JPH0222365U - - Google Patents

Info

Publication number
JPH0222365U
JPH0222365U JP10094788U JP10094788U JPH0222365U JP H0222365 U JPH0222365 U JP H0222365U JP 10094788 U JP10094788 U JP 10094788U JP 10094788 U JP10094788 U JP 10094788U JP H0222365 U JPH0222365 U JP H0222365U
Authority
JP
Japan
Prior art keywords
mechanism section
nitride film
film growth
section
plasma cvd
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP10094788U
Other languages
English (en)
Other versions
JPH065416Y2 (ja
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP10094788U priority Critical patent/JPH065416Y2/ja
Publication of JPH0222365U publication Critical patent/JPH0222365U/ja
Application granted granted Critical
Publication of JPH065416Y2 publication Critical patent/JPH065416Y2/ja
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

Links

Landscapes

  • Separation Of Gases By Adsorption (AREA)
  • Chemical Vapour Deposition (AREA)

Description

【図面の簡単な説明】
第１図は本考案のプラズマＣＶＤ窒化膜成長装
置の断面図である。 １，１５……Ｎ２ガス源、２……ＳｉＨ４ガス
源、３……ＮＨ３ガス源、４……ニドールバルブ
、５……ガスラインフイルタ、６……マスフロー
コントローラ、７……ストツプバルブ、８……反
応炉、９……圧力センサ、１０，１８……トラツ
プ、１１，１７……合成ゼオライト、１２……ス
トレーナー、１３……ポンプ、１４……連成計、
１６……高周波発振器、１９……電力計、２０…
…誘導コイル。

Claims (1)

    【実用新案登録請求の範囲】
  1. ウエハー搬送機構部とガス供給機構部とプラズ
    マ反応機構部とそれらに付属する真空系形成の真
    空ポンプ群から構成されているプラズマＣＶＤ法
    による窒化膜成長装置において、反応部と真空ポ
    ンプの間に極性分子を選択的に捕集し、回収する
    機構部を有することを特徴とするプラズマＣＶＤ
    窒化膜成長装置。
JP10094788U 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置 Expired - Lifetime JPH065416Y2 (ja)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP10094788U JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP10094788U JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Publications (2)

Publication Number Publication Date
JPH0222365U true JPH0222365U (ja) 1990-02-14
JPH065416Y2 JPH065416Y2 (ja) 1994-02-09

Family

ID=31329490

Family Applications (1)

Application Number Title Priority Date Filing Date
JP10094788U Expired - Lifetime JPH065416Y2 (ja) 1988-07-28 1988-07-28 プラズマｃｖｄ窒化膜成長装置

Country Status (1)

Country Link
JP (1) JPH065416Y2 (ja)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647234A (ja) * 1992-06-09 1994-02-22 Ebara Infilco Co Ltd Ｃｖｄ法排ガスの除害方法

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH0647234A (ja) * 1992-06-09 1994-02-22 Ebara Infilco Co Ltd Ｃｖｄ法排ガスの除害方法

Also Published As

Publication number Publication date
JPH065416Y2 (ja) 1994-02-09

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