JPH01155251U - - Google Patents
Info
- Publication number
- JPH01155251U JPH01155251U JP5120888U JP5120888U JPH01155251U JP H01155251 U JPH01155251 U JP H01155251U JP 5120888 U JP5120888 U JP 5120888U JP 5120888 U JP5120888 U JP 5120888U JP H01155251 U JPH01155251 U JP H01155251U
- Authority
- JP
- Japan
- Prior art keywords
- ion beam
- filament
- ion
- sample
- generation means
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000010884 ion-beam technique Methods 0.000 claims description 7
- 238000006386 neutralization reaction Methods 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- 230000003472 neutralizing effect Effects 0.000 description 1
Landscapes
- Electron Sources, Ion Sources (AREA)
Description
第１図はこの考案の一実施例の説明図、第２図
はその中性化電子補給装置およびガードの平面図
、第３図は従来例の説明図である。
１……イオンビーム発生手段、２……中性化電
子補給装置、３……ガード、１１……イオンビー
ム、１２……試料。
FIG. 1 is an explanatory diagram of an embodiment of this invention, FIG. 2 is a plan view of the neutralizing electron supply device and guard, and FIG. 3 is an explanatory diagram of a conventional example. DESCRIPTION OF SYMBOLS 1... Ion beam generation means, 2... Neutralization electron supply device, 3... Guard, 11... Ion beam, 12... Sample.
Claims (1)
ーム発生手段と、前記試料と前記イオンビーム発
生手段との間の前記イオンビーム内に配置されて
熱電子を放出するフイラメントを有する中性化電
子補給装置とを備えたイオン処理装置において、
前記フイラメントの前記イオンビームが照射され
る面を被覆しかつ前記フイラメントと同電位のガ
ードを設けたことを特徴とするイオン処理装置。 ion beam generation means for generating an ion beam toward a sample; and a neutralization electron replenishment device having a filament arranged in the ion beam between the sample and the ion beam generation means and emitting thermoelectrons. In an ion processing device equipped with
An ion processing apparatus characterized in that a guard is provided that covers a surface of the filament that is irradiated with the ion beam and has the same potential as the filament.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5120888U JPH01155251U (en) | 1988-04-15 | 1988-04-15 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5120888U JPH01155251U (en) | 1988-04-15 | 1988-04-15 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPH01155251U true JPH01155251U (en) | 1989-10-25 |
Family
ID=31277239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5120888U Pending JPH01155251U (en) | 1988-04-15 | 1988-04-15 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH01155251U (en) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0458445A (en) * | 1990-06-25 | 1992-02-25 | Rikagaku Kenkyusho | Electron beam source |
-
1988
- 1988-04-15 JP JP5120888U patent/JPH01155251U/ja active Pending
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0458445A (en) * | 1990-06-25 | 1992-02-25 | Rikagaku Kenkyusho | Electron beam source |