JP2007194514A - 半導体装置の製造方法 - Google Patents

半導体装置の製造方法 Download PDF

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Publication number
JP2007194514A
JP2007194514A JP2006013349A JP2006013349A JP2007194514A JP 2007194514 A JP2007194514 A JP 2007194514A JP 2006013349 A JP2006013349 A JP 2006013349A JP 2006013349 A JP2006013349 A JP 2006013349A JP 2007194514 A JP2007194514 A JP 2007194514A
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JP
Japan
Prior art keywords
metal layer
semiconductor wafer
heat treatment
manufacturing
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2006013349A
Other languages
English (en)
Japanese (ja)
Other versions
JP2007194514A5 (2
Inventor
Tamio Matsumura
民雄 松村
Tadashi Tsujino
忠 辻野
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Mitsubishi Electric Corp
Original Assignee
Mitsubishi Electric Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Electric Corp filed Critical Mitsubishi Electric Corp
Priority to JP2006013349A priority Critical patent/JP2007194514A/ja
Priority to US11/561,038 priority patent/US8183144B2/en
Priority to TW095143544A priority patent/TW200737382A/zh
Priority to CNB200610063646XA priority patent/CN100524632C/zh
Priority to DE102006062029A priority patent/DE102006062029B4/de
Priority to KR1020070005893A priority patent/KR100823648B1/ko
Priority to AT0010207A priority patent/AT503190B1/de
Publication of JP2007194514A publication Critical patent/JP2007194514A/ja
Publication of JP2007194514A5 publication Critical patent/JP2007194514A5/ja
Pending legal-status Critical Current

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    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D10/00—Bipolar junction transistors [BJT]
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00—Electrodes of devices having potential barriers
    • H10D64/01—Manufacture or treatment
    • H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
    • H10D64/0111—Manufacture or treatment of electrodes ohmically coupled to a semiconductor to Group IV semiconductors
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D48/00—Individual devices not covered by groups H10D1/00 - H10D44/00
    • H10D48/30—Devices controlled by electric currents or voltages
    • H10D48/32—Devices controlled by only the electric current supplied, or only the electric potential applied, to an electrode which does not carry the current to be rectified, amplified or switched
    • H10D48/34—Bipolar devices
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W20/00—Interconnections in chips, wafers or substrates
    • H10W20/40—Interconnections external to wafers or substrates, e.g. back-end-of-line [BEOL] metallisations or vias connecting to gate electrodes
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01331—Manufacture or treatment of die-attach connectors using blanket deposition
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/01—Manufacture or treatment
    • H10W72/013—Manufacture or treatment of die-attach connectors
    • H10W72/01361—Chemical or physical modification, e.g. by sintering or anodisation
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/071—Connecting or disconnecting
    • H10W72/073—Connecting or disconnecting of die-attach connectors
    • H10W72/07331—Connecting techniques
    • H10W72/07336—Soldering or alloying
    • H—ELECTRICITY
    • H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
    • H10W72/00—Interconnections or connectors in packages
    • H10W72/50—Bond wires
    • H10W72/59—Bond pads specially adapted therefor

Landscapes

  • Electrodes Of Semiconductors (AREA)
JP2006013349A 2006-01-23 2006-01-23 半導体装置の製造方法 Pending JP2007194514A (ja)

Priority Applications (7)

Application Number Priority Date Filing Date Title
JP2006013349A JP2007194514A (ja) 2006-01-23 2006-01-23 半導体装置の製造方法
US11/561,038 US8183144B2 (en) 2006-01-23 2006-11-17 Method of manufacturing semiconductor device
TW095143544A TW200737382A (en) 2006-01-23 2006-11-24 Method of manufacturing semiconductor device
CNB200610063646XA CN100524632C (zh) 2006-01-23 2006-12-29 半导体装置的制造方法
DE102006062029A DE102006062029B4 (de) 2006-01-23 2006-12-29 Verfahren zum Herstellen einer Halbleitervorrichtung
KR1020070005893A KR100823648B1 (ko) 2006-01-23 2007-01-19 반도체장치의 제조 방법
AT0010207A AT503190B1 (de) 2006-01-23 2007-01-22 Verfahren zur herstellung einer halbleitervorrichtung

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2006013349A JP2007194514A (ja) 2006-01-23 2006-01-23 半導体装置の製造方法

Publications (2)

Publication Number Publication Date
JP2007194514A true JP2007194514A (ja) 2007-08-02
JP2007194514A5 JP2007194514A5 (2) 2009-02-26

Family

ID=38282344

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2006013349A Pending JP2007194514A (ja) 2006-01-23 2006-01-23 半導体装置の製造方法

Country Status (7)

Country Link
US (1) US8183144B2 (2)
JP (1) JP2007194514A (2)
KR (1) KR100823648B1 (2)
CN (1) CN100524632C (2)
AT (1) AT503190B1 (2)
DE (1) DE102006062029B4 (2)
TW (1) TW200737382A (2)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010021171A (ja) * 2008-07-08 2010-01-28 Renesas Technology Corp 半導体装置の製造方法およびそれに用いる半導体製造装置
JP2011222898A (ja) * 2010-04-14 2011-11-04 Fuji Electric Co Ltd 半導体装置の製造方法
JP2012248572A (ja) * 2011-05-25 2012-12-13 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
JP2015130417A (ja) * 2014-01-08 2015-07-16 日東電工株式会社 フィルム状接着剤、フィルム状接着剤付きダイシングテープ、半導体装置の製造方法、及び半導体装置
WO2023090196A1 (ja) * 2021-11-16 2023-05-25 株式会社フルヤ金属 半導体デバイス及びそれに用いる酸化防止用金属材料並びに該金属材料のスパッタリングターゲット及び蒸着源

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4221012B2 (ja) * 2006-06-12 2009-02-12 トヨタ自動車株式会社 半導体装置とその製造方法
WO2009141740A2 (en) * 2008-05-23 2009-11-26 Florian Bieck Semiconductor wafer and method for producing the same
JPWO2010109572A1 (ja) * 2009-03-23 2012-09-20 トヨタ自動車株式会社 半導体装置
KR101923127B1 (ko) * 2011-09-08 2018-11-28 후지 덴키 가부시키가이샤 반도체 장치 및 반도체 장치의 제조방법
CN108352298B (zh) * 2015-11-09 2023-04-18 应用材料公司 底部处理

Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416979A (en) * 1977-07-07 1979-02-07 Mitsubishi Electric Corp Production of semiconuctor device
JPH0521372A (ja) * 1991-07-17 1993-01-29 Nippondenso Co Ltd 半導体装置の電極形成方法
JPH0637301A (ja) * 1992-07-20 1994-02-10 Toyota Motor Corp 半導体装置及びその製造方法
JP2003059860A (ja) * 2001-08-13 2003-02-28 Mitsubishi Electric Corp 半導体装置
JP2005019830A (ja) * 2003-06-27 2005-01-20 Denso Corp 半導体装置の製造方法
JP2007019458A (ja) * 2005-06-07 2007-01-25 Denso Corp 半導体装置およびその製造方法

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GB1149606A (en) 1967-02-27 1969-04-23 Motorola Inc Mounting for a semiconductor wafer which is resistant to fatigue caused by thermal stresses
JPS55111140A (en) * 1979-02-20 1980-08-27 Nec Corp Metalizing method for back surface of silicon wafer
JPS58106825A (ja) * 1981-12-18 1983-06-25 Matsushita Electric Ind Co Ltd 半導体装置の製造方法
DE3301666A1 (de) 1983-01-20 1984-07-26 Brown, Boveri & Cie Ag, 6800 Mannheim Verfahren zur herstellung einer mehrschichtigen kontaktmetallisierung
DD277602A3 (de) 1987-12-21 1990-04-11 Akad Wissenschaften Ddr Verfahren zur Herstellung eines weichlötfähigen Mehrschichtkontaktsystems für Halbleiterbauelemente
DE3823347A1 (de) 1988-07-09 1990-01-11 Semikron Elektronik Gmbh Leistungs-halbleiterelement
US5342793A (en) * 1990-02-20 1994-08-30 Sgs-Thomson Microelectronics, S.R.L. Process for obtaining multi-layer metallization of the back of a semiconductor substrate
JPH0472764A (ja) 1990-07-13 1992-03-06 Sharp Corp 半導体装置の裏面電極
DE69223868T2 (de) 1991-07-17 1998-09-03 Denso Corp Verfahren zur Herstellung von Elektroden eines Halbleiterbauelements
KR930017092A (ko) * 1992-01-15 1993-08-30 김광호 반도체장치 및 그 제조방법
US5924002A (en) * 1994-12-22 1999-07-13 Sony Corporation Method of manufacturing a semiconductor device having ohmic electrode
DE19527209A1 (de) * 1995-07-27 1997-01-30 Philips Patentverwaltung Halbleitervorrichtung
US6140703A (en) * 1996-08-05 2000-10-31 Motorola, Inc. Semiconductor metallization structure
DE19734434C1 (de) 1997-08-08 1998-12-10 Siemens Ag Halbleiterkörper mit Rückseitenmetallisierung und Verfahren zu deren Herstellung
KR100365436B1 (ko) * 1998-12-15 2003-04-10 주식회사 하이닉스반도체 반도체장치의배리어층형성방법
JP3960739B2 (ja) 2000-07-11 2007-08-15 シャープ株式会社 半導体装置とその製造方法
KR100724143B1 (ko) * 2001-01-17 2007-06-04 매그나칩 반도체 유한회사 반도체장치의 배리어층 형성방법
JP2003282845A (ja) * 2002-03-20 2003-10-03 Mitsubishi Electric Corp 炭化ケイ素基板の製造方法およびその製造方法により製造された炭化ケイ素基板、ならびに、ショットキーバリアダイオードおよび炭化ケイ素薄膜の製造方法
JP2003338620A (ja) * 2002-05-22 2003-11-28 Mitsubishi Electric Corp 半導体装置およびその製造方法
CN100454492C (zh) 2002-06-13 2009-01-21 衡阳科晶微电子有限公司 共晶焊背面金属化工艺
JP2004153081A (ja) * 2002-10-31 2004-05-27 Shin Etsu Handotai Co Ltd Ｓｏｉウエーハ及びｓｏｉウエーハの製造方法
KR100477396B1 (ko) * 2002-09-04 2005-03-28 한국전기연구원 금속 게이트 전극을 갖는 탄화규소 모스펫 소자 및 그제조방법
AU2003275614A1 (en) * 2002-10-30 2004-05-25 Semiconductor Energy Laboratory Co., Ltd. Semiconductor device and method for manufacturing semiconductor device
TWI247576B (en) * 2003-03-28 2006-01-11 Hon Hai Prec Ind Co Ltd Method of manufacturing electromagnetic interference shield
JP3767585B2 (ja) 2003-07-11 2006-04-19 株式会社デンソー 半導体装置
US7214620B2 (en) * 2003-10-28 2007-05-08 Samsung Electronics Co., Ltd. Methods of forming silicide films with metal films in semiconductor devices and contacts including the same
JP4792694B2 (ja) * 2003-11-13 2011-10-12 セイコーエプソン株式会社 電気光学装置用基板の製造方法、電気光学装置用基板、電気光学装置、電子機器
US20050268963A1 (en) * 2004-02-24 2005-12-08 David Jordan Process for manufacturing photovoltaic cells

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5416979A (en) * 1977-07-07 1979-02-07 Mitsubishi Electric Corp Production of semiconuctor device
JPH0521372A (ja) * 1991-07-17 1993-01-29 Nippondenso Co Ltd 半導体装置の電極形成方法
JPH0637301A (ja) * 1992-07-20 1994-02-10 Toyota Motor Corp 半導体装置及びその製造方法
JP2003059860A (ja) * 2001-08-13 2003-02-28 Mitsubishi Electric Corp 半導体装置
JP2005019830A (ja) * 2003-06-27 2005-01-20 Denso Corp 半導体装置の製造方法
JP2007019458A (ja) * 2005-06-07 2007-01-25 Denso Corp 半導体装置およびその製造方法

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP2010021171A (ja) * 2008-07-08 2010-01-28 Renesas Technology Corp 半導体装置の製造方法およびそれに用いる半導体製造装置
JP2011222898A (ja) * 2010-04-14 2011-11-04 Fuji Electric Co Ltd 半導体装置の製造方法
JP2012248572A (ja) * 2011-05-25 2012-12-13 Mitsubishi Electric Corp 半導体装置および半導体装置の製造方法
JP2015130417A (ja) * 2014-01-08 2015-07-16 日東電工株式会社 フィルム状接着剤、フィルム状接着剤付きダイシングテープ、半導体装置の製造方法、及び半導体装置
WO2023090196A1 (ja) * 2021-11-16 2023-05-25 株式会社フルヤ金属 半導体デバイス及びそれに用いる酸化防止用金属材料並びに該金属材料のスパッタリングターゲット及び蒸着源

Also Published As

Publication number Publication date
CN101009221A (zh) 2007-08-01
AT503190A2 (de) 2007-08-15
AT503190B1 (de) 2010-03-15
US20070173045A1 (en) 2007-07-26
KR20070077450A (ko) 2007-07-26
AT503190A3 (de) 2008-05-15
KR100823648B1 (ko) 2008-04-21
CN100524632C (zh) 2009-08-05
DE102006062029A1 (de) 2007-08-09
US8183144B2 (en) 2012-05-22
TW200737382A (en) 2007-10-01
DE102006062029B4 (de) 2010-04-08

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