JPH0160352U - - Google Patents
Info
- Publication number
- JPH0160352U JPH0160352U JP15475887U JP15475887U JPH0160352U JP H0160352 U JPH0160352 U JP H0160352U JP 15475887 U JP15475887 U JP 15475887U JP 15475887 U JP15475887 U JP 15475887U JP H0160352 U JPH0160352 U JP H0160352U
- Authority
- JP
- Japan
- Prior art keywords
- lens
- vacuum
- proton beam
- sample
- scattered
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 230000001133 acceleration Effects 0.000 claims description 5
- 238000005211 surface analysis Methods 0.000 claims description 5
- 230000005684 electric field Effects 0.000 claims description 2
- 238000010586 diagram Methods 0.000 description 2
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical group [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 1
Landscapes
- Analysing Materials By The Use Of Radiation (AREA)
Description
第１図は本考案の表面解析装置の概略全体構成
図。第２図は磁界型Ｑレンズを使つた場合のＱレ
ンズ近傍中央縦断面図。第３図は第２図の−
断面図。第４図は電界型Ｑレンズを使つた場合の
Ｑレンズ近傍中央縦断面図。第５図は第４図の
−断面図。第６図は従来例に係る表面解析装置
の概略全体構成図。第７図は従来例の装置におい
てＱレンズと加減速管をスリツトによつて仕切つ
た場合の縦断面図。第８図は従来例の装置におい
てＱレンズと加減速管をオリフイスによつて仕切
つた場合の縦断面図。
１……イオン源、２……マグネツト、３……加
減速管、４……オリフイス、５……Ｑレンズ、６
……オリフイス、７……超高真空チヤンバ、８…
…アクセプタンススリツト、９……位置検出器、
１０……試料、１１……ホルダ、１２……マニピ
ユレータ、１５……Ｑレンズ、１６……オリフイ
ス、２１〜２４……真空排気装置、３１，３２…
…スリツト、３４……鉄芯、３５……磁極、３６
……コイル、３８……絶縁壁、３９……電極。
FIG. 1 is a schematic overall configuration diagram of the surface analysis device of the present invention. Figure 2 is a central vertical cross-sectional view near the Q lens when a magnetic field type Q lens is used. Figure 3 is - of Figure 2.
Cross-sectional view. Fig. 4 is a central vertical cross-sectional view near the Q lens when an electric field type Q lens is used. FIG. 5 is a cross-sectional view taken from FIG. FIG. 6 is a schematic overall configuration diagram of a conventional surface analysis device. FIG. 7 is a longitudinal sectional view of a conventional device in which the Q lens and the acceleration/deceleration tube are separated by a slit. FIG. 8 is a longitudinal sectional view of a conventional device in which the Q lens and the acceleration/deceleration tube are separated by an orifice. 1... Ion source, 2... Magnet, 3... Acceleration/deceleration tube, 4... Orifice, 5... Q lens, 6
...Orifice, 7...Ultra-high vacuum chamber, 8...
...Acceptance slit, 9...Position detector,
10... Sample, 11... Holder, 12... Manipulator, 15... Q lens, 16... Orifice, 21-24... Vacuum exhaust device, 31, 32...
...Slit, 34...Iron core, 35...Magnetic pole, 36
... Coil, 38 ... Insulating wall, 39 ... Electrode.
Claims (1)
源１と、真空中に於て陽子ビーム軌道を曲げるマ
グネツト２と、真空中に於てマグネツト２を通つ
た陽子を加速して試料に当て試料で散乱された陽
子のうちΘ１８０゜の散乱角で散乱された陽子
を減速する加減速管３と、真空中で散乱された陽
子ビームを絞るＱレンズ５と、超高真空中に於て
試料１０を内部に保持する超高真空チヤンバ７と
、試料１０の直前に設けられ入射陽子ビームと散
乱角Θが１８０゜から一定範囲にある散乱ビーム
とを通すアクセプタンススリツト８と、加減速管
３の空間と超高真空チヤンバ７の間に設けられ両
空間の真空度の差を維持するための円筒状のオリ
フイス６と、散乱され減速された陽子ビームの運
動エネルギー分布を測定するアナライザーとより
なる表面解析装置に於て、Ｑレンズ５とオリフイ
ス６とが同一位置に設けられている事を特徴とす
る表面解析装置。 (2) Ｑレンズが磁界型のＱレンズである事を特
徴とする実用新案登録請求の範囲第(1)項記載の
表面解析装置。 (3) Ｑレンズが電界型のＱレンズである事を特
徴とする実用新案登録請求の範囲第(1)項記載の
表面解析装置。[Claims for Utility Model Registration] (1) An ion source 1 that generates a proton beam in a vacuum, a magnet 2 that bends the trajectory of the proton beam in a vacuum, and an ion source 1 that generates a proton beam in a vacuum, and a magnet 2 that passes through the magnet 2 in a vacuum. An acceleration/deceleration tube 3 that accelerates protons and decelerates them by applying them to the sample and decelerating the protons scattered by the sample at a scattering angle of Θ180°, and a Q lens 5 that focuses the scattered proton beam in vacuum. An ultra-high vacuum chamber 7 holds a sample 10 inside in an ultra-high vacuum, and an acceptance chamber is provided just before the sample 10 and passes an incident proton beam and a scattered beam whose scattering angle Θ is within a certain range from 180 degrees. 8, a cylindrical orifice 6 provided between the space of the acceleration/deceleration tube 3 and the ultra-high vacuum chamber 7 to maintain the difference in the degree of vacuum between the two spaces, and the kinetic energy of the scattered and decelerated proton beam. A surface analysis device comprising an analyzer for measuring distribution, characterized in that a Q lens 5 and an orifice 6 are provided at the same position. (2) The surface analysis device according to claim (1) of the utility model registration, characterized in that the Q lens is a magnetic field type Q lens. (3) The surface analysis device according to claim (1) of the utility model registration, characterized in that the Q lens is an electric field type Q lens.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15475887U JPH0622915Y2 (en) | 1987-10-07 | 1987-10-07 | Surface analyzer |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP15475887U JPH0622915Y2 (en) | 1987-10-07 | 1987-10-07 | Surface analyzer |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPH0160352U true JPH0160352U (en) | 1989-04-17 |
| JPH0622915Y2 JPH0622915Y2 (en) | 1994-06-15 |
Family
ID=31431775
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP15475887U Expired - Lifetime JPH0622915Y2 (en) | 1987-10-07 | 1987-10-07 | Surface analyzer |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPH0622915Y2 (en) |
-
1987
- 1987-10-07 JP JP15475887U patent/JPH0622915Y2/en not_active Expired - Lifetime
Also Published As
| Publication number | Publication date |
|---|---|
| JPH0622915Y2 (en) | 1994-06-15 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| JPH0378742B2 (en) | ||
| JPH0160352U (en) | ||
| JPH0160452U (en) | ||
| JPS63106055U (en) | ||
| GB957117A (en) | Improvements relating to mass spectrometers | |
| JPH0254156U (en) | ||
| JPS5833643Y2 (en) | Ion beam current detection device in mass spectrometer | |
| JPS5580253A (en) | Charged particle beam processing device | |
| JPS63147816U (en) | ||
| JPS6314358U (en) | ||
| JPS55122350A (en) | Compact double convergence type mass spectrometer | |
| JPH0227651A (en) | Surface analyzer | |
| JPS6422000U (en) | ||
| JPH01131185U (en) | ||
| JPS6412370U (en) | ||
| JPH0171857U (en) | ||
| JPS6312153U (en) | ||
| JPS5719950A (en) | Double focus type mass spectrometer | |
| JPH025874U (en) | ||
| JPS6151659U (en) | ||
| JPS5985573U (en) | mass spectrometer | |
| JPS5933765U (en) | Ion milling etching equipment | |
| JPS6339853U (en) | ||
| JPS63150845A (en) | Surface analysis device | |
| DAVIS | Development of a scanning electron microscope based microanalytical system[Ph. D. Thesis] |