JPH0244325U - - Google Patents

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Publication number
JPH0244325U
JPH0244325U JP1988123417U JP12341788U JPH0244325U JP H0244325 U JPH0244325 U JP H0244325U JP 1988123417 U JP1988123417 U JP 1988123417U JP 12341788 U JP12341788 U JP 12341788U JP H0244325 U JPH0244325 U JP H0244325U
Authority
JP
Japan
Prior art keywords
waveguide
processing apparatus
sample
center
plasma processing
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1988123417U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP1988123417U priority Critical patent/JPH0244325U/ja
Publication of JPH0244325U publication Critical patent/JPH0244325U/ja
Pending legal-status Critical Current

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  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)

Description

【図面の簡単な説明】[Brief explanation of drawings]

第1図は、本考案の一実施例のマイクロ波プラ
ズマ処理装置の要部構成図である。 1……マグネトロン、2……導波管、3……偏
心導波管、4……プラズマ発生室、5……試料台
、6……ウエハ、7,9……歯車、8……ベアリ
ング、10……モータ。
FIG. 1 is a block diagram of the main parts of a microwave plasma processing apparatus according to an embodiment of the present invention. 1... Magnetron, 2... Waveguide, 3... Eccentric waveguide, 4... Plasma generation chamber, 5... Sample stage, 6... Wafer, 7, 9... Gear, 8... Bearing, 10...Motor.

Claims (1)

【実用新案登録請求の範囲】[Scope of utility model registration request] マグネトロンと導波管とプラズマ発生室とを有
するマイクロ波プラズマ処理装置において、前記
導波管の中心と前記プラズマ発生室内試料の中心
とを偏心させて前記導波管を設け、該偏心導波管
を前記試料中心を中心に回転させる手段を設けた
ことを特徴とするマイクロ波プラズマ処理装置。
In a microwave plasma processing apparatus having a magnetron, a waveguide, and a plasma generation chamber, the waveguide is provided such that the center of the waveguide and the center of the sample in the plasma generation chamber are eccentric, and the eccentric waveguide A microwave plasma processing apparatus characterized in that the microwave plasma processing apparatus is provided with means for rotating the sample about the center of the sample.
JP1988123417U 1988-09-22 1988-09-22 Pending JPH0244325U (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1988123417U JPH0244325U (en) 1988-09-22 1988-09-22

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1988123417U JPH0244325U (en) 1988-09-22 1988-09-22

Publications (1)

Publication Number Publication Date
JPH0244325U true JPH0244325U (en) 1990-03-27

Family

ID=31372252

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1988123417U Pending JPH0244325U (en) 1988-09-22 1988-09-22

Country Status (1)

Country Link
JP (1) JPH0244325U (en)

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