の方法。 21.前記酸化剤が過酸化水素である、請求項16の方法。 22.前記酸化剤の前記ハロゲン化剤に対するモル比が約0.1乃至約3の範囲内 である、請求項16の方法。 23.前記コポリマーが少なくとも約80重量%のイソブチレンと約0.5から2 0重量%までのパラ−メチルスチレンを含む、請求項16の方法。
Applications Claiming Priority (3)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US08/686,194 US5670582A (en) | 1996-07-24 | 1996-07-24 | Process for halogenation of isomonoolefin/para-alkylstyrene copolymers |
| US08/686,194 | 1996-07-24 | ||
| PCT/US1997/012665 WO1998003563A1 (en) | 1996-07-24 | 1997-07-18 | Process for halogenation of isomonoolefin/para-alkylstyrene copolymers |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JP2000515193A true JP2000515193A (ja) | 2000-11-14 |
| JP4233607B2 JP4233607B2 (ja) | 2009-03-04 |
Family
ID=24755320
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP50712798A Expired - Lifetime JP4233607B2 (ja) | 1996-07-24 | 1997-07-18 | イソモノオレフィン/パラ―アルキルスチレンコポリマーのハロゲン化方法 |
Country Status (15)
| Country | Link |
|---|---|
| US (1) | US5670582A (ja) |
| EP (1) | EP0914357B1 (ja) |
| JP (1) | JP4233607B2 (ja) |
| KR (1) | KR20000067959A (ja) |
| CN (1) | CN1225648A (ja) |
| AT (1) | AT406582B (ja) |
| BR (1) | BR9710883A (ja) |
| CA (1) | CA2257820C (ja) |
| CZ (1) | CZ21299A3 (ja) |
| DE (1) | DE69715424T2 (ja) |
| EA (1) | EA199900132A1 (ja) |
| ES (1) | ES2179356T3 (ja) |
| HU (1) | HUP9904350A3 (ja) |
| PL (1) | PL330991A1 (ja) |
| WO (1) | WO1998003563A1 (ja) |
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| JP2014520941A (ja) * | 2011-07-20 | 2014-08-25 | ランクセス・インターナショナル・ソシエテ・アノニム | 臭素化ブチルゴムの製造方法 |
| WO2017170850A1 (ja) * | 2016-03-31 | 2017-10-05 | 富山化学工業株式会社 | 5-ブロモメチル-1-ベンゾチオフェンの製造方法 |
| WO2019013298A1 (ja) * | 2017-07-13 | 2019-01-17 | 株式会社カネカ | 臭素化ポリイソブチレン系重合体およびその製造方法 |
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| US6100343A (en) * | 1998-11-03 | 2000-08-08 | Beholz Technology, L.L.C. | Process for producing paintable polymeric articles |
| WO1999048933A1 (en) * | 1998-03-26 | 1999-09-30 | Beholz Technology, L.L.C. | Process for producing paintable polymeric articles |
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| RU2186789C1 (ru) * | 2001-01-12 | 2002-08-10 | Открытое акционерное общество Научно-исследовательский институт "Ярсинтез" | Способ получения галоидированного бутилкаучука |
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| RU2415873C1 (ru) * | 2009-11-05 | 2011-04-10 | Закрытое Акционерное Общество "Сибур Холдинг" | Способ получения бромбутилкаучука |
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| EP2550148B1 (en) * | 2010-03-24 | 2015-05-20 | LANXESS International S.A. | Process for the production of water and solvent-free polymers |
| SG184252A1 (en) | 2010-04-30 | 2012-10-30 | Exxonmobil Chem Patents Inc | Method for elastomer finishing |
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| NL2013819B1 (nl) | 2014-11-17 | 2016-10-10 | Lankhorst Eng Products B V | Bekledingskoker voor het omhullen van een onderwater-leiding. |
| WO2016099694A1 (en) | 2014-12-19 | 2016-06-23 | Exxonmobil Chemical Patents Inc. | Polymerization quenching |
| WO2017002625A1 (ja) * | 2015-07-01 | 2017-01-05 | 株式会社カネカ | ハロゲン化イソオレフィン系重合体の製造方法 |
| US10947375B2 (en) | 2016-01-29 | 2021-03-16 | Exxonmobil Chemical Patents Inc. | System and process for the production of functionalized olefinic-based polymer |
| WO2018217294A1 (en) | 2017-05-22 | 2018-11-29 | Exxonmobil Chemical Patents Inc. | Halogenated elastomers with mooney viscosity stability and method for preparing same |
| CN113366027A (zh) | 2018-12-17 | 2021-09-07 | 阿朗新科新加坡私人有限公司 | 使用叔醚生产异烯烃聚合物的方法 |
| SG11202105460TA (en) * | 2018-12-21 | 2021-07-29 | Arlanxeo Singapore Pte Ltd | Halogen recovery in a process for halogenating unsaturated isoolefin copolymer |
| SG11202105842XA (en) | 2018-12-27 | 2021-07-29 | Arlanxeo Singapore Pte Ltd | Process for producing chlorinated butyl rubber |
| CN110272514A (zh) * | 2019-07-05 | 2019-09-24 | 黄河三角洲京博化工研究院有限公司 | 一种溴化异丁烯-对甲基苯乙烯共聚物及其制备方法 |
| KR20230117594A (ko) * | 2020-12-11 | 2023-08-08 | 아란세오 싱가포르 프라이빗 리미티드 | 불포화 이소올레핀 공중합체의 할로겐화 방법에서의k+-함유 산화제에 의한 할로겐 회수 |
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- 1997-07-18 CZ CZ99212A patent/CZ21299A3/cs unknown
- 1997-07-18 WO PCT/US1997/012665 patent/WO1998003563A1/en not_active Ceased
- 1997-07-18 AT AT0907697A patent/AT406582B/de not_active IP Right Cessation
- 1997-07-18 CN CN97196596A patent/CN1225648A/zh active Pending
- 1997-07-18 HU HU9904350A patent/HUP9904350A3/hu unknown
- 1997-07-18 EP EP97933562A patent/EP0914357B1/en not_active Expired - Lifetime
- 1997-07-18 JP JP50712798A patent/JP4233607B2/ja not_active Expired - Lifetime
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Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2014520941A (ja) * | 2011-07-20 | 2014-08-25 | ランクセス・インターナショナル・ソシエテ・アノニム | 臭素化ブチルゴムの製造方法 |
| WO2017170850A1 (ja) * | 2016-03-31 | 2017-10-05 | 富山化学工業株式会社 | 5-ブロモメチル-1-ベンゾチオフェンの製造方法 |
| JPWO2017170850A1 (ja) * | 2016-03-31 | 2019-02-07 | 富士フイルム富山化学株式会社 | 5−ブロモメチル−1−ベンゾチオフェンの製造方法 |
| CN109526218A (zh) * | 2016-03-31 | 2019-03-26 | 富士胶片富山化学株式会社 | 5-溴甲基-1-苯并噻吩的制备方法 |
| CN109526218B (zh) * | 2016-03-31 | 2021-07-06 | 富士胶片富山化学株式会社 | 5-溴甲基-1-苯并噻吩的制备方法 |
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| WO2019013298A1 (ja) * | 2017-07-13 | 2019-01-17 | 株式会社カネカ | 臭素化ポリイソブチレン系重合体およびその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| CZ21299A3 (cs) | 1999-12-15 |
| WO1998003563A1 (en) | 1998-01-29 |
| ES2179356T3 (es) | 2003-01-16 |
| PL330991A1 (en) | 1999-06-21 |
| EA199900132A1 (ru) | 1999-08-26 |
| BR9710883A (pt) | 1999-08-17 |
| ATA907697A (de) | 1999-11-15 |
| CA2257820C (en) | 2003-09-23 |
| JP4233607B2 (ja) | 2009-03-04 |
| DE69715424T2 (de) | 2003-05-15 |
| CA2257820A1 (en) | 1998-01-29 |
| US5670582A (en) | 1997-09-23 |
| AT406582B (de) | 2000-06-26 |
| HUP9904350A3 (en) | 2000-09-28 |
| DE69715424D1 (de) | 2002-10-17 |
| EP0914357A2 (en) | 1999-05-12 |
| HUP9904350A2 (hu) | 2000-04-28 |
| KR20000067959A (ko) | 2000-11-25 |
| EP0914357B1 (en) | 2002-09-11 |
| CN1225648A (zh) | 1999-08-11 |
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