JPH0144676B2 - - Google Patents

Info

Publication number
JPH0144676B2
JPH0144676B2 JP2513382A JP2513382A JPH0144676B2 JP H0144676 B2 JPH0144676 B2 JP H0144676B2 JP 2513382 A JP2513382 A JP 2513382A JP 2513382 A JP2513382 A JP 2513382A JP H0144676 B2 JPH0144676 B2 JP H0144676B2
Authority
JP
Japan
Prior art keywords
glass
layer
resist layer
corrosive
manufacturing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP2513382A
Other languages
Japanese (ja)
Other versions
JPS58145675A (en
Inventor
Koichiro Shimamoto
Yukio Ogawa
Hisao Kitano
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nissha Printing Co Ltd
Original Assignee
Nissha Printing Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nissha Printing Co Ltd filed Critical Nissha Printing Co Ltd
Priority to JP2513382A priority Critical patent/JPS58145675A/en
Publication of JPS58145675A publication Critical patent/JPS58145675A/en
Publication of JPH0144676B2 publication Critical patent/JPH0144676B2/ja
Granted legal-status Critical Current

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  • Compositions Of Oxide Ceramics (AREA)
  • Devices For Post-Treatments, Processing, Supply, Discharge, And Other Processes (AREA)
  • Surface Treatment Of Glass (AREA)
  • ing And Chemical Polishing (AREA)

Description

【発明の詳細な説明】 本発明は表面に凹凸部分を有するセラミツク製
品の製造方法に関するものであり、更に詳しくは
所謂乾式のガラス腐食によるガラスの表面加工技
術を用いて表面に凹凸部分を有するセラミツク製
品を製造する方法において、凹凸部分とそうでな
い部分との境界を鮮明にしたセラミツク製品を得
ることを目的とするものである。
DETAILED DESCRIPTION OF THE INVENTION The present invention relates to a method for manufacturing a ceramic product having an uneven surface, and more specifically to a method for manufacturing a ceramic product having an uneven surface by using a glass surface processing technique using so-called dry glass corrosion. In a method for manufacturing a product, the object is to obtain a ceramic product in which the boundaries between uneven parts and non-irregular parts are sharp.

本出願人が既に出願したガラスの腐食方法と
は、ガラス腐食剤を混合した固体皮膜化可能なイ
ンキをガラス表面に塗布、印刷し、これを適当な
温度で乾式加熱する方法である(特開昭58−
88142号公報参照)。この方法は従来の腐食液を用
いる所謂湿式の腐食方法における作業者の安全、
廃液処理等の諸問題を解消するものであるが、凹
凸部分によつて文字・絵柄を形成しようとする場
合は凹凸部分とそうでない部分との境界が不鮮明
になるという問題があつた。本発明者はかかる問
題点に鑑み、種々研究考察を重ねた結果、本発明
を完成するに至つたものである。即ち本発明はセ
ラミツク基材表面の必要部分にガラス腐食性ガス
を透過させないようなレジスト層を設けた後、少
なくとも該レジスト層を設けない部分を覆うよう
に、加熱によつてガラス腐食性ガスを発生するよ
うなガラス腐食剤と固体皮膜形成能をもつ有機物
質とを主成分とするインキ組成物を用いて腐食剤
層を設け、しかる後該ガラス腐食剤が熱分解して
ガラス腐食性ガスを発生するような温度で加熱す
ることを特徴とする表面に凹凸部分を有するセラ
ミツク製品の製造方法である。
The glass corrosion method that the present applicant has already applied for is a method in which an ink mixed with a glass corrosive agent that can form a solid film is coated on the glass surface, printed, and then dry heated at an appropriate temperature. Showa 58-
(See Publication No. 88142). This method improves the safety of workers in the so-called wet corrosion method using conventional corrosive liquid.
This solves various problems such as waste liquid treatment, but when attempting to form characters or pictures using uneven areas, there is a problem in that the boundaries between uneven areas and other areas become unclear. In view of these problems, the present inventor has completed various research studies and has completed the present invention. That is, in the present invention, after providing a resist layer that does not allow glass corrosive gas to pass through a required portion of the surface of a ceramic base material, the glass corrosive gas is applied by heating to cover at least the portion where the resist layer is not provided. A corrosive agent layer is formed using an ink composition whose main components are a glass corrosive and an organic substance capable of forming a solid film, and then the glass corrosive is thermally decomposed to produce a glass corrosive gas. This is a method for manufacturing ceramic products having uneven portions on the surface, which is characterized by heating at a temperature such that the surface of the ceramic product is heated to such a temperature that the surface of the ceramic product is heated.

本発明においてセラミツク製品とは、ガラス製
品、タイル、ホーロー製品等を意味するものであ
る。以下においてはガラス製品の場合について本
発明について更に詳しく説明する。
In the present invention, ceramic products include glass products, tiles, enamel products, and the like. In the following, the invention will be explained in more detail in the case of glass products.

まず、ガラス基材表面の必要部分、即ち艶消し
加工等の凹凸部分を設けない部分にレジスト層を
設ける。レジスト層はガラス腐食性ガスを透過さ
せないためのものであり、無機物質に樹脂バイン
ダーを用いてインキ化したものを塗布又は印刷に
よつて形成する。無機物質としては各種の金属酸
化物、金属塩化物、金属炭化物、金属元素とのケ
イ酸化合物、炭酸化合物、水酸化化合物等を単独
で或いは混合物として用いる。樹脂バインダーと
しては、熱可塑性樹脂、熱硬化性樹脂、天然樹脂
等があり、特にポリアミドイミド、ポリイミド、
ポリベンズイミダゾール、芳香族ポリイミド、芳
香族ポリエステル等の耐熱性樹脂が好ましい。
First, a resist layer is provided on a necessary portion of the surface of a glass substrate, that is, a portion where uneven portions such as matte processing are not provided. The resist layer is for preventing glass corrosive gas from permeating, and is formed by coating or printing an ink made of an inorganic substance with a resin binder. As the inorganic substance, various metal oxides, metal chlorides, metal carbides, silicic acid compounds with metal elements, carbonate compounds, hydroxide compounds, etc. are used alone or as a mixture. Resin binders include thermoplastic resins, thermosetting resins, natural resins, etc., especially polyamideimide, polyimide,
Heat-resistant resins such as polybenzimidazole, aromatic polyimide, and aromatic polyester are preferred.

レジスト層は焼成後の除去を容易にするため、
加熱工程で溶融しないような高融点の無機物質の
使用が好ましく、この場合は高融点無機物質層の
上に低融点無機物質層を積層してもよい。このよ
うな構成にすると、上側に位置する低融点物質層
のみが加熱時に溶融し、連続した皮膜層を形成す
るのでより効率的にガスの透過を防ぎ且つ焼成後
の除去が容易となる。
The resist layer is easy to remove after baking.
It is preferable to use an inorganic material with a high melting point that does not melt during the heating process, and in this case, a layer of an inorganic material with a low melting point may be laminated on the layer of the inorganic material with a low melting point. With this configuration, only the upper low-melting point material layer melts during heating to form a continuous film layer, which more efficiently prevents gas permeation and facilitates removal after firing.

又、レジスト層はフツ化水素等のガラス腐食性
ガスと結合するものを適用してもよく、このよう
なものとしては、無機物質としてはCaO、
Al2O3、BaCO3、Na2CO3、KHCO3、SrCO3
SiO2・Al2O3、シリカゲル、アルカリ金属又はア
ルカリ土類、金属水素化物等の固体塩基があり、
樹脂バインダーでは含窒素樹脂がある。
In addition, the resist layer may be made of a material that binds to glass corrosive gas such as hydrogen fluoride, and examples of such material include CaO,
Al 2 O 3 , BaCO 3 , Na 2 CO 3 , KHCO 3 , SrCO 3 ,
There are solid bases such as SiO 2・Al 2 O 3 , silica gel, alkali metals or alkaline earths, metal hydrides, etc.
As a resin binder, there is a nitrogen-containing resin.

レジスト層の上に腐食剤層を設ける。腐食剤層
は、加熱によつてフツ化水素等のガラス腐食性ガ
スを発生するようなガラス腐食剤と固体皮膜形成
能をもつ有機物質とを主成分とするインキ組成物
を用いて、少なくとも前記レジスト層を設けてい
ない部分を覆うように塗布又は印刷手段にて形成
する。ガラス腐食剤としては例えばNH4F
(NH43AlF6、(NH42CuF4、(NH43FeF6
(NH42CoF4、NaHF2、KHF2(NH42NiF4等が
あり、前記固体皮膜形成能をもつ有機物質として
は熱硬化性樹脂等の高分子物質を用いる。更に必
要に応じて反応促進剤、溶剤等を混合してインキ
組成物を得る。反応促進剤としては例えば、
KH2PO4、KHSO4等がある。ガラス腐食剤の含
有量は形成しようとするセラミツク製品の凹凸表
面の凹凸程度によつて適宜調節する。
A corrosive layer is provided on top of the resist layer. The corrosive agent layer is formed by using an ink composition mainly composed of a glass corrosive that generates a glass corrosive gas such as hydrogen fluoride when heated, and an organic substance capable of forming a solid film. The resist layer is formed by coating or printing so as to cover the portions where no resist layer is provided. Examples of glass corrosives include NH 4 F
(NH 4 ) 3 AlF 6 , (NH 4 ) 2 CuF 4 , (NH 4 ) 3 FeF 6 ,
(NH 4 ) 2 CoF 4 , NaHF 2 , KHF 2 (NH 4 ) 2 NiF 4 and the like, and as the organic substance capable of forming a solid film, a polymeric substance such as a thermosetting resin is used. Further, if necessary, a reaction accelerator, a solvent, etc. are mixed to obtain an ink composition. Examples of reaction accelerators include:
Examples include KH 2 PO 4 and KHSO 4 . The content of the glass corrosive agent is appropriately adjusted depending on the degree of unevenness of the uneven surface of the ceramic product to be formed.

尚、腐食剤層を覆うようにガス拡散防止層を設
けてもよい。ガス拡散防止層は、ガラス腐食剤よ
り発生するガラス腐食性ガスの大気中への拡散を
防止することができるから、取り扱い作業がより
安全に行われ、ガラス腐食剤を効率的に利用する
ことができる。このガス拡散防止層は前記したレ
ジスト層に適用できる無機物質と樹脂バインダー
を用いてインキ化したものを塗布又は印刷して設
ける。
Note that a gas diffusion prevention layer may be provided to cover the corrosive layer. The gas diffusion prevention layer can prevent the glass corrosive gas generated from the glass corrosive agent from diffusing into the atmosphere, making handling operations safer and allowing the glass corrosive agent to be used more efficiently. can. This gas diffusion prevention layer is provided by coating or printing an ink made using an inorganic substance and a resin binder that can be applied to the resist layer described above.

次に前記ガラス基材を、腐食剤層が熱分解して
フツ化水素ガス等のガラス腐食性ガスを発生する
ような温度で加熱する。前記のような腐食剤であ
れば250℃〜550℃の温度範囲にて加熱処理すれば
よい。この加熱処理によつて腐食剤層がガラス基
材表面に接して設けられている部分、即ちレジス
ト層の設けた部分を除いて腐食剤層を設けた部分
のガラス基材は腐食され、凹凸部分が形成され
る。
Next, the glass substrate is heated at a temperature such that the corrosive layer thermally decomposes and generates a glass corrosive gas such as hydrogen fluoride gas. If the above-mentioned corrosive agent is used, it may be heat-treated in a temperature range of 250°C to 550°C. By this heat treatment, the glass substrate in the part where the corrosive agent layer is provided in contact with the surface of the glass substrate, that is, the part where the corrosive agent layer is provided except for the part where the resist layer is provided, is corroded, and the uneven parts are corroded. is formed.

加熱処理により生じた残存物は適宜の手段にて
洗浄除去する。
Residues generated by the heat treatment are washed and removed by appropriate means.

本発明は以上述べたような凹凸部分を有するセ
ラミツク製品の製造方法であるから、本発明を適
用することにより、繊細な図柄を形成する凹凸部
分を容易に、安全な作業をもつて得られるもので
ある。
Since the present invention is a method for manufacturing a ceramic product having an uneven part as described above, by applying the present invention, an uneven part forming a delicate pattern can be easily and safely obtained. It is.

以下本発明の実施例を説明する。 Examples of the present invention will be described below.

実施例 1mm厚のソーダガラス板表面にスクリーン印刷
で、下記組成のレジストインキを花柄に印刷
し、つづいて、下記組成のガラス腐食剤を上記
ガラス板表面にスプレーで全面コートした。更に
組成のガス拡散防止剤をスクリーン印刷で全面
塗布した。この結果ガラス板表面に厚さ15μのレ
ジスト層の上に厚さ20μのガラス腐食剤層、厚さ
15μのガス拡散防止層が形成された。
Example A floral pattern was printed on the surface of a soda glass plate with a thickness of 1 mm using a resist ink having the composition shown below, and then a glass corrosive agent having the composition shown below was coated over the entire surface of the glass plate by spraying. Furthermore, a gas diffusion inhibitor of the same composition was applied over the entire surface by screen printing. As a result, on the surface of the glass plate, a 20μ thick glass corrosive agent layer is applied on top of a 15μ thick resist layer.
A 15 μm gas diffusion prevention layer was formed.

レジスト剤組成 高融点ガラスフリツト OC−790(奥野製薬
工業社製) 40部 ポリアミド酸 SP−510(東レ社製) 30部 N・メチル・2ピロリドン 30部 ガラス腐食剤組成 フツ化アルミニウムアンモニウム塩
(NH43AlF6 30部 リン酸水素−カリウム KH2PO4 8部 コーポニール 4906(日本合成化学社製)
15部 トルエン 45部 デユオミン TDO(ライオン・アクゾ社製)
2部 ガス拡散防止剤組成 高融点フリツト OG−15(日本フエロー社
製) 40部 アルマテツクス 762・LV55A(三井東圧化
学社製) 14部 ユーバン 203E60(三井東圧化学社製) 4部 エピコート 1009(シエル社製) 2部 ソルベツソ #100(エツソ社製) 40部 その後該ガラス板に450℃、20分の加熱処理を
施し、残余物を水洗で取り除いた結果、美麗な花
柄抜きのマツト部が形成されたガラス板を得るこ
とができた。
Resist agent composition High melting point glass frit OC-790 (manufactured by Okuno Pharmaceutical Co., Ltd.) 40 parts Polyamic acid SP-510 (manufactured by Toray Industries, Inc.) 30 parts N-methyl-2-pyrrolidone 30 parts Glass corrosive composition Aluminum ammonium fluoride salt (NH 4 ) 3 AlF 6 30 parts Potassium hydrogen phosphate KH 2 PO 4 8 parts Coponyl 4906 (manufactured by Nippon Gosei Kagaku Co., Ltd.)
15 parts toluene 45 parts Duomine TDO (manufactured by Lion Akzo)
2 parts Gas diffusion inhibitor composition High melting point frit OG-15 (manufactured by Nippon Fellow Co., Ltd.) 40 parts Almatex 762/LV55A (manufactured by Mitsui Toatsu Chemical Co., Ltd.) 14 parts Euban 203E60 (manufactured by Mitsui Toatsu Chemical Co., Ltd.) 4 parts Epicote 1009 (manufactured by Mitsui Toatsu Chemical Co., Ltd.) (Manufactured by Ciel) 2 parts Solbetsuso #100 (Manufactured by Etsuso) 40 parts The glass plate was then heat treated at 450℃ for 20 minutes, and the residue was removed by washing with water, resulting in a beautiful pine part without floral patterns. A formed glass plate could be obtained.

Claims (1)

【特許請求の範囲】 1 セラミツク基材表面の必要部分にガラス腐食
性ガスを透過させないようなレジスト層を設けた
後、少なくとも該レジスト層を設けない部分を覆
うように、加熱によつてガラス腐食性ガスを発生
するようなガラス腐食剤と固体皮膜形成能をもつ
有機物質とを主成分とするインキ組成物を用いて
腐食剤層を設け、しかる後該ガラス腐食剤が熱分
解してガラス腐食性ガスを発生するような温度で
加熱することを特徴とする表面に凹凸部分を有す
るセラミツク製品の製造方法。 2 レジスト層が高融点無機物質よりなるもので
あることを特徴とする特許請求の範囲第1項記載
の表面に凹凸部分を有するセラミツク製品の製造
方法。 3 レジスト層が高融点無機物質よりなる層の上
に低融点無機物質よりなる層が積層されて構成さ
れるものであることを特徴とする特許請求の範囲
第1項記載の表面に凹凸部分を有するセラミツク
製品の製造方法。 4 レジスト層がガラス腐食性ガスと化学的に結
合する固体塩基及び/又は含窒素樹脂を主成分と
するものであることを特徴とする特許請求の範囲
第1項記載の表面に凹凸部分を有するセラミツク
製品の製造方法。 5 腐食剤層が、無機物質よりなるガス拡散防止
層によつて覆われたことを特徴とする特許請求の
範囲第1項記載の表面に凹凸部分を有するセラミ
ツク製品の製造方法。
[Scope of Claims] 1. After providing a resist layer that does not allow glass corrosive gas to pass through the necessary portions of the surface of the ceramic substrate, the glass is corroded by heating so as to cover at least the portions where the resist layer is not provided. A corrosive agent layer is formed using an ink composition whose main components are a glass corrosive agent that generates a toxic gas and an organic substance capable of forming a solid film, and then the glass corrosive agent thermally decomposes and corrodes the glass. A method for manufacturing a ceramic product having an uneven surface, the method comprising heating at a temperature that generates a toxic gas. 2. The method for manufacturing a ceramic product having an uneven surface on the surface as set forth in claim 1, wherein the resist layer is made of a high melting point inorganic substance. 3. A resist layer having an uneven portion on the surface as set forth in claim 1, wherein the resist layer is composed of a layer made of a low melting point inorganic material laminated on a layer made of a high melting point inorganic material. A method for manufacturing ceramic products. 4. Having an uneven portion on the surface according to claim 1, wherein the resist layer is mainly composed of a solid base and/or a nitrogen-containing resin that chemically bonds with glass corrosive gas. Method of manufacturing ceramic products. 5. The method for manufacturing a ceramic product having an uneven surface as claimed in claim 1, wherein the corrosive layer is covered with a gas diffusion prevention layer made of an inorganic substance.
JP2513382A 1982-02-17 1982-02-17 Manufacture of ceramic products with relief surface Granted JPS58145675A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP2513382A JPS58145675A (en) 1982-02-17 1982-02-17 Manufacture of ceramic products with relief surface

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2513382A JPS58145675A (en) 1982-02-17 1982-02-17 Manufacture of ceramic products with relief surface

Publications (2)

Publication Number Publication Date
JPS58145675A JPS58145675A (en) 1983-08-30
JPH0144676B2 true JPH0144676B2 (en) 1989-09-28

Family

ID=12157460

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2513382A Granted JPS58145675A (en) 1982-02-17 1982-02-17 Manufacture of ceramic products with relief surface

Country Status (1)

Country Link
JP (1) JPS58145675A (en)

Also Published As

Publication number Publication date
JPS58145675A (en) 1983-08-30

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