JPH02102197A - ダイヤモンドの合成方法 - Google Patents

ダイヤモンドの合成方法

Info

Publication number: JPH02102197A
Authority: JP; Japan
Prior art keywords: diamond; gas; pulse; microwave; substrate
Prior art date: 1988-10-07
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.): Granted

Application number

JP25439488A

Other languages

English (en)

Japanese (ja)

Other versions

JPH0476346B2 (2

Inventor

Satoshi Katsumata

聡勝又

Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)

Idemitsu Petrochemical Co Ltd

Original Assignee

Idemitsu Petrochemical Co Ltd

Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)

1988-10-07

Filing date

1988-10-07

Publication date

1990-04-13

1988-10-07 Application filed by Idemitsu Petrochemical Co Ltd filed Critical Idemitsu Petrochemical Co Ltd

1988-10-07 Priority to JP25439488A priority Critical patent/JPH02102197A/ja

1990-04-13 Publication of JPH02102197A publication Critical patent/JPH02102197A/ja

1992-12-03 Publication of JPH0476346B2 publication Critical patent/JPH0476346B2/ja

Status Granted legal-status Critical Current

Links

239000010432 diamond Substances 0.000 title claims abstract description 79
229910003460 diamond Inorganic materials 0.000 title claims abstract description 72
238000000034 method Methods 0.000 title claims description 11
230000002194 synthesizing effect Effects 0.000 title claims description 6
OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 claims abstract description 18
239000000758 substrate Substances 0.000 claims abstract description 16
229910052799 carbon Inorganic materials 0.000 claims abstract description 15
239000002994 raw material Substances 0.000 claims abstract description 12
230000005284 excitation Effects 0.000 claims abstract description 10
238000006243 chemical reaction Methods 0.000 abstract description 10
239000010419 fine particle Substances 0.000 abstract description 2
239000002245 particle Substances 0.000 abstract description 2
239000007789 gas Substances 0.000 description 42
239000010408 film Substances 0.000 description 20
CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 description 13
UFHFLCQGNIYNRP-UHFFFAOYSA-N Hydrogen Chemical compound [H][H] UFHFLCQGNIYNRP-UHFFFAOYSA-N 0.000 description 11
OKKJLVBELUTLKV-UHFFFAOYSA-N Methanol Chemical compound OC OKKJLVBELUTLKV-UHFFFAOYSA-N 0.000 description 9
229910002090 carbon oxide Inorganic materials 0.000 description 8
-1 olefin hydrocarbons Chemical class 0.000 description 8
230000015572 biosynthetic process Effects 0.000 description 7
230000000052 comparative effect Effects 0.000 description 7
229930195733 hydrocarbon Natural products 0.000 description 7
CSCPPACGZOOCGX-UHFFFAOYSA-N Acetone Chemical compound CC(C)=O CSCPPACGZOOCGX-UHFFFAOYSA-N 0.000 description 6
LFQSCWFLJHTTHZ-UHFFFAOYSA-N Ethanol Chemical compound CCO LFQSCWFLJHTTHZ-UHFFFAOYSA-N 0.000 description 6
VNWKTOKETHGBQD-UHFFFAOYSA-N methane Chemical compound C VNWKTOKETHGBQD-UHFFFAOYSA-N 0.000 description 6
238000003786 synthesis reaction Methods 0.000 description 6
239000003208 petroleum Substances 0.000 description 5
238000005268 plasma chemical vapour deposition Methods 0.000 description 5
229910052710 silicon Inorganic materials 0.000 description 5
239000010703 silicon Substances 0.000 description 5
XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 4
ATUOYWHBWRKTHZ-UHFFFAOYSA-N Propane Chemical compound CCC ATUOYWHBWRKTHZ-UHFFFAOYSA-N 0.000 description 4
XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 description 4
239000001569 carbon dioxide Substances 0.000 description 4
229910002092 carbon dioxide Inorganic materials 0.000 description 4
238000000151 deposition Methods 0.000 description 4
230000008021 deposition Effects 0.000 description 4
150000002430 hydrocarbons Chemical class 0.000 description 4
QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 3
UHOVQNZJYSORNB-UHFFFAOYSA-N Benzene Chemical compound C1=CC=CC=C1 UHOVQNZJYSORNB-UHFFFAOYSA-N 0.000 description 3
UGFAIRIUMAVXCW-UHFFFAOYSA-N Carbon monoxide Chemical compound [O+]#[C-] UGFAIRIUMAVXCW-UHFFFAOYSA-N 0.000 description 3
YMWUJEATGCHHMB-UHFFFAOYSA-N Dichloromethane Chemical compound ClCCl YMWUJEATGCHHMB-UHFFFAOYSA-N 0.000 description 3
XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
LYCAIKOWRPUZTN-UHFFFAOYSA-N Ethylene glycol Chemical compound OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 3
YZCKVEUIGOORGS-UHFFFAOYSA-N Hydrogen atom Chemical compound [H] YZCKVEUIGOORGS-UHFFFAOYSA-N 0.000 description 3
YXFVVABEGXRONW-UHFFFAOYSA-N Toluene Chemical compound CC1=CC=CC=C1 YXFVVABEGXRONW-UHFFFAOYSA-N 0.000 description 3
ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 3
150000001298 alcohols Chemical class 0.000 description 3
QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 3
229910002091 carbon monoxide Inorganic materials 0.000 description 3
150000001875 compounds Chemical class 0.000 description 3
MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
230000000694 effects Effects 0.000 description 3
229910002804 graphite Inorganic materials 0.000 description 3
239000010439 graphite Substances 0.000 description 3
239000001257 hydrogen Substances 0.000 description 3
229910052739 hydrogen Inorganic materials 0.000 description 3
239000001301 oxygen Substances 0.000 description 3
229910052760 oxygen Inorganic materials 0.000 description 3
239000002244 precipitate Substances 0.000 description 3
238000001308 synthesis method Methods 0.000 description 3
XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 2
KAKZBPTYRLMSJV-UHFFFAOYSA-N Butadiene Chemical compound C=CC=C KAKZBPTYRLMSJV-UHFFFAOYSA-N 0.000 description 2
RGSFGYAAUTVSQA-UHFFFAOYSA-N Cyclopentane Chemical compound C1CCCC1 RGSFGYAAUTVSQA-UHFFFAOYSA-N 0.000 description 2
RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
OTMSDBZUPAUEDD-UHFFFAOYSA-N Ethane Chemical compound CC OTMSDBZUPAUEDD-UHFFFAOYSA-N 0.000 description 2
LRHPLDYGYMQRHN-UHFFFAOYSA-N N-Butanol Chemical compound CCCCO LRHPLDYGYMQRHN-UHFFFAOYSA-N 0.000 description 2
UFWIBTONFRDIAS-UHFFFAOYSA-N Naphthalene Chemical compound C1=CC=CC2=CC=CC=C21 UFWIBTONFRDIAS-UHFFFAOYSA-N 0.000 description 2
HSFWRNGVRCDJHI-UHFFFAOYSA-N alpha-acetylene Natural products C#C HSFWRNGVRCDJHI-UHFFFAOYSA-N 0.000 description 2
HUMNYLRZRPPJDN-UHFFFAOYSA-N benzaldehyde Chemical compound O=CC1=CC=CC=C1 HUMNYLRZRPPJDN-UHFFFAOYSA-N 0.000 description 2
RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
239000012965 benzophenone Substances 0.000 description 2
GZUXJHMPEANEGY-UHFFFAOYSA-N bromomethane Chemical compound BrC GZUXJHMPEANEGY-UHFFFAOYSA-N 0.000 description 2
239000007806 chemical reaction intermediate Substances 0.000 description 2
XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 2
238000002309 gasification Methods 0.000 description 2
239000000543 intermediate Substances 0.000 description 2
150000002576 ketones Chemical class 0.000 description 2
239000000203 mixture Substances 0.000 description 2
FDPIMTJIUBPUKL-UHFFFAOYSA-N pentan-3-one Chemical compound CCC(=O)CC FDPIMTJIUBPUKL-UHFFFAOYSA-N 0.000 description 2
239000001294 propane Substances 0.000 description 2
KDYFGRWQOYBRFD-UHFFFAOYSA-N succinic acid Chemical compound OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 2
VZGDMQKNWNREIO-UHFFFAOYSA-N tetrachloromethane Chemical compound ClC(Cl)(Cl)Cl VZGDMQKNWNREIO-UHFFFAOYSA-N 0.000 description 2
GETQZCLCWQTVFV-UHFFFAOYSA-N trimethylamine Chemical compound CN(C)C GETQZCLCWQTVFV-UHFFFAOYSA-N 0.000 description 2
XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 2
RYHBNJHYFVUHQT-UHFFFAOYSA-N 1,4-Dioxane Chemical compound C1COCCO1 RYHBNJHYFVUHQT-UHFFFAOYSA-N 0.000 description 1
VYZAMTAEIAYCRO-UHFFFAOYSA-N Chromium Chemical compound [Cr] VYZAMTAEIAYCRO-UHFFFAOYSA-N 0.000 description 1
PMPVIKIVABFJJI-UHFFFAOYSA-N Cyclobutane Chemical compound C1CCC1 PMPVIKIVABFJJI-UHFFFAOYSA-N 0.000 description 1
XDTMQSROBMDMFD-UHFFFAOYSA-N Cyclohexane Chemical compound C1CCCCC1 XDTMQSROBMDMFD-UHFFFAOYSA-N 0.000 description 1
LVZWSLJZHVFIQJ-UHFFFAOYSA-N Cyclopropane Chemical compound C1CC1 LVZWSLJZHVFIQJ-UHFFFAOYSA-N 0.000 description 1
LCGLNKUTAGEVQW-UHFFFAOYSA-N Dimethyl ether Chemical compound COC LCGLNKUTAGEVQW-UHFFFAOYSA-N 0.000 description 1
XOBKSJJDNFUZPF-UHFFFAOYSA-N Methoxyethane Chemical compound CCOC XOBKSJJDNFUZPF-UHFFFAOYSA-N 0.000 description 1
ZOKXTWBITQBERF-UHFFFAOYSA-N Molybdenum Chemical compound [Mo] ZOKXTWBITQBERF-UHFFFAOYSA-N 0.000 description 1
CTQNGGLPUBDAKN-UHFFFAOYSA-N O-Xylene Chemical compound CC1=CC=CC=C1C CTQNGGLPUBDAKN-UHFFFAOYSA-N 0.000 description 1
XBDQKXXYIPTUBI-UHFFFAOYSA-M Propionate Chemical compound CCC([O-])=O XBDQKXXYIPTUBI-UHFFFAOYSA-M 0.000 description 1
238000001069 Raman spectroscopy Methods 0.000 description 1
241000779819 Syncarpia glomulifera Species 0.000 description 1
RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 1
IKHGUXGNUITLKF-XPULMUKRSA-N acetaldehyde Chemical compound [14CH]([14CH3])=O IKHGUXGNUITLKF-XPULMUKRSA-N 0.000 description 1
KXKVLQRXCPHEJC-UHFFFAOYSA-N acetic acid trimethyl ester Natural products COC(C)=O KXKVLQRXCPHEJC-UHFFFAOYSA-N 0.000 description 1
239000002253 acid Substances 0.000 description 1
150000001299 aldehydes Chemical class 0.000 description 1
239000000956 alloy Substances 0.000 description 1
229910045601 alloy Inorganic materials 0.000 description 1
229910052782 aluminium Inorganic materials 0.000 description 1
XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 1
150000001412 amines Chemical class 0.000 description 1
238000004458 analytical method Methods 0.000 description 1
229910052786 argon Inorganic materials 0.000 description 1
150000004945 aromatic hydrocarbons Chemical class 0.000 description 1
125000000732 arylene group Chemical group 0.000 description 1
239000001273 butane Substances 0.000 description 1
150000001722 carbon compounds Chemical class 0.000 description 1
229950005499 carbon tetrachloride Drugs 0.000 description 1
239000012159 carrier gas Substances 0.000 description 1
239000000919 ceramic Substances 0.000 description 1
NEHMKBQYUWJMIP-NJFSPNSNSA-N chloro(114C)methane Chemical compound [14CH3]Cl NEHMKBQYUWJMIP-NJFSPNSNSA-N 0.000 description 1
229910052804 chromium Inorganic materials 0.000 description 1
239000011651 chromium Substances 0.000 description 1
239000003245 coal Substances 0.000 description 1
229910017052 cobalt Inorganic materials 0.000 description 1
239000010941 cobalt Substances 0.000 description 1
GUTLYIVDDKVIGB-UHFFFAOYSA-N cobalt atom Chemical compound [Co] GUTLYIVDDKVIGB-UHFFFAOYSA-N 0.000 description 1
239000002131 composite material Substances 0.000 description 1
238000007796 conventional method Methods 0.000 description 1
230000000875 corresponding effect Effects 0.000 description 1
HWEQKSVYKBUIIK-UHFFFAOYSA-N cyclobuta-1,3-diene Chemical compound C1=CC=C1 HWEQKSVYKBUIIK-UHFFFAOYSA-N 0.000 description 1
239000010727 cylinder oil Substances 0.000 description 1
238000010586 diagram Methods 0.000 description 1
238000005868 electrolysis reaction Methods 0.000 description 1
238000005516 engineering process Methods 0.000 description 1
150000002148 esters Chemical class 0.000 description 1
150000002170 ethers Chemical class 0.000 description 1
LRMHFDNWKCSEQU-UHFFFAOYSA-N ethoxyethane;phenol Chemical compound CCOCC.OC1=CC=CC=C1 LRMHFDNWKCSEQU-UHFFFAOYSA-N 0.000 description 1
125000002534 ethynyl group Chemical group [H]C#C* 0.000 description 1
238000011156 evaluation Methods 0.000 description 1
239000000295 fuel oil Substances 0.000 description 1
239000003502 gasoline Substances 0.000 description 1
239000012208 gear oil Substances 0.000 description 1
229910052732 germanium Inorganic materials 0.000 description 1
GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 description 1
239000010649 ginger oil Substances 0.000 description 1
150000008282 halocarbons Chemical class 0.000 description 1
239000000383 hazardous chemical Substances 0.000 description 1
239000001307 helium Substances 0.000 description 1
229910052734 helium Inorganic materials 0.000 description 1
SWQJXJOGLNCZEY-UHFFFAOYSA-N helium atom Chemical compound [He] SWQJXJOGLNCZEY-UHFFFAOYSA-N 0.000 description 1
DMEGYFMYUHOHGS-UHFFFAOYSA-N heptamethylene Natural products C1CCCCCC1 DMEGYFMYUHOHGS-UHFFFAOYSA-N 0.000 description 1
125000004435 hydrogen atom Chemical group [H]* 0.000 description 1
239000012535 impurity Substances 0.000 description 1
239000011261 inert gas Substances 0.000 description 1
229910052742 iron Inorganic materials 0.000 description 1
230000001678 irradiating effect Effects 0.000 description 1
239000003350 kerosene Substances 0.000 description 1
238000004519 manufacturing process Methods 0.000 description 1
239000000463 material Substances 0.000 description 1
229910052751 metal Inorganic materials 0.000 description 1
239000002184 metal Substances 0.000 description 1
150000001247 metal acetylides Chemical class 0.000 description 1
150000002739 metals Chemical class 0.000 description 1
230000029052 metamorphosis Effects 0.000 description 1
WSFSSNUMVMOOMR-NJFSPNSNSA-N methanone Chemical compound O=[14CH2] WSFSSNUMVMOOMR-NJFSPNSNSA-N 0.000 description 1
VNKYTQGIUYNRMY-UHFFFAOYSA-N methoxypropane Chemical compound CCCOC VNKYTQGIUYNRMY-UHFFFAOYSA-N 0.000 description 1
229940102396 methyl bromide Drugs 0.000 description 1
229940073584 methylene chloride Drugs 0.000 description 1
125000000325 methylidene group Chemical group [H]C([H])=* 0.000 description 1
229910052750 molybdenum Inorganic materials 0.000 description 1
239000011733 molybdenum Substances 0.000 description 1
IJDNQMDRQITEOD-UHFFFAOYSA-N n-butane Chemical compound CCCC IJDNQMDRQITEOD-UHFFFAOYSA-N 0.000 description 1
OFBQJSOFQDEBGM-UHFFFAOYSA-N n-pentane Natural products CCCCC OFBQJSOFQDEBGM-UHFFFAOYSA-N 0.000 description 1
239000003345 natural gas Substances 0.000 description 1
229910052754 neon Inorganic materials 0.000 description 1
GKAOGPIIYCISHV-UHFFFAOYSA-N neon atom Chemical compound [Ne] GKAOGPIIYCISHV-UHFFFAOYSA-N 0.000 description 1
150000004767 nitrides Chemical class 0.000 description 1
QJGQUHMNIGDVPM-UHFFFAOYSA-N nitrogen group Chemical group [N] QJGQUHMNIGDVPM-UHFFFAOYSA-N 0.000 description 1
239000003921 oil Substances 0.000 description 1
JRZJOMJEPLMPRA-UHFFFAOYSA-N olefin Natural products CCCCCCCC=C JRZJOMJEPLMPRA-UHFFFAOYSA-N 0.000 description 1
150000007524 organic acids Chemical class 0.000 description 1
235000005985 organic acids Nutrition 0.000 description 1
QNGNSVIICDLXHT-UHFFFAOYSA-N para-ethylbenzaldehyde Natural products CCC1=CC=C(C=O)C=C1 QNGNSVIICDLXHT-UHFFFAOYSA-N 0.000 description 1
239000012188 paraffin wax Substances 0.000 description 1
239000010665 pine oil Substances 0.000 description 1
239000001739 pinus spp. Substances 0.000 description 1
238000001556 precipitation Methods 0.000 description 1
235000019260 propionic acid Nutrition 0.000 description 1
IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 1
230000000630 rising effect Effects 0.000 description 1
150000003376 silicon Chemical class 0.000 description 1
238000004544 sputter deposition Methods 0.000 description 1
239000000126 substance Substances 0.000 description 1
239000001384 succinic acid Substances 0.000 description 1
239000010409 thin film Substances 0.000 description 1
229910052719 titanium Inorganic materials 0.000 description 1
239000010936 titanium Substances 0.000 description 1
WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
229910052721 tungsten Inorganic materials 0.000 description 1
239000010937 tungsten Substances 0.000 description 1
229940036248 turpentine Drugs 0.000 description 1
239000008096 xylene Substances 0.000 description 1

Landscapes

Crystals, And After-Treatments Of Crystals (AREA)

JP25439488A 1988-10-07 1988-10-07 ダイヤモンドの合成方法 Granted JPH02102197A (ja)

Priority Applications (1)

Application Number	Priority Date	Filing Date	Title
JP25439488A JPH02102197A (ja)	1988-10-07	1988-10-07	ダイヤモンドの合成方法

Applications Claiming Priority (1)

Application Number	Priority Date	Filing Date	Title
JP25439488A JPH02102197A (ja)	1988-10-07	1988-10-07	ダイヤモンドの合成方法

Publications (2)

Publication Number	Publication Date
JPH02102197A true JPH02102197A (ja)	1990-04-13
JPH0476346B2 JPH0476346B2 (2)	1992-12-03

Family

ID=17264369

Family Applications (1)

Application Number	Title	Priority Date	Filing Date
JP25439488A Granted JPH02102197A (ja)	1988-10-07	1988-10-07	ダイヤモンドの合成方法

Country Status (1)

Country	Link
JP (1)	JPH02102197A (2)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04132683A (ja) *	1990-09-25	1992-05-06	Semiconductor Energy Lab Co Ltd	薄膜の作成方法
US6110542A (en) *	1990-09-25	2000-08-29	Semiconductor Energy Laboratory Co., Ltd.	Method for forming a film
JP2008291327A (ja) *	2007-05-25	2008-12-04	Toyota Motor Corp	アモルファスカーボン膜の製造方法および製造装置

1988
- 1988-10-07 JP JP25439488A patent/JPH02102197A/ja active Granted

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number	Priority date	Publication date	Assignee	Title
JPH04132683A (ja) *	1990-09-25	1992-05-06	Semiconductor Energy Lab Co Ltd	薄膜の作成方法
US6110542A (en) *	1990-09-25	2000-08-29	Semiconductor Energy Laboratory Co., Ltd.	Method for forming a film
US6660342B1 (en)	1990-09-25	2003-12-09	Semiconductor Energy Laboratory Co., Ltd.	Pulsed electromagnetic energy method for forming a film
US7125588B2 (en)	1990-09-25	2006-10-24	Semiconductor Energy Laboratory Co., Ltd.	Pulsed plasma CVD method for forming a film
JP2008291327A (ja) *	2007-05-25	2008-12-04	Toyota Motor Corp	アモルファスカーボン膜の製造方法および製造装置

Also Published As

Publication number	Publication date
JPH0476346B2 (2)	1992-12-03

Legal Events

Date	Code	Title	Description
2003-12-03	LAPS	Cancellation because of no payment of annual fees

Publication	Publication Date	Title
US4985227A (en)	1991-01-15	Method for synthesis or diamond
JPS63107898A (ja)	1988-05-12	プラズマを用いるダイヤモンドの合成法
Inspektor et al.	1989	Plasma CVD diamond deposition in CHO systems
US5491002A (en)	1996-02-13	Multilayer CVD diamond films
US5258206A (en)	1993-11-02	Method and apparatus for producing diamond thin films
JPS6136200A (ja)	1986-02-20	ダイヤモンドの気相合成法
JPH02102197A (ja)	1990-04-13	ダイヤモンドの合成方法
JPH02217398A (ja)	1990-08-30	ダイヤモンド類薄膜による被覆方法
JPH0524114B2 (2)	1993-04-06
JPS6054996A (ja)	1985-03-29	ダイヤモンドの合成法
JPH02239192A (ja)	1990-09-21	ダイヤモンドの合成方法
JPH0361369A (ja)	1991-03-18	ダイヤモンド状炭素膜の製造方法
JPH02188494A (ja)	1990-07-24	ダイヤモンド類薄膜の製造方法および製造装置
JP2706492B2 (ja)	1998-01-28	ダイヤモンド粉末の合成方法
JPH02250967A (ja)	1990-10-08	ダイヤモンド類被覆部材およびその製造方法
JP3126005B2 (ja)	2001-01-22	ダイヤモンドの製造方法
JPS63166733A (ja)	1988-07-09	ダイヤモンド膜の製造方法
JPH01197391A (ja)	1989-08-09	ダイヤモンドの合成方法
JPH03252396A (ja)	1991-11-11	ダイヤモンドの製造方法
JPH02133397A (ja)	1990-05-22	ダイヤモンドの合成方法とその合成装置
JP2585342B2 (ja)	1997-02-26	ダイヤモンド気相合成法
JPH0255297A (ja)	1990-02-23	ダイヤモンドの合成方法
Bárdoš et al.	1993	Reactive deposition of diamond and Si carbide films by hydrogen plasma etching of graphite and Si in the rf plasma jet
JPS60200896A (ja)	1985-10-11	繊維状ダイヤモンドの合成法
JPH04317497A (ja)	1992-11-09	ダイヤモンド薄膜の製造方法