JPH01155247U - - Google Patents

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Publication number
JPH01155247U
JPH01155247U JP5120788U JP5120788U JPH01155247U JP H01155247 U JPH01155247 U JP H01155247U JP 5120788 U JP5120788 U JP 5120788U JP 5120788 U JP5120788 U JP 5120788U JP H01155247 U JPH01155247 U JP H01155247U
Authority
JP
Japan
Prior art keywords
ion source
gas
source chamber
gas inlet
ion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP5120788U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP5120788U priority Critical patent/JPH01155247U/ja
Publication of JPH01155247U publication Critical patent/JPH01155247U/ja
Pending legal-status Critical Current

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  • Electron Sources, Ion Sources (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図はこの考案の第1の実施例の説明図、第
2図はガス放出体の正面図、第3図はその―
線断面図、第4図は第2図―線断面図、第5
図は第2の実施例の説明図、第6図は従来例の説
明図である。 1……イオン源室、2……プラズマ発生手段、
3……ガス放出体、4……ガス導入口、5……イ
オン流出口。
Figure 1 is an explanatory diagram of the first embodiment of this invention, Figure 2 is a front view of the gas emitting body, and Figure 3 is its -
Line sectional view, Figure 4 is Figure 2 - Line sectional view, Figure 5
The figure is an explanatory diagram of the second embodiment, and FIG. 6 is an explanatory diagram of the conventional example. 1... Ion source chamber, 2... Plasma generation means,
3... Gas emitting body, 4... Gas inlet, 5... Ion outlet.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] ガス導入口およびイオン流出口を有するイオン
源室と、前記ガス導入口から前記イオン源室内に
導入された原料ガスにマイクロ波および磁界を供
給してプラズマ化するプラズマ発生手段とを備え
たイオン源において、前記原料ガスを前記イオン
源室内に均一に放出させる多数の孔を形成したガ
ス放出体を前記イオン源室内の前記ガス導入口に
接続したことを特徴とするイオン源。
An ion source comprising an ion source chamber having a gas inlet and an ion outlet, and plasma generation means for supplying microwaves and a magnetic field to a source gas introduced into the ion source chamber from the gas inlet to generate plasma. An ion source characterized in that a gas emitting body having a large number of holes for uniformly releasing the raw material gas into the ion source chamber is connected to the gas inlet in the ion source chamber.
JP5120788U 1988-04-15 1988-04-15 Pending JPH01155247U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5120788U JPH01155247U (en) 1988-04-15 1988-04-15

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5120788U JPH01155247U (en) 1988-04-15 1988-04-15

Publications (1)

Publication Number Publication Date
JPH01155247U true JPH01155247U (en) 1989-10-25

Family

ID=31277238

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5120788U Pending JPH01155247U (en) 1988-04-15 1988-04-15

Country Status (1)

Country Link
JP (1) JPH01155247U (en)

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